JP6711098B2 - 半導体装置の放熱構造 - Google Patents
半導体装置の放熱構造 Download PDFInfo
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- JP6711098B2 JP6711098B2 JP2016081964A JP2016081964A JP6711098B2 JP 6711098 B2 JP6711098 B2 JP 6711098B2 JP 2016081964 A JP2016081964 A JP 2016081964A JP 2016081964 A JP2016081964 A JP 2016081964A JP 6711098 B2 JP6711098 B2 JP 6711098B2
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- 230000017525 heat dissipation Effects 0.000 title claims description 84
- 239000004065 semiconductor Substances 0.000 title claims description 66
- 239000000758 substrate Substances 0.000 claims description 25
- 229920006015 heat resistant resin Polymers 0.000 claims description 6
- 238000007789 sealing Methods 0.000 claims description 3
- 230000005855 radiation Effects 0.000 claims description 2
- 238000010276 construction Methods 0.000 claims 1
- 238000000465 moulding Methods 0.000 claims 1
- 238000009413 insulation Methods 0.000 description 9
- 238000012986 modification Methods 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- 230000015556 catabolic process Effects 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000003071 parasitic effect Effects 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
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- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
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- H01L23/3672—Foil-like cooling fins or heat sinks
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- H01L2224/32227—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the layer connector connecting to a bond pad of the item
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Description
2)パッケージ11上の上面電極と下面電極の絶縁
3)パッケージ11と放熱部品との絶縁
4)基板20の電気配線と放熱部品との絶縁
従来技術のこのような課題に鑑み、本発明の目的は、表面実装用の薄型半導体装置に適用できる優れた放熱性を備える半導体装置の放熱構造、好ましくは優れた絶縁信頼性も兼ね備える半導体装置の放熱構造を提供することである。
図1は本発明の第1実施形態に係る放熱構造101の概略を示す断面図である。
図2は本発明の第2実施形態に係る放熱構造102の概略を示す断面図である。なお、第1実施形態と同じ構成部材には同じ参照符号を付し、以下では主として相違点について説明する。
図3は本発明の第2実施形態の変形例に係る半導体デバイス10の放熱構造102Aの概略を示す断面図である。なお、第2実施形態と同じ構成部材には同じ参照符号を付し、以下では主として相違点について説明する。
11 パッケージ
12 電極
13 放熱電極
20 基板
30 ヒートシンク
31 ヒートスプレッダ
32 非絶縁部品
41 絶縁部品
42 絶縁部品
42A 絶縁部品
50 ネジ
Claims (6)
- 基板と電気的に接続される電気的接合面と、その反対側の放熱面とを有する半導体装置の放熱構造であって、
前記放熱面が非絶縁部材を介して導電性高熱伝導部材に接合または接触するとともに、
この導電性高熱伝導部材が第1絶縁部材を介して放熱部品に接合または接触しており、
前記導電性高熱伝導部材の厚みは、前記半導体装置の厚みよりも大きく、
前記導電性高熱伝導部材は、平面視で前記放熱部品よりも小さく、
前記半導体装置および前記導電性高熱伝導部材が平面視でいずれも略矩形状とした場合、前記導電性高熱伝導部材の各辺の長さは、前記導電性高熱伝導部材の厚みの2倍と前記半導体装置の各辺の長さとの和よりも大きいことを特徴とする、半導体装置の放熱構造。 - 請求項1に記載の半導体装置の放熱構造において、
前記第1絶縁部材は、平面視で前記導電性高熱伝導部材よりも大きいことを特徴とする、半導体装置の放熱構造。 - 請求項1または2に記載の半導体装置の放熱構造において、
前記基板と前記導電性高熱伝導部材との間で前記半導体装置の外周および前記基板のパターンの少なくとも一部を覆うように第2絶縁部材が配置されていることを特徴とする、半導体装置の放熱構造。 - 請求項3に記載の半導体装置の放熱構造において、
前記第2絶縁部材が前記基板と前記放熱部品との間の空間を占めるように配置されていることを特徴とする、半導体装置の放熱構造。 - 請求項4に記載の半導体装置の放熱構造において、
前記第2絶縁部材は、前記放熱部品への固定用の貫通穴を有することを特徴とする、半導体装置の放熱構造。 - 請求項3〜5のいずれか1項に記載の半導体装置の放熱構造において、
