JP7077223B2 - 精密なナノスケール製造のための汎用性のある方法 - Google Patents

精密なナノスケール製造のための汎用性のある方法 Download PDF

Info

Publication number
JP7077223B2
JP7077223B2 JP2018519399A JP2018519399A JP7077223B2 JP 7077223 B2 JP7077223 B2 JP 7077223B2 JP 2018519399 A JP2018519399 A JP 2018519399A JP 2018519399 A JP2018519399 A JP 2018519399A JP 7077223 B2 JP7077223 B2 JP 7077223B2
Authority
JP
Japan
Prior art keywords
substrate
super straight
droplets
inkjet
chuck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2018519399A
Other languages
English (en)
Japanese (ja)
Other versions
JP2018531786A (ja
Inventor
ヴイ. スリニーヴァッサン,シトルガタ
シンハル,シュラワン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Texas System
Original Assignee
University of Texas System
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Texas System filed Critical University of Texas System
Publication of JP2018531786A publication Critical patent/JP2018531786A/ja
Application granted granted Critical
Publication of JP7077223B2 publication Critical patent/JP7077223B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/40Distributing applied liquids or other fluent materials by members moving relatively to surface
    • B05D1/42Distributing applied liquids or other fluent materials by members moving relatively to surface by non-rotary members
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0291Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work the material being discharged on the work through discrete orifices as discrete droplets, beads or strips that coalesce on the work or are spread on the work so as to form a continuous coating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00349Creating layers of material on a substrate
    • B81C1/0038Processes for creating layers of materials not provided for in groups B81C1/00357 - B81C1/00373
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/023Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface
    • B05C11/028Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface with a body having a large flat spreading or distributing surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C13/00Means for manipulating or holding work, e.g. for separate articles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/027Coating heads with several outlets, e.g. aligned transversally to the moving direction of a web to be coated
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065After-treatment
    • B05D3/067Curing or cross-linking the coating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
JP2018519399A 2015-10-15 2016-10-14 精密なナノスケール製造のための汎用性のある方法 Active JP7077223B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201562242147P 2015-10-15 2015-10-15
US62/242,147 2015-10-15
PCT/US2016/057008 WO2017066546A1 (fr) 2015-10-15 2016-10-14 Procédé polyvalent pour la fabrication nanométrique de précision

Publications (2)

Publication Number Publication Date
JP2018531786A JP2018531786A (ja) 2018-11-01
JP7077223B2 true JP7077223B2 (ja) 2022-05-30

Family

ID=58517870

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018519399A Active JP7077223B2 (ja) 2015-10-15 2016-10-14 精密なナノスケール製造のための汎用性のある方法

Country Status (10)

Country Link
US (1) US9987653B2 (fr)
EP (1) EP3362189A4 (fr)
JP (1) JP7077223B2 (fr)
KR (1) KR102207781B1 (fr)
CN (1) CN108348951A (fr)
AU (1) AU2016340065B2 (fr)
CA (1) CA3001848C (fr)
IL (1) IL258703B2 (fr)
SG (1) SG11201803014WA (fr)
WO (1) WO2017066546A1 (fr)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2514139A (en) 2013-05-14 2014-11-19 Aghababaie Lin & Co Ltd Apparatus for fabrication of three dimensional objects
US10166725B2 (en) 2014-09-08 2019-01-01 Holo, Inc. Three dimensional printing adhesion reduction using photoinhibition
WO2017066546A1 (fr) * 2015-10-15 2017-04-20 Board Of Regents, The University Of Texas System Procédé polyvalent pour la fabrication nanométrique de précision
US11141919B2 (en) 2015-12-09 2021-10-12 Holo, Inc. Multi-material stereolithographic three dimensional printing
WO2017201431A1 (fr) * 2016-05-20 2017-11-23 Board Of Regents, The University Texas System Alignement de précision du système de coordonnées de substrat par rapport au système de coordonnées de jet d'encre
US10935891B2 (en) 2017-03-13 2021-03-02 Holo, Inc. Multi wavelength stereolithography hardware configurations
GB2564956B (en) 2017-05-15 2020-04-29 Holo Inc Viscous film three-dimensional printing systems and methods
US10245785B2 (en) 2017-06-16 2019-04-02 Holo, Inc. Methods for stereolithography three-dimensional printing
EP3427948B1 (fr) * 2017-07-10 2023-06-07 Meta Platforms Technologies, LLC Methode d'impression d'une structure tridimensionnelle et imprimante 3d pour une telle méthode
US10580659B2 (en) * 2017-09-14 2020-03-03 Canon Kabushiki Kaisha Planarization process and apparatus
US11448958B2 (en) * 2017-09-21 2022-09-20 Canon Kabushiki Kaisha System and method for controlling the placement of fluid resist droplets
CN107833649B (zh) * 2017-10-16 2019-10-11 中国科学院电工研究所 一种x射线波带片的制备方法
CN108162595B (zh) * 2018-01-05 2023-07-25 嘉兴学院 一种柔性介质基板的电流体动力喷印设备及控制方法
US11126083B2 (en) * 2018-01-24 2021-09-21 Canon Kabushiki Kaisha Superstrate and a method of using the same
US10606171B2 (en) * 2018-02-14 2020-03-31 Canon Kabushiki Kaisha Superstrate and a method of using the same
JP7301508B2 (ja) 2018-08-08 2023-07-03 キヤノン株式会社 接合レンズ、およびそれを有する光学系、および光学機器、および接合レンズの製造方法
US20220013417A1 (en) * 2018-12-13 2022-01-13 Board Of Regents, The University Of Texas System System and method for modification of substrates
EP3902659A4 (fr) 2018-12-26 2022-09-07 Holo, Inc. Capteurs pour systèmes et méthodes d'impression tridimensionnelle
US10892167B2 (en) * 2019-03-05 2021-01-12 Canon Kabushiki Kaisha Gas permeable superstrate and methods of using the same
US11550216B2 (en) * 2019-11-25 2023-01-10 Canon Kabushiki Kaisha Systems and methods for curing a shaped film
US11567401B2 (en) 2019-12-20 2023-01-31 Canon Kabushiki Kaisha Nanofabrication method with correction of distortion within an imprint system
US11562924B2 (en) * 2020-01-31 2023-01-24 Canon Kabushiki Kaisha Planarization apparatus, planarization process, and method of manufacturing an article
EP4110532A4 (fr) * 2020-02-25 2024-04-10 Univ Texas Systèmes nanométriques de dépôt de film mince
US11787117B2 (en) 2020-04-23 2023-10-17 Rtx Corporation Fabricating ceramic structures
CN111554812B (zh) * 2020-05-14 2022-04-22 苏州大学 图案化有机晶体阵列的制备方法及有机场效应晶体管
IL298377A (en) * 2020-05-18 2023-01-01 Sds Nano Inc High precision production processes of nanometer layers
EP4162303A1 (fr) * 2020-06-08 2023-04-12 Board of Regents, The University of Texas System Fabrication d'éléments optiques
CN114563312B (zh) * 2022-01-27 2022-12-06 苏州大学 一种薄膜力学性能的测量方法及测量装置

