JP6637515B2 - 半導体オン・インシュレータ構造の製造において使用するための熱的に安定した電荷トラップ層 - Google Patents
半導体オン・インシュレータ構造の製造において使用するための熱的に安定した電荷トラップ層 Download PDFInfo
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- JP6637515B2 JP6637515B2 JP2017549081A JP2017549081A JP6637515B2 JP 6637515 B2 JP6637515 B2 JP 6637515B2 JP 2017549081 A JP2017549081 A JP 2017549081A JP 2017549081 A JP2017549081 A JP 2017549081A JP 6637515 B2 JP6637515 B2 JP 6637515B2
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- single crystal
- crystal semiconductor
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- semiconductor handle
- silicon
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- 239000012212 insulator Substances 0.000 title description 42
- 238000004519 manufacturing process Methods 0.000 title description 22
- 239000004065 semiconductor Substances 0.000 claims description 250
- 239000000758 substrate Substances 0.000 claims description 201
- 239000013078 crystal Substances 0.000 claims description 188
- 239000011148 porous material Substances 0.000 claims description 100
- 238000000034 method Methods 0.000 claims description 97
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 52
- 229910052710 silicon Inorganic materials 0.000 claims description 52
- 239000010703 silicon Substances 0.000 claims description 52
- 239000000463 material Substances 0.000 claims description 42
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 38
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 25
- 238000003776 cleavage reaction Methods 0.000 claims description 21
- 230000007017 scission Effects 0.000 claims description 21
- 238000005530 etching Methods 0.000 claims description 20
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 20
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 19
- 229910052760 oxygen Inorganic materials 0.000 claims description 19
- 239000001301 oxygen Substances 0.000 claims description 19
- 239000000377 silicon dioxide Substances 0.000 claims description 18
- 235000012239 silicon dioxide Nutrition 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 13
- 238000011049 filling Methods 0.000 claims description 10
- 239000012298 atmosphere Substances 0.000 claims description 8
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 7
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 7
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims description 6
- 238000005304 joining Methods 0.000 claims description 6
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 claims description 6
- 230000001590 oxidative effect Effects 0.000 claims description 6
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 5
- 238000002048 anodisation reaction Methods 0.000 claims description 5
- 239000003792 electrolyte Substances 0.000 claims description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 3
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 3
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 3
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 3
- 238000007743 anodising Methods 0.000 claims description 2
- 238000010276 construction Methods 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 172
