WO2021256314A1 - 異物検査基板、基板処理装置、及び基板処理方法 - Google Patents
異物検査基板、基板処理装置、及び基板処理方法 Download PDFInfo
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- WO2021256314A1 WO2021256314A1 PCT/JP2021/021565 JP2021021565W WO2021256314A1 WO 2021256314 A1 WO2021256314 A1 WO 2021256314A1 JP 2021021565 W JP2021021565 W JP 2021021565W WO 2021256314 A1 WO2021256314 A1 WO 2021256314A1
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- Prior art keywords
- substrate
- foreign matter
- liquid
- inspection
- light
- Prior art date
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- 238000012545 processing Methods 0.000 title claims abstract description 105
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Images
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/85—Investigating moving fluids or granular solids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
- B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N21/49—Scattering, i.e. diffuse reflection within a body or fluid
- G01N21/53—Scattering, i.e. diffuse reflection within a body or fluid within a flowing fluid, e.g. smoke
- G01N21/532—Scattering, i.e. diffuse reflection within a body or fluid within a flowing fluid, e.g. smoke with measurement of scattering and transmission
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
Definitions
- This disclosure relates to a foreign matter inspection board, a board processing device, and a board processing method.
- the coating module described in Patent Document 1 has a spin chuck that holds the substrate horizontally from below, a nozzle that discharges a chemical solution onto the upper surface of the substrate held by the spin chuck, and a substrate that is held by the spin chuck. It is equipped with a cup for collecting the drug solution.
- a foreign matter detection unit is provided on the side of the cup.
- the foreign matter detection unit includes a laser light irradiation unit, a light receiving unit, and a flow path array.
- the laser light irradiation unit and the light receiving unit are provided so as to face each other with the flow path array sandwiched from the front and back.
- the laser light irradiation unit irradiates one flow path selected from a plurality of flow paths of the flow path array.
- the light receiving unit receives light transmitted through the flow path.
- the two types of jig boards described in Patent Document 2 are used for auto-teaching of a transfer robot.
- One jig board is a jig board on the detected side.
- the jig substrate on the detected side includes a disk-shaped jig main body and a cylindrical detected portion that rises vertically from the center of the jig main body.
- the other jig board is a sensor-side jig board.
- the sensor-side jig substrate includes a disk-shaped jig body having a circular hole formed in the center for receiving the detected portion, and a light emitting portion and a light receiving portion arranged to face each other on the edge of the hole.
- the sensor-side board is held by the first board holding part
- the detected side board is held by the second board holding part
- the light emitting part and the light receiving part detect the detected part
- the first board holding part and the second board holding part are held. The positional relationship of the parts is detected.
- One aspect of the present disclosure provides a technique for measuring a foreign substance in a processing liquid immediately before being supplied to a substrate.
- the foreign matter inspection board includes an inspection board, an irradiator, and a light receiver.
- a passing portion through which the treatment liquid passes is formed through the inspection substrate.
- the irradiator irradiates the treatment liquid with inspection light.
- the light receiver receives scattered light generated by the foreign matter in the processing liquid passing through the inspection light, or transmitted light attenuated by the foreign matter in the treatment liquid passing through the inspection light.
- the light receiver includes a photoelectric conversion element that converts the received scattered light or the transmitted light into an electric signal.
- the irradiator and the receiver are provided on the inspection board.
- foreign matter in the processing liquid immediately before being supplied to the substrate can be measured.
- FIG. 1 is a plan view showing a substrate processing apparatus according to an embodiment.
- FIG. 2 is a front view of the substrate processing apparatus of FIG.
- FIG. 3 is a cross-sectional view showing a liquid treatment module according to an embodiment.
- FIG. 4 is a flowchart showing a substrate processing method according to an embodiment.
- FIG. 5 is a perspective view showing a foreign matter inspection board according to an embodiment. 6 (A) is a plan view of the foreign matter inspection board of FIG. 5, and FIG. 6 (B) is a cross-sectional view taken along the line BB of FIG. 6 (A).
- FIG. 7 is a horizontal cross-sectional view showing an example of switching nozzles for irradiating inspection light.
- FIG. 1 is a plan view showing a substrate processing apparatus according to an embodiment.
- FIG. 2 is a front view of the substrate processing apparatus of FIG.
- FIG. 3 is a cross-sectional view showing a liquid treatment module according to an embodiment.
- FIG. 4 is a
- FIG. 8A is a perspective view showing an example of an irradiator and a nozzle before alignment
- FIG. 8B is a perspective view showing an example of an irradiator and a nozzle after alignment
- 9 (A) is a perspective view showing an example of electrical wiring before connection
- FIG. 9 (B) is a perspective view showing an example of electrical wiring after connection
- FIG. 9 (C) is an example of electrical wiring after connection.
- FIG. 10A is a cross-sectional view showing an example of the positioning unit before positioning
- FIG. 10B is a cross-sectional view showing an example of the positioning unit after positioning
- FIG. 11 is a flowchart showing an example of processing performed before S101 in FIG. 4 or after S106.
- FIG. 11 is a flowchart showing an example of processing performed before S101 in FIG. 4 or after S106.
- FIG. 12 is a flowchart showing an example of the process following FIG. 13 (A) is a perspective view showing an example of S204 of FIG. 11, FIG. 13 (B) is a perspective view showing an example of S205 of FIG. 11, and FIG. 13 (C) is a perspective view showing an example of S206.