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004004503A (ja) 2002-12-10 2004-01-08 Hoya Corp 眼鏡レンズ階調着色システム
JP2009517882A (ja) 2005-12-01 2009-04-30 モレキュラー・インプリンツ・インコーポレーテッド 固化したインプリンティング材料からモールドを分離する方法
JP2011520641A (ja) 2008-04-01 2011-07-21 モレキュラー・インプリンツ・インコーポレーテッド 大面積ロールツーロール・インプリント・リソグラフィ
JP2012101146A (ja) 2010-11-08 2012-05-31 Lac:Kk 曲面塗装装置
US20150048048A1 (en) 2013-08-19 2015-02-19 W. Dennis Slafer Methods for Forming Patterns on Curved Surfaces
WO2015026735A1 (fr) 2013-08-19 2015-02-26 Board Of Regents, The University Of Texas System Dépôt programmable de couches minces ayant un profil défini par l'utilisateur avec une précision de l'ordre du nanomètre
JP2015160162A (ja) 2014-02-26 2015-09-07 株式会社エルエーシー 曲面プリントシステム

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3324700A (en) * 1964-09-21 1967-06-13 United Shoe Machinery Corp Pulling chuck for rivet setting tool
IT1199923B (it) * 1985-12-23 1989-01-05 Olivetti & Co Spa Stampante a punti a getto d'inchiostro con testina multipla regolabile
US5772905A (en) 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
WO2000055686A1 (fr) * 1997-05-21 2000-09-21 Joseph Lyons Support de tranche passif ayant pour but de corriger la courbure du champ
US6063339A (en) * 1998-01-09 2000-05-16 Cartesian Technologies, Inc. Method and apparatus for high-speed dot array dispensing
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
EP2264522A3 (fr) 2000-07-16 2011-12-14 The Board of Regents of The University of Texas System Procédé de formation d'un motif sur un substrat
US6964793B2 (en) 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
MY164487A (en) * 2002-07-11 2017-12-29 Molecular Imprints Inc Step and repeat imprint lithography processes
US7234810B2 (en) * 2003-11-14 2007-06-26 Ophthonix, Inc. System for manufacturing an optical lens
WO2006025726A1 (fr) * 2004-09-02 2006-03-09 Vu Medisch Centrum Lentille intracameculaire artificielle
US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
US8011915B2 (en) 2005-11-04 2011-09-06 Asml Netherlands B.V. Imprint lithography
KR100690930B1 (ko) * 2006-05-03 2007-03-09 한국기계연구원 깊은 제거를 이용하여 원하는 패턴 두께 혹은 높은종횡비를 가지는 고해상도 패턴 형성 방법
US8142702B2 (en) 2007-06-18 2012-03-27 Molecular Imprints, Inc. Solvent-assisted layer formation for imprint lithography
KR101653195B1 (ko) * 2008-06-09 2016-09-01 보드 오브 리전츠 더 유니버시티 오브 텍사스 시스템 적응적 나노토포그래피 형상제작
JP2014033069A (ja) * 2012-08-03 2014-02-20 Toshiba Corp パターン形成方法及びディスペンサー
CN103064197B (zh) * 2013-01-08 2014-01-15 吉林瑞尔康隐形眼镜有限公司 彩色软性亲水接触镜及其制备方法
JPWO2014133145A1 (ja) * 2013-02-28 2017-02-02 Hoya株式会社 眼鏡レンズの製造方法および眼鏡レンズ基材用塗布液塗布装置
WO2017066546A1 (fr) * 2015-10-15 2017-04-20 Board Of Regents, The University Of Texas System Procédé polyvalent pour la fabrication nanométrique de précision

