JP7324230B2 - 流路付きプレート - Google Patents

流路付きプレート Download PDF

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Publication number
JP7324230B2
JP7324230B2 JP2020559932A JP2020559932A JP7324230B2 JP 7324230 B2 JP7324230 B2 JP 7324230B2 JP 2020559932 A JP2020559932 A JP 2020559932A JP 2020559932 A JP2020559932 A JP 2020559932A JP 7324230 B2 JP7324230 B2 JP 7324230B2
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JP
Japan
Prior art keywords
embedded
channel
flow path
heat exchange
exchange plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2020559932A
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English (en)
Japanese (ja)
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JPWO2020121898A5 (enExample
JPWO2020121898A1 (ja
Inventor
良仁 荒木
修平 諸田
年彦 花待
響 横山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NHK Spring Co Ltd
Original Assignee
NHK Spring Co Ltd
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Publication date
Application filed by NHK Spring Co Ltd filed Critical NHK Spring Co Ltd
Publication of JPWO2020121898A1 publication Critical patent/JPWO2020121898A1/ja
Publication of JPWO2020121898A5 publication Critical patent/JPWO2020121898A5/ja
Application granted granted Critical
Publication of JP7324230B2 publication Critical patent/JP7324230B2/ja
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Anticipated expiration legal-status Critical

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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D1/00—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators
    • F28D1/02—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid
    • F28D1/0246—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid heat-exchange elements having several adjacent conduits forming a whole, e.g. blocks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D1/00—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators
    • F28D1/02—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid
    • F28D1/0233—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid with air flow channels
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D1/00—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators
    • F28D1/02—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid
    • F28D1/04—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid with tubular conduits
    • F28D1/053—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid with tubular conduits the conduits being straight
    • F28D1/0535—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid with tubular conduits the conduits being straight the conduits having a non-circular cross-section
    • F28D1/05358—Assemblies of conduits connected side by side or with individual headers, e.g. section type radiators
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F1/00—Tubular elements; Assemblies of tubular elements
    • F28F1/02—Tubular elements of cross-section which is non-circular
    • F28F1/025—Tubular elements of cross-section which is non-circular with variable shape, e.g. with modified tube ends, with different geometrical features
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F1/00—Tubular elements; Assemblies of tubular elements
    • F28F1/02—Tubular elements of cross-section which is non-circular
    • F28F1/04—Tubular elements of cross-section which is non-circular polygonal, e.g. rectangular
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F9/00—Casings; Header boxes; Auxiliary supports for elements; Auxiliary members within casings
    • F28F9/02—Header boxes; End plates
    • F28F9/026—Header boxes; End plates with static flow control means, e.g. with means for uniformly distributing heat exchange media into conduits
    • F28F9/0282—Header boxes; End plates with static flow control means, e.g. with means for uniformly distributing heat exchange media into conduits by varying the geometry of conduit ends, e.g. by using inserts or attachments for modifying the pattern of flow at the conduit inlet or outlet
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Geometry (AREA)
  • Drying Of Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2020559932A 2018-12-14 2019-12-03 流路付きプレート Active JP7324230B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2018234929 2018-12-14
JP2018234929 2018-12-14
JP2019184146 2019-10-04
JP2019184146 2019-10-04
PCT/JP2019/047274 WO2020121898A1 (ja) 2018-12-14 2019-12-03 流路付きプレート

Publications (3)

Publication Number Publication Date
JPWO2020121898A1 JPWO2020121898A1 (ja) 2021-11-25
JPWO2020121898A5 JPWO2020121898A5 (enExample) 2022-06-22
JP7324230B2 true JP7324230B2 (ja) 2023-08-09

Family

ID=71075302

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020559932A Active JP7324230B2 (ja) 2018-12-14 2019-12-03 流路付きプレート

Country Status (7)

