JP6771731B2 - 接触性評価システム及び方法 - Google Patents
接触性評価システム及び方法 Download PDFInfo
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Description
図1Aに示すように、アブレーション治療を行うためのシステム100は、アブレーション治療システム110と、視覚化システム120と、カテーテル140とを備えてもよい。いくつかの実施形態では、システム100は、1つ以上のイリゲーションシステム(irrigation system)170、超音波システム190,及びナビゲーションシステム200を備えてもよい。このシステムは、以下に記載されるように、別個のディスプレイとすることもできるし、視覚化システム120の一部とすることもできるディスプレイ180を備えてもよい。いくつかの実施形態では、このシステムは、RF発生器、イリゲーションシステム170、先端イリゲーション型アブレーションカテーテル140、及び視覚化システム120を備える。
上述したように、カテーテル140は、照明及び分光のための光ファイバの収容部(accommodation)を備えた標準的なアブレーションカテーテルに基づくものであってもよい。いくつかの実施形態では、カテーテル140は、標準的な経中隔処置と一般的なアクセスツールにより、シースを通して心内腔に送達できる誘導可能なイリゲーション式RFアブレーションカテーテルである。カテーテルのハンドル147上には、治療のための標準的なRF発生器及びイリゲーションシステム170の接続部があってもよい。カテーテルハンドル147には光ファイバも通され、次いで、光ファイバは、組織測定値を得るための診断ユニットに接続される。
いくつかの実施形態では、組織アブレーションを監視するための方法が提供される。そのような方法は、以下に記載されるように、NADH蛍光のレベルを表示することによって損傷形成に影響を及ぼす可能性のある種々の因子に関するリアルタイムの視覚フィードバックを提供してもよい。
カテーテルの先端部が心内膜心筋又は心外膜心筋などの改造構造に接触すると、戻されたスペクトルに組織の特性及び状態が現れる。図3に示されているように、400nm〜600nmのスペクトルは、血液(小振幅)、アブレーションされたことのある組織、健康な組織で異なっている。波長が355nmで照明された場合、健康な組織のシグネチャは、大半が400nm〜600nmの波長のNADH蛍光であり、中心は約460nm〜約470nmである。これは、カテーテルが適切に配置されて、アブレーションの必要がある組織と接触しているか否か判断するのに役立つ。また、カテーテルを表面に対して更に押しつけると蛍光が上昇し、スペクトルシグネチャが基準ラインの上方にシフトする場合がある。このようなフィードバックの使用は、カテーテルアブレーション中及び操作中の穿孔の危険を低減するのに役立ち、最適でない組織接触部位でのアブレーションを回避するのに役立ち、ひいてはRFアブレーション時間を短縮させることができる。
非限定的な例として、図7は、損傷形成期間にわたってfNADH応答と治療インピーダンスを対比させたものである。インピーダンスは、世界中でアブレーション処置中に使用される標準的な指標である。通常、インピーダンスは、カテーテルの先端部から患者胴部に付着させたアブレーション接地パッドまで測定される。医師は、アブレーションエネルギー開始後の最初の2秒〜3秒で約10Ω〜15Ωの低下が見込めると予想する。インピーダンスが低下しない場合、これが心筋とのカテーテルの接触不良によるものらしいことが医師に分かり、損傷の試みが中止され、カテーテルが再配置される。上述の方法は、カテーテルと組織のより良好な接触を保証するために使用することもできる。インピーダンスが低下して新たなレベルを維持する場合、通常、医師は一定時間(30秒〜60秒又はそれ以上)にわたって損傷形成エネルギーを印加し続ける。インピーダンスが経時的に上昇する場合、これはカテーテル先端部の過熱の可能性を示す指標であり、下降しない場合は、心臓壁断裂をもたらす蒸気発生や脱落して塞栓体となる可能性のあるカテーテル先端部における炭化形成といった危険な状態を招くことがある。
