JP6722813B2 - 高感度オキシムエステル光重合開始剤及びこれを含有する光重合組成物 - Google Patents
高感度オキシムエステル光重合開始剤及びこれを含有する光重合組成物 Download PDFInfo
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- JP6722813B2 JP6722813B2 JP2019500541A JP2019500541A JP6722813B2 JP 6722813 B2 JP6722813 B2 JP 6722813B2 JP 2019500541 A JP2019500541 A JP 2019500541A JP 2019500541 A JP2019500541 A JP 2019500541A JP 6722813 B2 JP6722813 B2 JP 6722813B2
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- Prior art keywords
- alkyl
- oxime ester
- compound
- alkoxy
- meth
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- 239000000203 mixture Substances 0.000 title claims description 84
- -1 oxime ester Chemical class 0.000 title claims description 76
- 239000003999 initiator Substances 0.000 title claims description 24
- 150000001875 compounds Chemical class 0.000 claims description 45
- 239000000758 substrate Substances 0.000 claims description 25
- 239000000126 substance Substances 0.000 claims description 19
- 229910052739 hydrogen Inorganic materials 0.000 claims description 16
- 239000001257 hydrogen Substances 0.000 claims description 16
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims description 14
- 125000003545 alkoxy group Chemical group 0.000 claims description 14
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 14
- 239000002904 solvent Substances 0.000 claims description 14
- 238000000576 coating method Methods 0.000 claims description 12
- 239000000049 pigment Substances 0.000 claims description 12
- 125000000217 alkyl group Chemical group 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 11
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 11
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 10
- 125000006651 (C3-C20) cycloalkyl group Chemical group 0.000 claims description 9
- 125000006736 (C6-C20) aryl group Chemical group 0.000 claims description 8
- 239000011159 matrix material Substances 0.000 claims description 8
- 229910052736 halogen Inorganic materials 0.000 claims description 7
- 229920000642 polymer Polymers 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 150000002367 halogens Chemical class 0.000 claims description 6
- 150000002431 hydrogen Chemical class 0.000 claims description 6
- 125000005257 alkyl acyl group Chemical group 0.000 claims description 5
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 5
- 125000005251 aryl acyl group Chemical group 0.000 claims description 4
- 125000006526 (C1-C2) alkyl group Chemical group 0.000 claims description 3
- 125000006273 (C1-C3) alkyl group Chemical group 0.000 claims description 3
- 239000012670 alkaline solution Substances 0.000 claims 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 72
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 53
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 39
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 33
- 239000007787 solid Substances 0.000 description 32
- 238000006243 chemical reaction Methods 0.000 description 26
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 25
- 239000000243 solution Substances 0.000 description 25
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 24
- 239000010408 film Substances 0.000 description 23
- 230000015572 biosynthetic process Effects 0.000 description 21
- 238000003786 synthesis reaction Methods 0.000 description 21
- 239000012153 distilled water Substances 0.000 description 17
- 239000011541 reaction mixture Substances 0.000 description 17