Country Link
US (1) US20220026151A1 (enExample)
EP (1) EP3896722A4 (enExample)
JP (1) JP7324230B2 (enExample)
KR (1) KR102590641B1 (enExample)
CN (1) CN113169112B (enExample)
TW (1) TWI747100B (enExample)
WO (1) WO2020121898A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230036346A (ko) 2021-09-07 2023-03-14 선문대학교 산학협력단 Cyp125a13 효소를 이용한 스테로이드의 히드록시화 생물전환 방법
KR20230036348A (ko) 2021-09-07 2023-03-14 선문대학교 산학협력단 7α-히드록시스테로이드 탈수소 효소를 이용한 스테로이드의 탈수소화 생물전환 방법
KR102823387B1 (ko) 2021-09-07 2025-06-23 선문대학교 산학협력단 CYP154C3s 효소를 이용한 스테로이드의 하이드록시화 생물전환 방법
KR102638205B1 (ko) 2021-09-13 2024-02-20 선문대학교 산학협력단 Cyp105d18 효소를 이용한 이소퀴놀린 알칼로이드 화합물의 n-산화 생물전환 방법
KR102854914B1 (ko) * 2021-10-20 2025-09-03 니혼도꾸슈도교 가부시키가이샤 유지 장치
CN118280801A (zh) * 2022-12-29 2024-07-02 中微半导体设备(上海)股份有限公司 一种多孔塞组件、静电吸盘及等离子体刻蚀装置
KR102721433B1 (ko) * 2023-02-27 2024-10-25 엔지케이 인슐레이터 엘티디 웨이퍼 적재대
KR102685150B1 (ko) * 2023-10-12 2024-07-16 주식회사 미코세라믹스 세라믹 서셉터 및 그 제조 방법
JP7784470B2 (ja) * 2024-04-08 2025-12-11 日本特殊陶業株式会社 保持装置
KR102823869B1 (ko) 2024-08-26 2025-06-23 주식회사 리더티앤디 Mdf용 분체 도장 자동화 시스템

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003338492A (ja) 2002-05-21 2003-11-28 Tokyo Electron Ltd プラズマ処理装置
JP2006344766A (ja) 2005-06-09 2006-12-21 Matsushita Electric Ind Co Ltd プラズマ処理装置
JP2009218517A (ja) 2008-03-12 2009-09-24 Tohoku Univ シャワープレートの製造方法、シャワープレートおよびプラズマ処理装置
JP3154629U (ja) 2009-08-04 2009-10-22 日本碍子株式会社 静電チャック
JP2010123712A (ja) 2008-11-19 2010-06-03 Nihon Ceratec Co Ltd 静電チャックおよびその製造方法
JP2014209615A (ja) 2013-03-29 2014-11-06 Toto株式会社 静電チャック
JP2017135351A (ja) 2016-01-29 2017-08-03 日本特殊陶業株式会社 基板支持装置及びその製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2559123Y2 (ja) * 1992-03-31 1998-01-14 株式会社神戸製鋼所 真空アーク蒸着装置
US6108189A (en) * 1996-04-26 2000-08-22 Applied Materials, Inc. Electrostatic chuck having improved gas conduits
JP3965258B2 (ja) * 1999-04-30 2007-08-29 日本碍子株式会社 半導体製造装置用のセラミックス製ガス供給構造
US6490145B1 (en) * 2001-07-18 2002-12-03 Applied Materials, Inc. Substrate support pedestal
JP5331519B2 (ja) * 2008-03-11 2013-10-30 日本碍子株式会社 静電チャック
MY154101A (en) * 2008-11-26 2015-04-30 Nhk Spring Co Ltd Probe-unit base member and probe unit
JP6263484B2 (ja) * 2015-01-30 2018-01-17 日本特殊陶業株式会社 静電チャックおよびその製造方法
JP6257540B2 (ja) * 2015-01-30 2018-01-10 日本特殊陶業株式会社 静電チャックおよびその製造方法
CN108649012B (zh) * 2018-05-11 2021-10-01 北京华卓精科科技股份有限公司 新型陶瓷塞及具有该新型陶瓷塞的静电卡盘装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003338492A (ja) 2002-05-21 2003-11-28 Tokyo Electron Ltd プラズマ処理装置
JP2006344766A (ja) 2005-06-09 2006-12-21 Matsushita Electric Ind Co Ltd プラズマ処理装置
JP2009218517A (ja) 2008-03-12 2009-09-24 Tohoku Univ シャワープレートの製造方法、シャワープレートおよびプラズマ処理装置
JP2010123712A (ja) 2008-11-19 2010-06-03 Nihon Ceratec Co Ltd 静電チャックおよびその製造方法
JP3154629U (ja) 2009-08-04 2009-10-22 日本碍子株式会社 静電チャック
JP2014209615A (ja) 2013-03-29 2014-11-06 Toto株式会社 静電チャック
JP2017135351A (ja) 2016-01-29 2017-08-03 日本特殊陶業株式会社 基板支持装置及びその製造方法

Also Published As

Publication number Publication date
EP3896722A4 (en) 2022-08-24
KR20210087536A (ko) 2021-07-12
TWI747100B (zh) 2021-11-21
US20220026151A1 (en) 2022-01-27
JPWO2020121898A1 (ja) 2021-11-25
CN113169112B (zh) 2024-05-07
KR102590641B1 (ko) 2023-10-17
WO2020121898A1 (ja) 2020-06-18
EP3896722A1 (en) 2021-10-20
TW202025414A (zh) 2020-07-01
CN113169112A (zh) 2021-07-23

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