- 14 (A) is a perspective view showing an example of S208 of FIG. 11
- FIG. 14 (B) is a perspective view showing an example of S211 of FIG. 12
- FIG. 14 (C) is a perspective view showing an example of S212 of FIG. Is.
- FIG. 15 is a diagram showing an example of a distribution module and an inspection unit.
- FIG. 16 is a diagram showing an example of an image to be displayed on the display device.
- FIG. 17 is a plan view showing a modified example of the foreign matter inspection board shown in FIG. 6 (A).
- the substrate processing apparatus 1 will be described with reference to FIGS. 1 and 2.
- the X-axis direction, the Y-axis direction, and the Z-axis direction are perpendicular to each other
- the X-axis direction and the Y-axis direction are the horizontal direction
- the Z-axis direction is the vertical direction.
- the board processing device 1 includes a loading / unloading station 2 and a processing station 3.
- the loading / unloading station 2 and the processing station 3 are provided adjacent to each other in the X-axis direction.
- the loading / unloading station 2 includes a mounting table 21, a transport section 22, and a delivery section 23.
- the mounting table 21 is for mounting a plurality of carriers C.
- Each of the plurality of carriers C accommodates a plurality of horizontal substrates W at intervals in the vertical direction.
- the transport unit 22 is provided adjacent to the mounting table 21.
- a transport device 4 is arranged inside the transport unit 22.
- the transport device 4 transports the substrate W inside the transport unit 22, and transports the substrate W between a plurality of devices arranged next to the transport unit 22.
- the transport device 4 includes a transport arm 41 that holds the substrate W.
- the transport arm 41 can move in the horizontal direction (both directions in the X-axis direction and the Y-axis direction) and in the vertical direction, and can rotate around the vertical axis.
- the number of the transfer arms 41 may be one or a plurality.
- One transfer arm 41 takes out the substrate W from the carrier C, and the other transfer arm 41 accommodates the substrate W in the carrier C.
- the delivery section 23 is provided adjacent to the transport section 22.
- the delivery unit 23 has a transition device 23a that temporarily accommodates the substrate W. Further, as shown in FIG. 2, the delivery unit 23 has a hangar 23b for storing the foreign matter inspection board 8 and the dummy board 9.
- the foreign matter inspection board 8 and the dummy board 9 are stored in the same hangar 23b in the present embodiment, but may be stored in separate hangars 23b.
- the arrangement and number of the transition devices 23a and the hangar 23b are not particularly limited.
- the processing station 3 includes a transport block 31 and a processing block 32.
- the transport block 31 is provided adjacent to the delivery section 23.
- the transport block 31 has a rectangular parallelepiped shape.
- a transport device 5 is arranged inside the transport block 31. The transport device 5 transports the substrate W between a plurality of devices arranged next to the transport block 31.
- the transport device 5 includes a transport arm 51 that holds the substrate W.
- the transport arm 51 can move in the horizontal direction (both directions in the X-axis direction and the Y-axis direction) and in the vertical direction, and can rotate around the vertical axis.
- the number of the transfer arms 51 may be one or a plurality. In the latter case, for example, different transfer arms 51 are used before and after processing by the liquid processing module 6 described later.
- the processing block 32 is provided adjacent to the transport block 31.
- a plurality of processing blocks 32 may be provided.
- a plurality of processing blocks 32 are symmetrically arranged on both sides of the transport block 31 in the Y-axis direction.
- a plurality of processing blocks 32 are stacked in the vertical direction.
- the arrangement and number of the processing blocks 32 are not particularly limited.
- the processing block 32 includes a liquid processing module 6.
- the liquid treatment module 6 supplies the treatment liquid to the substrate W and processes the substrate W.
- the processing block 32 may include a plurality of liquid processing modules 6.
- the plurality of liquid treatment modules 6 are arranged in a row in the X-axis direction and are adjacent to one side of the transport block 31.
- the board processing device 1 includes a control device 7.
- the control device 7 is, for example, a computer, and includes a CPU (Central Processing Unit) 71 and a storage medium 72 such as a memory.
- the storage medium 72 stores programs that control various processes executed by the substrate processing device 1.
- the control device 7 controls the operation of the board processing device 1 by causing the CPU 71 to execute the program stored in the storage medium 72.
- the liquid treatment module 6 supplies the treatment liquid to the substrate W and processes the substrate W.
- the substrate W includes a semiconductor substrate such as a silicon wafer or a compound semiconductor wafer, or a glass substrate.
- a conductive film or an insulating film is formed on the surface of a semiconductor substrate or a glass substrate. Multiple films may be formed.
- the surface of the substrate W may include a device such as an electronic circuit, or may include an uneven pattern (not shown).
- the liquid processing module 6 has a processing container 61 for accommodating the substrate W inside, a holding portion 62 for holding the substrate W, and a rotating portion 63 for rotating the holding portion 62. Further, the liquid treatment module 6 has a liquid supply unit 64 that supplies the treatment liquid to the substrate W held in the holding unit 62, and a cup 68 that collects the treatment liquid L that is shaken off from the substrate W.
- the processing container 61 has a gate (not shown) and a gate valve (not shown) that opens and closes the gate.
- the substrate W is carried into the inside of the processing container 61 through the gate, processed inside the processing container 61, and then carried out to the outside of the processing container 61 through the gate.
- the holding portion 62 holds the substrate W horizontally, for example.