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004004503A (ja) 2002-12-10 2004-01-08 Hoya Corp 眼鏡レンズ階調着色システム
JP2009517882A (ja) 2005-12-01 2009-04-30 モレキュラー・インプリンツ・インコーポレーテッド 固化したインプリンティング材料からモールドを分離する方法
JP2011520641A (ja) 2008-04-01 2011-07-21 モレキュラー・インプリンツ・インコーポレーテッド 大面積ロールツーロール・インプリント・リソグラフィ
JP2012101146A (ja) 2010-11-08 2012-05-31 Lac:Kk 曲面塗装装置
US20150048048A1 (en) 2013-08-19 2015-02-19 W. Dennis Slafer Methods for Forming Patterns on Curved Surfaces
WO2015026735A1 (fr) 2013-08-19 2015-02-26 Board Of Regents, The University Of Texas System Dépôt programmable de couches minces ayant un profil défini par l'utilisateur avec une précision de l'ordre du nanomètre
JP2015160162A (ja) 2014-02-26 2015-09-07 株式会社エルエーシー 曲面プリントシステム

Also Published As

Publication number Publication date
WO2017066546A1 (fr) 2017-04-20
EP3362189A4 (fr) 2019-06-26
KR20180083332A (ko) 2018-07-20
CA3001848C (fr) 2023-09-19
IL258703A (en) 2018-06-28
EP3362189A1 (fr) 2018-08-22
US9987653B2 (en) 2018-06-05
SG11201803014WA (en) 2018-05-30
JP2018531786A (ja) 2018-11-01
KR102207781B1 (ko) 2021-01-26
IL258703B2 (en) 2023-11-01
IL258703B1 (en) 2023-07-01
CN108348951A (zh) 2018-07-31
CA3001848A1 (fr) 2017-04-20
US20170106399A1 (en) 2017-04-20
AU2016340065B2 (en) 2020-05-14
AU2016340065A1 (en) 2018-05-31

Similar Documents

Publication Publication Date Title
JP7077223B2 (ja) 精密なナノスケール製造のための汎用性のある方法
JP6994025B2 (ja) 構造のマイクロリソグラフィ加工
ES2886826T3 (es) Depósito programable de películas delgadas de un perfil definido por el usuario con una precisión de escala nanométrica
KR101031528B1 (ko) 실온 저압 마이크로- 및 나노- 임프린트 리소그래피용템플릿
US10717646B2 (en) Precision alignment of the substrate coordinate system relative to the inkjet coordinate system
KR20030040378A (ko) 임프린트 리소그래피를 위한 투명한 템플릿과 기판사이의고정확성 갭 및 방향설정 감지 방법
KR20030079909A (ko) 임프린트 리소그래피를 위한 고분해능 오버레이 정렬 방법및 시스템
JP2010123985A (ja) インプリント・リソグラフィ・プロセスおよびシステム
US20220082952A1 (en) Method of clamping a substrate to a clamping system, a substrate holder and a substrate support
KR20210052256A (ko) 슈퍼스트레이트 척, 사용 방법 및 물품의 제조 방법
TW202132079A (zh) 用於均勻光強度之曝光設備及其使用方法
US20210407797A1 (en) Apparatus for uniform light intensity and methods of using the same
JP7071484B2 (ja) インプリントシステム内のディストーションの補正を伴うナノ製作方法
US20200223206A1 (en) Methods for production and transfer of patterned thin films at wafer-scale
KR20210098334A (ko) 평탄화 장치, 평탄화 공정, 및 물품 제조 방법
US11664220B2 (en) Edge exclusion apparatus and methods of using the same
US20220102156A1 (en) Planarization apparatus, planarization process, and method of manufacturing an article
US20240019613A1 (en) Method for producing a mirror of a microlithographic projection exposure apparatus
KR20230047961A (ko) 고정밀 나노스케일 박막 제조 공정
Perez Composants micro-optiques popur systèmes miniatures d'imagerie à base de technologie MEMS

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180614

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20191010

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20200827

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20200915

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20201215

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20210212

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20210713

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20211011

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20211209

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20220419

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20220518

R150 Certificate of patent or registration of utility model

Ref document number: 7077223

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150