JP6896075B2 - 電磁放射を吸収しかつ熱放射を放出する誘電的にコーティングされたガラス基板を有するオーブン - Google Patents
電磁放射を吸収しかつ熱放射を放出する誘電的にコーティングされたガラス基板を有するオーブン Download PDFInfo
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- 239000000758 substrate Substances 0.000 title claims description 79
- 230000005670 electromagnetic radiation Effects 0.000 title claims description 33
- 239000011521 glass Substances 0.000 title claims description 28
- 230000005855 radiation Effects 0.000 title claims description 19
- 239000008199 coating composition Substances 0.000 claims description 111
- 239000011247 coating layer Substances 0.000 claims description 31
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 19
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 16
- 229910052719 titanium Inorganic materials 0.000 claims description 16
- 239000010936 titanium Substances 0.000 claims description 16
- 229910044991 metal oxide Inorganic materials 0.000 claims description 15
- 150000004706 metal oxides Chemical class 0.000 claims description 15
- 238000009826 distribution Methods 0.000 claims description 13
- 229910052736 halogen Inorganic materials 0.000 claims description 13
- 150000002367 halogens Chemical class 0.000 claims description 13
- 239000002241 glass-ceramic Substances 0.000 claims description 10
- 239000000377 silicon dioxide Substances 0.000 claims description 9
- 229910001887 tin oxide Inorganic materials 0.000 claims description 9
- 229910052731 fluorine Inorganic materials 0.000 claims description 7
- 239000011737 fluorine Substances 0.000 claims description 7
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 6
- 229910052718 tin Inorganic materials 0.000 claims description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 5
- 239000000919 ceramic Substances 0.000 claims description 5
- 229910001848 post-transition metal Inorganic materials 0.000 claims description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 2
- 229910052801 chlorine Inorganic materials 0.000 claims description 2
- 239000000460 chlorine Substances 0.000 claims description 2
- 229910052732 germanium Inorganic materials 0.000 claims description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 2
- 229910052740 iodine Inorganic materials 0.000 claims description 2
- 239000011630 iodine Substances 0.000 claims description 2
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 229910000420 cerium oxide Inorganic materials 0.000 claims 1
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
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- 238000000576 coating method Methods 0.000 description 20
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- 239000010410 layer Substances 0.000 description 11
- 239000000203 mixture Substances 0.000 description 7
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- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 229910052684 Cerium Inorganic materials 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 150000002222 fluorine compounds Chemical class 0.000 description 3
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- 238000005979 thermal decomposition reaction Methods 0.000 description 3
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- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical group F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 229910000502 Li-aluminosilicate Inorganic materials 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical group OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
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- 235000013305 food Nutrition 0.000 description 2
- 239000006112 glass ceramic composition Substances 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 238000005191 phase separation Methods 0.000 description 2
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- 230000035939 shock Effects 0.000 description 2
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 2
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(ii) oxide Chemical class [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- YMLFYGFCXGNERH-UHFFFAOYSA-K butyltin trichloride Chemical group CCCC[Sn](Cl)(Cl)Cl YMLFYGFCXGNERH-UHFFFAOYSA-K 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
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- 230000003111 delayed effect Effects 0.000 description 1
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- LQRUPWUPINJLMU-UHFFFAOYSA-N dioctyl(oxo)tin Chemical class CCCCCCCC[Sn](=O)CCCCCCCC LQRUPWUPINJLMU-UHFFFAOYSA-N 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 229910001506 inorganic fluoride Inorganic materials 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- REOJLIXKJWXUGB-UHFFFAOYSA-N mofebutazone Chemical group O=C1C(CCCC)C(=O)NN1C1=CC=CC=C1 REOJLIXKJWXUGB-UHFFFAOYSA-N 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/6402—Aspects relating to the microwave cavity