- the holding portion 62 holds the substrate W horizontally so that the surface of the substrate W on which the device is formed faces upward and the center of the upper surface of the substrate W coincides with the rotation center line of the rotation axis 63a.
- the holding portion 62 is a mechanical chuck in this embodiment, but may be a vacuum chuck, an electrostatic chuck, or the like.
- the holding portion 62 may be a rotatable spin chuck.
- the rotating portion 63 includes, for example, a vertical rotating shaft 63a and a rotating motor 63b for rotating the rotating shaft 63a.
- the rotational driving force of the rotary motor 63b may be transmitted to the rotary shaft 63a via a rotation transmission mechanism such as a timing belt or a gear.
- a rotation transmission mechanism such as a timing belt or a gear.
- the liquid supply unit 64 supplies the processing liquid to the substrate W held in the holding unit 62.
- the liquid supply unit 64 has, for example, a nozzle 65 for discharging the treatment liquid, a moving mechanism 66 for moving the nozzle 65 in the radial direction of the substrate W, and a supply line 67 for supplying the treatment liquid to the nozzle 65.
- the nozzle 65 supplies the processing liquid to the center of the upper surface of the rotating substrate W, for example.
- the treatment liquid wets and spreads from the center of the upper surface of the substrate W toward the peripheral edge by centrifugal force.
- As the treatment liquid for example, a chemical liquid, a rinsing liquid, and a drying liquid are supplied to the substrate W in this order.
- a plurality of types of chemicals may be supplied to the substrate W, and a rinse solution may be supplied between the supply of one chemical solution and the supply of another chemical solution.
- the plurality of types of treatment liquids may be discharged from the same nozzle 65 or may be discharged from different nozzles 65.
- the chemical solution may be acidic, alkaline, or neutral.
- the acidic chemical solution is, for example, DHF (dilute hydrofluoric acid) or the like.
- the alkaline chemical solution is, for example, SC1 (an aqueous solution containing hydrogen peroxide and ammonium hydroxide) or the like.
- the neutral chemical solution may be functional water such as ozone water.
- the rinsing solution is, for example, DIW (deionized water).
- the dry liquid is an organic solvent such as IPA (isopropyl alcohol).
- the moving mechanism 66 has, for example, a swivel head 66a for holding the nozzle 65, a swivel arm 66b provided at the tip of the swivel head 66a, and a swivel mechanism 66c (see FIG. 7) for swiveling the swivel arm 66b.
- the swivel mechanism 66c may also serve as an elevating mechanism for raising and lowering the swivel arm 66b.
- the moving mechanism 66 may have a guide rail and a linear motion mechanism instead of the swivel arm 66b and the swivel mechanism 66c.
- the guide rails are arranged horizontally and a linear motion mechanism moves the nozzle 65 along the guide rails.
- the supply line 67 supplies the processing liquid to the nozzle 65.
- a supply line 67 is provided for each type of treatment liquid.
- an on-off valve V for opening and closing the flow path of the treatment liquid
- a flow rate controller F for controlling the flow rate of the treatment liquid
- a flow meter M for measuring the flow rate of the treatment liquid. Be done.
- the cup 68 surrounds the peripheral edge of the substrate W held by the holding portion 62, and receives the processing liquid scattered from the peripheral edge of the substrate W.
- the cup 68 does not rotate with the rotating shaft 63a in the present embodiment, but may rotate with the rotating shaft 63a.
- the cup 68 includes a horizontal bottom wall 68a, a cylindrical side wall 68b extending upward from the entire peripheral edge of the bottom wall 68a, and an inclined wall 68c extending diagonally upward from the upper end of the side wall 68b toward the radial inward side of the side wall 68b. including.
- the bottom wall 68a is provided with an exhaust pipe 68d for discharging the treatment liquid accumulated inside the cup 68 and an exhaust pipe 68e for discharging the gas accumulated inside the cup 68.
- each step S101 to S106 shown in FIG. 4 is carried out under the control of the control device 7.
- the series of processes including S101 to S106 is repeated by changing the substrate W.
- the transfer device 4 takes out the substrate W from the carrier C and conveys the taken out substrate W to the transition device 23a. Subsequently, the transfer device 5 takes out the substrate W from the transition device 23a and carries the taken out substrate W into the liquid processing module 6 (S101).
- the liquid supply unit 64 supplies the chemical liquid to the substrate W (S102).
- the chemical solution is supplied to the center of the upper surface of the rotating substrate W and spreads over the entire radial direction of the upper surface by centrifugal force to form a liquid film.
- the chemical solution may also be supplied to the lower surface of the substrate W.
- the liquid supply unit 64 supplies the rinse liquid to the substrate W (S103).
- the rinse liquid is supplied to the center of the upper surface of the rotating substrate W and spreads over the entire radial direction of the upper surface by centrifugal force to form a liquid film.
- the liquid film of the chemical solution is replaced with the liquid film of the rinse solution.
- the rinse liquid may also be supplied to the lower surface of the substrate W.
- the liquid supply unit 64 supplies the drying liquid to the substrate W (S104).
- the dry liquid is supplied to the center of the upper surface of the rotating substrate W and spreads over the entire radial direction of the upper surface by centrifugal force to form a liquid film.
- the liquid film of the rinse liquid is replaced with the liquid film of the dry liquid.
- the rotating portion 63 rotates the substrate W together with the holding portion 62 to dry the substrate W (S105).
- the processing liquid is not supplied to the substrate W, the drying liquid remaining on the substrate W is shaken off, and the substrate W is dried.
