JP7417689B2 - マイクロデバイスの移動のためのシステム及び方法 - Google Patents
マイクロデバイスの移動のためのシステム及び方法 Download PDFInfo
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- JP7417689B2 JP7417689B2 JP2022169052A JP2022169052A JP7417689B2 JP 7417689 B2 JP7417689 B2 JP 7417689B2 JP 2022169052 A JP2022169052 A JP 2022169052A JP 2022169052 A JP2022169052 A JP 2022169052A JP 7417689 B2 JP7417689 B2 JP 7417689B2
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Description
Claims (13)
- 第1の本体から第2の本体へ発光ダイオードを移動させる方法であって、
前記第1の本体上の発光ダイオードを光励起して、前記第1の本体上の一又は複数の不具合発光ダイオードを検出することと、
分注器から、不具合が検出されなかった発光ダイオードを含む複数の発光ダイオードに対応する位置に接着剤を供給することと、
前記分注器からの接着剤が前記複数の発光ダイオードを前記第2の本体に固定するように、前記第2の本体に対して前記第1の本体を移動して、前記第1の本体上の発光ダイオードに第2の本体の第2の表面を接触させることと、
前記一又は複数の不具合発光ダイオードが前記第1の本体上に残っている間に、前記第2の表面が前記複数の発光ダイオードを並行して取り除くように、前記第2の本体に対して前記第1の本体を移動して、前記第2の表面を前記第1の本体から遠ざけることと、
を含む方法。 - 前記第1の本体は移動元基板を含み、前記第2の表面は移動面を含む、請求項1に記載の方法。
- 前記接着剤を供給することは、前記第1の本体上の選択された発光ダイオードに接着剤を選択的に供給することを含む、請求項1に記載の方法。
- 前記複数の発光ダイオードは、不具合が検出された発光ダイオードを除外する、請求項3に記載の方法。
- 前記第2の表面の下で接着剤を選択的に中和すること、を更に含む請求項1に記載の方法。
- 選択的に中和することは、前記接着剤に照射することを含む、請求項5に記載の方法。
- 前記第2の表面から第3の本体の第3の表面へ前記複数の発光ダイオードの少なくとも1つを移動すること、を更に含む、請求項1に記載の方法。
- 不具合マイクロデバイスに対応する箇所で、前記第2の表面又は前記第3の表面へ、少なくとも1つの発光ダイオードを移動すること、を含む、請求項7に記載の方法。
- 前記第2の表面又は前記第3の表面へ前記少なくとも1つの発光ダイオードを移動することは、一度に1つの発光ダイオードずつ行われる、請求項8に記載の方法。
- 前記第2の本体は、伸縮性フィルムを含む、請求項1に記載の方法。
- 前記第2の本体は、ローラを含む、請求項1に記載の方法。
- 前記第2の表面は、平らな表面を含む、請求項1に記載の方法。
- 前記第2の本体を前記第1の本体上の発光ダイオードに接触させる前に、前記接着剤を硬化するために放射パターンを発すること、を更に含む、請求項1に記載の方法。
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201662356431P | 2016-06-29 | 2016-06-29 | |
US62/356,431 | 2016-06-29 | ||
US15/270,763 US10032827B2 (en) | 2016-06-29 | 2016-09-20 | Systems and methods for transfer of micro-devices |
US15/270,763 | 2016-09-20 | ||
JP2018568689A JP6849707B2 (ja) | 2016-06-29 | 2017-06-15 | マイクロデバイスの移動のためのシステム及び方法 |
JP2021034032A JP7165223B2 (ja) | 2016-06-29 | 2021-03-04 | マイクロデバイスの移動のためのシステム及び方法 |
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JP2021034032A Division JP7165223B2 (ja) | 2016-06-29 | 2021-03-04 | マイクロデバイスの移動のためのシステム及び方法 |
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Publication Number | Publication Date |
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JP2023017798A JP2023017798A (ja) | 2023-02-07 |
JP7417689B2 true JP7417689B2 (ja) | 2024-01-18 |
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JP2018568689A Active JP6849707B2 (ja) | 2016-06-29 | 2017-06-15 | マイクロデバイスの移動のためのシステム及び方法 |
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Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9640108B2 (en) | 2015-08-25 | 2017-05-02 | X-Celeprint Limited | Bit-plane pulse width modulated digital display system |
WO2017146477A1 (ko) * | 2016-02-26 | 2017-08-31 | 서울반도체주식회사 | 디스플레이 장치 및 그의 제조 방법 |
US10360846B2 (en) | 2016-05-10 | 2019-07-23 | X-Celeprint Limited | Distributed pulse-width modulation system with multi-bit digital storage and output device |
US10453826B2 (en) | 2016-06-03 | 2019-10-22 | X-Celeprint Limited | Voltage-balanced serial iLED pixel and display |
