JP6561821B2 - 絶縁膜形成用組成物およびそれを用いたゲート絶縁膜 - Google Patents

絶縁膜形成用組成物およびそれを用いたゲート絶縁膜

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Publication number
JP6561821B2
JP6561821B2 JP2015245747A JP2015245747A JP6561821B2 JP 6561821 B2 JP6561821 B2 JP 6561821B2 JP 2015245747 A JP2015245747 A JP 2015245747A JP 2015245747 A JP2015245747 A JP 2015245747A JP 6561821 B2 JP6561821 B2 JP 6561821B2
Authority
JP
Japan
Prior art keywords
meth
vinyl
ether
acrylate
insulating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2015245747A
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English (en)
Japanese (ja)
Other versions
JP2017112234A5 (enExample
JP2017112234A (ja
Inventor
努 廣嶋
努 廣嶋
晃太郎 水野
晃太郎 水野
猛 吉川
猛 吉川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Artience Co Ltd
Original Assignee
Toyo Ink SC Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Ink SC Holdings Co Ltd filed Critical Toyo Ink SC Holdings Co Ltd
Priority to JP2015245747A priority Critical patent/JP6561821B2/ja
Publication of JP2017112234A publication Critical patent/JP2017112234A/ja
Publication of JP2017112234A5 publication Critical patent/JP2017112234A5/ja
Application granted granted Critical
Publication of JP6561821B2 publication Critical patent/JP6561821B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Electroluminescent Light Sources (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Formation Of Insulating Films (AREA)
  • Thin Film Transistor (AREA)
  • Organic Insulating Materials (AREA)
  • Insulating Bodies (AREA)
JP2015245747A 2015-12-17 2015-12-17 絶縁膜形成用組成物およびそれを用いたゲート絶縁膜 Expired - Fee Related JP6561821B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2015245747A JP6561821B2 (ja) 2015-12-17 2015-12-17 絶縁膜形成用組成物およびそれを用いたゲート絶縁膜

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015245747A JP6561821B2 (ja) 2015-12-17 2015-12-17 絶縁膜形成用組成物およびそれを用いたゲート絶縁膜

Publications (3)

Publication Number Publication Date
JP2017112234A JP2017112234A (ja) 2017-06-22
JP2017112234A5 JP2017112234A5 (enExample) 2018-09-13
JP6561821B2 true JP6561821B2 (ja) 2019-08-21

Family

ID=59081773

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015245747A Expired - Fee Related JP6561821B2 (ja) 2015-12-17 2015-12-17 絶縁膜形成用組成物およびそれを用いたゲート絶縁膜

Country Status (1)

Country Link
JP (1) JP6561821B2 (enExample)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62516A (ja) * 1985-06-26 1987-01-06 Canon Inc 活性エネルギ−線硬化型樹脂組成物
JP2003048929A (ja) * 2001-05-29 2003-02-21 Nippon Shokubai Co Ltd 硬化性樹脂組成物
JP2004300375A (ja) * 2003-04-01 2004-10-28 Showa Highpolymer Co Ltd エポキシ樹脂組成物およびその硬化物
JP2011228678A (ja) * 2010-04-01 2011-11-10 Sumitomo Chemical Co Ltd フッ素系有機化合物溶媒を含む有機薄膜トランジスタ絶縁層用組成物
WO2011162001A1 (ja) * 2010-06-23 2011-12-29 旭硝子株式会社 硬化性組成物および硬化膜の製造方法
JP2012195580A (ja) * 2011-03-03 2012-10-11 Mitsubishi Chemicals Corp 電界効果トランジスタのゲート絶縁層用組成物、ゲート絶縁層、電界効果トランジスタ及び表示パネル
JP2013214649A (ja) * 2012-04-03 2013-10-17 Asahi Glass Co Ltd 半導体装置およびその製造方法
JP6369023B2 (ja) * 2014-01-08 2018-08-08 東洋インキＳｃホールディングス株式会社 反応性モノマーおよびそれを用いてなる樹脂組成物

Also Published As

Publication number Publication date
JP2017112234A (ja) 2017-06-22

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