- 239000010410 layer Substances 0.000 description 144
- 239000010408 film Substances 0.000 description 23
- 230000003647 oxidation Effects 0.000 description 19
- 238000007254 oxidation reaction Methods 0.000 description 19
- 230000008569 process Effects 0.000 description 16
- 229910021426 porous silicon Inorganic materials 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 239000002131 composite material Substances 0.000 description 12
- 238000012546 transfer Methods 0.000 description 12
- 238000004140 cleaning Methods 0.000 description 11
- 150000002500 ions Chemical class 0.000 description 11
- 238000000137 annealing Methods 0.000 description 10
- 238000005229 chemical vapour deposition Methods 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 9
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 9
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 9
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 9
- 239000002019 doping agent Substances 0.000 description 8
- 238000002513 implantation Methods 0.000 description 8
- 230000003071 parasitic effect Effects 0.000 description 8
- 238000000151 deposition Methods 0.000 description 7
- 235000019441 ethanol Nutrition 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 7
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 229910052733 gallium Inorganic materials 0.000 description 6
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- 229910010271 silicon carbide Inorganic materials 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 229910052796 boron Inorganic materials 0.000 description 5
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 4
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 4
- 238000001994 activation Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052785 arsenic Inorganic materials 0.000 description 4
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 229910052732 germanium Inorganic materials 0.000 description 4
- 229910052734 helium Chemical group 0.000 description 4
- 239000007943 implant Substances 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000011574 phosphorus Substances 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- 238000005411 Van der Waals force Methods 0.000 description 3
- KXNLCSXBJCPWGL-UHFFFAOYSA-N [Ga].[As].[In] Chemical compound [Ga].[As].[In] KXNLCSXBJCPWGL-UHFFFAOYSA-N 0.000 description 3
- 230000004913 activation Effects 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000001307 helium Chemical group 0.000 description 3
- 230000001965 increasing effect Effects 0.000 description 3
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 3
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 3
- 238000000678 plasma activation Methods 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- 241000252506 Characiformes Species 0.000 description 2
- 229910000927 Ge alloy Inorganic materials 0.000 description 2
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 238000002109 crystal growth method Methods 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- -1 helium ions Chemical class 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 230000005527 interface trap Effects 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- 239000011856 silicon-based particle Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 1
