JP6697126B2 - 剥離水平化デバイスおよび剥離方法 - Google Patents
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- 238000000034 method Methods 0.000 title claims description 12
- 239000011521 glass Substances 0.000 claims description 25
- 239000000758 substrate Substances 0.000 claims description 25
- 230000000712 assembly Effects 0.000 claims description 14
- 238000000429 assembly Methods 0.000 claims description 14
- 230000007246 mechanism Effects 0.000 claims description 11
- 230000008859 change Effects 0.000 claims description 5
- 238000007667 floating Methods 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 31
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 16
- 229910052710 silicon Inorganic materials 0.000 description 16
- 239000010703 silicon Substances 0.000 description 16
- 238000010586 diagram Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000002860 competitive effect Effects 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004299 exfoliation Methods 0.000 description 1
- 238000010295 mobile communication Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000006855 networking Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
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- H—ELECTRICITY
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
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- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B43/00—Operations specially adapted for layered products and not otherwise provided for, e.g. repairing; Apparatus therefor
- B32B43/006—Delaminating
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/10—Removing layers, or parts of layers, mechanically or chemically
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68309—Auxiliary support including alignment aids
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1168—Gripping and pulling work apart during delaminating
- Y10T156/1179—Gripping and pulling work apart during delaminating with poking during delaminating [e.g., jabbing, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1978—Delaminating bending means
- Y10T156/1983—Poking delaminating means
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- Microelectronics & Electronic Packaging (AREA)
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- Mechanical Treatment Of Semiconductor (AREA)
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Description
第1および第2の固定プレートのうちの一方のプレートの外側に配設された取付けプレートと、
取付けプレートの中心位置周りに固定された連結ロッド組立体であって、連結ロッド組立体が、順次、摺動対および摺動対に連結された球面対を介して、第1および第2の固定プレートのうちの一方のプレートに連結されている、連結ロッド組立体と、
取付けプレートと、第1および第2の固定プレートのうちの一方のプレートとの間に配設された少なくとも3つの弾性組立体であって、弾性組立体のそれぞれが、取付けプレートと、第1および第2の保持プレートのうちの一方のプレートに結合されている、弾性組立体とを備える、剥離水平化デバイスを提供する。
1.本発明により使用される球面対と摺動対の組合せによって、基準物の動的変化に合わせて水平化物体を適応させることができるようになり、ばね組立体は、基準物の向きに基づいてリアルタイムで水平化物体の水平化を行う。その結果、ウェハとガラス基板の間の平行が常に保証され、ウェハに生じ得る損傷が回避される。
