JP6683500B2 - 検査装置及びレーザー加工装置 - Google Patents
検査装置及びレーザー加工装置 Download PDFInfo
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- JP6683500B2 JP6683500B2 JP2016032883A JP2016032883A JP6683500B2 JP 6683500 B2 JP6683500 B2 JP 6683500B2 JP 2016032883 A JP2016032883 A JP 2016032883A JP 2016032883 A JP2016032883 A JP 2016032883A JP 6683500 B2 JP6683500 B2 JP 6683500B2
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- 238000007689 inspection Methods 0.000 title claims description 46
- 238000012545 processing Methods 0.000 title claims description 38
- 238000003384 imaging method Methods 0.000 claims description 17
- 238000005286 illumination Methods 0.000 claims description 14
- 239000012780 transparent material Substances 0.000 claims description 13
- 230000001678 irradiating effect Effects 0.000 claims description 10
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 claims description 4
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 claims description 4
- 239000002390 adhesive tape Substances 0.000 description 7
- 238000007781 pre-processing Methods 0.000 description 7
- 230000002093 peripheral effect Effects 0.000 description 5
- 238000003672 processing method Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 238000012805 post-processing Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000010897 surface acoustic wave method Methods 0.000 description 2
- 229910013641 LiNbO 3 Inorganic materials 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
- B23K26/032—Observing, e.g. monitoring, the workpiece using optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/24—Optical enhancement of defects or not directly visible states, e.g. selective electrolytic deposition, bubbles in liquids, light emission, colour change
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/56—Cameras or camera modules comprising electronic image sensors; Control thereof provided with illuminating means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/56—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26 semiconducting
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/12—Circuits of general importance; Signal processing
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/10—Image acquisition modality
- G06T2207/10004—Still image; Photographic image
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Biochemistry (AREA)
- Analytical Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- High Energy & Nuclear Physics (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Signal Processing (AREA)
- Multimedia (AREA)
- Quality & Reliability (AREA)
- Theoretical Computer Science (AREA)
- Electromagnetism (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Toxicology (AREA)
- Laser Beam Processing (AREA)
- Dicing (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Description
14:検査装置
16:照明手段
18:撮像手段
20:表示手段
32:ランダムアクセスメモリ(記憶手段)
40:レーザー加工装置
44:保持手段
46:移動手段
48:レーザー光線照射手段
50:撮像手段
52:表示手段
90:ランダムアクセスメモリ(記憶手段)
Claims (5)
- 透明材料製部材の周縁に配置され、該部材を側方から照明する照明手段と、該部材に対面して配置され、該照明手段により照明された該部材を撮像する撮像手段と、該撮像手段が撮像した画像を表示する表示手段とを含み、
該照明手段は、該部材を収容可能な内径を有する環状板と、該環状板の片面に周方向に間隔をおいて配置された複数個の光源とを有する検査装置。 - 該撮像手段が撮像した画像と、該撮像手段が撮像した画像に基づいて検出された該部材のクラックの位置とを記憶する記憶手段を更に含む、請求項1記載の検査装置。
- 請求項1又は2記載の検査装置を備えるレーザー加工装置であって、
該部材を保持する保持手段と、X方向及び該X方向に直交するY方向に該保持手段を移動させる移動手段と、該保持手段に保持された該部材にレーザー光線を照射するレーザー光線照射手段とを備えるレーザー加工装置。 - 該部材を保持した該保持手段を該移動手段が移動させつつ、該撮像手段が該部材の片面における全領域を撮像する、請求項3記載のレーザー加工装置。
- 該部材は、リチウムタンタレート又はリチウムナイオベートから形成されたウエーハである、請求項3記載のレーザー加工装置。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016032883A JP6683500B2 (ja) | 2016-02-24 | 2016-02-24 | 検査装置及びレーザー加工装置 |
TW106101029A TWI701430B (zh) | 2016-02-24 | 2017-01-12 | 檢查裝置及雷射加工裝置 |
KR1020170017600A KR102643182B1 (ko) | 2016-02-24 | 2017-02-08 | 검사 장치 및 레이저 가공 장치 |
SG10201701084YA SG10201701084YA (en) | 2016-02-24 | 2017-02-10 | Inspecting apparatus and laser processing apparatus |
CN201710098265.3A CN107121433B (zh) | 2016-02-24 | 2017-02-22 | 检查装置和激光加工装置 |
DE102017103736.5A DE102017103736A1 (de) | 2016-02-24 | 2017-02-23 | Untersuchungsvorrichtung und laserbearbeitungsvorrichtung |
US15/440,686 US10628933B2 (en) | 2016-02-24 | 2017-02-23 | Inspecting apparatus and laser processing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016032883A JP6683500B2 (ja) | 2016-02-24 | 2016-02-24 | 検査装置及びレーザー加工装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017150922A JP2017150922A (ja) | 2017-08-31 |
JP6683500B2 true JP6683500B2 (ja) | 2020-04-22 |
Family
ID=59522736
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2016032883A Active JP6683500B2 (ja) | 2016-02-24 | 2016-02-24 | 検査装置及びレーザー加工装置 |
Country Status (7)
Country | Link |
---|---|
US (1) | US10628933B2 (ja) |
JP (1) | JP6683500B2 (ja) |
KR (1) | KR102643182B1 (ja) |
CN (1) | CN107121433B (ja) |
DE (1) | DE102017103736A1 (ja) |
SG (1) | SG10201701084YA (ja) |
TW (1) | TWI701430B (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JP6935168B2 (ja) * | 2016-02-12 | 2021-09-15 | 株式会社ディスコ | 加工装置 |
JP7010633B2 (ja) * | 2017-09-19 | 2022-01-26 | ファスフォードテクノロジ株式会社 | 半導体製造装置および半導体装置の製造方法 |
US12090574B2 (en) * | 2018-01-19 | 2024-09-17 | Panasonic Holdings Corporation | Laser slicing apparatus and laser slicing method |
CN110501332A (zh) * | 2018-05-18 | 2019-11-26 | 苏州汉扬精密电子有限公司 | 顶针的检测结构 |
JP7290449B2 (ja) * | 2019-04-03 | 2023-06-13 | 株式会社ディスコ | 超高速度撮像装置 |
CN111007080B (zh) * | 2019-12-25 | 2022-07-12 | 成都先进功率半导体股份有限公司 | 一种晶圆裂纹检查装置 |
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2016
- 2016-02-24 JP JP2016032883A patent/JP6683500B2/ja active Active
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2017
- 2017-01-12 TW TW106101029A patent/TWI701430B/zh active
- 2017-02-08 KR KR1020170017600A patent/KR102643182B1/ko active IP Right Grant
- 2017-02-10 SG SG10201701084YA patent/SG10201701084YA/en unknown
- 2017-02-22 CN CN201710098265.3A patent/CN107121433B/zh active Active
- 2017-02-23 US US15/440,686 patent/US10628933B2/en active Active
- 2017-02-23 DE DE102017103736.5A patent/DE102017103736A1/de active Pending
Also Published As
Publication number | Publication date |
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US20170243341A1 (en) | 2017-08-24 |
CN107121433B (zh) | 2021-08-27 |
TW201740105A (zh) | 2017-11-16 |
TWI701430B (zh) | 2020-08-11 |
US10628933B2 (en) | 2020-04-21 |
KR20170099761A (ko) | 2017-09-01 |
CN107121433A (zh) | 2017-09-01 |
DE102017103736A1 (de) | 2017-08-24 |
JP2017150922A (ja) | 2017-08-31 |
SG10201701084YA (en) | 2017-09-28 |
KR102643182B1 (ko) | 2024-03-04 |
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