- QYKABQMBXCBINA-UHFFFAOYSA-N 4-(oxan-2-yloxy)benzaldehyde Chemical compound C1=CC(C=O)=CC=C1OC1OCCCC1 QYKABQMBXCBINA-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 229910002601 GaN Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- LUXIMSHPDKSEDK-UHFFFAOYSA-N bis(disilanyl)silane Chemical compound [SiH3][SiH2][SiH2][SiH2][SiH3] LUXIMSHPDKSEDK-UHFFFAOYSA-N 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- 239000007833 carbon precursor Substances 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- VJTAZCKMHINUKO-UHFFFAOYSA-M chloro(2-methoxyethyl)mercury Chemical compound [Cl-].COCC[Hg+] VJTAZCKMHINUKO-UHFFFAOYSA-M 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- BUMGIEFFCMBQDG-UHFFFAOYSA-N dichlorosilicon Chemical compound Cl[Si]Cl BUMGIEFFCMBQDG-UHFFFAOYSA-N 0.000 description 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000010981 drying operation Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 229910021478 group 5 element Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 230000005660 hydrophilic surface Effects 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- XCLKKWIIZMHQIV-UHFFFAOYSA-N isobutylgermane Chemical compound CC(C)C[Ge] XCLKKWIIZMHQIV-UHFFFAOYSA-N 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 230000005226 mechanical processes and functions Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- APOOHHZPEUGNQX-UHFFFAOYSA-N n-methyl-n-trichlorogermylmethanamine Chemical compound CN(C)[Ge](Cl)(Cl)Cl APOOHHZPEUGNQX-UHFFFAOYSA-N 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000000082 organogermanium group Chemical group 0.000 description 1
- 238000007745 plasma electrolytic oxidation reaction Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000005389 semiconductor device fabrication Methods 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000012686 silicon precursor Substances 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 239000003351 stiffener Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000000699 topical effect Effects 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- VEDJZFSRVVQBIL-UHFFFAOYSA-N trisilane Chemical compound [SiH3][SiH2][SiH3] VEDJZFSRVVQBIL-UHFFFAOYSA-N 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
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-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76264—SOI together with lateral isolation, e.g. using local oxidation of silicon, or dielectric or polycristalline material refilled trench or air gap isolation regions, e.g. completely isolated semiconductor islands
- H01L21/7627—Vertical isolation by full isolation by porous oxide silicon, i.e. FIPOS techniques
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
- H01L21/0203—Making porous regions on the surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
- H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
- H01L21/02236—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
