TWI723578B - 高純度碳化矽單晶基材及其製備方法、應用 - Google Patents
高純度碳化矽單晶基材及其製備方法、應用 Download PDFInfo
- Publication number
- TWI723578B TWI723578B TW108136951A TW108136951A TWI723578B TW I723578 B TWI723578 B TW I723578B TW 108136951 A TW108136951 A TW 108136951A TW 108136951 A TW108136951 A TW 108136951A TW I723578 B TWI723578 B TW I723578B
- Authority
- TW
- Taiwan
- Prior art keywords
- silicon carbide
- carbide single
- single crystal
- crystal substrate
- purity silicon
- Prior art date
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims abstract description 260
- 229910010271 silicon carbide Inorganic materials 0.000 title claims abstract description 252
- 239000013078 crystal Substances 0.000 title claims abstract description 233
- 239000000758 substrate Substances 0.000 title claims abstract description 194
- 238000002360 preparation method Methods 0.000 title claims abstract description 18
- 230000007547 defect Effects 0.000 claims abstract description 59
- 239000002344 surface layer Substances 0.000 claims abstract description 45
- 238000010438 heat treatment Methods 0.000 claims abstract description 44
- 239000010410 layer Substances 0.000 claims abstract description 40
- 239000004065 semiconductor Substances 0.000 claims abstract description 8
- 238000000137 annealing Methods 0.000 claims description 49
- 238000001816 cooling Methods 0.000 claims description 17
- 238000004093 laser heating Methods 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 abstract description 48
- 238000000034 method Methods 0.000 abstract description 20
- 239000000463 material Substances 0.000 abstract description 5
- 238000005224 laser annealing Methods 0.000 abstract description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 13
- 229910002804 graphite Inorganic materials 0.000 description 12
- 239000010439 graphite Substances 0.000 description 12
- 239000012535 impurity Substances 0.000 description 12
- 238000010586 diagram Methods 0.000 description 7
- 238000012545 processing Methods 0.000 description 7
- 238000012360 testing method Methods 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000000407 epitaxy Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 2
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 150000002500 ions Chemical group 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/0445—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising crystalline silicon carbide
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/36—Carbides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
- C30B33/02—Heat treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Thermal Sciences (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811204666.3A CN109338463B (zh) | 2018-10-16 | 2018-10-16 | 一种高纯碳化硅单晶衬底 |
| CNCN201811204666.3 | 2018-10-16 | ||
| CN201811205277.2A CN109234802B (zh) | 2018-10-16 | 2018-10-16 | 一种制备高质量的半绝缘碳化硅单晶衬底的方法 |
| CNCN201811205277.2 | 2018-10-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202028546A TW202028546A (zh) | 2020-08-01 |
| TWI723578B true TWI723578B (zh) | 2021-04-01 |
Family
ID=70283624
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108136951A TWI723578B (zh) | 2018-10-16 | 2019-10-14 | 高純度碳化矽單晶基材及其製備方法、應用 |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP3666935B1 (enExample) |
| JP (1) | JP7239182B2 (enExample) |
| KR (1) | KR102345680B1 (enExample) |
| TW (1) | TWI723578B (enExample) |
| WO (1) | WO2020077848A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102321229B1 (ko) | 2021-03-30 | 2021-11-03 | 주식회사 쎄닉 | 탄화규소 웨이퍼 및 이를 적용한 반도체 소자 |
| CN113390354A (zh) * | 2021-07-21 | 2021-09-14 | 苏州恒嘉晶体材料有限公司 | 一种衬底片厚度检测装置及测量方法 |
| CN115418725B (zh) * | 2022-07-28 | 2024-04-26 | 浙江大学杭州国际科创中心 | 一种氮化硅薄膜热退火方法和装置 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1695253A (zh) * | 2001-05-25 | 2005-11-09 | 克里公司 | 不具有钒控制的半绝缘碳化硅 |
| TWI285404B (en) * | 2002-06-24 | 2007-08-11 | Cree Inc | Method for producing semi-insulating resistivity in high purity silicon carbide crystals |
| TW201101482A (en) * | 2009-05-11 | 2011-01-01 | Sumitomo Electric Industries | Insulating gate type bipolar transistor |
| CN106757357A (zh) * | 2017-01-10 | 2017-05-31 | 山东天岳晶体材料有限公司 | 一种高纯半绝缘碳化硅衬底的制备方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6218680B1 (en) * | 1999-05-18 | 2001-04-17 | Cree, Inc. | Semi-insulating silicon carbide without vanadium domination |
| US8617965B1 (en) * | 2004-02-19 | 2013-12-31 | Partial Assignment to University of Central Florida | Apparatus and method of forming high crystalline quality layer |
| JP4946264B2 (ja) * | 2006-08-23 | 2012-06-06 | 日立金属株式会社 | 炭化珪素半導体エピタキシャル基板の製造方法 |
| JP2009149481A (ja) * | 2007-12-21 | 2009-07-09 | Siltronic Ag | 半導体基板の製造方法 |
| JP5568054B2 (ja) * | 2011-05-16 | 2014-08-06 | トヨタ自動車株式会社 | 半導体素子の製造方法 |
| CN105821471B (zh) * | 2016-05-10 | 2018-10-30 | 山东大学 | 一种低应力高纯半绝缘SiC单晶的制备方法 |
| CN107723798B (zh) * | 2017-10-30 | 2020-06-02 | 中国电子科技集团公司第四十六研究所 | 一种高效率制备高纯半绝缘碳化硅单晶生长装置及方法 |
| CN108130592B (zh) * | 2017-11-14 | 2019-11-12 | 山东天岳先进材料科技有限公司 | 一种高纯半绝缘碳化硅单晶的制备方法 |
-
2018
- 2018-12-26 KR KR1020197037937A patent/KR102345680B1/ko active Active
- 2018-12-26 JP JP2019571537A patent/JP7239182B2/ja active Active
- 2018-12-26 EP EP18922090.8A patent/EP3666935B1/en active Active
- 2018-12-26 WO PCT/CN2018/123710 patent/WO2020077848A1/zh not_active Ceased
-
2019
- 2019-10-14 TW TW108136951A patent/TWI723578B/zh active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1695253A (zh) * | 2001-05-25 | 2005-11-09 | 克里公司 | 不具有钒控制的半绝缘碳化硅 |
| TWI285404B (en) * | 2002-06-24 | 2007-08-11 | Cree Inc | Method for producing semi-insulating resistivity in high purity silicon carbide crystals |
| TW201101482A (en) * | 2009-05-11 | 2011-01-01 | Sumitomo Electric Industries | Insulating gate type bipolar transistor |
| CN106757357A (zh) * | 2017-01-10 | 2017-05-31 | 山东天岳晶体材料有限公司 | 一种高纯半绝缘碳化硅衬底的制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP3666935B1 (en) | 2024-05-22 |
| KR20200044730A (ko) | 2020-04-29 |
| EP3666935C0 (en) | 2024-05-22 |
| JP2021502943A (ja) | 2021-02-04 |
| JP7239182B2 (ja) | 2023-03-14 |
| TW202028546A (zh) | 2020-08-01 |
| EP3666935A1 (en) | 2020-06-17 |
| WO2020077848A1 (zh) | 2020-04-23 |
| KR102345680B1 (ko) | 2021-12-29 |
| EP3666935A4 (en) | 2020-10-14 |
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