CN113308667B - 蒸镀掩模的制造方法及蒸镀掩模的制造装置 - Google Patents

蒸镀掩模的制造方法及蒸镀掩模的制造装置 Download PDF

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Publication number
CN113308667B
CN113308667B CN202110124821.6A CN202110124821A CN113308667B CN 113308667 B CN113308667 B CN 113308667B CN 202110124821 A CN202110124821 A CN 202110124821A CN 113308667 B CN113308667 B CN 113308667B
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China
Prior art keywords
mask
vapor deposition
spacer
mask frame
manufacturing
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CN202110124821.6A
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Chinese (zh)
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CN113308667A (zh
Inventor
山田哲行
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Japan Display Inc
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Japan Display Inc
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/10—Moulds; Masks; Masterforms
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrochemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
CN202110124821.6A 2020-02-07 2021-01-29 蒸镀掩模的制造方法及蒸镀掩模的制造装置 Active CN113308667B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020019818A JP7445449B2 (ja) 2020-02-07 2020-02-07 蒸着マスクの製造方法および製造装置
JP2020-019818 2020-02-07

Publications (2)

Publication Number Publication Date
CN113308667A CN113308667A (zh) 2021-08-27
CN113308667B true CN113308667B (zh) 2023-08-18

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CN202110124821.6A Active CN113308667B (zh) 2020-02-07 2021-01-29 蒸镀掩模的制造方法及蒸镀掩模的制造装置

Country Status (3)

Country Link
JP (1) JP7445449B2 (ko)
KR (1) KR102533404B1 (ko)
CN (1) CN113308667B (ko)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1453389A (zh) * 2002-04-26 2003-11-05 东北先锋电子股份有限公司 真空蒸镀用掩模和用该掩模制造的有机电致发光显示面板
CN101845279A (zh) * 2009-03-26 2010-09-29 精工爱普生株式会社 接合方法及接合体
JP2010229412A (ja) * 2010-04-27 2010-10-14 Seiko Epson Corp 接着シート、接合方法および接合体
JP2012077328A (ja) * 2010-09-30 2012-04-19 Mitsubishi Plastics Inc 蒸着用マスク、その製造方法及び蒸着方法
WO2019012585A1 (ja) * 2017-07-10 2019-01-17 シャープ株式会社 マスクシート枠体接合装置及び蒸着マスクの製造方法
CN109423604A (zh) * 2017-09-05 2019-03-05 大日本印刷株式会社 蒸镀掩模装置的制造方法和蒸镀掩模装置的制造装置
KR20190096578A (ko) * 2018-02-09 2019-08-20 주식회사 티지오테크 프레임에 접착된 마스크의 분리 방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3678199B2 (ja) 2001-05-16 2005-08-03 ソニー株式会社 半導体装置製造用マスクの作製方法、及び半導体装置の製造方法
KR100771532B1 (ko) * 2001-06-29 2007-10-31 주식회사 하이닉스반도체 포토마스크 제조장치
JP4089632B2 (ja) * 2003-03-07 2008-05-28 セイコーエプソン株式会社 マスクの製造方法、マスクの製造装置、発光材料の成膜方法
JP2004269968A (ja) 2003-03-10 2004-09-30 Sony Corp 蒸着用マスク
JP2009087840A (ja) 2007-10-02 2009-04-23 Seiko Epson Corp 蒸着マスク、蒸着マスクの製造方法、有機ｅｌ素子、電子機器
KR100946996B1 (ko) * 2008-06-27 2010-03-10 한양대학교 산학협력단 마스크 밀착장치 및 이를 구비한 노광 장비
JP5958804B2 (ja) 2012-03-30 2016-08-02 株式会社ブイ・テクノロジー 蒸着マスク、蒸着マスクの製造方法及び有機ｅｌ表示装置の製造方法
CN103668052A (zh) 2012-09-07 2014-03-26 昆山允升吉光电科技有限公司 一种复合掩模板组件
JP2019094528A (ja) 2017-11-21 2019-06-20 株式会社ジャパンディスプレイ 蒸着マスク、蒸着マスクの製造方法、及び表示装置の製造方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1453389A (zh) * 2002-04-26 2003-11-05 东北先锋电子股份有限公司 真空蒸镀用掩模和用该掩模制造的有机电致发光显示面板
CN101845279A (zh) * 2009-03-26 2010-09-29 精工爱普生株式会社 接合方法及接合体
JP2010229412A (ja) * 2010-04-27 2010-10-14 Seiko Epson Corp 接着シート、接合方法および接合体
JP2012077328A (ja) * 2010-09-30 2012-04-19 Mitsubishi Plastics Inc 蒸着用マスク、その製造方法及び蒸着方法
WO2019012585A1 (ja) * 2017-07-10 2019-01-17 シャープ株式会社 マスクシート枠体接合装置及び蒸着マスクの製造方法
CN109423604A (zh) * 2017-09-05 2019-03-05 大日本印刷株式会社 蒸镀掩模装置的制造方法和蒸镀掩模装置的制造装置
KR20190096578A (ko) * 2018-02-09 2019-08-20 주식회사 티지오테크 프레임에 접착된 마스크의 분리 방법

Also Published As

Publication number Publication date
JP7445449B2 (ja) 2024-03-07
KR20210101139A (ko) 2021-08-18
JP2021123777A (ja) 2021-08-30
CN113308667A (zh) 2021-08-27
KR102533404B1 (ko) 2023-05-19

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