JP6908819B2 - 近接センサ - Google Patents
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- JP6908819B2 JP6908819B2 JP2016192281A JP2016192281A JP6908819B2 JP 6908819 B2 JP6908819 B2 JP 6908819B2 JP 2016192281 A JP2016192281 A JP 2016192281A JP 2016192281 A JP2016192281 A JP 2016192281A JP 6908819 B2 JP6908819 B2 JP 6908819B2
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- 239000003990 capacitor Substances 0.000 claims description 65
- 238000005070 sampling Methods 0.000 claims description 38
- 238000006243 chemical reaction Methods 0.000 claims description 20
- 230000002596 correlated effect Effects 0.000 claims description 16
- 230000000630 rising effect Effects 0.000 claims description 15
- 230000000875 corresponding effect Effects 0.000 claims description 4
- 238000010586 diagram Methods 0.000 description 11
- 102100040862 Dual specificity protein kinase CLK1 Human genes 0.000 description 6
- 101000749294 Homo sapiens Dual specificity protein kinase CLK1 Proteins 0.000 description 5
- 238000001514 detection method Methods 0.000 description 4
- 102100040844 Dual specificity protein kinase CLK2 Human genes 0.000 description 3
- 101000749291 Homo sapiens Dual specificity protein kinase CLK2 Proteins 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 102100040856 Dual specificity protein kinase CLK3 Human genes 0.000 description 1
- 101000749304 Homo sapiens Dual specificity protein kinase CLK3 Proteins 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
- G01S7/00—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
- G01S7/48—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
- G01S7/483—Details of pulse systems
- G01S7/486—Receivers
- G01S7/4861—Circuits for detection, sampling, integration or read-out
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/94—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the way in which the control signals are generated
- H03K17/941—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the way in which the control signals are generated using an optical detector
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
- G01S17/00—Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
- G01S17/02—Systems using the reflection of electromagnetic waves other than radio waves
- G01S17/04—Systems determining the presence of a target
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
- G01S17/00—Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
- G01S17/02—Systems using the reflection of electromagnetic waves other than radio waves
- G01S17/06—Systems determining position data of a target
- G01S17/08—Systems determining position data of a target for measuring distance only
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01V—GEOPHYSICS; GRAVITATIONAL MEASUREMENTS; DETECTING MASSES OR OBJECTS; TAGS
- G01V8/00—Prospecting or detecting by optical means
- G01V8/10—Detecting, e.g. by using light barriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/02016—Circuit arrangements of general character for the devices
- H01L31/02019—Circuit arrangements of general character for the devices for devices characterised by at least one potential jump barrier or surface barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/12—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto
- H01L31/16—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto the semiconductor device sensitive to radiation being controlled by the light source or sources
- H01L31/167—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto the semiconductor device sensitive to radiation being controlled by the light source or sources the light sources and the devices sensitive to radiation all being semiconductor devices characterised by potential barriers
