JP7045008B2 - ショットキーバリアダイオード - Google Patents
ショットキーバリアダイオード Download PDFInfo
- Publication number
- JP7045008B2 JP7045008B2 JP2017206978A JP2017206978A JP7045008B2 JP 7045008 B2 JP7045008 B2 JP 7045008B2 JP 2017206978 A JP2017206978 A JP 2017206978A JP 2017206978 A JP2017206978 A JP 2017206978A JP 7045008 B2 JP7045008 B2 JP 7045008B2
- Authority
- JP
- Japan
- Prior art keywords
- trench
- electric field
- barrier diode
- schottky barrier
- drift layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000004888 barrier function Effects 0.000 title claims description 39
- 239000004065 semiconductor Substances 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 20
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 claims description 19
- 229910001195 gallium oxide Inorganic materials 0.000 claims description 18
- 230000005684 electric field Effects 0.000 description 47
- 238000004088 simulation Methods 0.000 description 22
- 238000010586 diagram Methods 0.000 description 16
- 230000015556 catabolic process Effects 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 12
- 239000010408 film Substances 0.000 description 11
- 239000010931 gold Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 7
- 239000010936 titanium Substances 0.000 description 7
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- 229910052737 gold Inorganic materials 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 239000002019 doping agent Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000010949 copper Substances 0.000 description 4
- 229910052763 palladium Inorganic materials 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910002601 GaN Inorganic materials 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- QZQVBEXLDFYHSR-UHFFFAOYSA-N gallium(III) oxide Inorganic materials O=[Ga]O[Ga]=O QZQVBEXLDFYHSR-UHFFFAOYSA-N 0.000 description 1
- 238000002248 hydride vapour-phase epitaxy Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
- H01L29/872—Schottky diodes
- H01L29/8725—Schottky diodes of the trench MOS barrier type [TMBS]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0607—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
- H01L29/0611—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0684—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/24—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only semiconductor materials not provided for in groups H01L29/16, H01L29/18, H01L29/20, H01L29/22
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Electrodes Of Semiconductors (AREA)
Description
図1は、本発明の第1の実施形態によるショットキーバリアダイオード100の構成を示す模式的な断面図である。
W1<W2
に設定されている。
図2は、本発明の第2の実施形態によるショットキーバリアダイオード200の構成を示す模式的な断面図である。
21 半導体基板の上面
22 半導体基板の裏面
30 ドリフト層
31 ドリフト層の上面
40 アノード電極
50 カソード電極
60 トレンチ
60a 端部に位置するトレンチ
61 絶縁膜
70 絶縁層
71 開口部
100,200 ショットキーバリアダイオード
M メサ領域
Claims (3)
- 酸化ガリウムからなる半導体基板と、
前記半導体基板上に設けられた酸化ガリウムからなるドリフト層と、
前記ドリフト層とショットキー接触するアノード電極と、
前記半導体基板とオーミック接触するカソード電極と、を備え、
前記ドリフト層は、平面視で前記アノード電極と重なる位置に設けられた複数のトレンチを有し、
前記複数のトレンチのうち、端部に位置するトレンチの幅が選択的に拡大されており、
前記端部に位置するトレンチの底部が湾曲しており、
前記端部に位置するトレンチの底部の曲率半径は、前記複数のトレンチのうち他のトレンチの底部の曲率半径よりも大きいことを特徴とするショットキーバリアダイオード。 - 前記複数のトレンチの内壁が絶縁膜で覆われていることを特徴とする請求項1に記載のショットキーバリアダイオード。
- 前記ドリフト層上に設けられた絶縁層をさらに備え、
前記アノード電極は、前記絶縁層上に形成されるとともに、前記絶縁層に形成された開口部を介して前記ドリフト層とショットキー接触することを特徴とする請求項1又は2に記載のショットキーバリアダイオード。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017206978A JP7045008B2 (ja) | 2017-10-26 | 2017-10-26 | ショットキーバリアダイオード |
PCT/JP2018/035645 WO2019082580A1 (ja) | 2017-10-26 | 2018-09-26 | ショットキーバリアダイオード |
EP18870149.4A EP3703137A4 (en) | 2017-10-26 | 2018-09-26 | SCHOTTKY BARRIER DIODE |
US16/758,790 US11626522B2 (en) | 2017-10-26 | 2018-09-26 | Schottky barrier diode |
CN201880069554.3A CN111279490B (zh) | 2017-10-26 | 2018-09-26 | 肖特基势垒二极管 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017206978A JP7045008B2 (ja) | 2017-10-26 | 2017-10-26 | ショットキーバリアダイオード |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019079984A JP2019079984A (ja) | 2019-05-23 |
JP7045008B2 true JP7045008B2 (ja) | 2022-03-31 |
Family
ID=66247384
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017206978A Active JP7045008B2 (ja) | 2017-10-26 | 2017-10-26 | ショットキーバリアダイオード |
