JP7351451B2 - 化合物、バインダー樹脂、ネガ型感光性樹脂組成物およびこれを用いて形成されたブラックバンクを含むディスプレイ装置 - Google Patents

化合物、バインダー樹脂、ネガ型感光性樹脂組成物およびこれを用いて形成されたブラックバンクを含むディスプレイ装置 Download PDF

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JP7351451B2
JP7351451B2 JP2022519054A JP2022519054A JP7351451B2 JP 7351451 B2 JP7351451 B2 JP 7351451B2 JP 2022519054 A JP2022519054 A JP 2022519054A JP 2022519054 A JP2022519054 A JP 2022519054A JP 7351451 B2 JP7351451 B2 JP 7351451B2
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パク、スミン
ジュン リー、ウォン
リム、ミニョウン
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LG Chem Ltd
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    • C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06—Esters of carbamic acids
    • C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
    • C07C271/26—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring
    • C07C271/28—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring to a carbon atom of a non-condensed six-membered aromatic ring
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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009138073A (ja) 2007-12-05 2009-06-25 National Institute Of Advanced Industrial & Technology フルオレン含有ポリウレタン及びその効率的製造方法
JP2011133851A (ja) 2009-12-22 2011-07-07 Lg Chem Ltd 基板接着力が向上した高遮光性ブラックマトリックス組成物
WO2012044027A2 (en) 2010-09-30 2012-04-05 Kolon Industries, Inc. Photosensitive resin composition
WO2014199967A1 (ja) 2013-06-14 2014-12-18 富士フイルム株式会社 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機ｅｌ表示装置、並びに、タッチパネル表示装置
JP2017146376A (ja) 2016-02-16 2017-08-24 東洋インキＳｃホールディングス株式会社 カラーフィルタ用顔料組成物、着色組成物およびカラーフィルタの製造方法
JP2018528447A (ja) 2015-10-19 2018-09-27 エルジー・ケム・リミテッド 樹脂組成物およびそれを用いて製造されたブラックバンクを含むディスプレイ装置
CN109293824A (zh) 2018-09-12 2019-02-01 大赛璐（中国）投资有限公司 单官能丙烯酸酯树脂及其制备方法和支撑材料组合物及其制备方法和应用

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07103195B2 (ja) 1987-10-14 1995-11-08 株式会社日立製作所 光学用材料
US20060166114A1 (en) * 2004-06-21 2006-07-27 Chun-Hsien Lee Photosensitive resin composition for black matrix
KR100787715B1 (ko) * 2005-12-29 2007-12-21 제일모직주식회사 감광성 수지 조성물 및 이를 이용한 블랙매트릭스
CN102702073B (zh) * 2007-05-11 2015-06-10 巴斯夫欧洲公司 肟酯光引发剂
CN102234463B (zh) 2010-04-27 2015-05-20 精工爱普生株式会社 白色油墨组合物以及使用该白色油墨组合物的记录物
JP2013533508A (ja) 2010-07-14 2013-08-22 エルジー・ケム・リミテッド ポジティブ型感光性樹脂組成物およびこれを含む有機発光素子ブラックバンク
JP6469669B2 (ja) * 2013-07-08 2019-02-13 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ オキシムエステル光開始剤
KR20160084894A (ko) * 2015-01-06 2016-07-15 전자부품연구원 감광성 레진 및 디스플레이용 절연층 제조방법
WO2017110591A1 (ja) * 2015-12-25 2017-06-29 昭和電工株式会社 新規ポリウレタン、硬化性組成物、オーバーコート膜ならびにフレキシブル配線板およびその製造方法
US11086219B2 (en) * 2016-03-30 2021-08-10 Toray Industries, Inc. Negative-type photosensitive resin composition, cured film, display device that includes the cured film, and production method therefor
KR102054045B1 (ko) * 2017-03-03 2019-12-09 주식회사 엘지화학 고분자 수지 화합물 및 이를 포함하는 블랙 뱅크용 감광성 수지 조성물
KR20190005391A (ko) * 2017-07-06 2019-01-16 주식회사 엘지화학 감광성 수지 조성물
WO2019022169A1 (ja) * 2017-07-26 2019-01-31 Jsr株式会社 赤外線透過膜形成用組成物、赤外線透過膜の形成方法、表示装置用保護板、及び表示装置
KR102227606B1 (ko) * 2018-04-06 2021-03-12 주식회사 엘지화학 카도계 바인더 수지, 이를 포함하는 감광성 수지 조성물, 블랙 매트릭스, 컬러필터 및 디스플레이 장치
KR102845749B1 (ko) * 2019-12-23 2025-08-12 주식회사 엘지화학 고분자 수지 화합물, 이의 제조 방법 및 이를 포함하는 감광성 수지 조성물

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009138073A (ja) 2007-12-05 2009-06-25 National Institute Of Advanced Industrial & Technology フルオレン含有ポリウレタン及びその効率的製造方法
JP2011133851A (ja) 2009-12-22 2011-07-07 Lg Chem Ltd 基板接着力が向上した高遮光性ブラックマトリックス組成物
WO2012044027A2 (en) 2010-09-30 2012-04-05 Kolon Industries, Inc. Photosensitive resin composition
WO2014199967A1 (ja) 2013-06-14 2014-12-18 富士フイルム株式会社 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機ｅｌ表示装置、並びに、タッチパネル表示装置
JP2018528447A (ja) 2015-10-19 2018-09-27 エルジー・ケム・リミテッド 樹脂組成物およびそれを用いて製造されたブラックバンクを含むディスプレイ装置
JP2017146376A (ja) 2016-02-16 2017-08-24 東洋インキＳｃホールディングス株式会社 カラーフィルタ用顔料組成物、着色組成物およびカラーフィルタの製造方法
CN109293824A (zh) 2018-09-12 2019-02-01 大赛璐（中国）投资有限公司 单官能丙烯酸酯树脂及其制备方法和支撑材料组合物及其制备方法和应用

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