JP6827526B2 - 密封材組成物 - Google Patents
密封材組成物 Download PDFInfo
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- JP6827526B2 JP6827526B2 JP2019510592A JP2019510592A JP6827526B2 JP 6827526 B2 JP6827526 B2 JP 6827526B2 JP 2019510592 A JP2019510592 A JP 2019510592A JP 2019510592 A JP2019510592 A JP 2019510592A JP 6827526 B2 JP6827526 B2 JP 6827526B2
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- C08G59/223—Di-epoxy compounds together with monoepoxy compounds
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- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
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Description
本出願は、2016年12月9日付けの韓国特許出願第10−2016−0167798号に基づく優先権の利益を主張し、当該韓国特許出願の文献に開示されたすべての内容は、本明細書の一部として含まれる。
本出願は、密封材組成物、有機電子装置、前記有機電子装置の信頼性評価方法および前記有機電子装置の製造方法に関する。
本出願の具体例で、前記密封材組成物は、300nm以上の長波長の活性エネルギー線での硬化性を補完するために、光増感剤をさらに含むことができる。前記光増感剤は、200nm〜400nm範囲の波長を吸収する化合物であってもよい。
環形構造を有する硬化性化合物として、脂環族エポキシ化合物Daicel社Celloxide 2021P(以下、CEL2021Pという)およびリモネンジオキサイド(LDO)を使用した。ビニルエーテル硬化性化合物として、1,4−シクロヘキサンジメタノールジビニルエーテル(CHDVE)を使用した。オキセタン基含有硬化性化合物として、TOAGOSEI社のOXT−221を使用した。また、光開始剤として、Tetrachem社のヨードニウム塩光開始剤であるTTA UV−694(以下、UV694という)を使用し、界面活性剤として、フッ素系界面活性剤であるDIC社のF430を使用した。また、カップリング剤として、シランカップリング剤(KBM−403)を使用し、光増感剤として、2−イソプロピルチオキサントン(ITX)を使用した。また、熱安定剤として、2,6−di−tert−Butyl−p−cresol(SIGMA aldrich社のBHT)を使用した。
Waveform−Var1:2μs、Main:8μs、Var2:2μs、Heating temperature:−45℃
Jetting Voltage−100V、Jetting Frequency−1000Hz
界面活性剤としてのF430の代わりに、フッ素系界面活性剤F−444(Megaface社)を使用したことを除いて、実施例1と同じ方法で有機層を形成した。
界面活性剤としてのF430の代わりに、フッ素系界面活性剤F−251(Megaface社)を使用したことを除いて、実施例1と同じ方法で有機層を形成した。
界面活性剤としてのF430の代わりに、フッ素系界面活性剤F−510(Megaface社)を使用したことを除いて、実施例1と同じ方法で有機層を形成した。
下記表1のような重量比で配合して混合容器に投入したことを除いて、実施例1と同じ方法で密封材組成物および有機層を形成した。下記表1で単位は、重量部である。
実施例で製造された硬化した有機層について有機層の厚さHに対する前記1次パターンと前記2次パターンの間の溝部の高さhの比率h/H×100を測定して計算した。前記数値が低いほど優れた平坦度を示す。
実施例で製造した密封材組成物についてインクジェットを通じて10pL一滴を塗布した後、60秒間維持させた後、光硬化して、光学顕微鏡を用いて広がる程度を測定した。ドットサイズが大きいほど広がり性に優れていて、前記でDimatix 10pL Q head nozzle間隔が同一であり、ドットピッチを254μmとして塗布した後に測定した。塗布された密封材組成物の単一ドットに対する直径を測定した。210μm以上の場合、非常に優秀、180μm以上の場合、広がり性が優秀に分類される。
31 基板
32 有機電子素子
33 有機層
34 無機層
35 保護膜
36 封止構造
37 封止フィルム
38 カバー基板
Claims (12)
- 硬化性化合物を含む、密封材組成物であって、
硬化性化合物が、ビニルエーテル硬化性化合物およびオキセタン基を有する硬化性化合物を含み、
オキセタン基を有する硬化性化合物が、ビニルエーテル硬化性化合物100重量部に対して5〜90重量部含まれ、
一方向に延長する1次パターンと、一方向に延長し、前記1次パターンと隣接して形成される2次パターンとを含む有機層の形態で硬化した状態で、前記有機層の厚さHに対する前記1次パターンと前記2次パターンの間の溝部の高さhの比率h/H×100が50%以下である密封材組成物。 - 1次パターンまたは2次パターンの幅は、2〜150mmの範囲内である、請求項1に記載の密封材組成物。
- 有機層の厚さHは、2〜25μmの範囲内である、請求項1に記載の密封材組成物。
- 硬化性化合物は、少なくとも一つ以上の硬化性官能基を含む、請求項1に記載の密封材組成物。
- 硬化性化合物は、5〜50重量部の分子構造内に環形構造を有する硬化性化合物および25重量部〜80重量部の前記ビニルエーテル硬化性化合物を含む、請求項1に記載の密封材組成物。
- 界面活性剤をさらに含む、請求項1に記載の密封材組成物。
- 光開始剤をさらに含む、請求項1に記載の密封材組成物。
- 光増感剤をさらに含む、請求項1に記載の密封材組成物。
- 基板と;基板上に形成された有機電子素子と;前記有機電子素子の前面を密封し、請求項1に記載の密封材組成物が硬化した状態の有機層と;を含み、
前記有機層は、一方向に延長する1次パターンおよび一方向に延長し、前記1次パターンと隣接して形成される2次パターンで硬化した状態で、前記有機層の厚さHに対する前記1次パターンと前記2次パターンの間の溝部の高さhの比率h/H×100が50%以下である有機電子装置。 - 有機電子素子が形成された基板上に、一方向に延長する1次パターンと、一方向に延長し、前記1次パターンと隣接して形成される2次パターンとを含む有機層の形態で請求項1に記載の密封材組成物を硬化した状態で、前記有機層の厚さHに対する前記1次パターンと前記2次パターンの間の溝部の高さhの比率h/H×100が50%以下である場合に、装置が信頼性を有すると評価する、有機電子装置の信頼性評価方法。
- 上部に有機電子素子が形成された基板の上に、請求項1に記載の密封材組成物が前記有機電子素子の前面を密封するように有機層を形成する段階を含む有機電子装置の製造方法。
- 有機層を形成する段階は、インクジェット印刷、グラビアコート、スピンコート、スクリーンプリントまたはリバースオフセットコートで進める、請求項11に記載の有機電子装置の製造方法。
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