- 238000005160 1H NMR spectroscopy Methods 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 16
- 230000035945 sensitivity Effects 0.000 description 15
- 239000000047 product Substances 0.000 description 13
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 12
- 239000010410 layer Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- 239000012044 organic layer Substances 0.000 description 11
- 238000003756 stirring Methods 0.000 description 11
- 229920006243 acrylic copolymer Polymers 0.000 description 10
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 8
- WTDHULULXKLSOZ-UHFFFAOYSA-N Hydroxylamine hydrochloride Chemical compound Cl.ON WTDHULULXKLSOZ-UHFFFAOYSA-N 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 8
- 239000012046 mixed solvent Substances 0.000 description 8
- 238000000746 purification Methods 0.000 description 8
- 239000011734 sodium Substances 0.000 description 8
- FBTOLQFRGURPJH-UHFFFAOYSA-N 1-phenyl-9h-carbazole Chemical group C1=CC=CC=C1C1=CC=CC2=C1NC1=CC=CC=C12 FBTOLQFRGURPJH-UHFFFAOYSA-N 0.000 description 7
- 239000011230 binding agent Substances 0.000 description 7
- 239000000178 monomer Substances 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 7
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 6
- 239000011976 maleic acid Substances 0.000 description 6
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 6
- 229910052753 mercury Inorganic materials 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 238000010898 silica gel chromatography Methods 0.000 description 6
- 125000006850 spacer group Chemical group 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 5
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 description 5
- 239000012346 acetyl chloride Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 230000000704 physical effect Effects 0.000 description 5
- 238000000926 separation method Methods 0.000 description 5
- KCOYLRXCNKJSSC-UHFFFAOYSA-N 9h-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1.C1=CC=C2C3=CC=CC=C3NC2=C1 KCOYLRXCNKJSSC-UHFFFAOYSA-N 0.000 description 4
- 241000209094 Oryza Species 0.000 description 4
- 235000007164 Oryza sativa Nutrition 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 239000011888 foil Substances 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 235000009566 rice Nutrition 0.000 description 4
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 3
- JNPCNDJVEUEFBO-UHFFFAOYSA-N 1-butylpyrrole-2,5-dione Chemical compound CCCCN1C(=O)C=CC1=O JNPCNDJVEUEFBO-UHFFFAOYSA-N 0.000 description 3
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 description 3
- XEZNGIUYQVAUSS-UHFFFAOYSA-N 18-crown-6 Chemical compound C1COCCOCCOCCOCCOCCO1 XEZNGIUYQVAUSS-UHFFFAOYSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 3
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 3
- FMFHUEMLVAIBFI-UHFFFAOYSA-N 2-phenylethenyl acetate Chemical compound CC(=O)OC=CC1=CC=CC=C1 FMFHUEMLVAIBFI-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- GHAZCVNUKKZTLG-UHFFFAOYSA-N N-ethyl-succinimide Natural products CCN1C(=O)CCC1=O GHAZCVNUKKZTLG-UHFFFAOYSA-N 0.000 description 3
- HDFGOPSGAURCEO-UHFFFAOYSA-N N-ethylmaleimide Chemical compound CCN1C(=O)C=CC1=O HDFGOPSGAURCEO-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 244000028419 Styrax benzoin Species 0.000 description 3
- 235000000126 Styrax benzoin Nutrition 0.000 description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 description 3
