JP7445449B2 - 蒸着マスクの製造方法および製造装置 - Google Patents

蒸着マスクの製造方法および製造装置 Download PDF

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Publication number
JP7445449B2
JP7445449B2 JP2020019818A JP2020019818A JP7445449B2 JP 7445449 B2 JP7445449 B2 JP 7445449B2 JP 2020019818 A JP2020019818 A JP 2020019818A JP 2020019818 A JP2020019818 A JP 2020019818A JP 7445449 B2 JP7445449 B2 JP 7445449B2
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Japan
Prior art keywords
vapor deposition
spacer
mask
rod
mask frame
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JP2020019818A
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Japanese (ja)
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JP2021123777A (ja
Inventor
哲行 山田
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Japan Display Inc
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Japan Display Inc
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Publication date
Application filed by Japan Display Inc filed Critical Japan Display Inc
Priority to JP2020019818A priority Critical patent/JP7445449B2/ja
Priority to KR1020210011235A priority patent/KR102533404B1/ko
Priority to CN202110124821.6A priority patent/CN113308667B/zh
Publication of JP2021123777A publication Critical patent/JP2021123777A/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/10—Moulds; Masks; Masterforms
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrochemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
JP2020019818A 2020-02-07 2020-02-07 蒸着マスクの製造方法および製造装置 Active JP7445449B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2020019818A JP7445449B2 (ja) 2020-02-07 2020-02-07 蒸着マスクの製造方法および製造装置
KR1020210011235A KR102533404B1 (ko) 2020-02-07 2021-01-27 증착 마스크의 제조 방법 및 제조 장치
CN202110124821.6A CN113308667B (zh) 2020-02-07 2021-01-29 蒸镀掩模的制造方法及蒸镀掩模的制造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020019818A JP7445449B2 (ja) 2020-02-07 2020-02-07 蒸着マスクの製造方法および製造装置

Publications (2)

Publication Number Publication Date
JP2021123777A JP2021123777A (ja) 2021-08-30
JP7445449B2 true JP7445449B2 (ja) 2024-03-07

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JP2020019818A Active JP7445449B2 (ja) 2020-02-07 2020-02-07 蒸着マスクの製造方法および製造装置

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Country Link
JP (1) JP7445449B2 (ko)
KR (1) KR102533404B1 (ko)
CN (1) CN113308667B (ko)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004269968A (ja) 2003-03-10 2004-09-30 Sony Corp 蒸着用マスク
JP2019094528A (ja) 2017-11-21 2019-06-20 株式会社ジャパンディスプレイ 蒸着マスク、蒸着マスクの製造方法、及び表示装置の製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3678199B2 (ja) 2001-05-16 2005-08-03 ソニー株式会社 半導体装置製造用マスクの作製方法、及び半導体装置の製造方法
KR100771532B1 (ko) * 2001-06-29 2007-10-31 주식회사 하이닉스반도체 포토마스크 제조장치
US6878208B2 (en) * 2002-04-26 2005-04-12 Tohoku Pioneer Corporation Mask for vacuum deposition and organic EL display manufactured by using the same
JP4089632B2 (ja) * 2003-03-07 2008-05-28 セイコーエプソン株式会社 マスクの製造方法、マスクの製造装置、発光材料の成膜方法
JP2009087840A (ja) 2007-10-02 2009-04-23 Seiko Epson Corp 蒸着マスク、蒸着マスクの製造方法、有機ｅｌ素子、電子機器
KR100946996B1 (ko) * 2008-06-27 2010-03-10 한양대학교 산학협력단 마스크 밀착장치 및 이를 구비한 노광 장비
JP2010229272A (ja) * 2009-03-26 2010-10-14 Seiko Epson Corp 接合方法および接合体
JP2010229412A (ja) * 2010-04-27 2010-10-14 Seiko Epson Corp 接着シート、接合方法および接合体
JP2012077328A (ja) * 2010-09-30 2012-04-19 Mitsubishi Plastics Inc 蒸着用マスク、その製造方法及び蒸着方法
JP5958804B2 (ja) 2012-03-30 2016-08-02 株式会社ブイ・テクノロジー 蒸着マスク、蒸着マスクの製造方法及び有機ｅｌ表示装置の製造方法
CN103668052A (zh) 2012-09-07 2014-03-26 昆山允升吉光电科技有限公司 一种复合掩模板组件
US20190319190A1 (en) * 2017-07-10 2019-10-17 Sharp Kabushiki Kaisha Mask sheet frame body bonding apparatus and manufacturing method of vapor deposition mask
JP7112680B2 (ja) * 2017-09-05 2022-08-04 大日本印刷株式会社 蒸着マスク装置の製造方法及び蒸着マスク装置の製造装置
KR102371176B1 (ko) * 2018-02-09 2022-03-08 주식회사 오럼머티리얼 프레임에 부착된 마스크의 분리 방법

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004269968A (ja) 2003-03-10 2004-09-30 Sony Corp 蒸着用マスク
JP2019094528A (ja) 2017-11-21 2019-06-20 株式会社ジャパンディスプレイ 蒸着マスク、蒸着マスクの製造方法、及び表示装置の製造方法

Also Published As

Publication number Publication date
KR20210101139A (ko) 2021-08-18
JP2021123777A (ja) 2021-08-30
KR102533404B1 (ko) 2023-05-19
CN113308667A (zh) 2021-08-27
CN113308667B (zh) 2023-08-18

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