- H01L31/173—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto the semiconductor device sensitive to radiation being controlled by the light source or sources the light sources and the devices sensitive to radiation all being semiconductor devices characterised by potential barriers formed in, or on, a common substrate
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
- H03K17/78—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used using opto-electronic devices, i.e. light-emitting and photoelectric devices electrically- or optically-coupled
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/94—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the way in which the control signals are generated
- H03K17/945—Proximity switches
- H03K17/955—Proximity switches using a capacitive detector
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K2217/00—Indexing scheme related to electronic switching or gating, i.e. not by contact-making or -breaking covered by H03K17/00
- H03K2217/94—Indexing scheme related to electronic switching or gating, i.e. not by contact-making or -breaking covered by H03K17/00 characterised by the way in which the control signal is generated
- H03K2217/941—Indexing scheme related to electronic switching or gating, i.e. not by contact-making or -breaking covered by H03K17/00 characterised by the way in which the control signal is generated using an optical detector
- H03K2217/94116—Indexing scheme related to electronic switching or gating, i.e. not by contact-making or -breaking covered by H03K17/00 characterised by the way in which the control signal is generated using an optical detector increasing reliability, fail-safe
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Radar, Positioning & Navigation (AREA)
- Computer Networks & Wireless Communication (AREA)
- Remote Sensing (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geophysics (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Electronic Switches (AREA)
- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
- Measurement Of Optical Distance (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Optical Radar Systems And Details Thereof (AREA)
Description
発光パルスが物体に反射することにより到来する反射光を受光し、前記物体の近接を検出する近接センサであって、
前記反射光を受光する受光素子から前記物体の近接度合いに応じた大きさで出力される電流を、電圧に変換して出力する変換回路と、
前記変換回路の出力電圧を差動電圧に変換して出力する差動変換回路と、
前記差動変換回路から入力される出力差動電圧を前記発光パルスの立ち上がり期間と前記発光パルスの立ち下がり期間で反転させ、前記出力差動電圧を前記発光パルスの立ち上がり期間でサンプリングした値から、前記出力差動電圧を前記発光パルスの立ち下がり期間でサンプリングした値を減算する、差動構成の相関二重サンプリング回路とを備え、
前記相関二重サンプリング回路は、
差動増幅器と、
第1の一対のキャパシタと、
前記差動増幅器の一対の入力ノードと前記差動増幅器の一対の出力ノードとの間に直列に挿入された第2の一対のキャパシタと、
前記第1の一対のキャパシタと前記一対の入力ノードとの間の接続関係を、前記発光パルスの立ち上がりと立ち下がりで反転させる第1のスイッチ回路と、
前記一対の入力ノードと前記一対の出力ノードとの間の接続を、前記発光パルスの立ち上がりと立ち下がりでオフさせる第2のスイッチ回路と、
前記第2のスイッチ回路が前記一対の入力ノードと前記一対の出力ノードとの間の接続をオンさせるとき、前記第2の一対のキャパシタと前記一対の出力ノードとの間の接続をオフさせ、前記第2のスイッチ回路が前記一対の入力ノードと前記一対の出力ノードとの間の接続をオフさせるとき、前記第2の一対のキャパシタと前記一対の出力ノードとの間の接続をオンさせる、第3のスイッチ回路と、
前記第2の一対のキャパシタを初期化する第4のスイッチ回路と、を備える、近接センサが提供される。
図4は、フェイズ1での各スイッチの開閉状態を示す図である。フェイズ1は、物体が近接していない無信号時の状態において、前段のオペアンプ21,31(図1参照)の出力オフセット及び後段の差動増幅器41の入力オフセット電圧を、一対のキャパシタC1p,C1nで保持するサンプリングフェイズを表す。
図5は、フェイズ2での各スイッチの開閉状態を示す図である。フェイズ2は、発光パルス12の立ち上がり時におけるサンプリングフェイズを表す。
図6は、フェイズ3での各スイッチの開閉状態を示す図である。フェイズ3は、一対のキャパシタC2p,C2nの一端をフローティングにして、フェイズ2で一対のキャパシタC2p,C2nに蓄積された電荷を保持するサンプリングフェイズを表す。また、フェイズ3は、一対のスイッチSW1を閉から開に且つ一対のスイッチSW2を開から閉に切り替える前のフェイズ3aと、一対のスイッチSW1を閉から開に且つ一対のスイッチSW2を開から閉に切り替えた後のフェイズ3bとに分かれる。しかし、フェイズ3内でのスイッチSW1,SW2の開閉の切り替え前後で、一対のキャパシタC2p,C2nの電荷は変化しない。