Country Status (5)
Country | Link |
---|---|
US (1) | US11626522B2 (ja) |
EP (1) | EP3703137A4 (ja) |
JP (1) | JP7045008B2 (ja) |
CN (1) | CN111279490B (ja) |
WO (1) | WO2019082580A1 (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3823045A1 (en) | 2019-11-14 | 2021-05-19 | Flosfia Inc. | Semiconductor device and system including semiconductor |
JP7371484B2 (ja) * | 2019-12-18 | 2023-10-31 | Tdk株式会社 | ショットキーバリアダイオード |
JP7415537B2 (ja) * | 2019-12-18 | 2024-01-17 | Tdk株式会社 | ショットキーバリアダイオード |
EP4089728A4 (en) | 2020-01-10 | 2023-06-28 | Flosfia Inc. | Conductive metal oxide film, semiconductor element, and semiconductor device |
JP7456220B2 (ja) * | 2020-03-19 | 2024-03-27 | Tdk株式会社 | ショットキーバリアダイオード |
JP2022129918A (ja) * | 2021-02-25 | 2022-09-06 | Tdk株式会社 | ショットキーバリアダイオード |
JP2022129917A (ja) * | 2021-02-25 | 2022-09-06 | Tdk株式会社 | ショットキーバリアダイオード |
JP2023079552A (ja) * | 2021-11-29 | 2023-06-08 | Tdk株式会社 | ジャンクションバリアショットキーダイオード |
JP2023079551A (ja) * | 2021-11-29 | 2023-06-08 | Tdk株式会社 | ショットキーバリアダイオード |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20160013554A1 (en) | 2013-03-01 | 2016-01-14 | Fujikura Ltd. | Integrated antenna, and manufacturing method thereof |
WO2016013554A1 (ja) | 2014-07-22 | 2016-01-28 | 株式会社Flosfia | 結晶性半導体膜および板状体ならびに半導体装置 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2002176177A (ja) * | 2000-12-07 | 2002-06-21 | Denso Corp | 半導体装置及びその製造方法 |
JP2009059912A (ja) * | 2007-08-31 | 2009-03-19 | Sumitomo Electric Ind Ltd | ショットキーバリアダイオード |
TWI382534B (zh) * | 2009-05-13 | 2013-01-11 | Anpec Electronics Corp | 整合金氧半導體場效電晶體與蕭特基二極體之半導體元件及其製作方法 |
JP5531620B2 (ja) * | 2010-01-05 | 2014-06-25 | 富士電機株式会社 | 半導体装置 |
TWM406804U (en) * | 2011-01-31 | 2011-07-01 | Taiwan Semiconductor Co Ltd | Structure of termination trench region for Schottky diode |
CN103781947B (zh) * | 2011-09-08 | 2019-05-10 | 株式会社田村制作所 | 晶体层叠结构体 |
CN103258861A (zh) * | 2012-02-15 | 2013-08-21 | 立锜科技股份有限公司 | 沟槽肖特基势垒二极管及其制造方法 |
JPWO2015060441A1 (ja) * | 2013-10-24 | 2017-03-09 | ローム株式会社 | 半導体装置および半導体パッケージ |
JP6296445B2 (ja) * | 2014-02-10 | 2018-03-20 | ローム株式会社 | ショットキーバリアダイオード |
EP2945192A1 (en) * | 2014-05-14 | 2015-11-18 | Nxp B.V. | Semiconductive device and associated method of manufacture |
JP6022082B2 (ja) * | 2014-07-11 | 2016-11-09 | 新電元工業株式会社 | 半導体装置及び半導体装置の製造方法 |
TW201614798A (en) * | 2014-10-01 | 2016-04-16 | Beyond Innovation Tech Co Ltd | Monolithic merged PIN Schottky diode structure |
JP6524666B2 (ja) * | 2015-01-15 | 2019-06-05 | 富士電機株式会社 | 半導体装置 |
DE102015103211B4 (de) * | 2015-03-05 | 2018-05-30 | Infineon Technologies Austria Ag | Verfahren zum herstellen einer halbleitervorrichtung mit ersten und zweiten feldelektrodenstrukturen |
US9716187B2 (en) * | 2015-03-06 | 2017-07-25 | Semiconductor Components Industries, Llc | Trench semiconductor device having multiple trench depths and method |
JP2017045969A (ja) | 2015-08-28 | 2017-03-02 | 株式会社タムラ製作所 | ショットキーバリアダイオード |
JP7116409B2 (ja) * | 2017-02-27 | 2022-08-10 | 株式会社タムラ製作所 | トレンチmos型ショットキーダイオード |
-
2017
- 2017-10-26 JP JP2017206978A patent/JP7045008B2/ja active Active
-
2018
- 2018-09-26 CN CN201880069554.3A patent/CN111279490B/zh active Active
- 2018-09-26 EP EP18870149.4A patent/EP3703137A4/en active Pending
- 2018-09-26 US US16/758,790 patent/US11626522B2/en active Active
- 2018-09-26 WO PCT/JP2018/035645 patent/WO2019082580A1/ja unknown
Patent Citations (2)
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US20160013554A1 (en) | 2013-03-01 | 2016-01-14 | Fujikura Ltd. | Integrated antenna, and manufacturing method thereof |
WO2016013554A1 (ja) | 2014-07-22 | 2016-01-28 | 株式会社Flosfia | 結晶性半導体膜および板状体ならびに半導体装置 |
Non-Patent Citations (1)
Title |
---|
佐々木公平ほか,トレンチMOS構造を設けたGa2O3ショットキーバリアダイオード,第64回応用物理学会春季学術講演会講演予稿集,日本,日本応用物理学会,2017年03月01日,15p-315-13 |
Also Published As
Publication number | Publication date |
---|---|
US20210167225A1 (en) | 2021-06-03 |
US11626522B2 (en) | 2023-04-11 |
CN111279490B (zh) | 2023-06-20 |
EP3703137A1 (en) | 2020-09-02 |
CN111279490A (zh) | 2020-06-12 |
JP2019079984A (ja) | 2019-05-23 |
EP3703137A4 (en) | 2021-07-14 |
WO2019082580A1 (ja) | 2019-05-02 |
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