- the holding unit 62 releases the holding of the substrate W, and then the transport device 5 receives the substrate W from the holding unit 62 and carries the received substrate W out of the liquid processing module 6 (S106). After that, this process is terminated.
- the substrate processing method is not limited to the method shown in FIG.
- a plurality of types of chemicals may be supplied to the substrate W, and a rinse solution may be supplied between the supply of one chemical solution and the supply of another chemical solution. Further, the supply of the drying liquid may be omitted.
- the processing liquid is supplied to the substrate W.
- Particles caused by deterioration of piping such as the supply line 67 and particles caused by the operation of various devices (for example, on-off valve V or flow rate controller F) provided in the middle of the piping may be mixed in the processing liquid. be.
- bubbles may be generated in the treatment liquid.
- the foreign matter in the treatment liquid is measured before S101 shown in FIG. 4 or after S106.
- the foreign matter inspection board 8 includes an inspection board 81, an irradiator 82, and a light receiver 83.
- a passing portion 81a through which the treatment liquid L passes is formed through the inspection substrate 81.
- the irradiator 82 irradiates the treatment liquid L with inspection light.
- the light receiver 83 receives the scattered light generated by the foreign matter in the processing liquid L passing through the inspection light.
- the light receiver 83 includes a photoelectric conversion element 83a that converts the received scattered light into an electric signal.
- the irradiator 82 and the light receiver 83 are provided on the inspection board 81.
- the optical axis of the irradiator 82 center line CA of the inspection light
- the optical axis of the light receiver 83 are oblique or vertical at the center line CB of the flow of the processing liquid L (FIG. 6). Then it is arranged so as to intersect diagonally).
- the irradiator 82 and the light receiver 83 are provided on the inspection board 81, and the passage portion 81a through which the processing liquid L passes is formed through the inspection board 81. Therefore, as shown in FIG. 5, foreign matter in the processing liquid L can be measured in the vicinity of the nozzle 65. Foreign matter in the treatment liquid L can increase in the process of passing through the pipe. If the foreign matter in the processing liquid L is measured in the vicinity of the nozzle 65, which is the downstream end of the pipe, the foreign matter in the processing liquid L immediately before being supplied to the substrate W can be measured, and the quality of the substrate W can be accurately controlled. ..
- the inspection board 81 is disk-shaped and has the same diameter as the board W. Therefore, the inspection board 81 and the board W can be transported by the same transport device 5.
- a circular passing portion 81a is formed through the center of the inspection substrate 81.
- the processing liquid L discharged from the nozzle 65 passes through the passing portion 81a.
- the shape of the passing portion 81a is not limited to a circular shape, and may be, for example, a slit shape or the like. Specifically, as shown in FIG. 17, a U-shape extending radially from the peripheral edge to the center of the inspection substrate 81. May be.
- the passing portion 81a may be a hole or a notch, and the shape of the passing portion 81a is not particularly limited.
- the inspection board 81 has etching resistance to the treatment liquid L.
- the material of the inspection board 81 is, for example, resin or ceramics.
- the irradiator 82 irradiates the treatment liquid L with inspection light.
- the wavelength of the inspection light is not particularly limited.
- the irradiator 82 includes, for example, a laser oscillator.
- An absorption plate 84 that absorbs the inspection light is provided on the side opposite to the irradiator 82 with the passing portion 81a through which the treatment liquid L passes as a reference.
- the light receiver 83 receives the scattered light generated by the foreign matter in the processing liquid L passing through the inspection light.
- the light receiver 83 includes a photoelectric conversion element 83a that converts the received scattered light into an electric signal.
- the number of times an electric signal having an intensity equal to or higher than the threshold value is generated represents the number of foreign substances. Further, the strength of the electric signal represents the particle size of the foreign substance.
- the light receiver 83 may further include a lens 83b that focuses scattered light from the processing liquid L toward the photoelectric conversion element 83a.
- the lens 83b is included in the light receiver 83 in this embodiment, it may be provided in the nozzle 65. In the latter case, the lens 83b can be arranged closer to the treatment liquid L than in the former case. In the latter case, a lens 83b is provided for each nozzle 65, and the lens 83b moves together with the nozzle 65. On the other hand, in the former case, the number of lenses 83b can be reduced as compared with the latter case.
- the inspection light is incident on the side surface of the flow of the treatment liquid L, and the scattered light is emitted from the side surface of the flow of the treatment liquid L.
- the flow of the treatment liquid L is arranged as compared with the case directly under the nozzle 65, and the side surface of the flow is not disturbed.
- the irradiator 82 irradiates the processing liquid L with the inspection light via the nozzle 65, and the light receiver 83 receives the scattered light from the processing liquid L via the nozzle 65.
- the nozzle 65 is formed of, for example, quartz or resin so as to transmit both inspection light and scattered light.
- the light receiver 83 may receive transmitted light.
- the transmitted light is attenuated by the foreign matter in the processing liquid L passing through the inspection light.
- the light receiver 83 includes a photoelectric conversion element 83a that converts the received transmitted light into an electric signal.
- the number of times the attenuation of the electric signal is equal to or greater than the threshold value indicates the number of foreign substances. Further, the amount of attenuation of the electric signal represents the particle size of the foreign substance.
- the optical axis of the irradiator 82 center line CA of the inspection light
- the optical axis of the light receiver 83 are arranged on the same straight line passing through the center line CB of the flow of the processing liquid L. Will be done.