US10032827B2 (en) | 2016-06-29 | 2018-07-24 | Applied Materials, Inc. | Systems and methods for transfer of micro-devices |
US20180033768A1 (en) * | 2016-07-26 | 2018-02-01 | Ananda H. Kumar | Flat panel display formed by self aligned assembly |
US10438339B1 (en) * | 2016-09-12 | 2019-10-08 | Apple Inc. | Optical verification system and methods of verifying micro device transfer |
US10297478B2 (en) * | 2016-11-23 | 2019-05-21 | Rohinni, LLC | Method and apparatus for embedding semiconductor devices |
US10998352B2 (en) | 2016-11-25 | 2021-05-04 | Vuereal Inc. | Integration of microdevices into system substrate |
CN110036492B (zh) * | 2016-11-25 | 2021-10-08 | 维耶尔公司 | 将微装置集成到系统衬底中 |
US10978530B2 (en) * | 2016-11-25 | 2021-04-13 | Vuereal Inc. | Integration of microdevices into system substrate |
US10916523B2 (en) | 2016-11-25 | 2021-02-09 | Vuereal Inc. | Microdevice transfer setup and integration of micro-devices into system substrate |
US10832609B2 (en) * | 2017-01-10 | 2020-11-10 | X Display Company Technology Limited | Digital-drive pulse-width-modulated output system |
US10403537B2 (en) * | 2017-03-10 | 2019-09-03 | Facebook Technologies, Llc | Inorganic light emitting diode (ILED) assembly via direct bonding |
KR102445450B1 (ko) * | 2017-06-12 | 2022-09-20 | 쿨리케 & 소파 네덜란드 비.브이. | 개별 부품들의 기판 상으로의 병렬적 조립 |
JP2019062006A (ja) * | 2017-09-25 | 2019-04-18 | 株式会社東芝 | 搬送装置および搬送方法 |
TWI805564B (zh) * | 2018-01-25 | 2023-06-21 | 晶元光電股份有限公司 | 晶粒轉移方法及其裝置 |
WO2019172707A1 (ko) * | 2018-03-09 | 2019-09-12 | 주식회사 나노엑스 | Led 검사 장치 및 이송 장치 |
KR102386932B1 (ko) * | 2018-03-09 | 2022-04-14 | 주식회사 나노엑스 | Led 검사 장치 및 이송 장치 |
JP6791208B2 (ja) * | 2018-05-22 | 2020-11-25 | 信越半導体株式会社 | 発光素子の製造方法 |
KR20200011024A (ko) * | 2018-07-23 | 2020-01-31 | 삼성전자주식회사 | Led 전송 장치를 포함하는 전자 장치 및 그 제어 방법 |
US11227970B1 (en) | 2018-10-18 | 2022-01-18 | Facebook Technologies, Llc | Light emitting diodes manufacture and assembly |
US11257982B1 (en) | 2018-10-18 | 2022-02-22 | Facebook Technologies, Llc | Semiconductor display device |
US11164905B2 (en) | 2018-10-18 | 2021-11-02 | Facebook Technologies, Llc | Manufacture of semiconductor display device |
CN111326464A (zh) * | 2018-12-14 | 2020-06-23 | 昆山工研院新型平板显示技术中心有限公司 | 利用激光剥离微器件的方法 |
KR102559566B1 (ko) * | 2018-12-27 | 2023-07-25 | 주식회사 나노엑스 | Led 검사 장치 및 이송 장치 |
CN109786311B (zh) * | 2019-01-28 | 2020-04-03 | 深圳新益昌科技股份有限公司 | 一种mini-LED高速固晶机及固晶方法 |
CN110033704B (zh) * | 2019-04-19 | 2022-07-19 | 京东方科技集团股份有限公司 | 转印装置和转印方法 |
CN114008763A (zh) * | 2019-06-18 | 2022-02-01 | 维耶尔公司 | 高吞吐量的缩微印刷工艺 |
CN111048499B (zh) * | 2019-12-16 | 2022-05-13 | 业成科技(成都)有限公司 | 微发光二极管显示面板及其制备方法 |
WO2022027139A1 (en) * | 2020-08-06 | 2022-02-10 | Vuereal Inc. | Microdevice block transfer |
FR3123503A1 (fr) * | 2021-05-31 | 2022-12-02 | Aledia | Organe de manipulation de dispositifs optoélectroniques et procédé de manipulation de tels dispositifs. |
KR20240036023A (ko) * | 2021-07-26 | 2024-03-19 | 뷰리얼 인크. | 마이크로led 결함 관리 |
