JP6827785B2 - インプリント装置、インプリント方法、および物品の製造方法 - Google Patents

インプリント装置、インプリント方法、および物品の製造方法 Download PDF

Info

Publication number
JP6827785B2
JP6827785B2 JP2016233247A JP2016233247A JP6827785B2 JP 6827785 B2 JP6827785 B2 JP 6827785B2 JP 2016233247 A JP2016233247 A JP 2016233247A JP 2016233247 A JP2016233247 A JP 2016233247A JP 6827785 B2 JP6827785 B2 JP 6827785B2
Authority
JP
Japan
Prior art keywords
light
substrate
mold
heating
imprinting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2016233247A
Other languages
English (en)
Japanese (ja)
Other versions
JP2018092997A (ja
JP2018092997A5 (enExample
Inventor
一洋 佐藤
一洋 佐藤
隆文 宮春
隆文 宮春
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2016233247A priority Critical patent/JP6827785B2/ja
Priority to SG10201709477TA priority patent/SG10201709477TA/en
Priority to TW106140698A priority patent/TWI668734B/zh
Priority to US15/823,338 priority patent/US11204548B2/en
Priority to KR1020170161314A priority patent/KR102282089B1/ko
Priority to CN201711231748.2A priority patent/CN108121155B/zh
Publication of JP2018092997A publication Critical patent/JP2018092997A/ja
Publication of JP2018092997A5 publication Critical patent/JP2018092997A5/ja
Application granted granted Critical
Publication of JP6827785B2 publication Critical patent/JP6827785B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00—Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C37/0025—Applying surface layers, e.g. coatings, decorative layers, printed layers, to articles during shaping, e.g. in-mould printing
    • B29C37/0028—In-mould coating, e.g. by introducing the coating material into the mould after forming the article
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00—Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C37/0025—Applying surface layers, e.g. coatings, decorative layers, printed layers, to articles during shaping, e.g. in-mould printing
    • B29C37/0028—In-mould coating, e.g. by introducing the coating material into the mould after forming the article
    • B29C2037/0046—In-mould printing, in-mould transfer printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2016233247A 2016-11-30 2016-11-30 インプリント装置、インプリント方法、および物品の製造方法 Active JP6827785B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2016233247A JP6827785B2 (ja) 2016-11-30 2016-11-30 インプリント装置、インプリント方法、および物品の製造方法
SG10201709477TA SG10201709477TA (en) 2016-11-30 2017-11-17 Imprint apparatus, imprinting method, and method for manufacturing article
TW106140698A TWI668734B (zh) 2016-11-30 2017-11-23 壓印設備，壓印方法及製造物件的方法
US15/823,338 US11204548B2 (en) 2016-11-30 2017-11-27 Imprint apparatus, imprinting method, and method for manufacturing article
KR1020170161314A KR102282089B1 (ko) 2016-11-30 2017-11-29 임프린트 장치, 임프린트 방법 및 물품의 제조 방법
CN201711231748.2A CN108121155B (zh) 2016-11-30 2017-11-30 压印装置、压印方法以及用于制造物品的方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016233247A JP6827785B2 (ja) 2016-11-30 2016-11-30 インプリント装置、インプリント方法、および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2018092997A JP2018092997A (ja) 2018-06-14
JP2018092997A5 JP2018092997A5 (enExample) 2020-01-09
JP6827785B2 true JP6827785B2 (ja) 2021-02-10

Family

ID=62190802

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016233247A Active JP6827785B2 (ja) 2016-11-30 2016-11-30 インプリント装置、インプリント方法、および物品の製造方法

Country Status (6)

Country Link
US (1) US11204548B2 (enExample)
JP (1) JP6827785B2 (enExample)
KR (1) KR102282089B1 (enExample)
CN (1) CN108121155B (enExample)
SG (1) SG10201709477TA (enExample)
TW (1) TWI668734B (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3620856A1 (en) * 2018-09-10 2020-03-11 Canon Kabushiki Kaisha Imprint method and article manufacturing method
JP7289633B2 (ja) * 2018-11-08 2023-06-12 キヤノン株式会社 インプリント装置および物品製造方法
TWI771623B (zh) 2018-11-08 2022-07-21 日商佳能股份有限公司 壓印裝置和產品製造方法
JP7267801B2 (ja) * 2019-03-26 2023-05-02 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP7379091B2 (ja) * 2019-10-30 2023-11-14 キヤノン株式会社 インプリント装置、インプリント方法、及び物品の製造方法
US11366384B2 (en) * 2019-12-18 2022-06-21 Canon Kabushiki Kaisha Nanoimprint lithography system and method for adjusting a radiation pattern that compensates for slippage of a template
US11199774B2 (en) * 2020-03-30 2021-12-14 Canon Kabushiki Kaisha Method and apparatus to improve frame cure imaging resolution for extrusion control
US11747731B2 (en) * 2020-11-20 2023-09-05 Canon Kabishiki Kaisha Curing a shaped film using multiple images of a spatial light modulator

