JP6588346B2 - エポキシ樹脂、反応性カルボキシレート化合物、それを用いた硬化型樹脂組成物、およびその用途 - Google Patents
エポキシ樹脂、反応性カルボキシレート化合物、それを用いた硬化型樹脂組成物、およびその用途 Download PDFInfo
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- JP6588346B2 JP6588346B2 JP2016009500A JP2016009500A JP6588346B2 JP 6588346 B2 JP6588346 B2 JP 6588346B2 JP 2016009500 A JP2016009500 A JP 2016009500A JP 2016009500 A JP2016009500 A JP 2016009500A JP 6588346 B2 JP6588346 B2 JP 6588346B2
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- compound
- reactive
- epoxy
- active energy
- resin composition
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
- C08G59/245—Di-epoxy compounds carbocyclic aromatic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
- C08G59/1455—Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
- C08G59/1455—Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
- C08G59/1461—Unsaturated monoacids
- C08G59/1466—Acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
- C08G59/621—Phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Emergency Medicine (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Epoxy Resins (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Materials For Photolithography (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020170003339A KR102567797B1 (ko) | 2016-01-14 | 2017-01-10 | 에폭시 수지, 반응성 에폭시카복실레이트 화합물, 반응성 폴리카본산 화합물, 및 활성 에너지선 경화형 수지 조성물 및 그의 용도 |
CN201710020382.8A CN107022062B (zh) | 2016-01-14 | 2017-01-11 | 环氧树脂、反应性环氧羧酸酯化合物、反应性多元羧酸化合物、树脂组合物、硬化物、物品 |
TW106101176A TWI699381B (zh) | 2016-01-14 | 2017-01-13 | 環氧樹脂、反應性羧酸酯化合物、使用該化合物之硬化型樹脂組成物及其用途 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016004985 | 2016-01-14 | ||
JP2016004985 | 2016-01-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017128671A JP2017128671A (ja) | 2017-07-27 |
JP6588346B2 true JP6588346B2 (ja) | 2019-10-09 |
Family
ID=59396090
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016009500A Active JP6588346B2 (ja) | 2016-01-14 | 2016-01-21 | エポキシ樹脂、反応性カルボキシレート化合物、それを用いた硬化型樹脂組成物、およびその用途 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6588346B2 (zh) |
KR (1) | KR102567797B1 (zh) |
CN (1) | CN107022062B (zh) |
TW (1) | TWI699381B (zh) |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2877659B2 (ja) | 1993-05-10 | 1999-03-31 | 日本化薬株式会社 | レジストインキ組成物及びその硬化物 |
JP3476027B2 (ja) * | 1994-04-28 | 2003-12-10 | 日本化薬株式会社 | エポキシ樹脂の製造方法 |
JPH11140144A (ja) | 1997-11-04 | 1999-05-25 | Nippon Kayaku Co Ltd | 樹脂組成物及びその硬化物 |
JP4561062B2 (ja) | 2003-08-07 | 2010-10-13 | 三菱化学株式会社 | カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、及び液晶表示装置 |
TWI415911B (zh) * | 2005-07-13 | 2013-11-21 | Ube Industries | 伸聯苯交聯酚醛清漆樹脂及其用途 |
WO2007132724A1 (ja) * | 2006-05-11 | 2007-11-22 | Nippon Kayaku Kabushiki Kaisha | 反応性カルボキシレート化合物、それを用いた硬化型樹脂組成物、およびその用途 |
KR101484661B1 (ko) * | 2007-08-21 | 2015-01-20 | 니폰 가야꾸 가부시끼가이샤 | 반응성 카르복실레이트 화합물, 이를 이용한 활성 에너지선 경화형 수지 조성물 및 그 용도 |
JP5279214B2 (ja) * | 2007-08-21 | 2013-09-04 | 日本化薬株式会社 | 反応性カルボキシレート化合物、それを用いた活性エネルギー線硬化型樹脂組成物、およびその用途 |
WO2009028479A1 (ja) * | 2007-08-28 | 2009-03-05 | Nippon Kayaku Kabushiki Kaisha | 反応性カルボキシレート化合物、それを用いた硬化型樹脂組成物、およびその用途 |
JP5754731B2 (ja) * | 2011-08-25 | 2015-07-29 | 明和化成株式会社 | エポキシ樹脂、エポキシ樹脂の製造方法、及びその使用 |
KR101639927B1 (ko) * | 2012-03-16 | 2016-07-14 | 스미또모 베이크라이트 가부시키가이샤 | 밀봉용 수지 조성물 및 이것을 사용하는 전자 장치 |
JP6025245B2 (ja) * | 2012-07-04 | 2016-11-16 | 日本化薬株式会社 | 新規エポキシカルボキシレート化合物、その誘導体、それを含有する活性エネルギー線硬化型樹脂組成物及びその硬化物 |
CN103897143B (zh) * | 2012-12-28 | 2018-05-01 | 明和化成株式会社 | 环氧树脂、环氧树脂的制造方法及其使用 |
-
2016
- 2016-01-21 JP JP2016009500A patent/JP6588346B2/ja active Active
-
2017
- 2017-01-10 KR KR1020170003339A patent/KR102567797B1/ko active IP Right Grant
- 2017-01-11 CN CN201710020382.8A patent/CN107022062B/zh active Active
- 2017-01-13 TW TW106101176A patent/TWI699381B/zh active
Also Published As
Publication number | Publication date |
---|---|
KR102567797B1 (ko) | 2023-08-22 |
JP2017128671A (ja) | 2017-07-27 |
TW201739782A (zh) | 2017-11-16 |
CN107022062B (zh) | 2020-05-08 |
KR20170085439A (ko) | 2017-07-24 |
CN107022062A (zh) | 2017-08-08 |
TWI699381B (zh) | 2020-07-21 |
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