JP6782695B2 - 誘導自己集合体施与のためのケイ素含有ブロックコポリマー - Google Patents

誘導自己集合体施与のためのケイ素含有ブロックコポリマー Download PDF

Info

Publication number
JP6782695B2
JP6782695B2 JP2017523324A JP2017523324A JP6782695B2 JP 6782695 B2 JP6782695 B2 JP 6782695B2 JP 2017523324 A JP2017523324 A JP 2017523324A JP 2017523324 A JP2017523324 A JP 2017523324A JP 6782695 B2 JP6782695 B2 JP 6782695B2
Authority
JP
Japan
Prior art keywords
block copolymer
alkyl
hydrogen
repeating unit
self
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2017523324A
Other languages
English (en)
Japanese (ja)
Other versions
JP2018502936A5 (enExample
JP2018502936A (ja
Inventor
ウー・ヘンペン
イン・ジャン
リン・グァンヤン
キム・ジウン
ポーネシュ・マーガレッタ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Merck Patent GmbH
Original Assignee
Merck Patent GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Merck Patent GmbH filed Critical Merck Patent GmbH
Publication of JP2018502936A publication Critical patent/JP2018502936A/ja
Publication of JP2018502936A5 publication Critical patent/JP2018502936A5/ja
Application granted granted Critical
Publication of JP6782695B2 publication Critical patent/JP6782695B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/42—Introducing metal atoms or metal-containing groups
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0209—Multistage baking
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/14—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
    • B05D3/141—Plasma treatment
    • B05D3/145—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/022—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polycondensates with side or terminal unsaturations
    • C08F299/024—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polycondensates with side or terminal unsaturations the unsaturation being in acrylic or methacrylic groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L53/005—Modified block copolymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32366—Localised processing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Graft Or Block Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP2017523324A 2014-10-30 2015-10-28 誘導自己集合体施与のためのケイ素含有ブロックコポリマー Expired - Fee Related JP6782695B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/527,939 US9505945B2 (en) 2014-10-30 2014-10-30 Silicon containing block copolymers for direct self-assembly application
US14/527,939 2014-10-30
PCT/EP2015/074980 WO2016066684A1 (en) 2014-10-30 2015-10-28 Silicon containing block copolymers for direct self-assembly application

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2019192457A Division JP6810782B2 (ja) 2014-10-30 2019-10-23 誘導自己集合体施与のためのケイ素含有ブロックコポリマー

Publications (3)

Publication Number Publication Date
JP2018502936A JP2018502936A (ja) 2018-02-01
JP2018502936A5 JP2018502936A5 (enExample) 2018-11-01
JP6782695B2 true JP6782695B2 (ja) 2020-11-11

Family

ID=54541022

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2017523324A Expired - Fee Related JP6782695B2 (ja) 2014-10-30 2015-10-28 誘導自己集合体施与のためのケイ素含有ブロックコポリマー
JP2019192457A Expired - Fee Related JP6810782B2 (ja) 2014-10-30 2019-10-23 誘導自己集合体施与のためのケイ素含有ブロックコポリマー

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2019192457A Expired - Fee Related JP6810782B2 (ja) 2014-10-30 2019-10-23 誘導自己集合体施与のためのケイ素含有ブロックコポリマー

Country Status (9)

Country Link
US (1) US9505945B2 (enExample)
EP (1) EP3212714B1 (enExample)
JP (2) JP6782695B2 (enExample)
KR (1) KR102226229B1 (enExample)
CN (1) CN107075057B (enExample)
IL (1) IL250995A0 (enExample)
SG (1) SG11201701937RA (enExample)
TW (1) TWI677526B (enExample)
WO (1) WO2016066684A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9738765B2 (en) * 2015-02-19 2017-08-22 International Business Machines Corporation Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers
JP6819950B2 (ja) * 2016-11-30 2021-01-27 エルジー・ケム・リミテッド ブロック共重合体
KR102096272B1 (ko) * 2016-11-30 2020-04-02 주식회사 엘지화학 블록 공중합체
CN110114377B (zh) 2016-12-21 2022-06-03 默克专利有限公司 嵌段共聚物自组装的新组合物和方法
JP7076701B2 (ja) * 2018-03-05 2022-05-30 東京応化工業株式会社 ブロック共重合体及びその製造方法、ならびに相分離構造を含む構造体の製造方法
FR3089982A1 (fr) * 2018-12-12 2020-06-19 Arkema France Procédé de fabrication d’un copolymère à blocs contenant du silicium
US20240219829A1 (en) 2021-05-18 2024-07-04 Merck Patent Gmbh Hydrophobic crosslinkable pinning underlayers with improved dry etch capabilities for patterning directed self-assembly of ps-b-pmma type block copolymers

