JP7239182B2 - 高純度炭化ケイ素単結晶基板及びその製造方法、応用 - Google Patents

高純度炭化ケイ素単結晶基板及びその製造方法、応用 Download PDF

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JP7239182B2
JP7239182B2 JP2019571537A JP2019571537A JP7239182B2 JP 7239182 B2 JP7239182 B2 JP 7239182B2 JP 2019571537 A JP2019571537 A JP 2019571537A JP 2019571537 A JP2019571537 A JP 2019571537A JP 7239182 B2 JP7239182 B2 JP 7239182B2
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silicon carbide
single crystal
crystal substrate
carbide single
purity silicon
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JP2021502943A (ja
JP2021502943A5 (enExample
Inventor
超 高
文文 柏
▲紅▼岩 ▲張▼
文涛 ▲竇▼
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SICC CO., LTD.
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SICC CO., LTD.
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Priority claimed from CN201811205277.2A external-priority patent/CN109234802B/zh
Priority claimed from CN201811204666.3A external-priority patent/CN109338463B/zh
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    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/36—Carbides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/0445—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising crystalline silicon carbide
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • C30B33/02—Heat treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002—Preparing wafers

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
JP2019571537A 2018-10-16 2018-12-26 高純度炭化ケイ素単結晶基板及びその製造方法、応用 Active JP7239182B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
CN201811205277.2A CN109234802B (zh) 2018-10-16 2018-10-16 一种制备高质量的半绝缘碳化硅单晶衬底的方法
CN201811205277.2 2018-10-16
CN201811204666.3 2018-10-16
CN201811204666.3A CN109338463B (zh) 2018-10-16 2018-10-16 一种高纯碳化硅单晶衬底
PCT/CN2018/123710 WO2020077848A1 (zh) 2018-10-16 2018-12-26 一种高纯碳化硅单晶衬底及其制备方法

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JP2021502943A JP2021502943A (ja) 2021-02-04
JP2021502943A5 JP2021502943A5 (enExample) 2021-04-15
JP7239182B2 true JP7239182B2 (ja) 2023-03-14

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EP (1) EP3666935B1 (enExample)
JP (1) JP7239182B2 (enExample)
KR (1) KR102345680B1 (enExample)
TW (1) TWI723578B (enExample)
WO (1) WO2020077848A1 (enExample)

Families Citing this family (3)

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Publication number Priority date Publication date Assignee Title
KR102321229B1 (ko) 2021-03-30 2021-11-03 주식회사 쎄닉 탄화규소 웨이퍼 및 이를 적용한 반도체 소자
CN113390354A (zh) * 2021-07-21 2021-09-14 苏州恒嘉晶体材料有限公司 一种衬底片厚度检测装置及测量方法
CN115418725B (zh) * 2022-07-28 2024-04-26 浙江大学杭州国际科创中心 一种氮化硅薄膜热退火方法和装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005508821A (ja) 2001-05-25 2005-04-07 クリー　インコーポレイテッド バナジウム優位でない半導体炭化ケイ素
JP2005531145A (ja) 2002-06-24 2005-10-13 クリー　インコーポレイテッド 高純度炭化珪素結晶において半絶縁性抵抗率を生成する方法

Family Cites Families (10)

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Publication number Priority date Publication date Assignee Title
US6218680B1 (en) * 1999-05-18 2001-04-17 Cree, Inc. Semi-insulating silicon carbide without vanadium domination
US8617965B1 (en) * 2004-02-19 2013-12-31 Partial Assignment to University of Central Florida Apparatus and method of forming high crystalline quality layer
JP4946264B2 (ja) * 2006-08-23 2012-06-06 日立金属株式会社 炭化珪素半導体エピタキシャル基板の製造方法
JP2009149481A (ja) * 2007-12-21 2009-07-09 Siltronic Ag 半導体基板の製造方法
US20120056202A1 (en) * 2009-05-11 2012-03-08 Sumitomo Electric Industries, Ltd. Semiconductor device
JP5568054B2 (ja) * 2011-05-16 2014-08-06 トヨタ自動車株式会社 半導体素子の製造方法
CN105821471B (zh) * 2016-05-10 2018-10-30 山东大学 一种低应力高纯半绝缘SiC单晶的制备方法
CN106757357B (zh) * 2017-01-10 2019-04-09 山东天岳先进材料科技有限公司 一种高纯半绝缘碳化硅衬底的制备方法
CN107723798B (zh) * 2017-10-30 2020-06-02 中国电子科技集团公司第四十六研究所 一种高效率制备高纯半绝缘碳化硅单晶生长装置及方法
CN108130592B (zh) * 2017-11-14 2019-11-12 山东天岳先进材料科技有限公司 一种高纯半绝缘碳化硅单晶的制备方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005508821A (ja) 2001-05-25 2005-04-07 クリー　インコーポレイテッド バナジウム優位でない半導体炭化ケイ素
JP2005531145A (ja) 2002-06-24 2005-10-13 クリー　インコーポレイテッド 高純度炭化珪素結晶において半絶縁性抵抗率を生成する方法

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EP3666935B1 (en) 2024-05-22
TW202028546A (zh) 2020-08-01
WO2020077848A1 (zh) 2020-04-23
JP2021502943A (ja) 2021-02-04
EP3666935C0 (en) 2024-05-22
EP3666935A4 (en) 2020-10-14
KR102345680B1 (ko) 2021-12-29
EP3666935A1 (en) 2020-06-17
KR20200044730A (ko) 2020-04-29
TWI723578B (zh) 2021-04-01

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