JP7309692B2 - 半導体ウェハのハイブリッド接合方法及び関連する3次元集積デバイス - Google Patents
半導体ウェハのハイブリッド接合方法及び関連する3次元集積デバイス Download PDFInfo
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- 239000004065 semiconductor Substances 0.000 title claims description 60
- 238000000034 method Methods 0.000 title claims description 45
- 235000012431 wafers Nutrition 0.000 claims description 103
- 229920000642 polymer Polymers 0.000 claims description 66
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 60
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 21
- 239000002184 metal Substances 0.000 claims description 18
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 13
- 239000011247 coating layer Substances 0.000 claims description 12
- 239000010410 layer Substances 0.000 claims description 11
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 9
- 238000000151 deposition Methods 0.000 claims description 7
- 238000007521 mechanical polishing technique Methods 0.000 claims description 4
- 238000005553 drilling Methods 0.000 claims description 2
- 238000004140 cleaning Methods 0.000 claims 1
- 238000001035 drying Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 12
- 239000002344 surface layer Substances 0.000 description 9
- 229910004298 SiO 2 Inorganic materials 0.000 description 8
- 239000000853 adhesive Substances 0.000 description 6
- 230000001070 adhesive effect Effects 0.000 description 6
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 description 6
- 238000013459 approach Methods 0.000 description 5
- 239000012790 adhesive layer Substances 0.000 description 4
- 229910052681 coesite Inorganic materials 0.000 description 4
- 229910052906 cristobalite Inorganic materials 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 229910052682 stishovite Inorganic materials 0.000 description 4
- 229910052905 tridymite Inorganic materials 0.000 description 4
- 230000006835 compression Effects 0.000 description 3
- 238000007906 compression Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000001029 thermal curing Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 210000005098 blood-cerebrospinal fluid barrier Anatomy 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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Description
1.金属/SiO2(Ziptronix社のダイレクト・ボンド・インターコネクト(Direct Bond Interconnect)法);
2.金属/ポリマー(BCB)(金属/接着剤のビアファーストによる3D接合)
の2つの主な手法に特許が与えられている。
米国特許出願公開第2007/0207592号;
米国特許出願公開第2015/0294963号;
米国特許出願公開第2002/0074670号;
米国特許出願公開第2017/0062366号;
論文「Adhesive Wafer Bonding Using Partially Cured Benzocyclobutene for Three-Dimensional Integration」、Frank Niklausら著、J.Electrochem.Soc. 2006 153巻、4号、G291~G295;
章「Hybrid Metal/Polymer Wafer Bonding Platform」、Jian-Qiang Lu、J.Jay McMahon、Ronald J.Gutmann著(書籍「Handbook of Wafer Bonding」、第1版、Peter Ramm編、(2012) Wiley-VCH Verlag GmbH & Co.KGaAに記載の章);
は、2つの半導体ウェハ間のハイブリッド接合を実現するための一般的な技術について、チュートリアル的な公開情報を提供している。