前記第2絶縁部材は、絶縁耐熱性樹脂による成形もしくは切削加工品、絶縁耐熱性のテープ、絶縁耐熱性の樹脂による封止、またはこれらのいずれか2つ以上の組み合わせによって配置されることを特徴とする、半導体装置の放熱構造。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016081964A JP6711098B2 (ja) | 2016-04-15 | 2016-04-15 | 半導体装置の放熱構造 |
EP17151972.1A EP3232468B1 (en) | 2016-04-15 | 2017-01-18 | Heat dissipation structure of a semiconductor device |
PT171519721T PT3232468T (pt) | 2016-04-15 | 2017-01-18 | Estrutura de dissipação de calor de um dispositivo semicondutor |
CN201710045272.7A CN107301987B (zh) | 2016-04-15 | 2017-01-20 | 半导体装置的散热结构 |
US15/410,781 US9997430B2 (en) | 2016-04-15 | 2017-01-20 | Heat dissipation structure of semiconductor device |
TW106109642A TWI648829B (zh) | 2016-04-15 | 2017-03-23 | 半導體裝置的散熱結構 |
KR1020170039895A KR101946467B1 (ko) | 2016-04-15 | 2017-03-29 | 반도체 장치의 방열구조 |
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JP2016081964A JP6711098B2 (ja) | 2016-04-15 | 2016-04-15 | 半導体装置の放熱構造 |
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JP2017191904A JP2017191904A (ja) | 2017-10-19 |
JP6711098B2 true JP6711098B2 (ja) | 2020-06-17 |
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US (1) | US9997430B2 (ja) |
EP (1) | EP3232468B1 (ja) |
JP (1) | JP6711098B2 (ja) |
KR (1) | KR101946467B1 (ja) |
CN (1) | CN107301987B (ja) |
PT (1) | PT3232468T (ja) |
TW (1) | TWI648829B (ja) |
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JP6693441B2 (ja) * | 2017-02-27 | 2020-05-13 | オムロン株式会社 | 電子装置およびその製造方法 |
CN110137720B (zh) * | 2018-02-09 | 2022-07-26 | 富士康(昆山)电脑接插件有限公司 | 一种用来固定散热器的固定装置及其抵压装置 |
KR102185824B1 (ko) | 2019-01-04 | 2020-12-02 | 강병혁 | 전력변환용 반도체 패키지의 방열구조 |
EP4297080A1 (de) * | 2022-06-20 | 2023-12-27 | Siemens Aktiengesellschaft | Schaltungsanordnung mit einem schaltungsträger und einem halbleiterbauelement |
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JPH08264688A (ja) * | 1995-03-28 | 1996-10-11 | Sumitomo Kinzoku Electro Device:Kk | 半導体用セラミックパッケージ |
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JP3451979B2 (ja) | 1999-04-28 | 2003-09-29 | 株式会社日立製作所 | 半導体装置 |
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JP3934565B2 (ja) * | 2003-02-21 | 2007-06-20 | 富士通株式会社 | 半導体装置 |
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TWI242863B (en) * | 2003-09-15 | 2005-11-01 | Siliconware Precision Industries Co Ltd | Heat dissipating structure and semiconductor package with the heat dissipating structure |
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US9997430B2 (en) | 2018-06-12 |
US20170301602A1 (en) | 2017-10-19 |
CN107301987B (zh) | 2019-11-05 |
KR101946467B1 (ko) | 2019-02-08 |
TW201803049A (zh) | 2018-01-16 |
EP3232468A1 (en) | 2017-10-18 |
EP3232468B1 (en) | 2021-01-06 |
JP2017191904A (ja) | 2017-10-19 |
TWI648829B (zh) | 2019-01-21 |
KR20170118599A (ko) | 2017-10-25 |
PT3232468T (pt) | 2021-01-18 |
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