WO2023136725A1 (en) * | 2022-01-17 | 2023-07-20 | Morphotonics Holding B.V. | Transfer process for micro elements |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007027551A (ja) | 2005-07-20 | 2007-02-01 | Fujitsu Ltd | Icチップ実装方法 |
JP2008502151A (ja) | 2004-06-04 | 2008-01-24 | ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシティー オブ イリノイ | 印刷可能半導体素子を製造して組み立てるための方法及びデバイス |
JP2009094181A (ja) | 2007-10-05 | 2009-04-30 | Sony Corp | 電子部品基板の製造方法 |
US20130069275A1 (en) | 2011-09-20 | 2013-03-21 | Etienne Menard | Printing transferable components using microstructured elastomeric surfaces with pressure modulated reversible adhesion |
JP2014163857A (ja) | 2013-02-27 | 2014-09-08 | Toray Eng Co Ltd | 蛍光発光体の検査装置 |
Family Cites Families (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5617385A (en) * | 1979-07-20 | 1981-02-19 | Tokyo Shibaura Electric Co | Production of display device |
JPS5617384A (en) * | 1979-07-20 | 1981-02-19 | Tokyo Shibaura Electric Co | Production of display device |
JPH0677317A (ja) | 1992-08-26 | 1994-03-18 | Mitsubishi Electric Corp | 半導体装置の組立方法 |
JP4491948B2 (ja) * | 2000-10-06 | 2010-06-30 | ソニー株式会社 | 素子実装方法および画像表示装置の製造方法 |
JP2003174041A (ja) * | 2001-12-06 | 2003-06-20 | Seiko Epson Corp | 素子の実装方法、電子機器、フラットパネルディスプレイ、システムインパッケージ型icおよびオプティカルエレクトリカルic |
US6849558B2 (en) | 2002-05-22 | 2005-02-01 | The Board Of Trustees Of The Leland Stanford Junior University | Replication and transfer of microstructures and nanostructures |
DE10342980B3 (de) * | 2003-09-17 | 2005-01-05 | Disco Hi-Tec Europe Gmbh | Verfahren zur Bildung von Chip-Stapeln |
US7408566B2 (en) | 2003-10-22 | 2008-08-05 | Oki Data Corporation | Semiconductor device, LED print head and image-forming apparatus using same, and method of manufacturing semiconductor device |
JP4672329B2 (ja) | 2003-10-22 | 2011-04-20 | 株式会社沖データ | 半導体装置、及び、それを用いたledプリントヘッド、画像形成装置、半導体装置の製造方法 |
ES2224893B1 (es) * | 2004-08-04 | 2005-12-16 | Neopack, S.L. | Metodo y aparato para la obtencion de hologramas y/o efectos opticos sobre un material laminar. |
US7378288B2 (en) * | 2005-01-11 | 2008-05-27 | Semileds Corporation | Systems and methods for producing light emitting diode array |
JP4761026B2 (ja) | 2005-06-03 | 2011-08-31 | ソニー株式会社 | 素子転写装置、素子の転写方法および表示装置の製造方法 |
CN1963672A (zh) | 2005-11-07 | 2007-05-16 | 中芯国际集成电路制造(上海)有限公司 | 利用微机电系统制造集成电路的可重构掩模的方法和器件 |
US20080122119A1 (en) * | 2006-08-31 | 2008-05-29 | Avery Dennison Corporation | Method and apparatus for creating rfid devices using masking techniques |
JP2010251360A (ja) | 2009-04-10 | 2010-11-04 | Sony Corp | 表示装置の製造方法および表示装置 |
US8689437B2 (en) * | 2009-06-24 | 2014-04-08 | International Business Machines Corporation | Method for forming integrated circuit assembly |
JP2011077235A (ja) | 2009-09-30 | 2011-04-14 | Nitto Denko Corp | 素子保持用粘着シートおよび素子の製造方法 |
WO2011123285A1 (en) | 2010-03-29 | 2011-10-06 | Semprius, Inc. | Selective transfer of active components |
JP5844549B2 (ja) | 2011-05-20 | 2016-01-20 | リンテック株式会社 | 転写装置および転写方法 |
US20130207544A1 (en) | 2011-09-30 | 2013-08-15 | Pinebrook Imaging Technology, Ltd. | Illumination system |