- H01L21/02238—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/02258—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by anodic treatment, e.g. anodic oxidation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76251—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques
- H01L21/76254—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques with separation/delamination along an ion implanted layer, e.g. Smart-cut, Unibond
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76264—SOI together with lateral isolation, e.g. using local oxidation of silicon, or dielectric or polycristalline material refilled trench or air gap isolation regions, e.g. completely isolated semiconductor islands
- H01L21/76286—Lateral isolation by refilling of trenches with polycristalline material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1203—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body the substrate comprising an insulating body on a semiconductor body, e.g. SOI
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Description
であり、粗さプロファイルは、トレースに沿って規則的に等間隔に配置された点を含み、yiは、平均線からデータポイントまでの垂直距離である。
Claims (57)
- その一方が単結晶半導体ハンドル基板の表面であり、他方が前記単結晶半導体ハンドル基板の裏面である2つの主要な、ほぼ平行な面と、
前記単結晶半導体ハンドル基板の前記表面と前記裏面を接合する外縁と、
前記単結晶半導体ハンドル基板の前記表面から前記裏面に向かって延びた表面領域であって、前記表面から前記裏面に向かって測定された深さDを有する表面領域と、
前記単結晶半導体ハンドル基板の前記表面と前記裏面の間のバルク領域と、
を含む単結晶半導体ハンドル基板であって、
前記表面領域は、それぞれ底面と側壁面を含む細孔を含み、
更に、細孔は、多結晶半導体材料で充填されている、
単結晶半導体ハンドル基板と、
前記単結晶半導体ハンドル基板の前記表面に接触している誘電体層と、
前記誘電体層に接触している単結晶半導体デバイス層と、
を含む多層構造。 - 前記単結晶半導体ハンドル基板は、シリコンを含む請求項1に記載の多層構造。
- 前記単結晶半導体デバイス層は、単結晶シリコンを含む請求項1に記載の多層構造。
- 前記単結晶半導体ハンドル基板は、約500Ω・cm〜約100,000Ω・cmのバルク抵抗率を有する請求項1に記載の多層構造。
- 前記単結晶半導体ハンドル基板は、約1000Ω・cm〜約100,000Ω・cmのバルク抵抗率を有する請求項1に記載の多層構造。
- 前記単結晶半導体ハンドル基板は、約1000Ω・cm〜約10,000Ω・cmのバルク抵抗率を有する請求項1に記載の多層構造。
- 前記単結晶半導体ハンドル基板は、約2000Ω・cm〜約10,000Ω・cmのバルク抵抗率を有する請求項1に記載の多層構造。
- 前記単結晶半導体ハンドル基板は、約3000Ω・cm〜約10,000Ω・cmのバルク抵抗率を有する請求項1に記載の多層構造。
- 前記単結晶半導体ハンドル基板は、約3000Ω・cm〜約5,000Ω・cmのバルク抵抗率を有する請求項1に記載の多層構造。
- 前記単結晶半導体ハンドル基板の前記表面領域は、約0.1マイクロメートル〜約50マイクロメートルの深さDを有する請求項1に記載の多層構造。
- 前記単結晶半導体ハンドル基板の前記表面領域は、前記単結晶半導体ハンドル基板の前記表面から前記細孔の底面に向かって測定して、約0.3マイクロメートル〜約20マイクロメートル、約1マイクロメートル〜約10マイクロメートル、または約1マイクロメートル〜約5マイクロメートルの深さDを有する請求項1に記載の多層構造。
- 前記単結晶半導体ハンドル基板の前記表面領域は、約5%〜約80%の細孔密度で、細孔を含む請求項1に記載の多層構造。
- 前記単結晶半導体ハンドル基板の前記表面領域は、約5%〜約50%の細孔密度で、細孔を含む請求項1に記載の多層構造。
- 前記細孔は、前記単結晶半導体ハンドル基板の前記表面から前記細孔の底面に向かって測定して、約1マイクロメートル〜約10マイクロメートルの平均深さを有する請求項1に記載の多層構造。
- 前記細孔は、前記単結晶半導体ハンドル基板の前記表面から前記細孔の底面に向かって測定して、約1マイクロメートル〜約5マイクロメートルの平均深さを有する請求項1に記載の多層構造。
- 前記細孔は、前記細孔の側壁に沿った任意の点で測定して、約1ナノメートル〜約1000ナノメートルの平均直径を有する請求項1に記載の多層構造。
- 前記細孔は、前記細孔の側壁に沿った任意の点で測定して、約2ナノメートル〜約200ナノメートルの平均直径を有する請求項1に記載の多層構造。
- 前記細孔のそれぞれの前記底面と側壁は、半導体酸化膜を含む請求項1に記載の多層構造。
- 前記多結晶半導体材料は、多結晶シリコンである請求項1に記載の多層構造。
- 前記誘電体層は、二酸化シリコン、窒化シリコン、酸窒化シリコン、酸化ハフニウム、酸化チタン、酸化ジルコニウム、酸化ランタン、酸化バリウム、およびそれらの組合せから成るグループから選択された材料を含む請求項1に記載の多層構造。
- 前記誘電体層は、二酸化シリコン、酸窒化シリコン、窒化シリコン、およびそれらの全ての組合せから成るグループから選択された材料を含む請求項1に記載の多層構造。
- 前記誘電体層は、複数の層を含み、該複数の層内の各絶縁層は、二酸化シリコン、酸窒化シリコン、および窒化シリコンから成るグループから選択された材料を含む請求項1に記載の多層構造。
- 前記誘電体層は、10ナノメートル〜10,000ナノメートルの厚さを有する埋め込み酸化物層を含む請求項1に記載の多層構造。
- 前記誘電体層は、二酸化シリコンを含む請求項1に記載の多層構造。
- 前記二酸化シリコンは、10ナノメートル〜10,000ナノメートルの厚さを有する請求項24に記載の多層構造。
- 単結晶半導体ハンドル基板の表面をエッチング溶液に接触させ、それによって前記単結晶半導体ハンドル基板の表面領域の中に細孔をエッチングするステップであって、
