CN114450322B - 化合物、粘合剂树脂、负型光敏树脂组合物和包括使用所述负型光敏树脂组合物形成的黑堤的显示装置 - Google Patents

化合物、粘合剂树脂、负型光敏树脂组合物和包括使用所述负型光敏树脂组合物形成的黑堤的显示装置 Download PDF

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CN114450322B
CN114450322B CN202080067878.0A CN202080067878A CN114450322B CN 114450322 B CN114450322 B CN 114450322B CN 202080067878 A CN202080067878 A CN 202080067878A CN 114450322 B CN114450322 B CN 114450322B
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resin composition
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CN114450322A (zh
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朴帅敏
李元中
林敏映
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LG Chem Ltd
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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20070070472A (ko) * 2005-12-29 2007-07-04 제일모직주식회사 감광성 수지 조성물 및 이를 이용한 블랙매트릭스
KR20110071965A (ko) * 2009-12-22 2011-06-29 주식회사 엘지화학 기판접착력이 향상된 고차광성 블랙매트릭스 조성물
KR20120033893A (ko) * 2010-09-30 2012-04-09 코오롱인더스트리 주식회사 감광성 수지 조성물
WO2014199967A1 (ja) * 2013-06-14 2014-12-18 富士フイルム株式会社 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機el表示装置、並びに、タッチパネル表示装置
KR20170045659A (ko) * 2015-10-19 2017-04-27 주식회사 엘지화학 수지 조성물 및 이를 이용하여 제조된 블랙뱅크를 포함하는 디스플레이 장치
JP2017146376A (ja) * 2016-02-16 2017-08-24 東洋インキScホールディングス株式会社 カラーフィルタ用顔料組成物、着色組成物およびカラーフィルタの製造方法
CN109476831A (zh) * 2017-03-03 2019-03-15 株式会社Lg化学 聚合物树脂化合物和包含其的用于黑堤的光敏树脂组合物
CN114466879A (zh) * 2019-12-23 2022-05-10 株式会社Lg化学 聚合物树脂化合物、用于制备其的方法、以及包含其的光敏树脂组合物

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07103195B2 (ja) 1987-10-14 1995-11-08 株式会社日立製作所 光学用材料
US20060166114A1 (en) * 2004-06-21 2006-07-27 Chun-Hsien Lee Photosensitive resin composition for black matrix
CN102702073B (zh) * 2007-05-11 2015-06-10 巴斯夫欧洲公司 肟酯光引发剂
JP5339326B2 (ja) 2007-12-05 2013-11-13 独立行政法人産業技術総合研究所 フルオレン含有ポリウレタン及びその効率的製造方法
CN102234463B (zh) 2010-04-27 2015-05-20 精工爱普生株式会社 白色油墨组合物以及使用该白色油墨组合物的记录物
JP2013533508A (ja) 2010-07-14 2013-08-22 エルジー・ケム・リミテッド ポジティブ型感光性樹脂組成物およびこれを含む有機発光素子ブラックバンク
JP6469669B2 (ja) * 2013-07-08 2019-02-13 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se オキシムエステル光開始剤
KR20160084894A (ko) * 2015-01-06 2016-07-15 전자부품연구원 감광성 레진 및 디스플레이용 절연층 제조방법
WO2017110591A1 (ja) * 2015-12-25 2017-06-29 昭和電工株式会社 新規ポリウレタン、硬化性組成物、オーバーコート膜ならびにフレキシブル配線板およびその製造方法
US11086219B2 (en) * 2016-03-30 2021-08-10 Toray Industries, Inc. Negative-type photosensitive resin composition, cured film, display device that includes the cured film, and production method therefor
KR20190005391A (ko) * 2017-07-06 2019-01-16 주식회사 엘지화학 감광성 수지 조성물
WO2019022169A1 (ja) * 2017-07-26 2019-01-31 Jsr株式会社 赤外線透過膜形成用組成物、赤外線透過膜の形成方法、表示装置用保護板、及び表示装置
KR102227606B1 (ko) * 2018-04-06 2021-03-12 주식회사 엘지화학 카도계 바인더 수지, 이를 포함하는 감광성 수지 조성물, 블랙 매트릭스, 컬러필터 및 디스플레이 장치
CN109293824B (zh) 2018-09-12 2019-09-06 大赛璐(中国)投资有限公司 单官能丙烯酸酯树脂及其制备方法和支撑材料组合物及其制备方法和应用

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20070070472A (ko) * 2005-12-29 2007-07-04 제일모직주식회사 감광성 수지 조성물 및 이를 이용한 블랙매트릭스
KR20110071965A (ko) * 2009-12-22 2011-06-29 주식회사 엘지화학 기판접착력이 향상된 고차광성 블랙매트릭스 조성물
KR20120033893A (ko) * 2010-09-30 2012-04-09 코오롱인더스트리 주식회사 감광성 수지 조성물
WO2014199967A1 (ja) * 2013-06-14 2014-12-18 富士フイルム株式会社 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機el表示装置、並びに、タッチパネル表示装置
KR20170045659A (ko) * 2015-10-19 2017-04-27 주식회사 엘지화학 수지 조성물 및 이를 이용하여 제조된 블랙뱅크를 포함하는 디스플레이 장치
CN107636536A (zh) * 2015-10-19 2018-01-26 株式会社Lg化学 树脂组合物和包括通过使用其制造的黑色堤部的显示装置
JP2017146376A (ja) * 2016-02-16 2017-08-24 東洋インキScホールディングス株式会社 カラーフィルタ用顔料組成物、着色組成物およびカラーフィルタの製造方法
CN109476831A (zh) * 2017-03-03 2019-03-15 株式会社Lg化学 聚合物树脂化合物和包含其的用于黑堤的光敏树脂组合物
CN114466879A (zh) * 2019-12-23 2022-05-10 株式会社Lg化学 聚合物树脂化合物、用于制备其的方法、以及包含其的光敏树脂组合物

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