JP6783688B2 - 半導体装置および半導体装置の製造方法 - Google Patents
半導体装置および半導体装置の製造方法 Download PDFInfo
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- JP6783688B2 JP6783688B2 JP2017048800A JP2017048800A JP6783688B2 JP 6783688 B2 JP6783688 B2 JP 6783688B2 JP 2017048800 A JP2017048800 A JP 2017048800A JP 2017048800 A JP2017048800 A JP 2017048800A JP 6783688 B2 JP6783688 B2 JP 6783688B2
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- film
- nitride film
- silicon nitride
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- 239000004065 semiconductor Substances 0.000 title claims description 51
- 238000000034 method Methods 0.000 title claims description 28
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 68
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 68
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 61
- 239000010410 layer Substances 0.000 claims description 43
- 239000011241 protective layer Substances 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 11
- 238000005530 etching Methods 0.000 claims description 9
- 238000000059 patterning Methods 0.000 claims description 2
- 230000000149 penetrating effect Effects 0.000 claims description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 15
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- 238000005260 corrosion Methods 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 239000011229 interlayer Substances 0.000 description 6
- 125000004433 nitrogen atom Chemical group N* 0.000 description 6
- 238000000206 photolithography Methods 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
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Description
例えば、特許文献1には、パッド上に第1開口部が形成された第1表面保護膜と、パッド上に第2開口部が形成され、パッドおよび第1表面保護膜上に形成された第2表面保護膜とを備え、パッドは、第1導体膜と、第1導体膜上に形成された反射防止膜とを有し、第1開口部の内部領域に第2開口部が内包されており、第1開口部の内部領域では反射防止膜が除去されている半導体装置が提案されている。
また、従来の半導体装置においては、特に、窒化チタンからなる反射防止膜上にシリコン酸化膜が設けられ、窒化チタンおよびシリコン酸化膜がパッド開口部に露出している場合、高温高湿度環境下での長期信頼性試験(THB)により、反射防止膜が酸化チタンとなって外観不良をおこすことがあった。
その結果、配線膜上に窒化チタン膜が設けられた配線層の上面および側面を覆う保護層を、2つのシリコン窒化膜間に酸化膜が配置された3層構造とすればよいことを見出し、本発明を想到した。
すなわち、本発明は以下の事項に関する。
前記配線層の上面および側面を覆う保護層と、
前記保護層と前記窒化チタン膜とを貫通し、前記配線膜が露出されてなるパッド部とを有し、
前記保護層が、第1シリコン窒化膜と酸化膜と第2シリコン窒化膜とが前記配線層側からこの順で積層されたものであることを特徴とする半導体装置。
前記配線層の上面および側面を覆うように、第1シリコン窒化膜と酸化膜と第2シリコン窒化膜とをこの順で形成することにより、保護層を形成する保護層形成工程と、
前記保護層と前記窒化チタン膜とをエッチングすることにより、前記保護層と前記窒化チタン膜とを貫通し、前記配線膜が露出されてなるパッド部を設けるパッド部形成工程とを有することを特徴とする半導体装置の製造方法。
また、本発明の半導体装置は、1回のフォトリソグラフィー工程によりパッド部を開口でき、生産性に優れる。
本発明者は、窒化チタンからなる反射防止膜を有する従来の半導体装置において、高温高湿度環境下での長期信頼性試験(THB)を行うことにより生じる窒化チタン膜の腐食について調べた。その結果、配線膜上に窒化チタン膜と酸化膜とがこの順で設けられ、酸化膜に形成された開口部と窒化チタン膜に形成された開口部とが平面視で重なる位置に、配線膜が露出されてなるパッド部が形成されている場合、特に、窒化チタン膜の酸化膜との対向面が腐食されやすいことが分かった。
そこで、本発明者は、窒化チタン膜と外部から侵入した水分との上記反応を抑制すべく検討し、窒化チタン膜と酸化膜との間にシリコン窒化膜を形成すればよいとの知見を得た。さらに、本発明者は検討を重ね、充分な信頼性を有する半導体装置とするには、窒化チタン膜と酸化膜との間だけでなく、酸化膜上にもシリコン窒化膜を形成する方法を考案した。
図1は、本発明の半導体装置の一例を示した断面模式図である。
本実施形態の半導体装置10は、基板1と、基板1上に層間絶縁膜2を介して設けられた配線層5と、配線層5の上面5aおよび側面5bを覆う保護層9とを有する。
