JP7464911B2 - ネガ型感光性樹脂組成物 - Google Patents

ネガ型感光性樹脂組成物 Download PDF

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Publication number
JP7464911B2
JP7464911B2 JP2020540172A JP2020540172A JP7464911B2 JP 7464911 B2 JP7464911 B2 JP 7464911B2 JP 2020540172 A JP2020540172 A JP 2020540172A JP 2020540172 A JP2020540172 A JP 2020540172A JP 7464911 B2 JP7464911 B2 JP 7464911B2
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Prior art keywords
group
manufactured
component
photosensitive resin
resin composition
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JP2020540172A
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Japanese (ja)
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JPWO2020044918A5 (fr
JPWO2020044918A1 (ja
Inventor
朋哉 鈴木
勲 安達
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Nissan Chemical Corp
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Nissan Chemical Corp
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Publication of JPWO2020044918A5 publication Critical patent/JPWO2020044918A5/ja
Priority to JP2024043870A priority Critical patent/JP2024073626A/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/04—Anhydrides, e.g. cyclic anhydrides
    • C08F222/06—Maleic anhydride
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36—Amides or imides
    • C08F222/40—Imides, e.g. cyclic imides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2020540172A 2018-08-30 2019-07-30 ネガ型感光性樹脂組成物 Active JP7464911B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2024043870A JP2024073626A (ja) 2018-08-30 2024-03-19 ネガ型感光性樹脂組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018162055 2018-08-30
JP2018162055 2018-08-30
PCT/JP2019/029854 WO2020044918A1 (fr) 2018-08-30 2019-07-30 Composition de résine photosensible négative

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2024043870A Division JP2024073626A (ja) 2018-08-30 2024-03-19 ネガ型感光性樹脂組成物

Publications (3)

Publication Number Publication Date
JPWO2020044918A1 JPWO2020044918A1 (ja) 2021-09-24
JPWO2020044918A5 JPWO2020044918A5 (fr) 2022-04-01
JP7464911B2 true JP7464911B2 (ja) 2024-04-10

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JP2020540172A Active JP7464911B2 (ja) 2018-08-30 2019-07-30 ネガ型感光性樹脂組成物
JP2024043870A Pending JP2024073626A (ja) 2018-08-30 2024-03-19 ネガ型感光性樹脂組成物

Family Applications After (1)

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JP2024043870A Pending JP2024073626A (ja) 2018-08-30 2024-03-19 ネガ型感光性樹脂組成物

Country Status (5)

Country Link
JP (2) JP7464911B2 (fr)
KR (1) KR20210052452A (fr)
CN (1) CN112639618A (fr)
TW (2) TWI815946B (fr)
WO (1) WO2020044918A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230030465A (ko) 2021-08-25 2023-03-06 동우 화인켐 주식회사 감광성 수지 조성물, 이를 이용한 돌출형 패턴 및 화상표시장치
KR20230030464A (ko) 2021-08-25 2023-03-06 동우 화인켐 주식회사 감광성 수지 조성물, 이를 이용한 돌출형 패턴 및 화상표시장치
KR20230030466A (ko) 2021-08-25 2023-03-06 동우 화인켐 주식회사 감광성 수지 조성물, 이를 이용한 돌출형 패턴 및 화상표시장치
KR20230030467A (ko) 2021-08-25 2023-03-06 동우 화인켐 주식회사 감광성 수지 조성물, 이를 이용한 돌출형 패턴 및 화상표시장치

Citations (4)

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Publication number Priority date Publication date Assignee Title
JP2006317698A (ja) 2005-05-12 2006-11-24 Tokyo Ohka Kogyo Co Ltd 三次元微小成形体製造用感光性ドライフィルムおよび感光性樹脂組成物
JP2007249190A (ja) 2006-02-14 2007-09-27 Fujifilm Electronic Materials Co Ltd 光硬化性組成物、それを用いた反射防止膜、及び固体撮像素子
JP2009216727A (ja) 2008-03-06 2009-09-24 Sumitomo Chemical Co Ltd マイクロレンズ及びマイクロレンズ用感光性組成物
JP2014002285A (ja) 2012-06-19 2014-01-09 Hitachi Chemical Co Ltd 隔壁形成材料、これを用いた感光性エレメント、隔壁の形成方法及び画像表示装置の製造方法

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JP2776810B2 (ja) 1987-07-03 1998-07-16 ソニー株式会社 固体撮像装置の製造方法
JP3254759B2 (ja) 1992-09-25 2002-02-12 ソニー株式会社 光学素子およびオンチップレンズの製造方法
TWI347499B (en) * 2005-05-12 2011-08-21 Tokyo Ohka Kogyo Co Ltd A method for increasing optical stability of three-dimensional micro moldings
JP2007140174A (ja) * 2005-11-18 2007-06-07 Fujifilm Corp パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP2010020077A (ja) * 2008-07-10 2010-01-28 Tokyo Ohka Kogyo Co Ltd マイクロレンズ保護膜形成用感光性樹脂組成物、マイクロレンズ保護膜形成用感光性ドライフィルム、及び液晶表示ディスプレイ
JP5555415B2 (ja) * 2008-09-30 2014-07-23 富士フイルム株式会社 硬化性着色組成物及びその製造方法、カラーフィルタ、並びに、固体撮像素子
JP2011002655A (ja) * 2009-06-18 2011-01-06 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント及びマイクロレンズアレイの製造法
CN102725691B (zh) 2010-01-26 2014-06-11 日产化学工业株式会社 正型抗蚀剂组合物及图案形成方法、固体摄像元件
JP2011202025A (ja) * 2010-03-25 2011-10-13 Fujifilm Corp 固体分散液、着色感光性組成物、インクジェット用インク、カラーフィルタ及びその製造方法、固体撮像素子、表示装置、並びに金属錯体化合物及びその互変異性体
CN103339532B (zh) 2011-01-31 2016-06-22 日产化学工业株式会社 微透镜形成用感光性树脂组合物
CN105765458B (zh) * 2013-10-21 2020-12-29 日产化学工业株式会社 负型感光性树脂组合物
JP6797889B2 (ja) * 2016-02-19 2020-12-09 富士フイルム株式会社 硬化性組成物、遮光膜、固体撮像装置、および、カラーフィルタ
JP6744233B2 (ja) * 2017-01-30 2020-08-19 日本化薬株式会社 ポリウレタン化合物、それを含有する活性エネルギー線硬化型樹脂組成物及びその用途

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006317698A (ja) 2005-05-12 2006-11-24 Tokyo Ohka Kogyo Co Ltd 三次元微小成形体製造用感光性ドライフィルムおよび感光性樹脂組成物
JP2007249190A (ja) 2006-02-14 2007-09-27 Fujifilm Electronic Materials Co Ltd 光硬化性組成物、それを用いた反射防止膜、及び固体撮像素子
JP2009216727A (ja) 2008-03-06 2009-09-24 Sumitomo Chemical Co Ltd マイクロレンズ及びマイクロレンズ用感光性組成物
JP2014002285A (ja) 2012-06-19 2014-01-09 Hitachi Chemical Co Ltd 隔壁形成材料、これを用いた感光性エレメント、隔壁の形成方法及び画像表示装置の製造方法

Also Published As

Publication number Publication date
TWI815946B (zh) 2023-09-21
TW202346901A (zh) 2023-12-01
TW202024672A (zh) 2020-07-01
CN112639618A (zh) 2021-04-09
WO2020044918A1 (fr) 2020-03-05
JP2024073626A (ja) 2024-05-29
KR20210052452A (ko) 2021-05-10
JPWO2020044918A1 (ja) 2021-09-24

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