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 3
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 235000019382 gum benzoic Nutrition 0.000 description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- SEEYREPSKCQBBF-UHFFFAOYSA-N n-methylmaleimide Chemical compound CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 description 3
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 3
- 229920002866 paraformaldehyde Polymers 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- UJPLWOQOYGUXEF-UHFFFAOYSA-N 1-(4-bromo-2-methylphenyl)ethanone Chemical compound CC(=O)C1=CC=C(Br)C=C1C UJPLWOQOYGUXEF-UHFFFAOYSA-N 0.000 description 2
- WYECURVXVYPVAT-UHFFFAOYSA-N 1-(4-bromophenyl)ethanone Chemical compound CC(=O)C1=CC=C(Br)C=C1 WYECURVXVYPVAT-UHFFFAOYSA-N 0.000 description 2
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 2
- DABFKTHTXOELJF-UHFFFAOYSA-N 1-propylpyrrole-2,5-dione Chemical compound CCCN1C(=O)C=CC1=O DABFKTHTXOELJF-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- QRHHZFRCJDAUNA-UHFFFAOYSA-N 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 QRHHZFRCJDAUNA-UHFFFAOYSA-N 0.000 description 2
- BLLZAHSARJPHSO-UHFFFAOYSA-N 2-[2-(4-ethoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OCC)=CC=C1C=CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 BLLZAHSARJPHSO-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- NTHGIYFSMNNHSC-UHFFFAOYSA-N 3-methylbutyl nitrate Chemical compound CC(C)CCO[N+]([O-])=O NTHGIYFSMNNHSC-UHFFFAOYSA-N 0.000 description 2
- PQJUJGAVDBINPI-UHFFFAOYSA-N 9H-thioxanthene Chemical compound C1=CC=C2CC3=CC=CC=C3SC2=C1 PQJUJGAVDBINPI-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- ZMXZTLUHMACQJK-UHFFFAOYSA-N C(C)(=O)ON=C(C)C1=CC=C(C=C1)N1C2=CC=CC=C2C=2C=C(C=CC1=2)[N+](=O)[O-] Chemical compound C(C)(=O)ON=C(C)C1=CC=C(C=C1)N1C2=CC=CC=C2C=2C=C(C=CC1=2)[N+](=O)[O-] ZMXZTLUHMACQJK-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- JAPXFLNIEJXMPN-UHFFFAOYSA-N [N+](=O)([O-])C=1C=CC=2N(C3=CC=CC=C3C=2C=1)C1=CC=C(C=C1)C(C)=NO Chemical compound [N+](=O)([O-])C=1C=CC=2N(C3=CC=CC=C3C=2C=1)C1=CC=C(C=C1)C(C)=NO JAPXFLNIEJXMPN-UHFFFAOYSA-N 0.000 description 2
- ZAUGUGLNFIIZIH-UHFFFAOYSA-N [N+](=O)([O-])C=1C=CC=2N(C3=CC=CC=C3C=2C=1)C1=CC=C(C=C1)C(C)=O Chemical compound [N+](=O)([O-])C=1C=CC=2N(C3=CC=CC=C3C=2C=1)C1=CC=C(C=C1)C(C)=O ZAUGUGLNFIIZIH-UHFFFAOYSA-N 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- 150000008366 benzophenones Chemical class 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 150000002923 oximes Chemical class 0.000 description 2
- 238000005191 phase separation Methods 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 150000003918 triazines Chemical class 0.000 description 2
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 2
- 230000002087 whitening effect Effects 0.000 description 2
- VMHYWKBKHMYRNF-UHFFFAOYSA-N (2-chlorophenyl)-phenylmethanone Chemical compound ClC1=CC=CC=C1C(=O)C1=CC=CC=C1 VMHYWKBKHMYRNF-UHFFFAOYSA-N 0.000 description 1
- XHXSXTIIDBZEKB-UHFFFAOYSA-N 1,2,3,4,5,6,7,8-octamethylanthracene-9,10-dione Chemical compound CC1=C(C)C(C)=C2C(=O)C3=C(C)C(C)=C(C)C(C)=C3C(=O)C2=C1C XHXSXTIIDBZEKB-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
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Description
感光性組成物は、エチレン性不飽和結合を有する重合性化合物に光重合開始剤を添加したものであり、該感光性組成物に対して365nm、405nm、436nmの混合光を照射することにより、重合硬化させることができるため、光硬化性インク、感光性印刷版、各種フォトレジスト等に用いられている。短波長の光源に対して感度を有する感光性組成物は、綺麗な印刷を得るために、感度に優れた光重合開始剤が求められている。
Claims (12)
