JP6760975B2 - 制御システム、位置決めシステム、リソグラフィ装置及びデバイス製造方法 - Google Patents

制御システム、位置決めシステム、リソグラフィ装置及びデバイス製造方法 Download PDF

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Publication number
JP6760975B2
JP6760975B2 JP2017564502A JP2017564502A JP6760975B2 JP 6760975 B2 JP6760975 B2 JP 6760975B2 JP 2017564502 A JP2017564502 A JP 2017564502A JP 2017564502 A JP2017564502 A JP 2017564502A JP 6760975 B2 JP6760975 B2 JP 6760975B2
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Japan
Prior art keywords
control system
feedforward
linear
output signal
positioning
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Japanese (ja)
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JP2018527599A (ja
JP2018527599A5 (https=
Inventor
ベスト，イェルン，ヨハンネス，テオドルス，ヘンドリクス デ
ベスト，イェルン，ヨハンネス，テオドルス，ヘンドリクス デ
アーンゲネント，ウィルヘルムス，ヘンリクス，テオドルス，マリア
デル メーレン，スタン，ヘンリクス ヴァン
デル メーレン，スタン，ヘンリクス ヴァン
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ASML Netherlands BV
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ASML Netherlands BV
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B11/00—Automatic controllers
    • G05B11/01—Automatic controllers electric
    • G05B11/14—Automatic controllers electric in which the output signal represents a discontinuous function of the deviation from the desired value, i.e. discontinuous controllers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Feedback Control In General (AREA)
JP2017564502A 2015-06-19 2016-05-19 制御システム、位置決めシステム、リソグラフィ装置及びデバイス製造方法 Active JP6760975B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP15172894.6 2015-06-19
EP15172894 2015-06-19
PCT/EP2016/061236 WO2016202519A1 (en) 2015-06-19 2016-05-19 Control system, positioning system, lithographic apparatus and device manufacturing method

Publications (3)

Publication Number Publication Date
JP2018527599A JP2018527599A (ja) 2018-09-20
JP2018527599A5 JP2018527599A5 (https=) 2019-05-09
JP6760975B2 true JP6760975B2 (ja) 2020-09-23

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ID=53476719

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JP2017564502A Active JP6760975B2 (ja) 2015-06-19 2016-05-19 制御システム、位置決めシステム、リソグラフィ装置及びデバイス製造方法

Country Status (4)

Country Link
US (1) US10401743B2 (https=)
JP (1) JP6760975B2 (https=)
NL (1) NL2016797A (https=)
WO (1) WO2016202519A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3493888A1 (de) * 2016-08-04 2019-06-12 Covestro Deutschland AG Verfahren zur regelung einer rektifikationskolonne
JP7148295B2 (ja) * 2018-07-04 2022-10-05 キヤノン株式会社 制御装置、露光装置及び物品の製造方法
JP7645658B2 (ja) * 2021-02-24 2025-03-14 キヤノン株式会社 制御装置、位置決め装置、リソグラフィー装置および物品製造方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6444501A (en) 1987-08-12 1989-02-16 Nippon Kokan Kk Method for controlling variable value control system
JP2790634B2 (ja) 1988-08-23 1998-08-27 勝久 古田 運動機械系の制御装置
US5442544A (en) * 1990-01-26 1995-08-15 Honeywell Inc. Single input single output rate optimal controller
JPH0888990A (ja) 1994-09-14 1996-04-02 Nec Corp モータの位置制御装置
US6287735B2 (en) 1998-09-16 2001-09-11 Nikon Corporation Method and apparatus for controlling the leveling table of a wafer stage
JP2003033065A (ja) 2001-07-19 2003-01-31 Aisin Seiki Co Ltd 電動モータの制御装置及びその設計手法
JP2004171164A (ja) 2002-11-19 2004-06-17 Nikki Denso Kk 逆システム及びこれを利用したモータ制御システム
US7209219B2 (en) 2003-03-06 2007-04-24 Asml Netherlands B.V. System for controlling a position of a mass
US7170581B2 (en) 2004-10-27 2007-01-30 Asml Netherlands B.V. Self-adapting feedforward control tuning for motion system, and lithographic apparatus provided with such a motion system
JP4462165B2 (ja) 2005-10-21 2010-05-12 日産自動車株式会社 制御装置
US7818073B2 (en) 2006-04-20 2010-10-19 Asml Netherlands B.V. Method for obtaining improved feedforward data, a lithographic apparatus for carrying out the method and a device manufacturing method
US7352149B2 (en) 2006-08-29 2008-04-01 Asml Netherlands B.V. Method for controlling the position of a movable object, a positioning system, and a lithographic apparatus
JP2008299488A (ja) 2007-05-30 2008-12-11 Shizuoka Institute Of Science And Technology 位置制御装置
US8064151B2 (en) * 2007-08-14 2011-11-22 Asml Netherlands B.V. Lithographic apparatus and thermal optical manipulator control method
NL1036266A1 (nl) * 2007-12-17 2009-06-18 Asml Holding Nv Pre-filter for a servo control loop, and applications thereof.
NL2003634A (en) 2008-11-14 2010-05-17 Asml Netherlands Bv Lithographic apparatus and control system.
US20100222898A1 (en) 2009-01-27 2010-09-02 Nikon Corporation Stage-control systems and methods including inverse closed loop with adaptive controller
JP2011008360A (ja) 2009-06-23 2011-01-13 Sumitomo Heavy Ind Ltd スライディングモード制御系の設計方法及びその設計支援装置
NL2004847A (en) 2009-06-30 2011-01-04 Asml Holding Nv Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatus.
CN102279529B (zh) 2010-06-11 2015-03-25 上海微电子装备有限公司 柔性双边驱动设备的位置控制装置、及相关参数的整定方法
JP5780058B2 (ja) 2011-08-29 2015-09-16 株式会社明電舎 周期外乱抑制装置
JP6340160B2 (ja) 2011-05-31 2018-06-06 株式会社牧野フライス製作所 送り駆動系の設計方法
JP6171729B2 (ja) 2013-08-27 2017-08-02 株式会社明電舎 周期外乱自動抑制方法
JP5929863B2 (ja) 2013-09-30 2016-06-08 株式会社明電舎 制御装置

Also Published As

Publication number Publication date
NL2016797A (en) 2016-12-22
WO2016202519A1 (en) 2016-12-22
US20180164701A1 (en) 2018-06-14
US10401743B2 (en) 2019-09-03
JP2018527599A (ja) 2018-09-20

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