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24C—DOMESTIC STOVES OR RANGES ; DETAILS OF DOMESTIC STOVES OR RANGES, OF GENERAL APPLICATION
- F24C15/00—Details
- F24C15/005—Coatings for ovens
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- A21B—BAKERS' OVENS; MACHINES OR EQUIPMENT FOR BAKING
- A21B1/00—Bakers' ovens
- A21B1/02—Bakers' ovens characterised by the heating arrangements
- A21B1/06—Ovens heated by radiators
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
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- C03C17/245—Oxides by deposition from the vapour phase
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2453—Coating containing SnO2
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- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
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- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/32—Radiation-absorbing paints
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- H05B6/00—Heating by electric, magnetic or electromagnetic fields
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- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/647—Aspects related to microwave heating combined with other heating techniques
- H05B6/6482—Aspects related to microwave heating combined with other heating techniques combined with radiant heating, e.g. infrared heating
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- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
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- C03C2217/211—SnO2
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/212—TiO2
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- C03C2217/20—Materials for coating a single layer on glass
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- C03C2217/213—SiO2
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
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- C03C2217/219—CrOx, MoOx, WOx
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- C03C2217/22—ZrO2
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- General Engineering & Computer Science (AREA)
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Description
1.開示の分野
本開示は、電磁放射を吸収しかつオーブンキャビティ内へ熱放射を放出する誘電的にコーティングされたガラスまたはガラス−セラミック基板を有するオーブンに関する。
住宅用の電気的に加熱されるオーブンおよびマイクロ波オーブンは、オーブンキャビティ内に均一な温度を生じない。電気的に加熱されるオーブン内の温度は、しばしばゆっくりと上昇し、熱源からの距離に応じて変化する。マイクロ波は、オーブンキャビティ内の全てのスペースを通過せず、高温および低温のノードが生じる。温度均一性を改善するために、回転するプラットフォームがオーブンキャビティ内の内容物を移動させるために使用されるまたはウェーブスターラがマイクロ波を分散させるために使用されるが、マイクロ波オーブンは、メイラード反応(例えば、食品におけるカラメル化)を生じるために必要な温度にめったに達せず、電気的に加熱されるオーブンの温度に達するために、付加的な熱源が通常は必要とされる。
本開示は、好適には狭い波長分布を有する電磁放射を吸収し、これにより、基板および誘電性コーティング組成物の温度を上昇させる、誘電的にコーティングされたガラスまたはガラス−セラミック基板を有するオーブンを提供する。これにより、基板および誘電性コーティング組成物は、好適には広い波長分布を有する熱放射をオーブンキャビティ内へ放出する。オーブンキャビティを実質的に均一な温度に急速に加熱することができる。高温および低温のノードが最小限に減じられまたは排除され、回転するプラットフォームおよび付加的な熱源は必要とされない。
図1は、従来のマイクロ波オーブンを示している。オーブンの壁部がマイクロ波を反射するように設計されているときでさえも、依然としてオーブンキャビティ内に低温のスポットまたは領域が生じ、この低温のスポットまたは領域において、加熱は、キャビティ内の他のところほど効率的ではない。キャビティを通過するマイクロ波のノードまたはローポイントにおいて低温スポットが生じる。このようなオーブンはしばしば、内容物を高温ノードへ移動させるためにまたはマイクロ波を分散させるために、回転する食品プラットフォームまたはウェーブスターラなどの構成部材を使用する。これらの構成部材は、オーブンにコストおよび複雑さを付加し、必ずしも、非効率的に加熱されるキャビティの、根底を成している問題を解決しない。
Claims (13)
- オーブンであって、
ドア及び複数の壁部を有する包囲されたキャビティであって、少なくとも1つの前記壁部は、ガラスまたはガラス−セラミック基板を含む、キャビティと、
電磁放射のソースと、
前記基板に塗布された誘電性コーティング組成物と、を有し、
前記誘電性コーティング組成物は、金属酸化物、セラミック酸化物またはそれらの組合せを含み、
該誘電性コーティング組成物は、酸素原子を共有することによって前記基板に化学的に結合し、
前記誘電性コーティング組成物は、前記電磁放射を吸収し、これにより、前記基板および前記誘電性コーティング組成物の温度を上昇させ、
前記誘電性コーティング組成物は、広い波長分布を有する熱放射を前記キャビティ内へ放出する、
オーブン。 - 金属酸化物が、ハロゲン、ポスト遷移金属またはそれらの組合せでドープされている、請求項1に記載のオーブン。
- 金属酸化物が、酸化スズ、酸化チタン、酸化ケイ素、酸化セリウム、酸化ジルコニウムまたはそれらのあらゆる組合せを含む、請求項1又は2に記載のオーブン。
- 金属酸化物が、ハロゲンがドープされており、該ハロゲンは、フッ素、塩素、ヨウ素またはそれらのあらゆる組合せを含む、請求項1から3までのいずれか1項記載のオーブン。
- ポスト遷移金属は、スズ、インジウム、ゲルマニウムまたはそれらの組合せを含む、請求項1から4までのいずれか1項記載のオーブン。
- 前記誘電性コーティング組成物は、フッ素がドープされた酸化スズと、選択的に、チタン、シリカまたはそれらの組合せとから成る、請求項1から5までのいずれか1項記載のオーブン。
- 前記誘電性コーティング組成物は、第1のコーティング層および第2のコーティング層を含み、前記第1のコーティング層は、前記ガラスまたはガラス−セラミック基板に設けられており、前記第2のコーティング層は、前記第1のコーティング層に設けられており、前記第1のコーティング層は、フッ素がドープされた酸化スズと、チタン、シリカまたはそれらの組合せとを含み、前記第2のコーティング層は、フッ素がドープされた酸化スズを含む、請求項1から6までのいずれか1項記載のオーブン。
- 第2のコーティング層は、チタンを有さない、請求項7に記載のオーブン。
- 前記電磁放射は、マイクロ波放射である、請求項1から8までのいずれか1項記載のオーブン。
- 前記オーブンは、マイクロ波オーブンである、請求項1から9までのいずれか1項記載のオーブン。
- コーティングされた基板のシート抵抗は、35〜65オーム/スクウェアである、請求項1から10までのいずれか1項記載のオーブン。
- 少なくとも1つの前記壁部は、キャビティの、上壁、底壁、左壁、右壁または後壁である、請求項1から11までのいずれか1項記載のオーブン。
- 前記誘電性コーティング組成物は、ドアに塗布されていない、請求項1から12までのいずれか1項記載のオーブン。
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