- the light receiver 83 is provided at the position of the absorption plate 84.
- the light receiver 83 When the light receiver 83 receives scattered light, it is possible to measure foreign matter having a smaller particle size than when the light receiver 83 receives transmitted light. On the other hand, when the light receiver 83 receives the transmitted light, unlike the case where the light receiver 83 receives the scattered light, the light receiver 83 is provided at the position of the absorption plate 84, so that the absorption plate 84 is unnecessary.
- a plurality (for example, three) nozzles 65 may be provided.
- the plurality of nozzles 65 are fixed to, for example, one swivel head 66a, and are arranged at intervals on the circumference of the swivel arm 66b about the swivel shaft 66d.
- the swivel mechanism 66c swivels the swivel arm 66b around the swivel shaft 66d
- the plurality of nozzles 65 sequentially intersect with the center line CA of the inspection light, and the nozzle 65 that irradiates the inspection light is switched.
- the nozzle 65 is not inserted into the passing portion 81a of the inspection board 81, and the inspection board 81 is arranged below the nozzle 65 in order to smoothly switch the nozzle 65.
- the foreign matter inspection substrate 8 may further include a position detector 85 (see FIG. 5) that detects the relative position of the center line CB of the flow of the processing liquid L with respect to the center line CA of the inspection light.
- the center line CB of the flow of the treatment liquid L is the center line of the nozzle 65.
- the position detector 85 is attached to, for example, the irradiator 82.
- the position detector 85 is, for example, a camera, and as shown in FIG. 8, images the center line CA of the inspection light and the center line CB of the flow of the processing liquid L.
- the center line CA of the inspection light is horizontal, and the center line CB of the flow of the treatment liquid L is vertical.
- the position of the nozzle 65 is controlled so that the two center lines CA and CB are orthogonal to each other.
- the position detector 85 can detect the relative position of the center line CB of the flow of the processing liquid L with respect to the center line CA of the inspection light, and can align the two center lines CA and CB. By the alignment, the amount of the processing liquid L passing through the inspection light can be made constant per unit time, and the foreign matter in the treatment liquid L can be quantitatively monitored.
- the foreign matter inspection board 8 further includes a transmission unit 86 that sends an electric signal generated by the light receiver 83 to the outside and / or receives power consumed by the irradiator 82 from the outside.
- the transmission unit 86 can perform arithmetic processing for analyzing the electric signal and measuring a foreign substance by an external computer (for example, a control device 7). It is not necessary to mount a CPU for performing arithmetic processing, a storage medium for storing arithmetic results, etc. on the inspection board 81, and the foreign matter inspection board 8 can be made lighter.
- the transmission unit 86 also sends an electric signal generated by the position detector 85 to the outside.
- the transmission unit 86 receives the electric power consumed by the irradiator 82 from the outside, it is not necessary to mount the rechargeable battery on the inspection board 81, and the foreign matter inspection board 8 can be made lighter.
- the transmission unit 86 also receives the electric power consumed by the position detector 85 from the outside. Further, the transmission unit 86 also receives an electric signal for controlling the irradiator 82 from the outside. Furthermore, the transmission unit 86 also receives an electric signal for controlling the position detector 85 from the outside.
- the transmission unit 86 By transmitting an electric signal and / or electric power between the foreign matter inspection board 8 and the outside by the transmission unit 86, the number of parts mounted on the inspection board 81 can be reduced, and the foreign matter inspection board 8 can be made lighter. As a result, the weight difference between the foreign matter inspection board 8 and the substrate W can be reduced, and both the foreign matter inspection board 8 and the substrate W can be conveyed by the same transfer device 5.
- the transmission unit 86 includes a terminal 86a that abuts on the terminal 56a of the transport device 5. Wired, it can transmit electrical signals and / or power.
- the transmission section 86 projects from the peripheral edge of the inspection board 81 so that the terminal 56a of the transport device 5 and the terminal 86a of the transmission section 86 come into contact with each other.
- the transport arm 51 has a main arm 51a and a pair of sub-arms 51b formed in a bifurcated shape from the tip of the main arm 51a.
- a transmission portion 56 is provided at the tip of the main arm 51a.
- the transmission unit 86 of the foreign matter inspection board 8 transmits an electric signal and / or electric power by wire in the present embodiment
- the electric signal and / or electric power may be transmitted wirelessly.
- wired communication it is possible to transmit a large amount of electric power as compared with the case of wireless communication.
- the foreign matter inspection board 8 may further include a suction portion 87 that is attracted to the electromagnet 57 of the transport device 5.
- the adsorption portion 87 is formed of a magnetic material such as iron.
- a pair of suction portions 87 are provided, for example, with the transmission portion 86 interposed therebetween.
- a pair of electromagnets 57 are provided so as to face the pair of suction portions 87.
- the rechargeable battery, the CPU, and the storage medium are not included in the foreign matter inspection board 8 in this embodiment, they may be included.
- the data stored in the storage medium of the foreign matter inspection board 8 may be collectively transmitted to, for example, the hangar 23b. That is, the hangar 23b may have a terminal that abuts on the terminal 86a of the foreign matter inspection board 8 instead of the transport arm 51.
- the foreign matter inspection board 8 may further include a positioning unit 88 positioned with respect to the transport device 5.
- the positioning unit 88 can suppress the deviation between the terminal 56a of the transport device 5 and the terminal 86a of the transmission unit 86.