US8518204B2 (en) | 2011-11-18 | 2013-08-27 | LuxVue Technology Corporation | Method of fabricating and transferring a micro device and an array of micro devices utilizing an intermediate electrically conductive bonding layer |
EP2780954B1 (en) * | 2011-11-18 | 2019-10-16 | Apple Inc. | Method of forming a micro led structure |
US8349116B1 (en) | 2011-11-18 | 2013-01-08 | LuxVue Technology Corporation | Micro device transfer head heater assembly and method of transferring a micro device |
US9287310B2 (en) * | 2012-04-18 | 2016-03-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Methods and apparatus for glass removal in CMOS image sensors |
WO2013184700A1 (en) | 2012-06-04 | 2013-12-12 | Pinebrook Imaging, Inc. | An optical projection array exposure system |
JP6116827B2 (ja) * | 2012-08-07 | 2017-04-19 | シャープ株式会社 | 半導体装置の製造方法及び半導体装置の製造装置 |
EP2731126A1 (en) * | 2012-11-09 | 2014-05-14 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Method for bonding bare chip dies |
US9252375B2 (en) | 2013-03-15 | 2016-02-02 | LuxVue Technology Corporation | Method of fabricating a light emitting diode display with integrated defect detection test |
KR101820275B1 (ko) | 2013-03-15 | 2018-01-19 | 애플 인크. | 리던던시 스킴을 갖춘 발광 다이오드 디스플레이 및 통합 결함 검출 테스트를 갖는 발광 다이오드 디스플레이를 제작하는 방법 |
US8791474B1 (en) | 2013-03-15 | 2014-07-29 | LuxVue Technology Corporation | Light emitting diode display with redundancy scheme |
JP5657828B1 (ja) | 2014-07-17 | 2015-01-21 | 大宮工業株式会社 | 転写方法及び転写装置 |
US20160144608A1 (en) | 2014-11-23 | 2016-05-26 | Mikro Mesa Technology Co., Ltd. | Method for transferring device |
US9927723B2 (en) | 2015-03-24 | 2018-03-27 | Applied Materials, Inc. | Apparatus and methods for on-the-fly digital exposure image data modification |
TWI557831B (zh) * | 2015-05-15 | 2016-11-11 | 友達光電股份有限公司 | 微組件的傳送方法 |
JP6375063B2 (ja) | 2015-05-21 | 2018-08-15 | ゴルテック.インク | マイクロ発光ダイオードの搬送方法、製造方法、装置及び電子機器 |
US20170186730A1 (en) * | 2015-12-26 | 2017-06-29 | Invensas Corporation | System and method for providing 3d wafer assembly with known-good-dies |
CN108463891B (zh) * | 2016-01-20 | 2020-09-22 | 歌尔股份有限公司 | 微发光二极管转移方法及制造方法 |
US10032827B2 (en) * | 2016-06-29 | 2018-07-24 | Applied Materials, Inc. | Systems and methods for transfer of micro-devices |
-
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- 2016-09-20 US US15/270,763 patent/US10032827B2/en active Active
-
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008502151A (ja) | 2004-06-04 | 2008-01-24 | ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシティー オブ イリノイ | 印刷可能半導体素子を製造して組み立てるための方法及びデバイス |
JP2007027551A (ja) | 2005-07-20 | 2007-02-01 | Fujitsu Ltd | Icチップ実装方法 |
JP2009094181A (ja) | 2007-10-05 | 2009-04-30 | Sony Corp | 電子部品基板の製造方法 |
US20130069275A1 (en) | 2011-09-20 | 2013-03-21 | Etienne Menard | Printing transferable components using microstructured elastomeric surfaces with pressure modulated reversible adhesion |
JP2014163857A (ja) | 2013-02-27 | 2014-09-08 | Toray Eng Co Ltd | 蛍光発光体の検査装置 |
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