図8は、フェイズ5での各スイッチの開閉状態を示す図である。フェイズ5は、フェイズ3と同様、一対のキャパシタC2p,C2nの一端をフローティングにして、フェイズ4で一対のキャパシタC2p,C2nに蓄積された電荷を保持するサンプリングフェイズを表す。また、フェイズ5は、一対のスイッチSW1を開から閉に且つ一対のスイッチSW2を閉から開に切り替える前のフェイズ5aと、一対のスイッチSW1を開から閉に且つ一対のスイッチSW2を閉から開に切り替えた後のフェイズ5bとに分かれる。フェイズ5では、フェイズ3で開閉を一旦切り替えたスイッチSW1,SW2の開閉が再度切り替えられ、スイッチSW1,SW2の開閉状態が初期状態に戻される。しかし、フェイズ5内でのスイッチSW1,SW2の開閉の切り替え前後で、一対のキャパシタC2p,C2nの電荷は変化しない。
フェイズ2'以降のフェイズは、フェイズ2〜5を1セット(1サンプリング周期)として、発光パルス12の指定されたパルス数と同じ回数、繰り返される。発光パルス12の指定されたパルス数をnとした場合、最終的なn回目の出力電圧VOUTは、
10 受光素子
11 発光素子
12 発光パルス
13 反射光
20 変換回路
30 差動変換回路
40 相関二重サンプリング回路
41 差動増幅器
C1p,C1n 第1の一対のキャパシタ
C2p,C2n 第2の一対のキャパシタ
S1 第1のスイッチ回路
S2 第2のスイッチ回路
S3 第3のスイッチ回路
S4 第4のスイッチ回路
Claims (3)
- 発光パルスが物体に反射することにより到来する反射光を受光し、前記物体の近接を検出する近接センサであって、
前記反射光を受光する受光素子から前記物体の近接度合いに応じた大きさで出力される電流を、電圧に変換して出力する変換回路と、
前記変換回路の出力電圧を差動電圧に変換して出力する差動変換回路と、
前記差動変換回路から入力される出力差動電圧を前記発光パルスの立ち上がり期間と前記発光パルスの立ち下がり期間で反転させ、前記出力差動電圧を前記発光パルスの立ち上がり期間でサンプリングした値から、前記出力差動電圧を前記発光パルスの立ち下がり期間でサンプリングした値を減算する、差動構成の相関二重サンプリング回路とを備え、
前記相関二重サンプリング回路は、
差動増幅器と、
第1の一対のキャパシタと、
前記差動増幅器の一対の入力ノードと前記差動増幅器の一対の出力ノードとの間に直列に挿入された第2の一対のキャパシタと、
前記第1の一対のキャパシタと前記一対の入力ノードとの間の接続関係を、前記発光パルスの立ち上がりと立ち下がりで反転させる第1のスイッチ回路と、
前記一対の入力ノードと前記一対の出力ノードとの間の接続を、前記発光パルスの立ち上がりと立ち下がりでオフさせる第2のスイッチ回路と、
前記第2のスイッチ回路が前記一対の入力ノードと前記一対の出力ノードとの間の接続をオンさせるとき、前記第2の一対のキャパシタと前記一対の出力ノードとの間の接続をオフさせ、前記第2のスイッチ回路が前記一対の入力ノードと前記一対の出力ノードとの間の接続をオフさせるとき、前記第2の一対のキャパシタと前記一対の出力ノードとの間の接続をオンさせる、第3のスイッチ回路と、
前記第2の一対のキャパシタを初期化する第4のスイッチ回路と、を備える、近接センサ。 - 前記発光パルスは、赤外光のパルスであり、
前記受光素子は、フォトダイオードである、
請求項1に記載の近接センサ。 - 前記発光パルスを出力する発光素子を駆動する駆動部を備えた、請求項1又は2に記載の近接センサ。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016192281A JP6908819B2 (ja) | 2016-09-29 | 2016-09-29 | 近接センサ |
KR1020170111136A KR102279479B1 (ko) | 2016-09-29 | 2017-08-31 | 근접 센서 |
US15/696,530 US10126414B2 (en) | 2016-09-29 | 2017-09-06 | Proximity sensor |
TW106132276A TWI735657B (zh) | 2016-09-29 | 2017-09-20 | 接近感測器 |
CN201710883165.1A CN107888176B (zh) | 2016-09-29 | 2017-09-26 | 接近传感器 |
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JP2016192281A JP6908819B2 (ja) | 2016-09-29 | 2016-09-29 | 近接センサ |
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JP2018056852A JP2018056852A (ja) | 2018-04-05 |
JP6908819B2 true JP6908819B2 (ja) | 2021-07-28 |
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US (1) | US10126414B2 (ja) |
JP (1) | JP6908819B2 (ja) |
KR (1) | KR102279479B1 (ja) |
CN (1) | CN107888176B (ja) |
TW (1) | TWI735657B (ja) |
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US10921447B2 (en) | 2018-01-29 | 2021-02-16 | Rohm Co., Ltd. | Control circuit of light emitting and receiving device |
KR102523383B1 (ko) | 2018-11-16 | 2023-04-19 | 엘지디스플레이 주식회사 | 포토 센서가 내장된 표시패널과 이를 이용한 표시장치 |
CN109632266B (zh) * | 2019-01-28 | 2021-04-16 | 上海科世达-华阳汽车电器有限公司 | 一种靠近接近开关的检测方法及相关装置 |
CN111856476B (zh) | 2019-04-30 | 2023-08-04 | 昇佳电子股份有限公司 | 接近传感器操作方法及应用该方法的接近传感器 |
CN110376568A (zh) * | 2019-08-13 | 2019-10-25 | 北京雷瑟瑞达科技有限公司 | 一种用于激光雷达的接收组件及系统 |
KR102489362B1 (ko) * | 2021-04-12 | 2023-01-17 | 서울대학교산학협력단 | 근접 센싱을 수행하는 반도체 장치 |
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KR101659789B1 (ko) * | 2013-11-26 | 2016-09-26 | 셈테크 코포레이션 | 근접 검출을 위한 용량성 감지 인터페이스 |
JP2015141555A (ja) * | 2014-01-29 | 2015-08-03 | シナプティクス・ディスプレイ・デバイス合同会社 | タッチ検出回路及びそれを備える半導体集積回路 |
US9733731B2 (en) * | 2014-05-12 | 2017-08-15 | Atmel Corporation | Timing synchronization of active stylus and touch sensor |
MX2021007934A (es) * | 2014-08-08 | 2023-01-17 | Quantum Si Inc | Dispositivo integrado para el depósito temporal de fotones recibidos. |
EP2996250B1 (en) * | 2014-09-11 | 2020-02-19 | ams AG | Optical sensor arrangement and method for generating an analog output signal |
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