- the positioning portion 88 is, for example, a concave portion, and positioning is performed by fitting the concave portion 88 with the convex portion 58 of the transport device 5.
- the recess 88 is provided, for example, on the lower surface of the transmission portion 86. Although the recess 88 is provided on the lower surface of the transmission portion 86 in the present embodiment, it may be provided on the lower surface of the suction portion 87.
- the concave portion 88 may have a tapered surface 88a that corrects the deviation between the concave portion 88 and the convex portion 58.
- the convex portion 58 may have a tapered surface 58a that corrects the deviation between the convex portion 58 and the concave portion 88. Only one of the two tapered surfaces 88a and 58a may be provided.
- the arrangement of the concave portion and the convex portion may be reversed, and the positioning portion 88 may be a convex portion, and positioning may be performed by fitting the convex portion with the concave portion of the transport device 5.
- a plurality of concave portions and a plurality of convex portions are provided, for example.
- FIGS. 11 to 14 An example of the processing performed before S101 or after S106 in FIG. 4 will be described with reference to FIGS. 11 to 14.
- Each step S201 to S215 shown in FIGS. 11 to 12 is carried out under the control of the control device 7.
- the series of processes including S201 to S215 may be carried out periodically or may be carried out upon request.
- the transport device 5 picks up the foreign matter inspection board 8 from the hangar 23b (S201).
- the terminal 56a of the transport device 5 and the terminal 86a of the transmission unit 86 come into contact with each other.
- the convex portion 58 of the transport device 5 and the concave portion 88 of the foreign matter inspection board 8 are fitted.
- electric power is supplied to the electromagnet 57 of the transport device 5, and the suction portion 87 of the foreign matter inspection board 8 is attracted to the electromagnet 57.
- control device 7 confirms the connection between the terminal 56a of the transport device 5 and the terminal 86a of the transmission unit 86 (S202). For example, the control device 7 sends an electric signal requesting a reply from the transport device 5 to the foreign matter inspection board 8. The control device 7 confirms the connection by receiving a reply electric signal from the foreign matter inspection board 8 by the transport device 5.
- the transport device 5 picks up the dummy board 9 from the hangar 23b (S203).
- the dummy substrate 9 has etching resistance to the treatment liquid L.
- the material of the dummy substrate 9 is, for example, resin or ceramics.
- the order of S201 to S202 and S203 may be reversed, and S203 may be implemented before S201 to S202.
- the transport device 5 transports the foreign matter inspection board 8 and the dummy board 9 (S204).
- the transport device 5 includes a first transport arm 51A, a second transport arm 51B, and a moving mechanism 52.
- the first transport arm 51A holds the foreign matter inspection board 8.
- the second transfer arm 51B holds the dummy substrate 9.
- the moving mechanism 52 independently moves the first transport arm 51A and the second transport arm 51B.
- the first transfer arm 51A is arranged above the second transfer arm 51B.
- the foreign matter inspection board 8 can be held above the dummy board 9.
- the transport device 5 carries the dummy substrate 9 into the liquid treatment module 6 (S205).
- the holding portion 62 (see FIG. 3) of the liquid treatment module 6 holds the dummy substrate 9 horizontally from below.
- the transport device 5 carries the foreign matter inspection board 8 into the liquid treatment module 6 (S206).
- the foreign matter inspection board 8 is arranged above the holding portion 62 (see FIG. 3) of the liquid treatment module 6 and above the dummy board 9.
- control device 7 detects the relative position of the center line CB of the flow of the processing liquid L with respect to the center line CA of the inspection light by the position detector 85, and aligns the two center lines CA and CB ( S207). For example, the position of the nozzle 65 is controlled so that the two center lines CA and CB are orthogonal to each other.
- control device 7 controls the liquid supply unit 64 of the liquid treatment module 6 and the foreign matter inspection board 8 to inspect the foreign matter in the treatment liquid L (S208).
- the irradiator 82 irradiates the processing liquid L with the inspection light.
- the light receiver 83 receives the scattered light generated by the foreign matter in the processing liquid L passing through the inspection light.
- the light receiver 83 converts the received scattered light into an electric signal.
- the control device 7 analyzes the electric signal generated by the light receiver 83 and measures the foreign matter. The number of times an electric signal having an intensity equal to or higher than the threshold value is generated represents the number of foreign substances. Further, the strength of the electric signal represents the particle size of the foreign substance.
- the light receiver 83 may receive the transmitted light that is attenuated by the foreign matter in the processing liquid L passing through the inspection light.
- the light receiver 83 converts the received transmitted light into an electric signal.
- the control device 7 analyzes the electric signal generated by the light receiver 83 and measures the foreign matter. The number of times the attenuation of the electric signal is equal to or greater than the threshold value indicates the number of foreign substances. Further, the amount of attenuation of the electric signal represents the particle size of the foreign substance.
- the control device 7 horizontally holds the inspection board 81 above the holding portion 62 of the liquid processing module 6 by the transport device 5.
- An irradiator 82 and a light receiver 83 are provided on the inspection board 81.
- the irradiator 82 irradiates the processing liquid L with the inspection light via the nozzle 65, and the light receiver 83 receives the scattered light from the processing liquid L via the nozzle 65.
- the control device 7 holds the inspection board 81 horizontally above the dummy board 9 by the transport device 5, and rotates the dummy board 9 together with the holding portion 62.
