JP6854660B2 - 反射防止膜の製造方法および型の製造方法 - Google Patents

反射防止膜の製造方法および型の製造方法 Download PDF

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Publication number
JP6854660B2
JP6854660B2 JP2017018555A JP2017018555A JP6854660B2 JP 6854660 B2 JP6854660 B2 JP 6854660B2 JP 2017018555 A JP2017018555 A JP 2017018555A JP 2017018555 A JP2017018555 A JP 2017018555A JP 6854660 B2 JP6854660 B2 JP 6854660B2
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JP
Japan
Prior art keywords
antireflection film
mold
base material
film
aluminum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2017018555A
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English (en)
Japanese (ja)
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JP2018123403A5 (enExample
JP2018123403A (ja
Inventor
林　秀和
秀和 林
登喜生 田口
登喜生 田口
幸男 島村
幸男 島村
智之 北川
智之 北川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SUNTECHOPT CO., LTD.
Sharp Corp
Original Assignee
SUNTECHOPT CO., LTD.
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by SUNTECHOPT CO., LTD., Sharp Corp filed Critical SUNTECHOPT CO., LTD.
Priority to JP2017018555A priority Critical patent/JP6854660B2/ja
Priority to CN201880009997.3A priority patent/CN110268102B/zh
Priority to PCT/JP2018/003480 priority patent/WO2018143370A1/ja
Priority to US16/483,100 priority patent/US20200241172A1/en
Publication of JP2018123403A publication Critical patent/JP2018123403A/ja
Publication of JP2018123403A5 publication Critical patent/JP2018123403A5/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
    • B29C33/424—Moulding surfaces provided with means for marking or patterning
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/12—Anodising more than once, e.g. in different baths
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/16—Pretreatment, e.g. desmutting
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/24—Chemical after-treatment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G02B1/116—Multilayers including electrically conducting layers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2905/00—Use of metals, their alloys or their compounds, as mould material
    • B29K2905/02—Aluminium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2011/00—Optical elements, e.g. lenses, prisms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
    • C25D11/08—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing inorganic acids
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
    • C25D11/10—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing organic acids

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
JP2017018555A 2017-02-03 2017-02-03 反射防止膜の製造方法および型の製造方法 Active JP6854660B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2017018555A JP6854660B2 (ja) 2017-02-03 2017-02-03 反射防止膜の製造方法および型の製造方法
CN201880009997.3A CN110268102B (zh) 2017-02-03 2018-02-01 防反射膜、防反射膜的制造方法、模具及模具的制造方法
PCT/JP2018/003480 WO2018143370A1 (ja) 2017-02-03 2018-02-01 反射防止膜、反射防止膜の製造方法、型および型の製造方法
US16/483,100 US20200241172A1 (en) 2017-02-03 2018-02-01 Antireflective film, method for manufacturing antireflective film, mold, and method for manufacturing mold

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017018555A JP6854660B2 (ja) 2017-02-03 2017-02-03 反射防止膜の製造方法および型の製造方法

Publications (3)

Publication Number Publication Date
JP2018123403A JP2018123403A (ja) 2018-08-09
JP2018123403A5 JP2018123403A5 (enExample) 2019-10-03
JP6854660B2 true JP6854660B2 (ja) 2021-04-07

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JP2017018555A Active JP6854660B2 (ja) 2017-02-03 2017-02-03 反射防止膜の製造方法および型の製造方法

Country Status (4)

Country Link
US (1) US20200241172A1 (enExample)
JP (1) JP6854660B2 (enExample)
CN (1) CN110268102B (enExample)
WO (1) WO2018143370A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3628758A1 (en) * 2018-09-27 2020-04-01 Apple Inc. Textured surface for titanium parts
JP7663838B2 (ja) * 2019-07-31 2025-04-17 ソニーグループ株式会社 医療用観察システム及び表示装置
US12085734B1 (en) * 2020-04-20 2024-09-10 Apple Inc. Electronic devices with low-reflectance coatings
CN112589686A (zh) * 2021-01-05 2021-04-02 贵阳方盛汽车饰件有限公司 一种关于汽车行业皮纹塑料件去除亮斑方法
CN113802163B (zh) * 2021-08-18 2023-02-17 陕西师范大学 一种氧化铝微米阶梯与纳米孔复合结构的制备方法
TWI821864B (zh) 2021-12-29 2023-11-11 大立光電股份有限公司 成像鏡頭、遮光片及電子裝置
TWI850085B (zh) * 2022-01-28 2024-07-21 大立光電股份有限公司 成像鏡頭及電子裝置
JP7800286B2 (ja) * 2022-04-28 2026-01-16 株式会社Ｊｖｃケンウッド モニターケース
CN114890658B (zh) * 2022-06-06 2024-02-27 浙江晶泰玻璃科技有限公司 一种防眩光玻璃及其制备工艺
US20250329302A1 (en) * 2024-04-19 2025-10-23 Innolux Corporation Display device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5194486B2 (ja) * 2007-02-28 2013-05-08 住友化学株式会社 液晶表示装置
US9416461B2 (en) * 2009-10-14 2016-08-16 Sharp Kabushiki Kaisha Die and method for manufacturing die, and anti-reflection coating
WO2011052652A1 (ja) * 2009-10-28 2011-05-05 シャープ株式会社 型および型の製造方法ならびに反射防止膜
WO2011055757A1 (ja) * 2009-11-06 2011-05-12 シャープ株式会社 型の製造方法および型
JP5622118B2 (ja) * 2012-01-11 2014-11-12 大日本印刷株式会社 反射防止フィルム、反射防止フィルムの作製に用いられる型、および、型の製造方法
CN107002272B (zh) * 2014-11-21 2021-10-26 夏普株式会社 模具、模具的制造方法、防反射膜及防反射膜的制造方法
JP6458051B2 (ja) * 2014-11-25 2019-01-23 シャープ株式会社 型および型の製造方法ならびに反射防止膜

Also Published As

Publication number Publication date
CN110268102A (zh) 2019-09-20
US20200241172A1 (en) 2020-07-30
WO2018143370A1 (ja) 2018-08-09
CN110268102B (zh) 2021-10-08
JP2018123403A (ja) 2018-08-09

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