2.本発明により、Rx/Ry方向の回転を可能にするための1つの球面対、およびZ方向の移動を可能にするための1つの摺動対のみを有する簡単な構造がもたらされる。そのようなレイアウトはより合理的であり、実際に容易に使用することができ、能動的な制御を必要とすることなく、動的な水平化用途において特に有用である。
Claims (12)
- 第1の物体と第2の物体を剥離する工程中に水平化するための剥離水平化デバイスであって、前記第1および第2の物体が、それぞれ第1の固定プレートおよび第2の固定プレートによって固定されている、剥離水平化デバイスにおいて、
前記第1および第2の固定プレートのうちの一方のプレートの外側に配設された取付けプレートと、
前記取付けプレートの中心位置周りに固定された連結ロッド組立体であって、前記連結ロッド組立体が、順次、摺動対および前記摺動対に連結された球面対を介して、前記第1および第2の固定プレートのうちの前記一方のプレートに連結されている、連結ロッド組立体と、
前記取付けプレートと、前記第1および第2の固定プレートのうちの前記一方のプレートとの間に配設された少なくとも3つの弾性組立体であって、前記弾性組立体のそれぞれが、前記取付けプレートと、前記第1および第2の固定プレートのうちの前記一方のプレートに結合されている、弾性組立体と、
を備える、剥離水平化デバイス。 - 前記少なくとも3つの弾性組立体が、前記球面対周りで均等に分配されている、請求項1に記載の剥離水平化デバイス。
- 前記弾性組立体のそれぞれに、前記取付けプレートまたは前記第1および第2の固定プレートのうちの前記一方のプレートに留め付けられたプレテンション調整機構が設けられている、請求項1に記載の剥離水平化デバイス。
- 前記プレテンション調整機構が、前記取付けプレートから径方向外側を指す方向に沿って徐々に増大する垂直方向高さを有するくさび形状表面を備えており、前記弾性組立体が板ばねとして実現されており、それぞれの板ばねが、前記取付けプレートに固定された第1の端部と、前記くさび形状表面に接触している第2の端部とを有している、請求項3に記載の剥離水平化デバイス。
- 前記くさび形状表面には、その各側部に、前記板ばねの移動方向に沿って制限ショルダが設けられている、請求項4に記載の剥離水平化デバイス。
- 前記摺動対が、リニア軸受またはリニアガイドである、請求項1に記載の剥離水平化デバイス。
- 前記球面対が、球面軸受、球面滑り軸受、浮動性継手、または自在継手である、請求項1に記載の剥離水平化デバイス。
- 前記自在継手が、2自由度を有する自在継手である、請求項7に記載の剥離水平化デバイス。
- 前記第1および第2の物体のそれぞれが、ウェハまたはガラス基板である、請求項1に記載の剥離水平化デバイス。
- 請求項1に記載の前記剥離水平化デバイスを使用した剥離方法であって、
a)第1の固定プレートの上、または第2の固定プレートの下に、取付けプレートを配設するステップと、
b)前記第1および第2の物体間の接合境界面に沿って、前記第1および第2の固定プレートのうちの前記取付けプレートが設けられていない方のプレートに、前記第1の物体が前記第2の物体から分離するまで、外部からの圧力を加えるステップと
を備える剥離方法。 - 前記ステップa)とステップb)の間に、前記弾性組立体のそれぞれのプレテンションを必要に応じて水平化によって調整するステップをさらに備える、請求項10に記載の剥離方法。
- 前記第1および第2の物体からなる剥離物体のプロファイルが変化したとき、摺動対および球面対があることによって、前記第1および第2の固定プレートのうちの前記取付けプレートが設けられた方のプレートが、前記剥離物体の動的変化に適応できるようになり、前記弾性組立体のそれぞれが、前記第1および第2の固定プレートのうちの前記取付けプレートが設けられた方の前記プレートの動的変化に基づいて、前記第1および第2の固定プレートのうちの前記取付けプレートが設けられた方の前記プレートにそれぞれ圧力を加え、それにより、前記第1の物体が前記第2の物体に対して常に平行に保たれる、請求項10に記載の剥離方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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CN201610617042.9 | 2016-07-29 | ||
CN201610617042.9A CN107665848B (zh) | 2016-07-29 | 2016-07-29 | 一种解键合调平装置及解键合方法 |
PCT/CN2017/094765 WO2018019276A1 (zh) | 2016-07-29 | 2017-07-27 | 一种解键合调平装置及解键合方法 |
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JP2019527484A JP2019527484A (ja) | 2019-09-26 |
JP6697126B2 true JP6697126B2 (ja) | 2020-05-20 |
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US (1) | US10971380B2 (ja) |
JP (1) | JP6697126B2 (ja) |
KR (1) | KR102177004B1 (ja) |
CN (1) | CN107665848B (ja) |
SG (1) | SG11201900761SA (ja) |
TW (1) | TWI622114B (ja) |
WO (1) | WO2018019276A1 (ja) |
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- 2017-07-27 US US16/321,682 patent/US10971380B2/en active Active
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WO2018019276A1 (zh) | 2018-02-01 |
SG11201900761SA (en) | 2019-02-27 |
KR20190029700A (ko) | 2019-03-20 |
CN107665848A (zh) | 2018-02-06 |
US20200090961A1 (en) | 2020-03-19 |
CN107665848B (zh) | 2020-08-25 |
KR102177004B1 (ko) | 2020-11-10 |
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