- the treatment liquid L passes through the passing portion 81a of the inspection substrate 81, is supplied to the center of the upper surface of the rotating dummy substrate 9, spreads wet from the center of the upper surface of the dummy substrate 9 toward the peripheral edge by centrifugal force, and is shaken off from the peripheral edge. , Collected in cup 68.
- the rotating dummy substrate 9 can collect the treatment liquid L in the cup 68 and suppress the scattering of the treatment liquid L.
- the control device 7 checks whether or not there is an uninspected processing liquid L (S209).
- the number and type of the treatment liquid L to be inspected are stored in the storage medium 72 in advance and are appropriately referred to.
- the treatment liquid L to be inspected is, for example, a chemical liquid.
- the number and type of the processing liquid L to be inspected can be appropriately changed by the user of the substrate processing apparatus 1.
- control device 7 carries out the treatment after S207 again.
- S207 to S209 are repeatedly carried out until the inspection of all the treatment liquids L to be inspected is carried out.
- control device 7 carries out the foreign matter inspection board 8 from the liquid treatment module 6 by the transport device 5 (S210).
- the foreign matter inspection board 8 is retracted from directly above the holding portion 62 of the liquid treatment module 6.
- the liquid supply unit 64 supplies the rinse liquid from the nozzle 65 to the dummy substrate 9 that rotates together with the holding unit 62 (see FIG. 3), and cleans the dummy substrate 9. (S211).
- the chemical solution adhering to the dummy substrate 9 can be washed away.
- the rotating portion 63 rotates the dummy substrate 9 together with the holding portion 62 (see FIG. 3) to dry the dummy substrate 9 (S212).
- the treatment liquid is not supplied to the dummy substrate 9, and the rinse liquid remaining on the dummy substrate 9 is shaken off.
- the transport device 5 carries out the dummy substrate 9 from the liquid processing module 6 (S213).
- control device 7 checks whether or not there is an uninspected liquid treatment module 6 (S214).
- the number and location of the liquid treatment modules 6 to be inspected are stored in the storage medium 72 in advance and are appropriately referred to.
- the number and location of the liquid treatment modules 6 to be inspected can be appropriately changed by the user of the substrate processing apparatus 1.
- control device 7 re-executes the treatment after S204.
- S204 to S214 are repeatedly carried out until the inspection of all the liquid treatment modules 6 to be inspected is carried out.
- the transport device 5 transports the foreign matter inspection board 8 and the dummy board 9 to the hangar 23b and stores them (S215). After that, this process ends.
- the control device 7 sequentially conveys the foreign matter inspection substrate 8 to the plurality of liquid treatment modules 6 by the transfer device 5, and each of the plurality of liquid treatment modules 6 irradiates the inspection light and an electric signal. And measure the foreign matter by analyzing the electrical signal. Since one foreign matter inspection board 8 is sequentially conveyed to a plurality of liquid treatment modules 6, one foreign matter inspection board 8 can inspect a plurality of liquid treatment modules 6. Further, it is possible to detect the difference in processing quality among the plurality of liquid processing modules 6.
- each of the plurality of liquid treatment modules 6 sequentially supplies the plurality of treatment liquids L to the substrate W.
- the plurality of treatment liquids L have different chemical compositions and are supplied to the substrate W through different supply lines 67. Therefore, the control device 7 irradiates the inspection light and generates an electric signal for each treatment liquid L in each of the plurality of liquid treatment modules 6.
- a plurality of processing liquids L can be inspected with one foreign matter inspection board 8.
- the substrate processing apparatus 1 has a distribution module 11 that distributes a plurality of processing liquids L to a plurality of liquid processing modules 6, and a distribution module 11 for each processing liquid L to remove foreign substances in the processing liquid L. Further includes an inspection unit 12 for inspection. If the supply source of the treatment liquid L is inspected by the inspection unit 12 and the supply destination of the treatment liquid L is inspected by the foreign matter inspection board 8, the place where the foreign matter is mixed can be specified.
- the control device 7 displays the inspection location for inspecting the foreign matter in the treatment liquid L and the inspection result of the foreign matter on the display device for each treatment liquid L.
- the inspection location includes, for example, a distribution module 11 and a liquid treatment module 6.
- the foreign matter inspection result includes, for example, the particle size of the foreign matter and the number of foreign matter.
- the control device 7 may also display the date on which the inspection for foreign matter is performed on the display device.
- the user of the board processing device 1 can identify the place where the foreign matter is mixed by looking at the image of the display device. Instead of the user of the substrate processing apparatus 1, the control apparatus 7 may specify the place where the foreign matter is mixed.
- the control device 7 may stop the operation of the liquid treatment module 6 or the distribution module 11 based on the inspection result of foreign matter. Further, the control device 7 may operate a notification device such as a display device or an acoustic device based on the inspection result of the foreign substance to notify the alarm by an image or a sound.
- a notification device such as a display device or an acoustic device based on the inspection result of the foreign substance to notify the alarm by an image or a sound.