- 下記化学式1で表されるオキシムエステルフェニルカルバゾール化合物:
ここで、R1及びR2は、それぞれ独立して、水素、ニトロ、シアノ、アルコキシ、又はハロゲンであり、R 1 及びR 2 のうちいずれか一方がニトロ基であり;R3は、(C1−C20)アルキル、(C6−C20)アリール、(C1−C20)アルコキシ、(C6−C20)アリール(C1−C20)アルキル、ヒドロキシ(C1−C20)アルキル、ヒドロキシ(C1−C20)アルコキシ(C1−C20)アルキル、(C3−C20)シクロアルキル、(C1−C20)アルキルアシル、又は(C6−C20)アリールアシルであり;R4は、(C1−C20)アルキル、(C6−C20)アリール、(C1−C20)アルコキシ、(C6−C20)アリール(C1−C20)アルキル、ヒドロキシ(C1−C20)アルキル、ヒドロキシ(C1−C20)アルコキシ(C1−C20)アルキル、(C3−C20)シクロアルキル、(C1−C20)アルキルアシル、又は(C6−C20)アリールアシルであり;R5及びR6は、それぞれ独立して、水素、(C1−C20)アルキル、(C1−C20)アルコキシ、ヒドロキシ(C1−C20)アルキル、ヒドロキシ(C1−C20)アルコキシ(C1−C20)アルキル、(C3−C20)シクロアルキル、又は(C1−C20)アルキルアシルであり;nは0又は1の整数である。 - R3は、(C3−C7)アルキル又は(C6−C7)アリールである、請求項1に記載のオキシムエステルフェニルカルバゾール化合物。
- R4は、(C1−C3)アルキル又は(C6−C8)アリールである、請求項1に記載のオキシムエステルフェニルカルバゾール化合物。
- R5及びR6は、それぞれ独立して、水素又は(C1−C2)アルキルである、請求項1に記載のオキシムエステルフェニルカルバゾール化合物。
- 請求項1に記載のオキシムエステルフェニルカルバゾール化合物を含有する光重合開始剤。
- 請求項1に記載のオキシムエステルフェニルカルバゾール化合物と、
溶剤又はアルカリ水溶液に可溶な高分子化合物及びエチレン性不飽和結合を有する光重合性化合物から選ばれた1種以上の化合物と、を含有する光重合組成物。 - 請求項1に記載のオキシムエステルフェニルカルバゾール化合物と、
溶剤又はアルカリ水溶液に可溶な高分子化合物及びエチレン性不飽和結合を有する光重合性化合物から選択される1種以上の化合物と、
染料又は顔料と、を含有することを特徴とする光重合組成物。 - 請求項6に記載の光重合組成物から形成されるブラックマトリックス。
- 請求項6に記載の光重合組成物から形成されるカラーフィルタ。
- 請求項6に記載の光重合組成物から形成される有機絶縁膜を有する基板。
- 請求項6に記載の光重合組成物をコーティングして形成される膜を有する基材。
- 前記膜は、ディスプレイパネルとして使用されるものである、請求項11に記載の基材。
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PCT/KR2017/007132 WO2018008959A1 (ko) | 2016-07-08 | 2017-07-05 | 고감도 옥심에스터 광중합 개시제 및 이를 포함하는 광중합 조성물 |
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JP7175168B2 (ja) * | 2018-11-29 | 2022-11-18 | 東京応化工業株式会社 | 感光性樹脂組成物、パターン化された硬化膜の製造方法、及びパターン化された硬化膜 |
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JP5117397B2 (ja) * | 2005-12-20 | 2013-01-16 | チバ ホールディング インコーポレーテッド | オキシムエステル光開始剤 |
CN101528694B (zh) * | 2006-12-27 | 2012-03-07 | 株式会社艾迪科 | 肟酯化合物和含有该化合物的光聚合引发剂 |
KR101026612B1 (ko) * | 2007-01-19 | 2011-04-04 | 주식회사 엘지화학 | 옥심 에스테르기와 트리아진기를 동시에 포함하는 광활성화합물 및 이를 포함하는 감광성 조성물 |
KR101526618B1 (ko) * | 2007-05-11 | 2015-06-05 | 바스프 에스이 | 옥심 에스테르 광개시제 |
JP2010215575A (ja) * | 2009-03-18 | 2010-09-30 | Toyo Ink Mfg Co Ltd | 新規オキシムエステル化合物およびそれを含んでなるラジカル重合開始剤および重合性組成物およびそれを用いたネガ型レジストおよびそれを用いた画像パターン形成方法 |
JP2011075981A (ja) * | 2009-10-01 | 2011-04-14 | Toppan Printing Co Ltd | 着色組成物、カラーフィルタの製造方法およびカラーフィルタ |
KR101358057B1 (ko) * | 2011-07-19 | 2014-02-12 | (주)경인양행 | 옥심 에스테르 화합물 및 그것을 포함하는 광중합 개시제 |
CN103998427A (zh) * | 2011-12-07 | 2014-08-20 | 巴斯夫欧洲公司 | 肟酯光敏引发剂 |
JP2015001654A (ja) * | 2013-06-17 | 2015-01-05 | 東レ株式会社 | 積層樹脂ブラックマトリクス基板の製造方法 |
JP2017537347A (ja) * | 2014-11-12 | 2017-12-14 | サムヤン コーポレーション | 液晶ディスプレイパネル用ブラックマトリックスフォトレジスト組成物 |
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2017
- 2017-06-30 TW TW106121935A patent/TWI635079B/zh active
- 2017-07-05 CN CN201780038768.XA patent/CN109564387B/zh active Active
- 2017-07-05 WO PCT/KR2017/007132 patent/WO2018008959A1/ko active Application Filing
- 2017-07-05 JP JP2019500541A patent/JP6722813B2/ja active Active
- 2017-07-05 KR KR1020170085198A patent/KR101897411B1/ko active IP Right Grant
- 2017-07-05 US US16/316,085 patent/US20200199261A1/en not_active Abandoned
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CN109564387A (zh) | 2019-04-02 |
US20200199261A1 (en) | 2020-06-25 |
CN109564387B (zh) | 2022-03-15 |
WO2018008959A1 (ko) | 2018-01-11 |
KR101897411B1 (ko) | 2018-09-12 |
KR20180006314A (ko) | 2018-01-17 |
TW201802071A (zh) | 2018-01-16 |
TWI635079B (zh) | 2018-09-11 |
JP2019523247A (ja) | 2019-08-22 |
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