a1)前記半導体ウェハのうちの第1の半導体ウェハに対して、まだ硬化していないシロキサン・ポリマーのコーティング層を、前記第1の半導体ウェハの頂面及びその導電性パッドの上にコンフォーマルに堆積させて、その導電性パッドを覆い且つそれらの間の陥凹部を充填するステップであって、前記シロキサン・ポリマーは硬化させると収縮するタイプのものである、ステップと;
a2)前記半導体性ウェハのうちの第2の半導体ウェハが、露出した導電性パッドを有するように、且つ前記第2の半導体ウェハの頂面の上及び導電性パッド間の陥凹部の中にシリコン酸化物又はまだ硬化していない前記シロキサン・ポリマーのコーティング層を有するようにするステップと;
b)前記第1の半導体ウェハのまだ硬化していない前記シロキサン・ポリマーの層の厚さを、化学的機械研磨技法を用いてその一番上の部分を取り除くことによって減じるステップであって、それによりその導電性パッドを、露出させ、且つまだ硬化していない前記シロキサン・ポリマーで充填された陥凹部と共にそれらを平坦化するステップと;
c)前記2つの半導体ウェハをそれらの間で互いに対向して位置合わせされるように結合するステップであって、それにより2つの半導体ウェハの導電性パッドを隣り合わせに互いに接して配置し、且つまだ硬化していない前記シロキサン・ポリマー及び/又はシリコン酸化物で充填された前記陥凹部を隣り合わせに互いに接して配置するステップと;
d)前記シロキサン・ポリマーのそれぞれの部分を同時に硬化させ、且つ前記シロキサン・ポリマーのそれぞれの部分を互いに、又はシリコン酸化物のそれぞれの部分と固着させるのに十分な温度及び時間で、互いに結合された2つの半導体ウェハをオーブンの中で一緒にベークするステップと
を含む。
SC-480;
SC-200;
SC-300;
SC-400;
SC-500;
SC-700;
SC-800;
上記シリーズのシロキサン・ポリマーの混合物;
はすべて、特に適切であることが立証されている。これらのシロキサン・ポリマーの試験が行われ、熱硬化ステップの間にさらに圧縮力をかけない場合も、第1の半導体ウェハの隣接する電気コンタクト間のギャップを充填するシロキサン・ポリマーの各部分が、第2の半導体ウェハの対向するシロキサン・ポリマーの各部分又はSiO2の各部分に適切に固着することが見出されている。シロキサン・ポリマーは硬化させると収縮するため、2つの半導体ウェハのこのハイブリッド接合プロセスにそれらを確実に用いることが可能である。
Claims (6)
- 相互に間隔を置いて配置された複数の導電性パッドをそれぞれが有する2つの半導体ウェハを互いに接合するためのハイブリッド接合方法であって、前記複数の導電性パッドは、前記ウェハの頂面上に露出され、且つそれらの間に陥凹部を画定している、方法において:
a1)前記半導体ウェハのうちの第1の半導体ウェハ上に、まだ硬化されていないシロキサン・ポリマーのコーティング層を、前記第1の半導体ウェハの前記頂面及びその導電性パッドを覆うようにコンフォーマルに堆積させ、それによりその導電性パッドを覆い隠し、且つそれらの間の前記陥凹部を埋めるステップであって、前記シロキサン・ポリマーは硬化されたとき収縮するタイプである、ステップと;
a2)露出した導電性パッドと、シリコン酸化物又はまだ硬化されていない前記シロキサン・ポリマーのコーティング層とを備えるように、前記半導体ウェハのうちの第2の半導体ウェハを実現するステップであって、前記コーティング層は前記第2の半導体ウェハの前記頂面を覆い且つ前記導電性パッド間の前記陥凹部内にある、ステップと;
b)前記第1の半導体ウェハのまだ硬化されていない前記シロキサン・ポリマーの前記層の厚さを、化学的機械研磨技法によりその最上部を取り除くことによって減じるステップであって、それによりその導電性パッドを露出させ、且つそれらを、まだ硬化されていない前記シロキサン・ポリマーで埋められた前記陥凹部と共に平坦化するステップと;
c)互いに対向してそれらの間で位置合わせされた前記2つの半導体ウェハを結合するステップであって、それにより前記2つの半導体ウェハの導電性パッドを互いに隣接して配置し、且つまだ硬化されていない前記シロキサン・ポリマーの部分及び/又は前記シリコン酸化物の部分で埋められた前記陥凹部を互いに隣接して配置するステップと;
d)互いに共に結合された前記2つの半導体ウェハを、前記シロキサン・ポリマーがまだ硬化されていない状態でオーブン内に配置し、そして互いに結合された前記2つの半導体ウェハをオーブンの内で一緒にベークするステップであって、前記シロキサン・ポリマーの前記部分を同時に硬化させ、同時に前記シロキサン・ポリマーの前記部分を互いに又はシリコン酸化物の前記部分と固着させるのに十分な温度及び時間で前記2つの半導体ウェハをベークするステップと
を含む、ハイブリッド接合方法。 - 前記ステップa2)は、前記半導体性ウェハのうちの前記第2の半導体ウェハ上に、まだ硬化されていない前記シロキサン・ポリマーのコーティング層を、前記第2の半導体ウェハの前記頂面及びその導電性パッドを覆うようにコンフォーマルに堆積させ、それによりその導電性パッドを覆い隠し、且つそれらの間の前記陥凹部を埋めるステップによって、そして次いで、前記第2の半導体ウェハのまだ硬化されていない前記シロキサン・ポリマーの前記層の厚さを、化学的機械研磨技法によりその最上部を取り除くことによって減じるステップであって、それによりその導電性パッドを露出させ、且つそれらを、まだ硬化されていない前記シロキサン・ポリマーで埋められた前記陥凹部と共にそれらを平坦化するステップによって実行される、請求項1に記載のハイブリッド接合方法。
- 前記ステップa2)は、前記半導体ウェハのうちの前記第2の半導体ウェハ上にシリコン酸化物のコーティング層を堆積させるステップ、前記コーティング層に複数の孔を掘るステップ、及びそれらを金属で充填して前記導電性パッドを実現するステップによって実行される、請求項1に記載のハイブリッド接合方法。
- 前記ステップa1)及びa2)を実行する前に、前記2つの半導体ウェハの前記頂面を、H2O2及びNH3を用いたウェット洗浄プロセスで予備洗浄し、次いで前記頂面をイソプロピルアルコールで乾燥させるステップを含む、請求項1から3までのいずれか一項に記載のハイブリッド接合方法。
- 前記ステップd)が300℃~400℃の範囲の温度で実行される、請求項1から4までのいずれか一項に記載のハイブリッド接合方法。
- ステップb)の後であってステップc)の前に、
シロキサン・ポリマーのコーティング層を有する1又は複数の前記半導体ウェハを、100℃~200℃の間の範囲の温度で2分間ベークする操作を実行することを含む、請求項1から5までのいずれか一項に記載のハイブリッド接合方法。
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