JP6797529B2 - 光学部材の製造方法及びそれに用いられる組成物 - Google Patents

光学部材の製造方法及びそれに用いられる組成物 Download PDF

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JP6797529B2
JP6797529B2 JP2016006572A JP2016006572A JP6797529B2 JP 6797529 B2 JP6797529 B2 JP 6797529B2 JP 2016006572 A JP2016006572 A JP 2016006572A JP 2016006572 A JP2016006572 A JP 2016006572A JP 6797529 B2 JP6797529 B2 JP 6797529B2
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meth
monomer
acrylate monomer
urethane
composition
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JP2016134629A5 (https=
JP2016134629A (ja
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理沙 和田
理沙 和田
武司 大幸
武司 大幸
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Toyo Gosei Co Ltd
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Toyo Gosei Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09D133/08—Homopolymers or copolymers of acrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/106—Esters of polycondensation macromers
    • C08F222/1065—Esters of polycondensation macromers of alcohol terminated (poly)urethanes, e.g. urethane(meth)acrylates
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/253—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/263—Preparing and using a stamper, e.g. pressing or injection molding substrates

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Toxicology (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Thermal Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2016006572A 2015-01-21 2016-01-15 光学部材の製造方法及びそれに用いられる組成物 Active JP6797529B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201562106142P 2015-01-21 2015-01-21
US62/106,142 2015-01-21

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JP2016134629A JP2016134629A (ja) 2016-07-25
JP2016134629A5 JP2016134629A5 (https=) 2019-02-21
JP6797529B2 true JP6797529B2 (ja) 2020-12-09

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JP (1) JP6797529B2 (https=)

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* Cited by examiner, † Cited by third party
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JP6504653B2 (ja) 2014-03-31 2019-04-24 東洋合成工業株式会社 組成物及び部品の製造方法
CN107924006B (zh) 2015-08-24 2020-10-09 东洋合成工业株式会社 装置的制造方法及组合物
JP6774826B2 (ja) 2015-09-11 2020-10-28 東洋合成工業株式会社 部品の製造方法
EP3405932B1 (en) * 2016-01-29 2025-02-19 KiwiSecurity Software GmbH Methods and apparatus for using video analytics to detect regions for privacy protection within images from moving cameras
WO2019031360A1 (ja) * 2017-08-07 2019-02-14 日産化学株式会社 インプリント用レプリカモールド材料
JP6997417B2 (ja) * 2017-08-07 2022-01-17 日産化学株式会社 インプリント用レプリカモールド材料

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JP2004216641A (ja) * 2003-01-10 2004-08-05 Three M Innovative Properties Co 可とう性成形型及びその製造方法ならびに微細構造体の製造方法
JP2005288933A (ja) * 2004-04-01 2005-10-20 Three M Innovative Properties Co 可とう性成形型及びその製造方法
US20080110557A1 (en) * 2006-11-15 2008-05-15 Molecular Imprints, Inc. Methods and Compositions for Providing Preferential Adhesion and Release of Adjacent Surfaces
JP4560523B2 (ja) * 2007-02-01 2010-10-13 リンテック株式会社 光記録媒体製造用シート、ならびに光記録媒体およびその製造方法
JP5515516B2 (ja) * 2009-08-27 2014-06-11 大日本印刷株式会社 ナノインプリント方法、パターン形成体、及びナノインプリント装置
JP2012031240A (ja) * 2010-07-29 2012-02-16 Hitachi High-Technologies Corp 微細構造転写用の光重合性樹脂組成物
JP4988032B2 (ja) * 2010-12-08 2012-08-01 株式会社東芝 磁気記録媒体の製造方法
CN103282394B (zh) * 2011-01-12 2015-07-01 三菱丽阳株式会社 活性能量线固化性树脂组合物、微细凹凸结构体及微细凹凸结构体的制造方法
CN103975033B (zh) * 2011-12-07 2016-04-13 第一毛织株式会社 光固化粘合剂组合物以及包含它的显示装置
JP2013228729A (ja) * 2012-03-30 2013-11-07 Sanyo Chem Ind Ltd 光学部品用活性エネルギー線硬化性組成物
WO2013150567A1 (ja) 2012-04-06 2013-10-10 三菱電機株式会社 複合半導体スイッチ装置
JP2014074165A (ja) * 2012-09-12 2014-04-24 Sanyo Chem Ind Ltd 感光性組成物
JP2014108974A (ja) * 2012-11-30 2014-06-12 Sanyo Chem Ind Ltd 感光性組成物
CN104884487B (zh) 2012-12-28 2018-01-05 东洋合成工业株式会社 树脂组合物、树脂模具、光压印方法、以及集成电路与光学元件的制造方法
JP6534347B2 (ja) 2013-03-04 2019-06-26 東洋合成工業株式会社 組成物、樹脂モールド、光インプリント方法、光学素子の製造方法、及び電子素子の製造方法
JP2014225653A (ja) 2013-04-11 2014-12-04 東洋合成工業株式会社 樹脂モールド
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JP6443849B2 (ja) 2013-05-09 2018-12-26 東洋合成工業株式会社 樹脂、樹脂の製造方法及び部品
US9240565B2 (en) 2013-06-06 2016-01-19 Toyo Gosei Co., Ltd. Composition
JP5815913B1 (ja) * 2014-03-18 2015-11-17 Ｄｉｃグラフィックス株式会社 活性エネルギー線硬化型オフセットインキ組成物
JP2015187205A (ja) * 2014-03-26 2015-10-29 三菱化学株式会社 硬化性樹脂組成物、並びにこれを用いて得られる硬化物及び積層体
JP6504653B2 (ja) 2014-03-31 2019-04-24 東洋合成工業株式会社 組成物及び部品の製造方法
JP2018135512A (ja) * 2017-02-23 2018-08-30 三洋化成工業株式会社 活性エネルギー線硬化性樹脂組成物

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JP2016134629A (ja) 2016-07-25
US10723909B2 (en) 2020-07-28

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