保護層9は、図1に示すように、第1シリコン窒化膜41と酸化膜3と第2シリコン窒化膜42とが配線層5側からこの順で積層されたものである。
本実施形態の半導体装置10は、保護層9と、配線層5を形成している窒化チタン膜7とを貫通し、配線膜5が露出されてなるパッド部8を有する。
層間絶縁膜2としては、SiO2膜、TEOS(オルトケイ酸テトラエチル(Si(OC2H5)4))を原料とする酸化膜など公知の絶縁膜を用いることができる。
窒化チタン膜7は、反射防止膜である。窒化チタン膜7の厚みは、250〜800Åであることが好ましい。
第1シリコン窒化膜41は、第1シリコン窒化膜41と接して配置される窒化チタン膜7に効率よく窒素原子を供給できるように、窒素含有量が多いことが好ましい。具体的には、第1シリコン窒化膜41は、窒素含有量がシリコンと比較して原子組成比で1.2倍以上であることが好ましい。第1シリコン窒化膜41中の窒素含有量は、例えばX線光電子分光分析法(XPS)により測定できる。また、第1シリコン窒化膜41は、第2シリコン窒化膜42と比較して窒素含有量が多いものであることが好ましい。
第1シリコン窒化膜41の厚みは、100〜1000Åであることが好ましい。第1シリコン窒化膜41の厚みが100Å以上であると、窒化チタン膜7の腐食を防止する効果が顕著となる。第1シリコン窒化膜41の厚みが1000Å以下であると、第1シリコン窒化膜41と窒化チタン膜7との応力差が十分に小さいものとなる。
以上のように、第1シリコン窒化膜41は耐水性があり、さらにその下に窒素含有率の高い窒化チタン膜7が形成される。このため、たとえ、第1シリコン窒化膜41が薄く形成された場合であっても、窒化チタン膜7と第1シリコン窒化膜41上の酸化膜3中を侵入した水分との反応を抑制でき、高い信頼性を有する半導体装置10となる。
酸化膜3の厚みは、2000〜8000Åとすることが好ましく、5000Å程度とすることがより好ましい。酸化膜3の厚みが2000Å以上であると、酸化膜3を設けることによる配線層5と保護層9との応力差を緩和する効果が顕著となる。酸化膜3の厚みが8000Å以下であると、酸化膜3の膜厚が半導体装置10の小型化に影響を来し難く、好ましい。
第2シリコン窒化膜42の厚みは、5000〜15000Åであることが好ましく、10000Å程度であることがより好ましい。第2シリコン窒化膜42の厚みが5000Å以上であると、外部から侵入した水分に起因する窒化チタン膜7の腐食を防止する効果が顕著となる。第2シリコン窒化膜42の厚みが15000Å以下であると、第2シリコン窒化膜42と配線層5との間の応力差による亀裂が発生しにくく、好ましい。
次に、本発明の半導体の製造方法の一例として、図1に示す半導体装置の製造方法を例に挙げて説明する。図2〜図6は、図1に示す半導体装置の製造方法の一例を説明するための工程図である。
具体的には、図2に示すように、基板1上に化学気相成長(CVD)法などにより層間絶縁膜2を形成する。その後、層間絶縁膜2上にスパッタリング法などにより配線膜6を形成する。次に、配線膜6上に、アルゴンガス(Ar)と窒素ガス(N2)を用いる反応性スパッタ法により窒化チタン膜7を形成する。
第1シリコン窒化膜41は、第1シリコン窒化膜41と接して配置される窒化チタン膜7に効率よく窒素原子を供給できるように、プラズマCVD法における窒素を含んだガス(N2またはNH3)の流量を多く設定した条件で形成することにより、窒素含有量が多いものとすることが好ましい。
酸化膜3をエッチングする際に用いるエッチングガスとしては、例えば、CHF3とCF4とArからなる混合ガスを用いることができる。
以上の工程により、図1に示す半導体装置10が得られる。
本発明の半導体装置は、上述した実施形態の半導体装置10に限定されない。
例えば、上述した実施形態の半導体装置10では、配線膜6と窒化チタン膜7とからなる1層の配線層5を有する場合を例に挙げて説明したが、上記の配線層5を最上層とした公知の材料からなる多層配線構造をとってもよい。
また、本発明の半導体装置には、用途に応じて、さらに様々な機能を有する層が含まれていてもよい。
Claims (4)
- 基板上に設けられた配線膜と、前記配線膜上に設けられた窒化チタン膜とからなる配線層と、
前記配線層の上面および側面を覆う保護層と、
前記保護層と前記窒化チタン膜とを貫通し、前記配線膜が露出されてなるパッド部とを有し、
前記保護層が、第1シリコン窒化膜と酸化膜と第2シリコン窒化膜とが前記配線層側からこの順で積層されたものであることを特徴とする半導体装置。 - 前記第1シリコン窒化膜の厚みが100〜1000Åであることを特徴とする請求項1に記載の半導体装置。
- 基板上に、配線膜と窒化チタン膜とをこの順で形成してパターニングすることにより、配線層を形成する配線層形成工程と、
前記配線層の上面および側面を覆うように、第1シリコン窒化膜と酸化膜と第2シリコン窒化膜とをこの順で形成することにより、保護層を形成する保護層形成工程と、
前記保護層と前記窒化チタン膜とをエッチングすることにより、前記保護層と前記窒化チタン膜とを貫通し、前記配線膜が露出されてなるパッド部を設けるパッド部形成工程とを有することを特徴とする半導体装置の製造方法。 - 前記保護層形成工程において、厚み100〜1000Åの前記第1シリコン窒化膜を形成することを特徴とする請求項3に記載の半導体装置の製造方法。
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US15/915,992 US10297562B2 (en) | 2017-03-14 | 2018-03-08 | Semiconductor device and method of manufacturing a semiconductor device |
TW107108229A TW201834182A (zh) | 2017-03-14 | 2018-03-12 | 半導體裝置以及半導體裝置的製造方法 |
CN201810200156.2A CN108573944A (zh) | 2017-03-14 | 2018-03-12 | 半导体装置和半导体装置的制造方法 |
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US20070238304A1 (en) * | 2006-04-11 | 2007-10-11 | Jui-Hung Wu | Method of etching passivation layer |
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