前記単結晶半導体ハンドル基板は、
その一方が前記単結晶半導体ハンドル基板の前記表面であり、他方が前記単結晶半導体ハンドル基板の裏面である2つの主要な、ほぼ平行な面と、
前記単結晶半導体ハンドル基板の前記表面と前記裏面を接合する外縁と、
前記単結晶半導体ハンドル基板の前記表面と前記裏面の間のバルク領域と、を含み、
前記表面領域は、前記単結晶半導体ハンドル基板の前記表面から前記裏面に向かって延び、前記表面から前記裏面に向かって測定された深さDを有し、
前記細孔のそれぞれは、底面と側壁面とを含む、ステップと、
前記細孔のそれぞれの前記底面と前記側壁面とを酸化させるステップと、
酸化された前記底面と酸化された前記側壁面とを有する前記細孔のそれぞれを、アモルファス半導体材料、多結晶半導体材料、または半導体酸化物で充填するステップと、
単結晶半導体ドナー基板の表面上の誘電体層を前記単結晶半導体ハンドル基板の前記表面に接合し、それによって接合構造を形成するステップであって、
前記単結晶半導体ドナー基板は、
その一方が前記単結晶半導体ドナー基板の前記表面であり、他方が前記単結晶半導体ドナー基板の裏面である2つの主要な、ほぼ平行な面と、
前記単結晶半導体ドナー基板の前記表面と前記裏面を接合する外縁と、を含むステップと、
を含み、多層構造を形成する方法。 - 前記単結晶半導体ハンドル基板は、シリコンを含む請求項26に記載の方法。
- 前記単結晶半導体ハンドル基板は、チョクラルスキー法またはフローティングゾーン法によって成長した単結晶シリコンインゴットからスライスされたシリコンウエハを含む請求項26に記載の方法。
- 前記単結晶半導体ドナー基板は、単結晶シリコンを含む請求項26に記載の方法。
- 前記単結晶半導体ドナー基板は、チョクラルスキー法またはフローティングゾーン法によって成長した単結晶シリコンインゴットからスライスされた単結晶シリコンウエハである請求項26に記載の方法。
- 前記単結晶半導体ハンドル基板は、約500Ω・cm〜約100,000Ω・cmのバルク抵抗率を有する請求項26に記載の方法。
- 前記単結晶半導体ハンドル基板は、約1000Ω・cm〜約100,000Ω・cmのバルク抵抗率を有する請求項26に記載の方法。
- 前記単結晶半導体ハンドル基板は、約1000Ω・cm〜約10,000Ω・cmのバルク抵抗率を有する請求項26に記載の方法。
- 前記単結晶半導体ハンドル基板は、約2000Ω・cm〜約10,000Ω・cmのバルク抵抗率を有する請求項26に記載の方法。
- 前記単結晶半導体ハンドル基板は、約3000Ω・cm〜約10,000Ω・cmのバルク抵抗率を有する請求項26に記載の方法。
- 前記単結晶半導体ハンドル基板は、約3000Ω・cm〜約5000Ω・cmのバルク抵抗率を有する請求項26に記載の方法。
- 前記単結晶半導体ハンドル基板の前記表面領域は、約5%〜約80%の細孔密度にエッチングされた請求項26に記載の方法。
- 前記単結晶半導体ハンドル基板の前記表面領域は、約5%〜約50%の細孔密度にエッチングされた請求項26に記載の方法。
- 前記単結晶半導体ハンドル基板の前記表面領域は、前記単結晶半導体ハンドル基板の前記表面から前記細孔の底面に向かって測定して、約1マイクロメートル〜約10マイクロメートルの平均深さまで前記細孔をエッチングするのに十分な時間、エッチング溶液に接触する請求項26に記載の方法。
- 前記単結晶半導体ハンドル基板の前記表面領域は、前記単結晶半導体ハンドル基板の前記表面から前記細孔の底面に向かって測定して、約1マイクロメートル〜約5マイクロメートルの平均深さまで前記細孔をエッチングするのに十分な時間、エッチング溶液に接触する請求項26に記載の方法。
- 前記単結晶半導体ハンドル基板の前記表面領域は、前記細孔の側壁に沿った任意の点で測定して、約1ナノメートル〜約1000ナノメートルの平均直径まで前記細孔をエッチングするのに十分な時間、エッチング溶液に接触する請求項26に記載の方法。
- 前記単結晶半導体ハンドル基板の前記表面領域は、前記細孔の側壁に沿った任意の点で測定して、約2ナノメートル〜約200ナノメートルの平均直径まで前記細孔をエッチングするのに十分な時間、エッチング溶液に接触する請求項26に記載の方法。
- 前記単結晶半導体ハンドル基板の前記表面領域は、エッチングの後に乾燥される請求項26に記載の方法。
- 前記細孔のそれぞれの前記底面と前記側壁面は、前記表面領域の中に前記細孔を含む前記単結晶半導体ハンドル基板を、酸素を含む周囲雰囲気に接触させることによって、酸化される請求項26に記載の方法。
- 酸素を含む前記周囲雰囲気は、空気である請求項44に記載の方法。
- 前記細孔のそれぞれの前記底面と前記側壁面は、陽極酸化によって酸化される請求項26に記載の方法。
- 陽極酸化は、硫酸を含む陽極酸化電解液中で起こる請求項46に記載の方法。
- 前記細孔は、アモルファス半導体材料で充填される請求項26に記載の方法。
- 前記細孔は、アモルファスシリコンで充填される請求項26に記載の方法。
- 前記細孔は、多結晶半導体材料で充填される請求項26に記載の方法。
- 前記細孔は、多結晶シリコンで充填される請求項26に記載の方法。
- 前記細孔は、半導体酸化物で充填される請求項26に記載の方法。
- 前記細孔は、二酸化シリコンで充填される請求項26に記載の方法。
- 前記半導体ドナー基板の前記誘電体層と前記半導体ハンドル基板の前記表面上の前記半導体酸化物との間の接合を強化するのに十分な温度と時間、前記接合構造を加熱するステップを更に含む請求項26に記載の方法。
- 前記単結晶半導体ドナー基板は、劈開面を含む請求項26に記載の方法。
- 前記接合構造を前記単結晶半導体ドナー基板の前記劈開面で機械的に劈開し、それによって前記単結晶半導体ハンドル基板と、前記単結晶半導体ハンドル基板の前記表面領域に接触した前記誘電体層と、該誘電体層に接触した単結晶半導体デバイス層と、を含む劈開構造を製造するステップを更に含む請求項55に記載の方法。
- 前記単結晶半導体デバイス層と前記単結晶半導体ハンドル基板との間の接合を強化するのに十分な温度と時間、前記劈開構造を加熱するステップを更に含む請求項56に記載の方法。
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- 2016-03-11 CN CN201680015930.1A patent/CN107408532A/zh active Pending
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CN107408532A (zh) | 2017-11-28 |
WO2016149113A1 (en) | 2016-09-22 |
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US10290533B2 (en) | 2019-05-14 |
TW201705382A (zh) | 2017-02-01 |
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