JP7058878B2 - 色素含有アルマイト処理プラズマインジケータ - Google Patents
色素含有アルマイト処理プラズマインジケータ Download PDFInfo
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- JP7058878B2 JP7058878B2 JP2018560375A JP2018560375A JP7058878B2 JP 7058878 B2 JP7058878 B2 JP 7058878B2 JP 2018560375 A JP2018560375 A JP 2018560375A JP 2018560375 A JP2018560375 A JP 2018560375A JP 7058878 B2 JP7058878 B2 JP 7058878B2
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- Prior art keywords
- dye
- plasma
- treatment
- indicator
- red
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- 238000011282 treatment Methods 0.000 claims description 42
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- NWKBFCIAPOSTKG-UHFFFAOYSA-M trimethyl-[3-[(3-methyl-5-oxo-1-phenyl-4h-pyrazol-4-yl)diazenyl]phenyl]azanium;chloride Chemical compound [Cl-].CC1=NN(C=2C=CC=CC=2)C(=O)C1N=NC1=CC=CC([N+](C)(C)C)=C1 NWKBFCIAPOSTKG-UHFFFAOYSA-M 0.000 description 1
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- SWGJCIMEBVHMTA-UHFFFAOYSA-K trisodium;6-oxido-4-sulfo-5-[(4-sulfonatonaphthalen-1-yl)diazenyl]naphthalene-2-sulfonate Chemical compound [Na+].[Na+].[Na+].C1=CC=C2C(N=NC3=C4C(=CC(=CC4=CC=C3O)S([O-])(=O)=O)S([O-])(=O)=O)=CC=C(S([O-])(=O)=O)C2=C1 SWGJCIMEBVHMTA-UHFFFAOYSA-K 0.000 description 1
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Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N31/00—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
- G01N31/22—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods using chemical indicators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
Landscapes
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- Engineering & Computer Science (AREA)
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PCT/JP2017/046587 WO2018128123A1 (ja) | 2017-01-04 | 2017-12-26 | 色素含有アルマイト処理プラズマインジケータ |
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KR (1) | KR102489971B1 (ko) |
CN (1) | CN110114668A (ko) |
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JP7464219B2 (ja) | 2019-04-23 | 2024-04-09 | 株式会社サクラクレパス | 積層体及びインジケーター |
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US20010006610A1 (en) | 1998-02-03 | 2001-07-05 | Michael J Miller | Contained indicators for determining sterilizations |
JP2006162504A (ja) | 2004-12-09 | 2006-06-22 | Olympus Corp | 生体関連物質検出用試験片の製造方法 |
JP2008127673A (ja) | 2006-11-24 | 2008-06-05 | Fujifilm Corp | 微細構造体の製造方法および微細構造体 |
WO2015129660A1 (ja) | 2014-02-28 | 2015-09-03 | 株式会社サクラクレパス | 着色アルミニウム成形体及びその製造方法 |
JP2015205995A (ja) | 2014-04-21 | 2015-11-19 | 株式会社サクラクレパス | プラズマ処理検知用インキ組成物及びプラズマ処理検知インジケータ |
JP2016065204A (ja) | 2014-09-16 | 2016-04-28 | 株式会社サクラクレパス | プラズマ処理検知用インキ組成物及びプラズマ処理検知インジケータ |
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GB9002856D0 (en) * | 1990-02-08 | 1990-04-04 | Alcan Int Ltd | Fluid detection device |
US5942438A (en) * | 1997-11-07 | 1999-08-24 | Johnson & Johnson Medical, Inc. | Chemical indicator for oxidation-type sterilization processes using bleachable dyes |
JP5285283B2 (ja) * | 2008-01-24 | 2013-09-11 | 東京エレクトロン株式会社 | プラズマ処理容器の陽極酸化処理方法 |
DE102009043762A1 (de) * | 2009-09-30 | 2011-03-31 | Clariant International Ltd. | Verfahren zum Färben von anodisch oxidierten Aluminiumoberflächen |
CN102925770B (zh) * | 2012-08-27 | 2014-07-09 | 安徽家园铝业有限公司 | 氧化着色电泳涂漆铝合金型材的生产方法 |
JP6126042B2 (ja) | 2013-06-04 | 2017-05-10 | 株式会社サクラクレパス | プラズマ処理検知用インキ組成物及びプラズマ処理検知インジケーター |
TWI624890B (zh) * | 2013-08-22 | 2018-05-21 | Sakura Color Prod Corp | Indicator for electronic component manufacturing apparatus, and design and/or management method of the same |
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2017
- 2017-12-26 KR KR1020197016661A patent/KR102489971B1/ko active IP Right Grant
- 2017-12-26 MY MYPI2019003362A patent/MY193027A/en unknown
- 2017-12-26 CN CN201780080935.7A patent/CN110114668A/zh active Pending
- 2017-12-26 WO PCT/JP2017/046587 patent/WO2018128123A1/ja active Application Filing
- 2017-12-26 JP JP2018560375A patent/JP7058878B2/ja active Active
- 2017-12-29 TW TW106146512A patent/TWI735726B/zh active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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US20010006610A1 (en) | 1998-02-03 | 2001-07-05 | Michael J Miller | Contained indicators for determining sterilizations |
JP2006162504A (ja) | 2004-12-09 | 2006-06-22 | Olympus Corp | 生体関連物質検出用試験片の製造方法 |
JP2008127673A (ja) | 2006-11-24 | 2008-06-05 | Fujifilm Corp | 微細構造体の製造方法および微細構造体 |
WO2015129660A1 (ja) | 2014-02-28 | 2015-09-03 | 株式会社サクラクレパス | 着色アルミニウム成形体及びその製造方法 |
JP2015205995A (ja) | 2014-04-21 | 2015-11-19 | 株式会社サクラクレパス | プラズマ処理検知用インキ組成物及びプラズマ処理検知インジケータ |
JP2016065204A (ja) | 2014-09-16 | 2016-04-28 | 株式会社サクラクレパス | プラズマ処理検知用インキ組成物及びプラズマ処理検知インジケータ |
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TW201833395A (zh) | 2018-09-16 |
KR102489971B1 (ko) | 2023-01-17 |
WO2018128123A1 (ja) | 2018-07-12 |
KR20190102185A (ko) | 2019-09-03 |
CN110114668A (zh) | 2019-08-09 |
TWI735726B (zh) | 2021-08-11 |
JPWO2018128123A1 (ja) | 2019-11-07 |
MY193027A (en) | 2022-09-23 |
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