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Abstract
Description
81 検査基板
81a 通過部
82 照射器
83 受光器
83a 光電変換素子
Claims (16)
- 処理液の通過する通過部が貫通形成された検査基板と、
前記処理液に対して検査光を照射する照射器と、
前記処理液中の異物が前記検査光を通過することで生じる散乱光、又は前記処理液中の異物が前記検査光を通過することで減衰される透過光を受光する受光器と、
を備え、
前記受光器は、受光した前記散乱光又は前記透過光を電気信号に変換する光電変換素子を含み、
前記照射器と前記受光器とが、前記検査基板に設けられる、異物検査基板。 - 前記検査光の中心線に対する、前記処理液の流れの中心線の相対位置を検出する位置検出器を更に備える、請求項1に記載の異物検査基板。
- 前記受光器で生成される前記電気信号を外部に送る、及び/又は前記照射器で消費される電力を外部から受け取る伝達部を更に備える、請求項1又は2に記載の異物検査基板。
- 前記伝達部は、外部の搬送装置の端子に当接する端子を含む、請求項3に記載の異物検査基板。
- 前記搬送装置の電磁石に吸着される吸着部を備える、請求項4に記載の異物検査基板。
- 前記搬送装置に対して位置決めされる位置決め部を備える、請求項4又は5に記載の異物検査基板。
- 請求項1~6のいずれか1項に記載の異物検査基板と、
基板に対して前記処理液を供給する複数の液処理モジュールと、
複数の前記液処理モジュールに前記基板を搬送する搬送装置と、
前記異物検査基板と前記液処理モジュールと前記搬送装置とを制御する制御装置と、
を備え、
前記制御装置は、前記搬送装置によって前記異物検査基板を複数の前記液処理モジュールに順番に搬送し、複数の前記液処理モジュールのそれぞれにて前記検査光の照射と前記電気信号の生成とを実施し、前記電気信号を解析することで前記異物を計測する、基板処理装置。 - 複数の前記液処理モジュールのそれぞれは、複数の前記処理液を前記基板に対して順番に供給し、
前記制御装置は、複数の前記液処理モジュールのそれぞれにて前記処理液毎に前記検査光の照射と前記電気信号の生成とを実施する、請求項7に記載の基板処理装置。 - 複数の前記処理液を複数の前記液処理モジュールに分配する分配モジュールと、前記分配モジュールにて前記処理液毎に前記処理液中の前記異物を検査する検査ユニットとを更に備える、請求項8に記載の基板処理装置。
- 前記制御装置は、前記処理液毎に、前記処理液の前記異物を検査する検査場所と、前記異物の検査結果とを表示装置に表示する、請求項7~9のいずれか1項に記載の基板処理装置。
- 前記液処理モジュールは、前記基板を水平に保持するスピンチャックと、前記スピンチャックで保持されている前記基板に対して上方から前記処理液を吐出するノズルとを含み、
前記制御装置は、前記検査光の照射と前記電気信号の生成とを実施する際に、前記搬送装置によって前記検査基板を前記スピンチャックよりも上方に水平に保持する、請求項7~10のいずれか1項に記載の基板処理装置。 - 前記照射器は、前記ノズルを介して前記処理液に前記検査光を照射し、
前記受光器は、前記ノズルを介して前記処理液から前記散乱光又は前記透過光を受光する、請求項11に記載の基板処理装置。 - 前記スピンチャックに水平に保持されるダミー基板を更に備え、
前記制御装置は、前記検査光の照射と前記電気信号の生成とを実施する際に、前記搬送装置によって前記検査基板を前記ダミー基板よりも上方に水平に保持し、前記スピンチャックと共に前記ダミー基板を回転させる、請求項11又は12に記載の基板処理装置。 - 前記制御装置は、前記検査光の照射と前記電気信号の生成とを実施した後、前記スピンチャックと共に回転する前記ダミー基板に対して前記ノズルからリンス液を供給する、請求項13に記載の基板処理装置。
- 前記搬送装置は、前記異物検査基板を保持する第1搬送アームと、前記ダミー基板を保持する第2搬送アームと、前記第1搬送アームと前記第2搬送アームを独立に移動させる移動機構とを含み、
前記第1搬送アームは、前記第2搬送アームの上方に配置される、請求項13又は14に記載の基板処理装置。 - 基板に対して処理液を供給し、前記基板を処理することと、
請求項1~6のいずれか1項に記載の異物検査基板の前記照射器によって、前記処理液に対して前記検査光を照射することと、
前記散乱光又は前記透過光を前記受光器によって受光し、前記光電変換素子によって電気信号に変換することと、
前記電気信号を解析し、前記異物を計測することと、
を有する、基板処理方法。
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JP2010066241A (ja) * | 2008-09-12 | 2010-03-25 | Olympus Corp | 基板検査装置、及び、基板検査方法 |
KR20100055775A (ko) * | 2008-11-18 | 2010-05-27 | 세메스 주식회사 | 기판 처리 장치 및 이를 이용한 기판 처리 방법 |
KR20110019239A (ko) * | 2009-08-19 | 2011-02-25 | 세메스 주식회사 | 기판 처리 장치 및 그의 처리 방법 |
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JP3798201B2 (ja) * | 1999-10-26 | 2006-07-19 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP2004327638A (ja) * | 2003-04-24 | 2004-11-18 | Matsushita Electric Ind Co Ltd | 薄膜塗布装置 |
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KR20100055775A (ko) * | 2008-11-18 | 2010-05-27 | 세메스 주식회사 | 기판 처리 장치 및 이를 이용한 기판 처리 방법 |
KR20110019239A (ko) * | 2009-08-19 | 2011-02-25 | 세메스 주식회사 | 기판 처리 장치 및 그의 처리 방법 |
WO2017126360A1 (ja) * | 2016-01-21 | 2017-07-27 | 東京エレクトロン株式会社 | 異物検出装置及び異物検出方法 |
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