JP6955933B2 - 加工装置 - Google Patents
加工装置 Download PDFInfo
- Publication number
- JP6955933B2 JP6955933B2 JP2017166451A JP2017166451A JP6955933B2 JP 6955933 B2 JP6955933 B2 JP 6955933B2 JP 2017166451 A JP2017166451 A JP 2017166451A JP 2017166451 A JP2017166451 A JP 2017166451A JP 6955933 B2 JP6955933 B2 JP 6955933B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- holding
- outer diameter
- chuck table
- axis direction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000008859 change Effects 0.000 claims description 33
- 238000004040 coloring Methods 0.000 claims description 17
- 235000012431 wafers Nutrition 0.000 description 139
- 238000005520 cutting process Methods 0.000 description 54
- 238000004140 cleaning Methods 0.000 description 43
- 239000003086 colorant Substances 0.000 description 10
- 230000003028 elevating effect Effects 0.000 description 10
- 239000000758 substrate Substances 0.000 description 9
- 238000005452 bending Methods 0.000 description 7
- 238000009434 installation Methods 0.000 description 7
- 230000007246 mechanism Effects 0.000 description 7
- 238000003860 storage Methods 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- 238000003754 machining Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 238000007726 management method Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67294—Apparatus for monitoring, sorting or marking using identification means, e.g. labels on substrates or labels on containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67715—Changing the direction of the conveying path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
- H01L21/67781—Batch transfer of wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge clamping, e.g. clamping ring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Robotics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Dicing (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Description
11 カセット
12 基台
13 キャビネット
14 チャックテーブル(保持手段)
18 洗浄手段
20 スピンナーテーブル
30 搬送手段
31 第1搬送アーム
37 ブラケット
37c 着色指標部
37d 着色指標部
40 センタリングガイド
41 第2搬送アーム
47 ブラケット
47c 着色指標部
47d 着色指標部
50 切削送り手段
54 X軸テーブル
55 保持面
58A 基台部
58B 基台部
60 インデックス送り手段
61 切り込み送り手段
70 切削手段(加工手段)
71 操作パネル(入力手段、表示手段)
72 設定画面表示エリア
73 サイズ変更設定画面
74 テーブルサイズ設定部
80 制御手段
E1 カセット設置領域
E2 搬入出領域
E3 洗浄領域
E4 加工領域
F リングフレーム
U ウェーハユニット
W ウェーハ(被加工物)
Claims (2)
- 被加工物を保持する保持手段と、該保持手段が保持する該被加工物を加工する加工手段と、該被加工物を保持して搬送する搬送手段と、加工装置を駆動するための操作指令を入力する入力手段と、該入力手段から入力された情報を表示する表示手段と、制御手段と、を備える加工装置であって、
該保持手段は、該被加工物の外径に応じて形成されたチャックテーブルを備え、該チャックテーブルは該被加工物の外径に応じて着脱変更可能に構成され、
少なくとも該チャックテーブルは、該被加工物の外径サイズ毎に設定された色に着色されており、
該被加工物の外径サイズに対応して該加工装置の変更を設定する該表示手段のサイズ変更設定画面の全体の背景色として、該被加工物の外径毎に設定された該色が一色で表示されること、を特徴とする加工装置。 - 該搬送手段は、保持部の位置を変更して外径サイズの異なる該被加工物を搬送可能な搬送アームを備え、
該搬送アームは、該被加工物の外径毎に設定された該色で該保持部の位置を示す着色指標部を有すること、を特徴とする請求項1に記載の加工装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017166451A JP6955933B2 (ja) | 2017-08-31 | 2017-08-31 | 加工装置 |
KR1020180095530A KR102542087B1 (ko) | 2017-08-31 | 2018-08-16 | 가공 장치 |
CN201810981050.0A CN109427632B (zh) | 2017-08-31 | 2018-08-27 | 加工装置 |
