JP6855164B2 - キャリア箔付銅箔及び銅張積層板 - Google Patents

キャリア箔付銅箔及び銅張積層板 Download PDF

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Publication number
JP6855164B2
JP6855164B2 JP2015515308A JP2015515308A JP6855164B2 JP 6855164 B2 JP6855164 B2 JP 6855164B2 JP 2015515308 A JP2015515308 A JP 2015515308A JP 2015515308 A JP2015515308 A JP 2015515308A JP 6855164 B2 JP6855164 B2 JP 6855164B2
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Japan
Prior art keywords
foil
copper foil
carrier foil
carrier
copper
Prior art date
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Active
Application number
JP2015515308A
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English (en)
Japanese (ja)
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JPWO2015080052A1 (ja
Inventor
哲広 松永
哲広 松永
光由 松田
光由 松田
哲聡 高梨
哲聡 高梨
信之 河合
信之 河合
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Mining and Smelting Co Ltd
Original Assignee
Mitsui Mining and Smelting Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C9/00—Alloys based on copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/04—Wires; Strips; Foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/09—Use of materials for the conductive, e.g. metallic pattern
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
    • H05K3/025—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates by transfer of thin metal foil formed on a temporary carrier, e.g. peel-apart copper
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/50—Properties of the layers or laminate having particular mechanical properties
    • B32B2307/54—Yield strength; Tensile strength
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2311/00—Metals, their alloys or their compounds
    • B32B2311/12—Copper
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00—Electrical equipment
    • B32B2457/08—PCBs, i.e. printed circuit boards
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Laminated Bodies (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Electroplating Methods And Accessories (AREA)
JP2015515308A 2013-11-27 2014-11-21 キャリア箔付銅箔及び銅張積層板 Active JP6855164B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013245256 2013-11-27
JP2013245256 2013-11-27
PCT/JP2014/080921 WO2015080052A1 (ja) 2013-11-27 2014-11-21 キャリア箔付銅箔及び銅張積層板

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2019123171A Division JP6784806B2 (ja) 2013-11-27 2019-07-01 キャリア箔付銅箔及び銅張積層板

Publications (2)

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JPWO2015080052A1 JPWO2015080052A1 (ja) 2017-03-16
JP6855164B2 true JP6855164B2 (ja) 2021-04-07

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JP2015515308A Active JP6855164B2 (ja) 2013-11-27 2014-11-21 キャリア箔付銅箔及び銅張積層板
JP2019123171A Active JP6784806B2 (ja) 2013-11-27 2019-07-01 キャリア箔付銅箔及び銅張積層板

Family Applications After (1)

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Country Status (6)

Country Link
JP (2) JP6855164B2 (zh)
KR (2) KR102272762B1 (zh)
CN (1) CN105745360B (zh)
MY (1) MY187285A (zh)
TW (1) TWI644995B (zh)
WO (1) WO2015080052A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6546526B2 (ja) * 2015-12-25 2019-07-17 三井金属鉱業株式会社 キャリア付銅箔及びコアレス支持体用積層板、並びに配線層付コアレス支持体及びプリント配線板の製造方法
CN107248591A (zh) * 2017-06-14 2017-10-13 深圳先进技术研究院 柔性全固态薄膜锂电池及其制备方法
WO2020145003A1 (ja) * 2019-01-11 2020-07-16 三井金属鉱業株式会社 積層体
US10697082B1 (en) * 2019-08-12 2020-06-30 Chang Chun Petrochemical Co., Ltd. Surface-treated copper foil
KR102137068B1 (ko) * 2019-11-27 2020-07-23 와이엠티 주식회사 캐리어박 부착 금속박, 이의 제조방법 및 이를 포함하는 적층체
CN113684506B (zh) * 2021-08-30 2022-02-11 广东嘉元科技股份有限公司 一种具有撕边在线收卷装置的生箔机
WO2023189565A1 (ja) * 2022-03-29 2023-10-05 三井金属鉱業株式会社 キャリア付金属箔、金属張積層板及びプリント配線板
WO2023189566A1 (ja) * 2022-03-29 2023-10-05 三井金属鉱業株式会社 キャリア付金属箔、金属張積層板及びプリント配線板