Claims (22)
- カテーテルと、アブレーション治療システムと、視覚化システムと、プロセッサとを備えるシステムを使用して組織アブレーションを監視する方法であって、
前記プロセッサは、
前記視覚化システムからアブレーションの必要な組織を前進する前記カテーテルの遠位先端に送られた照明光により前記組織が照明されて、組織内に励起されたNADHのNADH信号を、前記アブレーション療法システムにより前記組織に損傷を形成するために実施される前記組織に対するアブレーションの実施中に受け取ること、
前記アブレーションの実施中に、前記カテーテルの遠位先端と前記組織との間の接触の安定性を示す前記NADH蛍光信号の振幅が上昇してNADH蛍光の基準ラインに達したときに、前記カテーテルの遠位先端と前記組織とが適切に接触したと判断できるように前記NADH蛍光信号の振幅を表示すること、
を含む方法。 - 前記プロセッサは、前記遠位先端が前記組織に接触し続けていることを確認するために、前記アブレーションの実施中に前記NADH蛍光の振幅を監視することをさらに含む請求項1に記載の方法。
- 前記プロセッサは、前記遠位先端と前記組織との間の接触の安定性を判断するために、前記アブレーションの実施中に前記NADH蛍光の振幅を監視することを更に含む請求項1又は2に記載の方法。
- 前記プロセッサは、前記遠位先端と前記組織との間の接触が安定していない場合に、前記組織のアブレーションを停止することを更に含む請求項3に記載の方法。
- 前記プロセッサは、前記照明された前記組織から反射される蛍光光線のスペクトルを収集して、前記スペクトルのピークレベルからアブレーションされた組織とアブレーションされていない組織の組織タイプを識別することを更に含む請求項1〜4のいずれか1項に記載の方法。
- 前記組織が約300nm〜約400nmの波長の光で照明される請求項1〜5のいずれか1項に記載の方法。
- 前記判断することは、波長が約450nm〜約470nmの反射光のレベルを監視してピークNADH蛍光を識別することを含む請求項1〜6のいずれか1項に記載の方法。
- 前記アブレーションは、高周波(RF)アブレーション、マイクロ波アブレーション、電気穿孔法、電磁アブレーション、冷凍アブレーション、レーザアブレーション、超音波アブレーション、化学的アブレーション及びそれらの組み合わせからなる群から選ばれる請求項1〜7のいずれか1項に記載の方法。
- 前記カテーテルが、
カテーテル本体と、
前記カテーテル本体の遠位端に配置される前記遠位先端であって、照明キャビティと組織との間で光を交換するための1つ以上の開口部を備える照明キャビティを画定する前記遠位先端と、
前記カテーテル本体を通って、前記遠位先端の前記照明キャビティに延びる1つ以上の光ファイバであって、光源及び光測定器と通信状態にあり、前記組織を照明して前記組織から反射された光エネルギーを前記光測定器に中継する1つ以上の光ファイバと、
を備える請求項1〜8のいずれか1項に記載の方法。 - 前記カテーテルの長軸方向に対して径方向及び軸方向に前記組織を照明することを更に含む請求項1〜9のいずれか1項に記載の方法。
- 前記NADH蛍光のレベルをディスプレイに表示することによって、前記損傷の形成に関するリアルタイムの視覚的なフィードバックを提供することを更に含む請求項1〜10のいずれか1項に記載の方法。
- 前記プロセッサによりNADH蛍光ピークが検出されたときに前記アブレーションが実施される請求項1〜11のいずれか1項に記載の方法。
- 前記プロセッサは、前記NADH蛍光のレベルを監視することと組み合わせて、前記組織の超音波評価を実行することを更に含む請求項1〜12のいずれか1項に記載の方法。
- カテーテルと、アブレーション治療システムと、視覚化システムと、プロセッサとを備える、組織アブレーションを監視するためのシステムであって、
前記カテーテルが、
カテーテル本体と、
前記カテーテル本体の遠位端に配置される遠位先端であって、光エネルギーを組織に通すための1つ以上の開口部を備え、
前記アブレーション治療システムは、前記遠位先端と通信状態にあり、前記遠位先端を介して組織にアブレーションの実施を可能とし、
前記視覚化システムは、
