NL2016797A - Control system, positioning system, lithographic apparatus and device manufacturing method. - Google Patents
Control system, positioning system, lithographic apparatus and device manufacturing method. Download PDFInfo
- Publication number
- NL2016797A NL2016797A NL2016797A NL2016797A NL2016797A NL 2016797 A NL2016797 A NL 2016797A NL 2016797 A NL2016797 A NL 2016797A NL 2016797 A NL2016797 A NL 2016797A NL 2016797 A NL2016797 A NL 2016797A
- Authority
- NL
- Netherlands
- Prior art keywords
- feedforward
- substrate
- control system
- linear
- patterning device
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title description 8
- 239000000758 substrate Substances 0.000 claims description 57
- 238000000059 patterning Methods 0.000 claims description 45
- 230000005855 radiation Effects 0.000 claims description 36
- 238000001459 lithography Methods 0.000 claims description 4
- 238000005286 illumination Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 description 20
- 230000006870 function Effects 0.000 description 8
- 239000010410 layer Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 230000003071 parasitic effect Effects 0.000 description 6
- 239000007788 liquid Substances 0.000 description 5
- 230000005291 magnetic effect Effects 0.000 description 5
- 238000005457 optimization Methods 0.000 description 5
- 238000007654 immersion Methods 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 3
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- 238000009826 distribution Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000004590 computer program Methods 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 230000010363 phase shift Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000012876 topography Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000001364 causal effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 238000012887 quadratic function Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B11/00—Automatic controllers
- G05B11/01—Automatic controllers electric
- G05B11/14—Automatic controllers electric in which the output signal represents a discontinuous function of the deviation from the desired value, i.e. discontinuous controllers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Feedback Control In General (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP15172894 | 2015-06-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2016797A true NL2016797A (en) | 2016-12-22 |
Family
ID=53476719
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2016797A NL2016797A (en) | 2015-06-19 | 2016-05-19 | Control system, positioning system, lithographic apparatus and device manufacturing method. |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10401743B2 (https=) |
| JP (1) | JP6760975B2 (https=) |
| NL (1) | NL2016797A (https=) |
| WO (1) | WO2016202519A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3493888A1 (de) * | 2016-08-04 | 2019-06-12 | Covestro Deutschland AG | Verfahren zur regelung einer rektifikationskolonne |
| JP7148295B2 (ja) * | 2018-07-04 | 2022-10-05 | キヤノン株式会社 | 制御装置、露光装置及び物品の製造方法 |
| JP7645658B2 (ja) * | 2021-02-24 | 2025-03-14 | キヤノン株式会社 | 制御装置、位置決め装置、リソグラフィー装置および物品製造方法 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6444501A (en) | 1987-08-12 | 1989-02-16 | Nippon Kokan Kk | Method for controlling variable value control system |
| JP2790634B2 (ja) | 1988-08-23 | 1998-08-27 | 勝久 古田 | 運動機械系の制御装置 |
| US5442544A (en) * | 1990-01-26 | 1995-08-15 | Honeywell Inc. | Single input single output rate optimal controller |
| JPH0888990A (ja) | 1994-09-14 | 1996-04-02 | Nec Corp | モータの位置制御装置 |
| US6287735B2 (en) | 1998-09-16 | 2001-09-11 | Nikon Corporation | Method and apparatus for controlling the leveling table of a wafer stage |
| JP2003033065A (ja) | 2001-07-19 | 2003-01-31 | Aisin Seiki Co Ltd | 電動モータの制御装置及びその設計手法 |
| JP2004171164A (ja) | 2002-11-19 | 2004-06-17 | Nikki Denso Kk | 逆システム及びこれを利用したモータ制御システム |
| US7209219B2 (en) | 2003-03-06 | 2007-04-24 | Asml Netherlands B.V. | System for controlling a position of a mass |
| US7170581B2 (en) | 2004-10-27 | 2007-01-30 | Asml Netherlands B.V. | Self-adapting feedforward control tuning for motion system, and lithographic apparatus provided with such a motion system |
| JP4462165B2 (ja) | 2005-10-21 | 2010-05-12 | 日産自動車株式会社 | 制御装置 |
| US7818073B2 (en) | 2006-04-20 | 2010-10-19 | Asml Netherlands B.V. | Method for obtaining improved feedforward data, a lithographic apparatus for carrying out the method and a device manufacturing method |
| US7352149B2 (en) | 2006-08-29 | 2008-04-01 | Asml Netherlands B.V. | Method for controlling the position of a movable object, a positioning system, and a lithographic apparatus |
| JP2008299488A (ja) | 2007-05-30 | 2008-12-11 | Shizuoka Institute Of Science And Technology | 位置制御装置 |
| US8064151B2 (en) * | 2007-08-14 | 2011-11-22 | Asml Netherlands B.V. | Lithographic apparatus and thermal optical manipulator control method |
| NL1036266A1 (nl) * | 2007-12-17 | 2009-06-18 | Asml Holding Nv | Pre-filter for a servo control loop, and applications thereof. |
| NL2003634A (en) | 2008-11-14 | 2010-05-17 | Asml Netherlands Bv | Lithographic apparatus and control system. |
| US20100222898A1 (en) | 2009-01-27 | 2010-09-02 | Nikon Corporation | Stage-control systems and methods including inverse closed loop with adaptive controller |
| JP2011008360A (ja) | 2009-06-23 | 2011-01-13 | Sumitomo Heavy Ind Ltd | スライディングモード制御系の設計方法及びその設計支援装置 |
| NL2004847A (en) | 2009-06-30 | 2011-01-04 | Asml Holding Nv | Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatus. |
| CN102279529B (zh) | 2010-06-11 | 2015-03-25 | 上海微电子装备有限公司 | 柔性双边驱动设备的位置控制装置、及相关参数的整定方法 |
| JP5780058B2 (ja) | 2011-08-29 | 2015-09-16 | 株式会社明電舎 | 周期外乱抑制装置 |
| JP6340160B2 (ja) | 2011-05-31 | 2018-06-06 | 株式会社牧野フライス製作所 | 送り駆動系の設計方法 |
| JP6171729B2 (ja) | 2013-08-27 | 2017-08-02 | 株式会社明電舎 | 周期外乱自動抑制方法 |
| JP5929863B2 (ja) | 2013-09-30 | 2016-06-08 | 株式会社明電舎 | 制御装置 |
-
2016
- 2016-05-19 US US15/735,956 patent/US10401743B2/en active Active
- 2016-05-19 WO PCT/EP2016/061236 patent/WO2016202519A1/en not_active Ceased
- 2016-05-19 JP JP2017564502A patent/JP6760975B2/ja active Active
- 2016-05-19 NL NL2016797A patent/NL2016797A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2016202519A1 (en) | 2016-12-22 |
| US20180164701A1 (en) | 2018-06-14 |
| US10401743B2 (en) | 2019-09-03 |
| JP6760975B2 (ja) | 2020-09-23 |
| JP2018527599A (ja) | 2018-09-20 |
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