JP7077893B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JP7077893B2 JP7077893B2 JP2018177460A JP2018177460A JP7077893B2 JP 7077893 B2 JP7077893 B2 JP 7077893B2 JP 2018177460 A JP2018177460 A JP 2018177460A JP 2018177460 A JP2018177460 A JP 2018177460A JP 7077893 B2 JP7077893 B2 JP 7077893B2
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- Prior art keywords
- semiconductor element
- conductor plate
- semiconductor
- circuit board
- signal
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- 239000004065 semiconductor Substances 0.000 title claims description 450
- 239000004020 conductor Substances 0.000 claims description 138
- 239000000758 substrate Substances 0.000 claims description 51
- 230000008054 signal transmission Effects 0.000 claims description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical group [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 5
- 238000013459 approach Methods 0.000 claims description 4
- 238000007789 sealing Methods 0.000 description 18
- 238000005516 engineering process Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000005476 soldering Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 239000008393 encapsulating agent Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
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Description
12、14、16、18:半導体素子
12d、14d、16d、18d:信号パッド
20:封止体
22、24、26、28:導体板
32、34:回路基板
36、38、40:電力端子
42、44:信号端子
Claims (15)
- 第1導体板と、
前記第1導体板上に配置された第1半導体素子と、
前記第1導体板上に配置されているとともに、前記第1半導体素子よりも素子サイズが小さい第2半導体素子と、
前記第1導体板上に配置されているとともに、前記第1導体板から電気的に絶縁された信号伝送路を有する第1回路基板と、
複数の第1信号端子と、を備え、
前記第1半導体素子及び前記第2半導体素子の各々は、前記第1導体板に電気的に接続された主電極と、前記複数の第1信号端子の対応する一つに電気的に接続された信号パッドとを有し、
前記第1導体板に垂直な平面視において、前記複数の第1信号端子は、前記第1半導体素子に対して第1方向に位置するとともに、前記第1方向に対して垂直な第2方向に沿って配列されており、
前記第2半導体素子及び前記第1回路基板は、前記平面視において、前記複数の第1信号端子と前記第1半導体素子との間に位置するとともに、前記第2方向に沿って配列されており、
前記第1半導体素子の前記信号パッドは、前記第1回路基板の前記信号伝送路を介して、前記複数の第1信号端子の対応する一つに接続されている、
半導体装置。 - 前記第1導体板に対向する第2導体板をさらに備え、
前記第1半導体素子及び前記第2半導体素子の各々は、前記第2導体板に電気的に接続された他の主電極をさらに備える、請求項1に記載の半導体装置。 - 前記第1導体板に対して前記第2方向に位置する第3導体板と、
前記第3導体板上に配置された第3半導体素子と、
前記第3導体板上に配置されているとともに、前記第3半導体素子よりも素子サイズが小さい第4半導体素子と、
前記第3導体板上に配置されているとともに、前記第3導体板から電気的に絶縁された信号伝送路を有する第2回路基板と、
複数の第2信号端子と、をさらに備え、
前記第3半導体素子及び前記第4半導体素子の各々は、前記第3導体板に電気的に接続された主電極と、前記複数の第2信号端子の対応する一つに電気的に接続された信号パッドとを有し、
前記第3導体板に垂直な平面視において、前記複数の第2信号端子は、前記第3半導体素子に対して前記第1方向に位置するとともに、前記第2方向に沿って配列されており、
前記第4半導体素子及び前記第2回路基板は、前記平面視において、前記複数の第2信号端子と前記第3半導体素子との間に位置するとともに、前記第2方向に沿って配列されており、
前記第3半導体素子の前記信号パッドは、前記第2回路基板の前記信号伝送路を介して、前記複数の第2信号端子の対応する一つに接続されている、請求項1又は2に記載の半導体装置。 - 前記第3導体板に対向する第4導体板をさらに備え、
前記第3半導体素子及び前記第4半導体素子の各々は、前記第4導体板に電気的に接続された他の主電極をさらに備える、請求項3に記載の半導体装置。 - 前記第3導体板は、第1継手部を介して前記第2導体板へ接続されており、
前記平面視において、前記第1継手部は、前記第2半導体素子と前記第4半導体素子との間に位置する、請求項2を引用する請求項3又は4に記載の半導体装置。 - 前記第1導体板上における前記第1半導体素子、前記第2半導体素子及び前記第1回路基板の配置は、前記第3導体板上における前記第3半導体素子、前記第4半導体素子及び前記第2回路基板の配置と左右対称である、請求項3から5のいずれか一項に記載に半導体装置。
- 前記第1半導体素子及び前記第3半導体素子は、同じ構成を有する第1種類の半導体素子であり、
前記第1種類の半導体素子は、前記第2方向に沿って配列された複数の信号パッドを有し、
前記第1種類の半導体素子の前記複数の信号パッドでは、同じ機能を有する信号パッドが左右対称に配置されている、請求項6に記載の半導体装置。 - 前記第1導体板上における前記第2半導体素子及び前記第1回路基板の配置と、前記第3導体板上における前記第4半導体素子及び前記第2回路基板の配置とは、互いに同一である、請求項3から5のいずれか一項に記載に半導体装置。
- 前記第2半導体素子の半導体基板は、前記第1半導体素子の半導体基板よりもバンドギャップが広い、請求項1から8のいずれか一項に記載の半導体装置。
- 前記第1半導体素子の前記半導体基板は、シリコン(Si)基板であり、
前記第2半導体素子の前記半導体基板は、炭化シリコン(SiC)基板である、請求項9に記載の半導体装置。 - 前記複数の第1信号端子と前記第1回路基板の前記信号伝送路との間を接続する第1ボンディングワイヤと、
前記複数の第1信号端子と前記第2半導体素子の前記信号パッドとの間を接続する第2ボンディングワイヤと、をさらに備え、
前記第1ボンディングワイヤは、前記第1回路基板に近づくにつれて、前記第2ボンディングワイヤから離れるように延びている、請求項1から10のいずれか一項に記載の半導体装置。 - 前記第2半導体素子の前記第1方向における寸法は、前記第1回路基板の前記第1方向における寸法と等しい、請求項1から11のいずれか一項に記載の半導体装置。
- 前記第2半導体素子の前記第2方向における寸法は、前記第1回路基板の前記第2方向における寸法と等しい、請求項1から12のいずれか一項に記載の半導体装置。
- 前記第1半導体素子と前記第2半導体素子との間の前記第1方向における間隔は、前記第1半導体素子と前記第1回路基板との間の前記第1方向における間隔と等しい、請求項1から13のいずれか一項に記載の半導体装置。
- 前記第2半導体素子と前記第1回路基板とは、前記第1半導体素子を前記第1方向へ仮想的に拡張した範囲内に含まれる、請求項1から14のいずれか一項に記載の半導体装置。
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