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02500152A (ja) * 1987-05-21 1990-01-18 ヒューズ・エアクラフト・カンパニー シリコン含有ネガレジスト材料および基体のパターン化用処理方法
US5985524A (en) * 1997-03-28 1999-11-16 International Business Machines Incorporated Process for using bilayer photoresist
US6210856B1 (en) * 1999-01-27 2001-04-03 International Business Machines Corporation Resist composition and process of forming a patterned resist layer on a substrate
JP3963623B2 (ja) * 1999-12-09 2007-08-22 富士フイルム株式会社 ポジ型フォトレジスト組成物
US6291696B2 (en) * 2000-01-06 2001-09-18 Shin-Etsu Chemical Co., Ltd. Preparation of tris (trimethylsilyl) silylethyl esters
JP3858968B2 (ja) * 2000-01-06 2006-12-20 信越化学工業株式会社 トリス（トリメチルシリル）シリルエチルエステルの製造方法
US6444408B1 (en) * 2000-02-28 2002-09-03 International Business Machines Corporation High silicon content monomers and polymers suitable for 193 nm bilayer resists
JP3781960B2 (ja) 2000-09-29 2006-06-07 信越化学工業株式会社 反射防止膜材料およびパターン形成方法
JP3912512B2 (ja) * 2002-07-02 2007-05-09 信越化学工業株式会社 珪素含有高分子化合物、レジスト材料及びパターン形成方法
JP4040392B2 (ja) 2002-08-22 2008-01-30 富士フイルム株式会社 ポジ型フォトレジスト組成物
US8696918B2 (en) 2010-05-05 2014-04-15 Micron Technology, Inc. Methods of utilizing block copolymer to form patterns
US8691925B2 (en) * 2011-09-23 2014-04-08 Az Electronic Materials (Luxembourg) S.A.R.L. Compositions of neutral layer for directed self assembly block copolymers and processes thereof
US8961918B2 (en) 2012-02-10 2015-02-24 Rohm And Haas Electronic Materials Llc Thermal annealing process
US8710150B2 (en) 2012-02-10 2014-04-29 Rohm And Haas Electronic Materials Llc Blended block copolymer composition
US8697810B2 (en) * 2012-02-10 2014-04-15 Rohm And Haas Electronic Materials Llc Block copolymer and methods relating thereto
JP5745439B2 (ja) * 2012-02-17 2015-07-08 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、並びに、これを用いたパターン形成方法、レジスト膜及び電子デバイスの製造方法
JP6070964B2 (ja) * 2012-03-27 2017-02-01 日産化学工業株式会社 自己組織化膜の下層膜形成組成物
WO2014003023A1 (ja) * 2012-06-29 2014-01-03 Jsr株式会社 パターン形成用組成物及びパターン形成方法
US8822619B1 (en) 2013-02-08 2014-09-02 Rohm And Haas Electronic Materials Llc Directed self assembly copolymer composition and related methods
JP5956370B2 (ja) * 2013-03-12 2016-07-27 信越化学工業株式会社 珪素含有下層膜材料及びパターン形成方法

Also Published As

Publication number Publication date
TWI677526B (zh) 2019-11-21
EP3212714A1 (en) 2017-09-06
TW201619278A (zh) 2016-06-01
JP2018502936A (ja) 2018-02-01
IL250995A0 (en) 2017-04-30
SG11201701937RA (en) 2017-04-27
KR20170081206A (ko) 2017-07-11
JP6810782B2 (ja) 2021-01-06
CN107075057B (zh) 2019-02-15
US9505945B2 (en) 2016-11-29
WO2016066684A1 (en) 2016-05-06
US20160122579A1 (en) 2016-05-05
JP2020033566A (ja) 2020-03-05
EP3212714B1 (en) 2019-03-06
CN107075057A (zh) 2017-08-18
KR102226229B1 (ko) 2021-03-10

Similar Documents

Publication Publication Date Title
JP6810782B2 (ja) 誘導自己集合体施与のためのケイ素含有ブロックコポリマー
TWI535770B (zh) 用於導向自組裝嵌段共聚物之中性層組合物及其方法
JP6454324B2 (ja) 誘導自己組織化用ブロックコポリマーに用いる高エッチング耐性ポリマーブロック
CN108137313B (zh) 用于嵌段共聚物自组装的组合物和方法
KR102409830B1 (ko) 자가-조립 적용을 위한 중합체 조성물
JP2018503241A (ja) 誘導自己集合体パターン化のための欠陥低減方法および組成物
KR20240008940A (ko) Ps-b-pmma형 블록 공중합체의 유도 자기 조립의 패턴화를 위한 개선된 건식 에칭 능력을 가진 소수성 가교성 피닝 하층
KR102267528B1 (ko) 블록 공중합체의 자기-조립을 위한 신규한 조성물 및 방법
TWI901886B (zh) 用於圖案化苯乙烯-嵌段-甲基丙烯酸甲酯（ｐｓ-ｂ-ｐｍｍａ）型嵌段共聚物之定向自組裝之具有改良乾蝕刻能力的疏水性可交聯釘壓底層及使用彼之方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180921

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20180921

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20180921

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20190109

A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20190108

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20190123

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20190626

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20191023

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20191030

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20191211

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A712

Effective date: 20200226

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20200304

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20200907

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20200908

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20201007

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20201020

R150 Certificate of patent or registration of utility model

Ref document number: 6782695

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees