TW202305513A - 曝光裝置、元件製造方法及平板顯示器之製造方法 - Google Patents

曝光裝置、元件製造方法及平板顯示器之製造方法 Download PDF

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Publication number
TW202305513A
TW202305513A TW111113260A TW111113260A TW202305513A TW 202305513 A TW202305513 A TW 202305513A TW 111113260 A TW111113260 A TW 111113260A TW 111113260 A TW111113260 A TW 111113260A TW 202305513 A TW202305513 A TW 202305513A
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TW
Taiwan
Prior art keywords
exposure
substrate
unit
pattern
spatial light
Prior art date
Application number
TW111113260A
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English (en)
Chinese (zh)
Inventor
加藤正紀
水野恭志
水野仁
Original Assignee
日商尼康股份有限公司
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Filing date
Publication date
Application filed by 日商尼康股份有限公司 filed Critical 日商尼康股份有限公司
Publication of TW202305513A publication Critical patent/TW202305513A/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW111113260A 2021-04-09 2022-04-07 曝光裝置、元件製造方法及平板顯示器之製造方法 TW202305513A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021066818 2021-04-09
JP2021-066818 2021-04-09

Publications (1)

Publication Number Publication Date
TW202305513A true TW202305513A (zh) 2023-02-01

Family

ID=83546189

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111113260A TW202305513A (zh) 2021-04-09 2022-04-07 曝光裝置、元件製造方法及平板顯示器之製造方法

Country Status (5)

Country Link
JP (1) JP7663120B2 (https=)
KR (1) KR20230150879A (https=)
CN (1) CN117083572A (https=)
TW (1) TW202305513A (https=)
WO (1) WO2022215690A1 (https=)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3052587B2 (ja) * 1992-07-28 2000-06-12 日本電気株式会社 露光装置
JP3593642B2 (ja) * 1996-08-29 2004-11-24 富士通株式会社 露光方法及び露光装置
US7459247B2 (en) * 2004-12-27 2008-12-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2007108559A (ja) 2005-10-17 2007-04-26 Nikon Corp 走査型露光装置及びデバイスの製造方法
US8431328B2 (en) * 2007-02-22 2013-04-30 Nikon Corporation Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus

Also Published As

Publication number Publication date
CN117083572A (zh) 2023-11-17
JPWO2022215690A1 (https=) 2022-10-13
WO2022215690A1 (ja) 2022-10-13
KR20230150879A (ko) 2023-10-31
JP7663120B2 (ja) 2025-04-16

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