JP7513215B2 - 基板保持装置、及び導電膜付き基板の製造方法 - Google Patents

基板保持装置、及び導電膜付き基板の製造方法 Download PDF

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Publication number
JP7513215B2
JP7513215B2 JP2023545456A JP2023545456A JP7513215B2 JP 7513215 B2 JP7513215 B2 JP 7513215B2 JP 2023545456 A JP2023545456 A JP 2023545456A JP 2023545456 A JP2023545456 A JP 2023545456A JP 7513215 B2 JP7513215 B2 JP 7513215B2
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Prior art keywords
substrate
outer edge
contact
mask member
holding device
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JP2023545456A
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Japanese (ja)
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JPWO2023032721A1 (https=
JPWO2023032721A5 (https=
Inventor
壮太郎 仲村
淳平 滝川
沙弥 加藤
一樹 秋庭
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AGC Inc
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Asahi Glass Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2023545456A 2021-08-30 2022-08-19 基板保持装置、及び導電膜付き基板の製造方法 Active JP7513215B2 (ja)

Applications Claiming Priority (3)

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JP2021139521 2021-08-30
JP2021139521 2021-08-30
PCT/JP2022/031468 WO2023032721A1 (ja) 2021-08-30 2022-08-19 基板保持装置、及び導電膜付き基板の製造方法

Publications (3)

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JPWO2023032721A1 JPWO2023032721A1 (https=) 2023-03-09
JPWO2023032721A5 JPWO2023032721A5 (https=) 2023-12-04
JP7513215B2 true JP7513215B2 (ja) 2024-07-09

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JP2023545456A Active JP7513215B2 (ja) 2021-08-30 2022-08-19 基板保持装置、及び導電膜付き基板の製造方法

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JP (1) JP7513215B2 (https=)
WO (1) WO2023032721A1 (https=)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006328518A (ja) 2005-05-30 2006-12-07 Optrex Corp スパッタ成膜装置
JP2008235294A (ja) 2007-03-16 2008-10-02 Shinon Denki Sangyo Kk 半導体集積回路用トレー
JP2011214034A (ja) 2010-03-31 2011-10-27 Seiko Epson Corp スパッタ装置
JP2015175865A (ja) 2014-03-13 2015-10-05 セイコーエプソン株式会社 光学部品、光学部品の製造方法、電子機器、および移動体
JP2016092025A (ja) 2014-10-29 2016-05-23 東レエンジニアリング株式会社 基板保持装置および方法ならびに基板検査装置
JP2016519778A (ja) 2013-03-12 2016-07-07 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 極端紫外線リソグラフィマスクブランク製造システムとそのための操作方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08313856A (ja) * 1995-05-18 1996-11-29 Dainippon Screen Mfg Co Ltd 基板搬送装置
JP4601932B2 (ja) * 2003-09-16 2010-12-22 大日本印刷株式会社 基板収納ケース

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006328518A (ja) 2005-05-30 2006-12-07 Optrex Corp スパッタ成膜装置
JP2008235294A (ja) 2007-03-16 2008-10-02 Shinon Denki Sangyo Kk 半導体集積回路用トレー
JP2011214034A (ja) 2010-03-31 2011-10-27 Seiko Epson Corp スパッタ装置
JP2016519778A (ja) 2013-03-12 2016-07-07 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 極端紫外線リソグラフィマスクブランク製造システムとそのための操作方法
JP2015175865A (ja) 2014-03-13 2015-10-05 セイコーエプソン株式会社 光学部品、光学部品の製造方法、電子機器、および移動体
JP2016092025A (ja) 2014-10-29 2016-05-23 東レエンジニアリング株式会社 基板保持装置および方法ならびに基板検査装置

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WO2023032721A1 (ja) 2023-03-09

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