JP7499627B2 - レーザ装置 - Google Patents
レーザ装置 Download PDFInfo
- Publication number
- JP7499627B2 JP7499627B2 JP2020116378A JP2020116378A JP7499627B2 JP 7499627 B2 JP7499627 B2 JP 7499627B2 JP 2020116378 A JP2020116378 A JP 2020116378A JP 2020116378 A JP2020116378 A JP 2020116378A JP 7499627 B2 JP7499627 B2 JP 7499627B2
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- JP
- Japan
- Prior art keywords
- chamber
- supported
- resonator
- optical
- location
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000003287 optical effect Effects 0.000 claims description 120
- 230000009467 reduction Effects 0.000 claims description 3
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- 238000005192 partition Methods 0.000 description 10
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical group C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 8
- 238000007493 shaping process Methods 0.000 description 7
- 230000008859 change Effects 0.000 description 4
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- 230000005540 biological transmission Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
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- 230000010355 oscillation Effects 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
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- 239000002245 particle Substances 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/025—Constructional details of solid state lasers, e.g. housings or mountings
- H01S3/027—Constructional details of solid state lasers, e.g. housings or mountings comprising a special atmosphere inside the housing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020116378A JP7499627B2 (ja) | 2020-07-06 | 2020-07-06 | レーザ装置 |
KR1020210078436A KR20220005392A (ko) | 2020-07-06 | 2021-06-17 | 레이저장치 |
TW110122576A TWI834977B (zh) | 2020-07-06 | 2021-06-21 | 雷射裝置 |
CN202110706451.7A CN113904204B (zh) | 2020-07-06 | 2021-06-24 | 激光装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020116378A JP7499627B2 (ja) | 2020-07-06 | 2020-07-06 | レーザ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2022014176A JP2022014176A (ja) | 2022-01-19 |
JP7499627B2 true JP7499627B2 (ja) | 2024-06-14 |
Family
ID=79187507
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020116378A Active JP7499627B2 (ja) | 2020-07-06 | 2020-07-06 | レーザ装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7499627B2 (ko) |
KR (1) | KR20220005392A (ko) |
CN (1) | CN113904204B (ko) |
TW (1) | TWI834977B (ko) |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004105200A1 (ja) | 2003-05-20 | 2004-12-02 | Mitsubishi Denki Kabushiki Kaisha | レーザ発振器 |
JP2006295226A (ja) | 2006-08-01 | 2006-10-26 | Matsushita Electric Ind Co Ltd | レーザ発振装置 |
US20070263692A1 (en) | 2004-03-24 | 2007-11-15 | Norbert Taufenbach | Gas Slab Laser |
WO2008136073A1 (ja) | 2007-04-20 | 2008-11-13 | Mitsubishi Electric Corporation | レーザ発振器 |
JP2013048202A (ja) | 2011-03-30 | 2013-03-07 | Gigaphoton Inc | レーザシステム |
JP2013051381A (ja) | 2011-08-31 | 2013-03-14 | Nidek Co Ltd | エキシマレーザ装置 |
JP2018073926A (ja) | 2016-10-27 | 2018-05-10 | ビアメカニクス株式会社 | レーザ発振器 |
JP2019134122A (ja) | 2018-02-02 | 2019-08-08 | 住友重機械工業株式会社 | レーザ発振器 |
JP2020096139A (ja) | 2018-12-14 | 2020-06-18 | 住友重機械工業株式会社 | ガスレーザ装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02105478A (ja) | 1988-10-14 | 1990-04-18 | Toshiba Corp | レーザ発振器 |
JPH07111351A (ja) * | 1993-10-12 | 1995-04-25 | Toshiba Corp | レーザー発振器 |
JP3768455B2 (ja) * | 2002-04-11 | 2006-04-19 | 三菱電機株式会社 | 直交励起型レーザ発振器 |
JP3665039B2 (ja) * | 2002-04-24 | 2005-06-29 | 三菱電機株式会社 | 直交励起型レーザ発振器 |
-
2020
- 2020-07-06 JP JP2020116378A patent/JP7499627B2/ja active Active
-
2021
- 2021-06-17 KR KR1020210078436A patent/KR20220005392A/ko active Search and Examination
- 2021-06-21 TW TW110122576A patent/TWI834977B/zh active
- 2021-06-24 CN CN202110706451.7A patent/CN113904204B/zh active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004105200A1 (ja) | 2003-05-20 | 2004-12-02 | Mitsubishi Denki Kabushiki Kaisha | レーザ発振器 |
US20070263692A1 (en) | 2004-03-24 | 2007-11-15 | Norbert Taufenbach | Gas Slab Laser |
JP2006295226A (ja) | 2006-08-01 | 2006-10-26 | Matsushita Electric Ind Co Ltd | レーザ発振装置 |
WO2008136073A1 (ja) | 2007-04-20 | 2008-11-13 | Mitsubishi Electric Corporation | レーザ発振器 |
JP2013048202A (ja) | 2011-03-30 | 2013-03-07 | Gigaphoton Inc | レーザシステム |
JP2013051381A (ja) | 2011-08-31 | 2013-03-14 | Nidek Co Ltd | エキシマレーザ装置 |
JP2018073926A (ja) | 2016-10-27 | 2018-05-10 | ビアメカニクス株式会社 | レーザ発振器 |
JP2019134122A (ja) | 2018-02-02 | 2019-08-08 | 住友重機械工業株式会社 | レーザ発振器 |
JP2020096139A (ja) | 2018-12-14 | 2020-06-18 | 住友重機械工業株式会社 | ガスレーザ装置 |
Also Published As
Publication number | Publication date |
---|---|
JP2022014176A (ja) | 2022-01-19 |
TWI834977B (zh) | 2024-03-11 |
CN113904204B (zh) | 2024-05-28 |
CN113904204A (zh) | 2022-01-07 |
TW202209772A (zh) | 2022-03-01 |
KR20220005392A (ko) | 2022-01-13 |
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