CN110268102B - 防反射膜、防反射膜的制造方法、模具及模具的制造方法 - Google Patents

防反射膜、防反射膜的制造方法、模具及模具的制造方法 Download PDF

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Publication number
CN110268102B
CN110268102B CN201880009997.3A CN201880009997A CN110268102B CN 110268102 B CN110268102 B CN 110268102B CN 201880009997 A CN201880009997 A CN 201880009997A CN 110268102 B CN110268102 B CN 110268102B
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antireflection film
film
mold
aluminum
less
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Chinese (zh)
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CN110268102A (zh
Inventor
林秀和
田口登喜生
岛村幸男
北川智之
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Sharp Corp
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Sharp Corp
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
    • B29C33/424—Moulding surfaces provided with means for marking or patterning
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/12—Anodising more than once, e.g. in different baths
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/16—Pretreatment, e.g. desmutting
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/24—Chemical after-treatment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G02B1/116—Multilayers including electrically conducting layers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2905/00—Use of metals, their alloys or their compounds, as mould material
    • B29K2905/02—Aluminium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2011/00—Optical elements, e.g. lenses, prisms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
    • C25D11/08—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing inorganic acids
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
    • C25D11/10—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing organic acids

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
CN201880009997.3A 2017-02-03 2018-02-01 防反射膜、防反射膜的制造方法、模具及模具的制造方法 Active CN110268102B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017-018555 2017-02-03
JP2017018555A JP6854660B2 (ja) 2017-02-03 2017-02-03 反射防止膜の製造方法および型の製造方法
PCT/JP2018/003480 WO2018143370A1 (ja) 2017-02-03 2018-02-01 反射防止膜、反射防止膜の製造方法、型および型の製造方法

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CN110268102A CN110268102A (zh) 2019-09-20
CN110268102B true CN110268102B (zh) 2021-10-08

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US (1) US20200241172A1 (enExample)
JP (1) JP6854660B2 (enExample)
CN (1) CN110268102B (enExample)
WO (1) WO2018143370A1 (enExample)

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Publication number Priority date Publication date Assignee Title
EP3628758A1 (en) * 2018-09-27 2020-04-01 Apple Inc. Textured surface for titanium parts
JP7663838B2 (ja) * 2019-07-31 2025-04-17 ソニーグループ株式会社 医療用観察システム及び表示装置
US12085734B1 (en) * 2020-04-20 2024-09-10 Apple Inc. Electronic devices with low-reflectance coatings
CN112589686A (zh) * 2021-01-05 2021-04-02 贵阳方盛汽车饰件有限公司 一种关于汽车行业皮纹塑料件去除亮斑方法
CN113802163B (zh) * 2021-08-18 2023-02-17 陕西师范大学 一种氧化铝微米阶梯与纳米孔复合结构的制备方法
TWI821864B (zh) 2021-12-29 2023-11-11 大立光電股份有限公司 成像鏡頭、遮光片及電子裝置
TWI850085B (zh) * 2022-01-28 2024-07-21 大立光電股份有限公司 成像鏡頭及電子裝置
JP7800286B2 (ja) * 2022-04-28 2026-01-16 株式会社Ｊｖｃケンウッド モニターケース
CN114890658B (zh) * 2022-06-06 2024-02-27 浙江晶泰玻璃科技有限公司 一种防眩光玻璃及其制备工艺
US20250329302A1 (en) * 2024-04-19 2025-10-23 Innolux Corporation Display device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101271217A (zh) * 2007-02-28 2008-09-24 住友化学株式会社 液晶显示装置及其中使用的偏光板组
CN102575373A (zh) * 2009-10-14 2012-07-11 夏普株式会社 模具和模具的制造方法以及防反射膜
CN102597332A (zh) * 2009-10-28 2012-07-18 夏普株式会社 模具和模具的制造方法以及防反射膜
CN102666941A (zh) * 2009-11-06 2012-09-12 夏普株式会社 模具的制造方法和模具
CN104395783A (zh) * 2012-06-22 2015-03-04 夏普株式会社 防反射结构体和显示装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5622118B2 (ja) * 2012-01-11 2014-11-12 大日本印刷株式会社 反射防止フィルム、反射防止フィルムの作製に用いられる型、および、型の製造方法
CN107002272B (zh) * 2014-11-21 2021-10-26 夏普株式会社 模具、模具的制造方法、防反射膜及防反射膜的制造方法
JP6458051B2 (ja) * 2014-11-25 2019-01-23 シャープ株式会社 型および型の製造方法ならびに反射防止膜

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101271217A (zh) * 2007-02-28 2008-09-24 住友化学株式会社 液晶显示装置及其中使用的偏光板组
CN102575373A (zh) * 2009-10-14 2012-07-11 夏普株式会社 模具和模具的制造方法以及防反射膜
CN102597332A (zh) * 2009-10-28 2012-07-18 夏普株式会社 模具和模具的制造方法以及防反射膜
CN102666941A (zh) * 2009-11-06 2012-09-12 夏普株式会社 模具的制造方法和模具
CN104395783A (zh) * 2012-06-22 2015-03-04 夏普株式会社 防反射结构体和显示装置

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CN110268102A (zh) 2019-09-20
US20200241172A1 (en) 2020-07-30
JP6854660B2 (ja) 2021-04-07
WO2018143370A1 (ja) 2018-08-09
JP2018123403A (ja) 2018-08-09

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