光源と、
光測定器と、
前記光源及び前記光測定器と通信状態にあり、前記カテーテル本体を通って、前記遠位先端まで延びる1つ以上の光ファイバであって、前記組織に光エネルギーを渡すように構成された光ファイバと、
を備え、
前記プロセッサは、前記アブレーション治療システム、前記光源、及び前記光測定器と通信状態にあり、前記プロセッサは、
前記組織に対するアブレーションの実施中に、前記カテーテルの前記遠位先端を通して光で照明された前記組織からNADH蛍光データを受け取り、
前記アブレーションの実施中に、前記カテーテルの遠位先端と前記組織との間の接触の安定性を示すNADH蛍光信号の振幅が上昇してNADH蛍光の基準ラインに達したときに、前記カテーテルの遠位先端と前記組織とが適切に接触したと判断できるように前記NADH蛍光信号の振幅を表示する、
ようにプログラムされているシステム。 - 前記プロセッサは、前記遠位先端が前記組織に接触し続けていることを確認するために、前記アブレーションの実施中に前記NADH蛍光のレベルを監視するようにプログラムされている請求項14に記載のシステム。
- 前記プロセッサは、前記遠位先端と前記組織との間の接触の安定性を判断するために、前記アブレーションの実施中に前記NADH蛍光のレベルを監視するように更にプログラムされている請求項14又は15に記載のシステム。
- 前記組織が約300nm〜約400nmの波長の光で照明される請求項14〜16のいずれか1項に記載のシステム。
- 前記プロセッサは、波長が約450nm〜約470nmの反射光のレベルを監視する請求項14〜17のいずれか1項に記載のシステム。
- 前記アブレーションは、高周波(RF)アブレーション、マイクロ波アブレーション、電気穿孔法、電磁アブレーション、冷凍アブレーション、レーザアブレーション、超音波アブレーション、化学的アブレーション及びそれらの組み合わせからなる群から選ばれる請求項14〜18のいずれか1項に記載のシステム。
- 前記カテーテルは、前記カテーテルの長軸方向に対して径方向及び軸方向に前記組織を照明するように構成されている請求項14〜19のいずれか1項に記載のシステム。
- 前記カテーテルは、1つ以上の超音波トランスデューサと1つ以上の電磁位置特定センサとを更に備え、
前記システムは、前記組織の超音波評価のための、前記1つ以上の超音波トランスデューサと通信状態にある超音波システムを更に備える、
請求項14〜20のいずれか1項に記載のシステム。 - 前記システムは、前記カテーテルの位置を特定してナビゲートするための、前記1つ以上の電磁位置特定システムと通信状態にあるナビゲーションシステムを更に備える、
請求項21に記載のシステム。
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AU2020257151A1 (en) | 2020-11-19 |
JP2018503411A (ja) | 2018-02-08 |
US10682179B2 (en) | 2020-06-16 |
CN107427213A (zh) | 2017-12-01 |
US10143517B2 (en) | 2018-12-04 |
CN107427213B (zh) | 2021-04-16 |
AU2015343274B2 (en) | 2020-07-23 |
KR20170110572A (ko) | 2017-10-11 |
CN113208723A (zh) | 2021-08-06 |
US20160120602A1 (en) | 2016-05-05 |
EP3215001A1 (en) | 2017-09-13 |
EP3215001A4 (en) | 2018-04-04 |
US11596472B2 (en) | 2023-03-07 |
JP2021000470A (ja) | 2021-01-07 |
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US20190053849A1 (en) | 2019-02-21 |
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