JPWO2022215690A5 - - Google Patents

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Publication number
JPWO2022215690A5
JPWO2022215690A5 JP2023513020A JP2023513020A JPWO2022215690A5 JP WO2022215690 A5 JPWO2022215690 A5 JP WO2022215690A5 JP 2023513020 A JP2023513020 A JP 2023513020A JP 2023513020 A JP2023513020 A JP 2023513020A JP WO2022215690 A5 JPWO2022215690 A5 JP WO2022215690A5
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JP
Japan
Prior art keywords
exposure
substrate
exposure pattern
unit
light modulator
Prior art date
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Application number
JP2023513020A
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English (en)
Japanese (ja)
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JPWO2022215690A1 (https=
JP7663120B2 (ja
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Priority claimed from PCT/JP2022/017093 external-priority patent/WO2022215690A1/ja
Publication of JPWO2022215690A1 publication Critical patent/JPWO2022215690A1/ja
Publication of JPWO2022215690A5 publication Critical patent/JPWO2022215690A5/ja
Application granted granted Critical
Publication of JP7663120B2 publication Critical patent/JP7663120B2/ja
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JP2023513020A 2021-04-09 2022-04-05 露光装置、デバイス製造方法およびフラットパネルディスプレイの製造方法 Active JP7663120B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021066818 2021-04-09
JP2021066818 2021-04-09
PCT/JP2022/017093 WO2022215690A1 (ja) 2021-04-09 2022-04-05 露光装置、デバイス製造方法およびフラットパネルディスプレイの製造方法

Publications (3)

Publication Number Publication Date
JPWO2022215690A1 JPWO2022215690A1 (https=) 2022-10-13
JPWO2022215690A5 true JPWO2022215690A5 (https=) 2024-01-17
JP7663120B2 JP7663120B2 (ja) 2025-04-16

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ID=83546189

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023513020A Active JP7663120B2 (ja) 2021-04-09 2022-04-05 露光装置、デバイス製造方法およびフラットパネルディスプレイの製造方法

Country Status (5)

Country Link
JP (1) JP7663120B2 (https=)
KR (1) KR20230150879A (https=)
CN (1) CN117083572A (https=)
TW (1) TW202305513A (https=)
WO (1) WO2022215690A1 (https=)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3052587B2 (ja) * 1992-07-28 2000-06-12 日本電気株式会社 露光装置
JP3593642B2 (ja) * 1996-08-29 2004-11-24 富士通株式会社 露光方法及び露光装置
US7459247B2 (en) * 2004-12-27 2008-12-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2007108559A (ja) 2005-10-17 2007-04-26 Nikon Corp 走査型露光装置及びデバイスの製造方法
US8431328B2 (en) * 2007-02-22 2013-04-30 Nikon Corporation Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus

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