JP7176494B2 - 積層型電子部品 - Google Patents
積層型電子部品 Download PDFInfo
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- JP7176494B2 JP7176494B2 JP2019155182A JP2019155182A JP7176494B2 JP 7176494 B2 JP7176494 B2 JP 7176494B2 JP 2019155182 A JP2019155182 A JP 2019155182A JP 2019155182 A JP2019155182 A JP 2019155182A JP 7176494 B2 JP7176494 B2 JP 7176494B2
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Description
この開示に従う積層型電子部品の第1の実施形態を示す積層セラミックコンデンサ100について、図1ないし図4を用いて説明する。
積層セラミックコンデンサ100の構造について、以下に説明する。図1は、積層セラミックコンデンサ100の断面図である。積層セラミックコンデンサ100は、積層体10を備えている。積層体10は、積層された複数の誘電体層11と複数の内部電極層12とを含む。
この開示に係る積層セラミックコンデンサ100の誘電体層11は、前述したようにCZ系のペロブスカイト相を含み、元素M1をさらに含む。ただし、元素M1は、擬ポテンシャル法が用いられた第一原理計算による、元素M1を介したCZとCuとの結合エネルギーが-9.8eV以下である元素である。この元素M1について、以下で説明する。
この開示に従う積層型電子部品の第2の実施形態を示す積層セラミックコンデンサ100Aについて、図5を用いて説明する。積層セラミックコンデンサ100Aは、積層体10Aを備えている。その他の構成要素については、積層セラミックコンデンサ100と同様であるため、説明は省略される。また、積層セラミックコンデンサ100Aの巨視的な構造は、積層セラミックコンデンサ100の巨視的な構造と同様であるため、図示は省略される(図1参照)。
この開示に従う積層型電子部品の実施形態を示す積層セラミックコンデンサ100の製造方法について、製造工程順に説明する。積層セラミックコンデンサ100の製造方法は、以下の各工程を備える。なお、以下で用いられている各符号は、図1に示されているものに対応する。
10 積層体
11 誘電体層
12 内部電極層
12a 第1の内部電極層
12b 第2の内部電極層
13a 第1の端面
13b 第2の端面
14a 第1の外部電極
14b 第2の外部電極
BL 界面層
SP 二次相
Claims (4)
- CaZrO3系のペロブスカイト相を含む複数の誘電体層と、Cuを含む複数の内部電極層とが積層された積層体を備え、
前記誘電体層は、元素M1(ただし、元素M1は、擬ポテンシャル法が用いられた第一原理計算による、元素M1を介したCaZrO3とCuとの結合エネルギーが-9.8eV以下である元素)をさらに含み、かつ前記内部電極層との界面の少なくとも一部に、前記元素M1を含む界面層を有し、
前記誘電体層に含まれる元素の量をモル部で表した場合、前記界面層における前記元素M1の量のZrの量に対する比m1が0.03≦m1≦0.25であり、
前記誘電体層は、前記元素M1を含む二次相をさらに有し、
前記界面層中に前記二次相のうち少なくとも一部が含まれている、積層型電子部品。 - 前記元素M1は、Al、Si、Mn、TiおよびVから選ばれる少なくとも1種類の元素である、請求項1に記載の積層型電子部品。
- CaZrO3系のペロブスカイト相を含む複数の誘電体層と、Niを含む複数の内部電極層とが積層された積層体を備え、
前記誘電体層は、元素M2(ただし、元素M2は、擬ポテンシャル法が用いられた第一原理計算による、元素M2を介したCaZrO3とNiとの結合エネルギーが-12.3eV以下である元素)をさらに含み、かつ前記内部電極層との界面の少なくとも一部に、前記元素M2を含む界面層を有し、
前記誘電体層に含まれる元素の量をモル部で表した場合、前記界面層における前記元素M2の量のZrの量に対する比m2が0.03≦m2≦0.25であり、
前記誘電体層は、前記元素M2を含む二次相をさらに有し、
前記界面層中に前記二次相のうち少なくとも一部が含まれている、積層型電子部品。 - 前記元素M2は、Al、Si、Mn、TiおよびVから選ばれる少なくとも1種類の元素である、請求項3に記載の積層型電子部品。
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