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3528364B2 (ja) 1995-10-18 2004-05-17 ソニー株式会社 レーザビーム合成装置及び合成方法並びにレーザ製版装置及びレーザ製版方法
JP2002122945A (ja) 2000-10-18 2002-04-26 Noritsu Koki Co Ltd デジタル露光装置及びこれを備える写真処理装置
TW529172B (en) * 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
US7153616B2 (en) * 2004-03-31 2006-12-26 Asml Holding N.V. System and method for verifying and controlling the performance of a maskless lithography tool
JP4958614B2 (ja) * 2006-04-18 2012-06-20 キヤノン株式会社 パターン転写装置、インプリント装置、パターン転写方法および位置合わせ装置
KR20090026116A (ko) * 2006-06-09 2009-03-11 가부시키가이샤 니콘 패턴 형성 방법 및 패턴 형성 장치, 노광 방법 및 노광 장치 및 디바이스 제조 방법
KR101360160B1 (ko) 2006-11-22 2014-02-12 엘아이지에이디피 주식회사 미세패턴 형성장치 및 이를 이용한 미세패턴 형성방법
JP5329520B2 (ja) 2007-03-27 2013-10-30 カール・ツァイス・エスエムティー・ゲーエムベーハー 低角度で入射する補正光を用いる補正光学素子
WO2009153925A1 (ja) * 2008-06-17 2009-12-23 株式会社ニコン ナノインプリント方法及び装置
US8345242B2 (en) * 2008-10-28 2013-01-01 Molecular Imprints, Inc. Optical system for use in stage control
JP2011248327A (ja) * 2010-04-27 2011-12-08 Panasonic Corp 照明装置及びそれを備えた投写型表示装置
WO2012014798A1 (ja) 2010-07-30 2012-02-02 ソニー株式会社 光源ユニット、照明装置および表示装置
US8842294B2 (en) * 2011-06-21 2014-09-23 Canon Kabushiki Kaisha Position detection apparatus, imprint apparatus, and position detection method
JP5686779B2 (ja) 2011-10-14 2015-03-18 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP5932286B2 (ja) * 2011-10-14 2016-06-08 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP2013175604A (ja) 2012-02-24 2013-09-05 Toshiba Corp パターン形成装置、パターン形成方法及び半導体装置の製造方法
JP6076618B2 (ja) 2012-05-14 2017-02-08 アストロデザイン株式会社 光学的分解能向上装置
CN103962079B (zh) * 2013-01-28 2017-11-17 西门子公司 加热装置和用于发生化学反应的设备
WO2014139543A1 (en) * 2013-03-13 2014-09-18 Carl Zeiss Smt Gmbh Microlithographic apparatus
JP6418773B2 (ja) 2013-05-14 2018-11-07 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
JP2015005676A (ja) * 2013-06-22 2015-01-08 株式会社ニコン 照明光学系、照明光学装置、露光装置、およびデバイス製造方法
JP6329353B2 (ja) 2013-10-01 2018-05-23 キヤノン株式会社 インプリント装置、および物品の製造方法
JP6336275B2 (ja) * 2013-12-26 2018-06-06 キヤノン株式会社 インプリント装置、および物品の製造方法
JP6294680B2 (ja) 2014-01-24 2018-03-14 キヤノン株式会社 インプリント装置、および物品の製造方法
KR101901729B1 (ko) * 2014-05-02 2018-09-28 에이에스엠엘 네델란즈 비.브이. 조밀 피처들의 핫스폿들의 감소
JP2016042498A (ja) 2014-08-13 2016-03-31 キヤノン株式会社 インプリント装置および物品製造方法
US20170210036A1 (en) * 2016-01-22 2017-07-27 Canon Kabushiki Kaisha Mold replicating method, imprint apparatus, and article manufacturing method
US11175598B2 (en) * 2017-06-30 2021-11-16 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article

Also Published As

Publication number Publication date
KR102282089B1 (ko) 2021-07-27
CN108121155A (zh) 2018-06-05
SG10201709477TA (en) 2018-06-28
KR20180062391A (ko) 2018-06-08
US11204548B2 (en) 2021-12-21
JP2018092997A (ja) 2018-06-14
CN108121155B (zh) 2022-06-03
TWI668734B (zh) 2019-08-11
US20180149969A1 (en) 2018-05-31
TW201822250A (zh) 2018-06-16

Similar Documents

Publication Publication Date Title
JP6827785B2 (ja) インプリント装置、インプリント方法、および物品の製造方法
KR102298456B1 (ko) 임프린트 장치 및 물품의 제조 방법
JP6685821B2 (ja) 計測装置、インプリント装置、物品の製造方法、光量決定方法、及び、光量調整方法
TWI651762B (zh) 對位裝置，對位方法，光蝕刻裝置，及物品製造方法
KR101977437B1 (ko) 임프린트 장치, 조명 광학계 및 물품 제조 방법
TWI720301B (zh) 壓印裝置及製造物品的方法
JP2021004940A (ja) 計測装置、リソグラフィ装置、および物品の製造方法
US10545416B2 (en) Detection apparatus, lithography apparatus, and method of manufacturing article
KR102259008B1 (ko) 임프린트 장치, 제어 데이터의 생성 방법, 및 물품의 제조 방법
JP2020170771A (ja) インプリント装置および物品製造方法
JP2020161634A (ja) インプリント装置、インプリント方法、および物品の製造方法
US20240027921A1 (en) Detection device, lithography apparatus, and article manufacturing method
US11480872B2 (en) Imprint apparatus, imprint method, and method for manufacturing article
JP7636906B2 (ja) 計測装置、リソグラフィ装置、および物品の製造方法
JP7437928B2 (ja) インプリント装置、インプリント方法および物品製造方法
JP2021097160A (ja) インプリント装置、インプリント方法、及び物品の製造方法
US12429795B2 (en) Detection apparatus, lithography apparatus, and article manufacturing method
JP2019029442A (ja) インプリント装置および物品の製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20191119

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20191119

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20200923

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20201013

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20201209

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20201222

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20210120

R151 Written notification of patent or utility model registration

Ref document number: 6827785

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151