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3466506B2 (ja) 1999-04-23 2003-11-10 三井金属鉱業株式会社 キャリア箔付電解銅箔及びその電解銅箔の製造方法並びにその電解銅箔を使用した銅張積層板
JP3370624B2 (ja) * 1999-08-24 2003-01-27 三井金属鉱業株式会社 キャリア箔付電解銅箔及びその電解銅箔を使用した銅張積層板
JP2001068804A (ja) * 1999-08-31 2001-03-16 Mitsui Mining & Smelting Co Ltd キャリア箔付電解銅箔及びその電解銅箔の製造方法並びにその電解銅箔を使用した銅張積層板
JP3670179B2 (ja) * 1999-11-11 2005-07-13 三井金属鉱業株式会社 キャリア箔付電解銅箔及びそのキャリア箔付電解銅箔を用いた銅張積層板
JP4073248B2 (ja) 2002-05-14 2008-04-09 三井金属鉱業株式会社 高温耐熱用キャリア箔付電解銅箔の製造方法及びその製造方法で得られる高温耐熱用キャリア箔付電解銅箔
JP2005288856A (ja) * 2004-03-31 2005-10-20 Mitsui Mining & Smelting Co Ltd キャリア箔付電解銅箔及びその製造方法並びにそのキャリア箔付電解銅箔を用いた銅張積層板
JP2005307270A (ja) * 2004-04-21 2005-11-04 Mitsui Mining & Smelting Co Ltd キャリア箔付電解銅箔及びそのキャリア箔付電解銅箔の製造方法
WO2006106956A1 (ja) * 2005-03-31 2006-10-12 Mitsui Mining & Smelting Co., Ltd 電解銅箔及び電解銅箔の製造方法、その電解銅箔を用いて得られた表面処理電解銅箔、その表面処理電解銅箔を用いた銅張積層板及びプリント配線板
JP4065004B2 (ja) * 2005-03-31 2008-03-19 三井金属鉱業株式会社 電解銅箔、その電解銅箔を用いて得られた表面処理電解銅箔、その表面処理電解銅箔を用いた銅張積層板及びプリント配線板
TWI394659B (zh) * 2005-07-27 2013-05-01 Nippon Steel Chemical Co 高屈曲性可撓性覆銅積層板之製造方法
JP2007294923A (ja) * 2006-03-31 2007-11-08 Nikko Kinzoku Kk 強度、導電率、曲げ加工性に優れた銅条又は銅箔の製造方法、銅条又は銅箔、並びにそれを用いた電子部品
TW200804626A (en) * 2006-05-19 2008-01-16 Mitsui Mining & Smelting Co Copper foil provided with carrier sheet, method for fabricating copper foil provided with carrier sheet, surface-treated copper foil provided with carrier sheet, and copper-clad laminate using the surface-treated copper foil provided with carrier she
JP4777206B2 (ja) * 2006-09-29 2011-09-21 新日鐵化学株式会社 フレキシブル銅張積層板の製造方法
JP5588607B2 (ja) * 2007-10-31 2014-09-10 三井金属鉱業株式会社 電解銅箔及びその電解銅箔の製造方法
JP5379528B2 (ja) * 2009-03-24 2013-12-25 三井金属鉱業株式会社 キャリア箔付電解銅箔、キャリア箔付電解銅箔の製造方法及びそのキャリア箔付電解銅箔を用いて得られる銅張積層板
KR101385761B1 (ko) * 2010-07-01 2014-04-17 미쓰이금속광업주식회사 전해 동박 및 그 제조 방법

Also Published As

Publication number Publication date
JPWO2015080052A1 (ja) 2017-03-16
KR102356179B1 (ko) 2022-02-08
MY187285A (en) 2021-09-19
TW201536876A (zh) 2015-10-01
JP2019178431A (ja) 2019-10-17
JP6784806B2 (ja) 2020-11-11
KR20160090818A (ko) 2016-08-01
CN105745360B (zh) 2017-12-08
TWI644995B (zh) 2018-12-21
KR102272762B1 (ko) 2021-07-05
CN105745360A (zh) 2016-07-06
KR20210037020A (ko) 2021-04-05
WO2015080052A1 (ja) 2015-06-04

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