TW107129990A TWI768112B (zh) | 2017-08-31 | 2018-08-28 | 加工裝置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017166451A JP6955933B2 (ja) | 2017-08-31 | 2017-08-31 | 加工装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019046891A JP2019046891A (ja) | 2019-03-22 |
JP6955933B2 true JP6955933B2 (ja) | 2021-10-27 |
Family
ID=65514728
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017166451A Active JP6955933B2 (ja) | 2017-08-31 | 2017-08-31 | 加工装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6955933B2 (ja) |
KR (1) | KR102542087B1 (ja) |
CN (1) | CN109427632B (ja) |
TW (1) | TWI768112B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7235597B2 (ja) | 2019-06-03 | 2023-03-08 | 株式会社ディスコ | 加工装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5580066B2 (ja) | 2010-02-01 | 2014-08-27 | 株式会社ディスコ | 切削装置 |
JP5506557B2 (ja) | 2010-06-16 | 2014-05-28 | 株式会社ディスコ | 切削ブレードの管理方法 |
EP2891173B1 (en) * | 2012-08-31 | 2019-03-27 | Semiconductor Technologies & Instruments Pte Ltd. | Multifunction wafer and film frame handling system |
JP6230934B2 (ja) * | 2014-03-06 | 2017-11-15 | 株式会社ディスコ | 切削装置 |
JP6327952B2 (ja) * | 2014-05-29 | 2018-05-23 | 株式会社ディスコ | 加工装置 |
JP2017013199A (ja) * | 2015-07-03 | 2017-01-19 | 株式会社ディスコ | 切削装置 |
-
2017
- 2017-08-31 JP JP2017166451A patent/JP6955933B2/ja active Active
-
2018
- 2018-08-16 KR KR1020180095530A patent/KR102542087B1/ko active IP Right Grant
- 2018-08-27 CN CN201810981050.0A patent/CN109427632B/zh active Active
- 2018-08-28 TW TW107129990A patent/TWI768112B/zh active
Also Published As
Publication number | Publication date |
---|---|
KR20190024700A (ko) | 2019-03-08 |
CN109427632B (zh) | 2024-03-15 |
CN109427632A (zh) | 2019-03-05 |
KR102542087B1 (ko) | 2023-06-09 |
TWI768112B (zh) | 2022-06-21 |
TW201913775A (zh) | 2019-04-01 |
JP2019046891A (ja) | 2019-03-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN106313347B (zh) | 切削装置 | |
JP4744425B2 (ja) | 基板処理装置 | |
JP5580066B2 (ja) | 切削装置 | |
JP6218600B2 (ja) | 加工装置 | |
JP2012222231A (ja) | ワーク搬送装置及びワーク加工装置 | |
JP2018207022A (ja) | 加工装置 | |
JP2013236002A (ja) | 保持テーブル | |
JP6955933B2 (ja) | 加工装置 | |
TWI769373B (zh) | 切割裝置 | |
JP5924467B2 (ja) | ダイシング装置 | |
JP7357521B2 (ja) | 加工装置 | |
JP2018117003A (ja) | ウェーハ加工装置 | |
TWI833941B (zh) | 切割裝置 | |
JPH07276174A (ja) | ワーク加工方法および装置 | |
JP7046635B2 (ja) | カセット | |
JP6105308B2 (ja) | 加工装置 | |
JP2013093530A (ja) | ユニット搬出入装置 | |
JP2014154633A (ja) | 加工装置 | |
JP7242438B2 (ja) | 加工装置 | |
JP6071466B2 (ja) | 加工装置 | |
JP2016168632A (ja) | 加工装置 | |
CN114743909A (zh) | 加工装置和被加工物的搬出方法 | |
JP2023081601A (ja) | 加工装置 | |
JP2024039510A (ja) | 取付方法及び切削装置 | |
JP2022116492A (ja) | 加工装置、プログラム、及び記憶媒体 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20200602 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20210519 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20210601 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210726 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20210907 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20211004 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6955933 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |