JP6953661B2 - 基板収納容器 - Google Patents
基板収納容器 Download PDFInfo
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- JP6953661B2 JP6953661B2 JP2019508740A JP2019508740A JP6953661B2 JP 6953661 B2 JP6953661 B2 JP 6953661B2 JP 2019508740 A JP2019508740 A JP 2019508740A JP 2019508740 A JP2019508740 A JP 2019508740A JP 6953661 B2 JP6953661 B2 JP 6953661B2
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
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- F16K15/02—Check valves with guided rigid valve members
- F16K15/025—Check valves with guided rigid valve members the valve being loaded by a spring
- F16K15/026—Check valves with guided rigid valve members the valve being loaded by a spring the valve member being a movable body around which the medium flows when the valve is open
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
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- H—ELECTRICITY
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- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67379—Closed carriers characterised by coupling elements, kinematic members, handles or elements to be externally gripped
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67383—Closed carriers characterised by substrate supports
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
- H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67769—Storage means
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Description
(2)上記(1)の態様において、前記給気部材は、前記気体を濾過する濾過部材を有してもよい。
(3)上記(1)又は(2)の態様において前記機能ユニットは、前記給気部材から供給された前記気体を貯留するハウジング部材と、前記ハウジング部材の開口を覆うカバー部材と、前記ハウジング部材及び前記カバー部材の少なくとも一方に形成された前記気体を吹出す吹出孔と、を含む気体置換ユニットであってもよい。
(4)上記(1)又は(2)の態様において、前記機能ユニットは、前記内部空間への前記気体の流通を可能にするチェックバルブを含むバルブユニットであってもよい。
(5)上記(1)又は(2)の態様において、前記機能ユニットは、前記内部空間への前記気体の流通を不能にする閉塞ユニットであってもよい。
(6)上記(1)又は(2)の態様において、前記機能ユニットは、前記内部空間に供給される前記気体を浄化するフィルタ部材を含むフィルタユニットであってもよい。
(7)上記(1)から(6)までのいずれか1つの態様において、前記気体は、窒素ガス又はドライエアであってもよい。
図1に示される基板収納容器1は、複数枚の基板Wを収納する容器本体2と、この容器本体2の開口に着脱自在に装着される蓋体4と、を備えている。基板収納容器1に収納される基板Wとしては、直径が300mmや450mmの半導体ウエハ、マスクガラスなどが挙げられる。
機能ユニットUとしては、気体置換ユニット3R,3L、バルブユニットU1、閉塞ユニットU2、小径フィルタユニットU3、大径フィルタユニットU4などが挙げられる。
まず、基板収納容器1の内部空間を気体置換ユニット3R,3Lにより気体Gに置換する構成について説明する。図5は、気体置換ユニット3R,3Lの斜視図であり、図6は、気体置換ユニット3R,3Lの分解斜視図である。図7は、気体置換ユニット3R,3Lの(a)正面図、(b)平面図、(c)底面図、(d)背面図である。図8は、気体置換ユニット3R,3Lの図7におけるA−A断面図である。なお、図5から図8は、正面Fから見て右側の気体置換ユニット3Rについて示す。
図12において、給気部材50から高圧で導入された気体Gは、濾過部材51を通過し、オフセットプレート押さえ90とオフセットプレート95との隙間を流れ、後方Bのオフセットプレート押さえ90と気体置換ユニット3Rの下部の接続具311との接続部に向かう。
図14は、バルブユニットU1を接続した状態における下部取付部の断面斜視図である。
バルブユニットU1は、給気部材50から基板収納容器1の内部空間への気体Gの流通を可能にするが、内部空間の気体Gが給気部材50に逆流しない、チェックバルブ110を含むものである。
図15は、閉塞ユニットU2を接続した状態における下部取付部の(a)斜視図、(b)断面斜視図である。
閉塞ユニットU2は、給気部材50から基板収納容器1の内部空間への気体Gの流通を不能にするものである。
図16は、小径フィルタユニットU3を接続した状態における下部取付部の(a)斜視図、(b)断面斜視図である。
小径フィルタユニットU3は、給気部材50から基板収納容器1の内部空間に供給される気体Gを浄化するフィルタ部材130を含むものである。
図17は、大径フィルタユニットU4を接続した状態における下部取付部の(a)斜視図、(b)断面斜視図である。
大径フィルタユニットU4は、小径フィルタユニットU3と同様に、給気部材50から基板収納容器1の内部空間に供給される気体Gを浄化するフィルタ部材140を含むものである。
実施形態の気体置換ユニット3R,3Lにおいて、第1吹出孔群31a−z、第3吹出孔群33a−z及び第2吹出孔群32a−fの開口面積や数量や配置も実施形態に限らず、底面2fの上面に沿って吹き込むダウンフローエアなどの外部からエアに対向できるように、下方の吹出風量を増やすように構成してもよい。
2 容器本体、2a 正面開口枠、2b 背面壁、2c 右側壁、2d 左側壁、2e 天面、2f 底面、21 支持片、22 位置規制部、23 グリップ、25 トップフランジ、26 ボトムプレート、27 貫通孔、28 ストッパ、29 取付孔
3R,3L 気体置換ユニット、31 ハウジング部材、31A,31B 面部、311 接続具、312 回止め突起、313 位置決め突起、32 カバー部材、31a・・・31z 第1吹出孔、32a・・・32f 第2吹出孔、33a・・・33z 第3吹出孔、34,35 フィルタ部材
4 蓋体
50 給気部材、50a グロメット、51 濾過部材、52 逆止弁、53 コイルバネ、54 バルブハウジング
60 排気部材
8 位置決め固定部材、81,82,83 フランジ、84A,84B Oリング、85 Cリング、86 スリット、87 端部、88 切欠き
9 オフセット部材、90 オフセットプレート押さえ、91 Oリング、92 凹部、93 パッキン、94 Oリング、95 オフセットプレート、96 差込孔
F 正面、B 後方、G 気体、W 基板、NL 法線
U 機能ユニット
U1 バルブユニット、110 チェックバルブ、111 コイルバネ、112 バルブハウジング
U2 閉塞ユニット、120 プラグ本体、121 パッキン
U3 小径フィルタユニット、130 フィルタ部材、131 パッキン、133 フィルタハウジング
U4 大径フィルタユニット 140 フィルタ部材、141 パッキン、143 フィルタハウジング
Claims (5)
- 複数枚の基板を収納可能な容器本体と、
前記容器本体の外部から内部空間に気体を供給可能な給気部材と、を備え、
前記容器本体をフロントオープンボックスに形成し、底面に前記給気部材を取付けた基板収納容器であって、
前記容器本体の底面の取付孔に固定されたオフセット部材を備え、
前記オフセット部材は、前記容器本体内側から前記取付孔に取り付けられたオフセットプレート押さえと前記容器本体外側から前記取付孔に取り付けられたオフセットプレートとで、前記気体を前記容器本体の底面に沿って流す流路を形成し、
前記給気部材は、前記内部空間の環境を異なる状態に変更する機能ユニットが、嵌合によって交換可能に接続され、
前記機能ユニットは、前記内部空間への前記気体の流通を可能にするチェックバルブを含むバルブユニットであり、
前記バルブユニットは、2つのフランジを外面に含むバルブハウジングと、
前記チェックバルブを前記バルブハウジングの弁座に向けて付勢するコイルバネと、で構成され、
前記バルブユニットは、前記2つのフランジによって前記オフセットプレート押さえを挟持するように、前記オフセットプレート押さえに形成された差込孔に嵌合係止されている
ことを特徴とする基板収納容器。 - 前記給気部材は、前記気体を濾過する濾過部材を有する
ことを特徴とする請求項1に記載の基板収納容器。 - 前記給気部材は、逆止弁を有する
ことを特徴とする請求項1又は2に記載の基板収納容器。 - 前記バルブハウジングは、弾性を有する材料で形成されている
ことを特徴とする請求項1から3までのいずれか1項に記載の基板収納容器。 - 前記気体は、窒素ガス又はドライエアである
ことを特徴とする請求項1から4までのいずれか1項に記載の基板収納容器。
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PCT/JP2018/005296 WO2018179964A1 (ja) | 2017-03-27 | 2018-02-15 | 基板収納容器 |
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JP7110663B2 (ja) * | 2018-03-28 | 2022-08-02 | Tdk株式会社 | ウエハ収容容器及びウエハ収容容器の清浄化方法 |
CN112074944B (zh) * | 2018-04-25 | 2024-07-05 | 未来儿股份有限公司 | 基板收纳容器 |
JP7234476B2 (ja) * | 2019-02-19 | 2023-03-08 | 信越ポリマー株式会社 | 基板収納容器 |
CN112289718A (zh) * | 2019-07-13 | 2021-01-29 | 家登精密工业股份有限公司 | 基板载具及其气体扩散模块 |
US12017841B2 (en) | 2019-07-13 | 2024-06-25 | Gudeng Precision Industrial Co., Ltd | Substrate container system |
US11104496B2 (en) * | 2019-08-16 | 2021-08-31 | Gudeng Precision Industrial Co., Ltd. | Non-sealed reticle storage device |
JP7351681B2 (ja) * | 2019-09-05 | 2023-09-27 | 信越ポリマー株式会社 | 基板収納容器 |
DE102020127889A1 (de) * | 2020-10-22 | 2022-04-28 | Feurer Febra Gmbh | Ladungsträger |
TWI824554B (zh) * | 2021-06-08 | 2023-12-01 | 美商恩特葛瑞斯股份有限公司 | 晶圓容器及潔淨系統 |
KR102314174B1 (ko) * | 2021-06-10 | 2021-10-18 | (주)상아프론테크 | 웨이퍼 저장 장치 |
CN113937041A (zh) * | 2021-06-30 | 2022-01-14 | 家登精密工业股份有限公司 | 基板容器系统 |
US20230054753A1 (en) * | 2021-08-17 | 2023-02-23 | Gudeng Precision Industrial Co., Ltd. | Gas diffusion device, and wafer container including the same |
US20230307275A1 (en) * | 2022-03-25 | 2023-09-28 | Entegris, Inc. | Wafer container purge port assembly |
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US5873468A (en) * | 1995-11-16 | 1999-02-23 | Sumitomo Sitix Corporation | Thin-plate supporting container with filter means |
US7455180B2 (en) * | 2002-10-25 | 2008-11-25 | Shin-Etsu Polymer Co., Ltd. | Substrate storage container |
US7201276B2 (en) * | 2003-11-07 | 2007-04-10 | Entegris, Inc. | Front opening substrate container with bottom plate |
US7328727B2 (en) * | 2004-04-18 | 2008-02-12 | Entegris, Inc. | Substrate container with fluid-sealing flow passageway |
WO2009114798A2 (en) * | 2008-03-13 | 2009-09-17 | Entegris, Inc. | Wafer container with tubular environmental control components |
JP6041699B2 (ja) * | 2013-02-20 | 2016-12-14 | 信越ポリマー株式会社 | 基板収納容器 |
US10347517B2 (en) * | 2013-10-14 | 2019-07-09 | Entegris, Inc. | Towers for substrate carriers |
JP6265844B2 (ja) | 2014-06-18 | 2018-01-24 | 信越ポリマー株式会社 | 基板収納容器 |
JP6325374B2 (ja) | 2014-07-02 | 2018-05-16 | ミライアル株式会社 | 基板収納容器 |
KR102397525B1 (ko) * | 2014-07-25 | 2022-05-12 | 신에츠 폴리머 가부시키가이샤 | 기판 수납 용기 |
TWI712098B (zh) | 2014-12-01 | 2020-12-01 | 美商恩特葛瑞斯股份有限公司 | 基板容器、用於基板容器之閥總成、沖洗模組及其替換方法 |
JPWO2016135952A1 (ja) * | 2015-02-27 | 2017-12-21 | ミライアル株式会社 | 基板収納容器 |
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- 2018-02-15 US US16/494,451 patent/US11646214B2/en active Active
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- 2018-02-15 JP JP2019508740A patent/JP6953661B2/ja active Active
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CN110383451A (zh) | 2019-10-25 |
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TWI738981B (zh) | 2021-09-11 |
US20200020549A1 (en) | 2020-01-16 |
TW201836949A (zh) | 2018-10-16 |
DE112018001612T5 (de) | 2020-01-16 |
SG11201908168WA (en) | 2019-10-30 |
WO2018179964A1 (ja) | 2018-10-04 |
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CN110383451B (zh) | 2023-09-12 |
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