JP7221451B2 - 異物検査基板、基板処理装置、及び基板処理方法 - Google Patents
異物検査基板、基板処理装置、及び基板処理方法 Download PDFInfo
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Description
81 検査基板
81a 通過部
82 照射器
83 受光器
83a 光電変換素子
Claims (16)
- 処理液の通過する通過部が貫通形成された検査基板と、
前記処理液に対して検査光を照射する照射器と、
前記処理液中の異物が前記検査光を通過することで生じる散乱光、又は前記処理液中の異物が前記検査光を通過することで減衰される透過光を受光する受光器と、
を備え、
前記受光器は、受光した前記散乱光又は前記透過光を電気信号に変換する光電変換素子を含み、
前記照射器と前記受光器とが、前記検査基板に設けられる、異物検査基板。 - 前記検査光の中心線に対する、前記処理液の流れの中心線の相対位置を検出する位置検出器を更に備える、請求項1に記載の異物検査基板。
- 前記受光器で生成される前記電気信号を外部に送る、及び/又は前記照射器で消費される電力を外部から受け取る伝達部を更に備える、請求項1又は2に記載の異物検査基板。
- 前記伝達部は、外部の搬送装置の端子に当接する端子を含む、請求項3に記載の異物検査基板。
- 前記搬送装置の電磁石に吸着される吸着部を備える、請求項4に記載の異物検査基板。
- 前記搬送装置に対して位置決めされる位置決め部を備える、請求項4又は5に記載の異物検査基板。
- 請求項1~6のいずれか1項に記載の異物検査基板と、
基板に対して前記処理液を供給する複数の液処理モジュールと、
複数の前記液処理モジュールに前記基板を搬送する搬送装置と、
前記異物検査基板と前記液処理モジュールと前記搬送装置とを制御する制御装置と、
を備え、
前記制御装置は、前記搬送装置によって前記異物検査基板を複数の前記液処理モジュールに順番に搬送し、複数の前記液処理モジュールのそれぞれにて前記検査光の照射と前記電気信号の生成とを実施し、前記電気信号を解析することで前記異物を計測する、基板処理装置。 - 複数の前記液処理モジュールのそれぞれは、複数の前記処理液を前記基板に対して順番に供給し、
前記制御装置は、複数の前記液処理モジュールのそれぞれにて前記処理液毎に前記検査光の照射と前記電気信号の生成とを実施する、請求項7に記載の基板処理装置。 - 複数の前記処理液を複数の前記液処理モジュールに分配する分配モジュールと、前記分配モジュールにて前記処理液毎に前記処理液中の前記異物を検査する検査ユニットとを更に備える、請求項8に記載の基板処理装置。
- 前記制御装置は、前記処理液毎に、前記処理液の前記異物を検査する検査場所と、前記異物の検査結果とを表示装置に表示する、請求項7~9のいずれか1項に記載の基板処理装置。
- 前記液処理モジュールは、前記基板を水平に保持するスピンチャックと、前記スピンチャックで保持されている前記基板に対して上方から前記処理液を吐出するノズルとを含み、
前記制御装置は、前記検査光の照射と前記電気信号の生成とを実施する際に、前記搬送装置によって前記検査基板を前記スピンチャックよりも上方に水平に保持する、請求項7~10のいずれか1項に記載の基板処理装置。 - 前記照射器は、前記ノズルを介して前記処理液に前記検査光を照射し、
前記受光器は、前記ノズルを介して前記処理液から前記散乱光又は前記透過光を受光する、請求項11に記載の基板処理装置。 - 前記スピンチャックに水平に保持されるダミー基板を更に備え、
前記制御装置は、前記検査光の照射と前記電気信号の生成とを実施する際に、前記搬送装置によって前記検査基板を前記ダミー基板よりも上方に水平に保持し、前記スピンチャックと共に前記ダミー基板を回転させる、請求項11又は12に記載の基板処理装置。 - 前記制御装置は、前記検査光の照射と前記電気信号の生成とを実施した後、前記スピンチャックと共に回転する前記ダミー基板に対して前記ノズルからリンス液を供給する、請求項13に記載の基板処理装置。
- 前記搬送装置は、前記異物検査基板を保持する第1搬送アームと、前記ダミー基板を保持する第2搬送アームと、前記第1搬送アームと前記第2搬送アームを独立に移動させる移動機構とを含み、
前記第1搬送アームは、前記第2搬送アームの上方に配置される、請求項13又は14に記載の基板処理装置。 - 基板に対して処理液を供給し、前記基板を処理することと、
請求項1~6のいずれか1項に記載の異物検査基板の前記照射器によって、前記処理液に対して前記検査光を照射することと、
前記散乱光又は前記透過光を前記受光器によって受光し、前記光電変換素子によって電気信号に変換することと、
前記電気信号を解析し、前記異物を計測することと、
を有する、基板処理方法。
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JPWO2021256314A1 (ja) | 2021-12-23 |
CN115702338B (zh) | 2024-08-06 |
WO2021256314A1 (ja) | 2021-12-23 |
KR20220142546A (ko) | 2022-10-21 |
CN115702338A (zh) | 2023-02-14 |
KR102539402B1 (ko) | 2023-06-01 |
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