JP6549578B2 - 金属−配位子錯体、それに由来するオレフィン重合触媒、及びその触媒を利用したオレフィン重合方法 - Google Patents
金属−配位子錯体、それに由来するオレフィン重合触媒、及びその触媒を利用したオレフィン重合方法 Download PDFInfo
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- JP6549578B2 JP6549578B2 JP2016536150A JP2016536150A JP6549578B2 JP 6549578 B2 JP6549578 B2 JP 6549578B2 JP 2016536150 A JP2016536150 A JP 2016536150A JP 2016536150 A JP2016536150 A JP 2016536150A JP 6549578 B2 JP6549578 B2 JP 6549578B2
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- hydrocarbyl
- heterohydrocarbylene
- hydrocarbylene
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- solution
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- 239000003446 ligand Substances 0.000 title claims description 76
- 239000003054 catalyst Substances 0.000 title claims description 52
- 150000001336 alkenes Chemical class 0.000 title claims description 47
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 title claims description 44
- 238000006116 polymerization reaction Methods 0.000 title claims description 25
- 239000002685 polymerization catalyst Substances 0.000 title claims description 10
- 238000000034 method Methods 0.000 title description 24
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 133
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 123
- 125000000743 hydrocarbylene group Chemical group 0.000 claims description 82
- 229910052757 nitrogen Inorganic materials 0.000 claims description 64
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 33
- 239000001257 hydrogen Substances 0.000 claims description 33
- 229910052739 hydrogen Inorganic materials 0.000 claims description 33
- 229920000098 polyolefin Polymers 0.000 claims description 28
- 229910052751 metal Inorganic materials 0.000 claims description 23
- 239000002184 metal Substances 0.000 claims description 23
- 230000004913 activation Effects 0.000 claims description 21
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 19
- 125000001624 naphthyl group Chemical group 0.000 claims description 18
- 229910052726 zirconium Inorganic materials 0.000 claims description 18
- 229910052735 hafnium Inorganic materials 0.000 claims description 15
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 12
- 230000003647 oxidation Effects 0.000 claims description 11
- 238000007254 oxidation reaction Methods 0.000 claims description 11
- 229910052717 sulfur Inorganic materials 0.000 claims description 10
- 229910052736 halogen Inorganic materials 0.000 claims description 9
- 150000002367 halogens Chemical class 0.000 claims description 9
- 230000007935 neutral effect Effects 0.000 claims description 8
- 239000003426 co-catalyst Substances 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 239000002879 Lewis base Substances 0.000 claims description 5
- 125000000129 anionic group Chemical group 0.000 claims description 5
- 239000012634 fragment Substances 0.000 claims description 5
- 150000007527 lewis bases Chemical class 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
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- 125000006658 (C1-C15) hydrocarbyl group Chemical group 0.000 claims description 4
- 239000007795 chemical reaction product Substances 0.000 claims description 4
- 125000001424 substituent group Chemical group 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 229910052698 phosphorus Inorganic materials 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 2
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 claims 1
- 125000001145 hydrido group Chemical group *[H] 0.000 claims 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 261
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 204
- 239000000243 solution Substances 0.000 description 197
- 239000007787 solid Substances 0.000 description 83
- UHOVQNZJYSORNB-MZWXYZOWSA-N benzene-d6 Chemical compound [2H]C1=C([2H])C([2H])=C([2H])C([2H])=C1[2H] UHOVQNZJYSORNB-MZWXYZOWSA-N 0.000 description 82
- -1 hydrocarbon radical Chemical class 0.000 description 82
- 238000006243 chemical reaction Methods 0.000 description 52
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 48
- 230000015572 biosynthetic process Effects 0.000 description 48
- 239000000463 material Substances 0.000 description 48
- 239000003921 oil Substances 0.000 description 48
- 235000019198 oils Nutrition 0.000 description 48
- 239000000047 product Substances 0.000 description 46
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 44
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 41
- 238000003786 synthesis reaction Methods 0.000 description 41
- 238000003756 stirring Methods 0.000 description 33
- 239000000203 mixture Substances 0.000 description 27
- 239000003039 volatile agent Substances 0.000 description 25
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 24
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 22
- 125000003118 aryl group Chemical group 0.000 description 22
- 238000002390 rotary evaporation Methods 0.000 description 22
- 238000002360 preparation method Methods 0.000 description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 21
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 20
- 239000005977 Ethylene Substances 0.000 description 20
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 235000019439 ethyl acetate Nutrition 0.000 description 18
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 description 16
- 125000004432 carbon atom Chemical group C* 0.000 description 16
- 239000013078 crystal Substances 0.000 description 16
- 238000010992 reflux Methods 0.000 description 16
- 239000002904 solvent Substances 0.000 description 16
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 15
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 15
- 125000000217 alkyl group Chemical group 0.000 description 15
- 125000002947 alkylene group Chemical group 0.000 description 14
- ATDGTVJJHBUTRL-UHFFFAOYSA-N cyanogen bromide Chemical compound BrC#N ATDGTVJJHBUTRL-UHFFFAOYSA-N 0.000 description 14
- 239000000725 suspension Substances 0.000 description 14
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 13
- 235000010210 aluminium Nutrition 0.000 description 13
- 125000004474 heteroalkylene group Chemical group 0.000 description 13
- 229910052782 aluminium Inorganic materials 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical class [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 12
- 238000003818 flash chromatography Methods 0.000 description 12
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 12
- 239000004711 α-olefin Substances 0.000 description 12
- 239000008346 aqueous phase Substances 0.000 description 11
- 239000012141 concentrate Substances 0.000 description 11
- 229920000642 polymer Polymers 0.000 description 11
- 0 C*=C([*@@](C=C1)c2c(C)cccc2C)[*@]1c1c(C)cccc1C Chemical compound C*=C([*@@](C=C1)c2c(C)cccc2C)[*@]1c1c(C)cccc1C 0.000 description 10
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 10
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 10
- 239000000741 silica gel Substances 0.000 description 10
- 229910002027 silica gel Inorganic materials 0.000 description 10
- QWUWMCYKGHVNAV-UHFFFAOYSA-N 1,2-dihydrostilbene Chemical group C=1C=CC=CC=1CCC1=CC=CC=C1 QWUWMCYKGHVNAV-UHFFFAOYSA-N 0.000 description 9
- 239000012267 brine Substances 0.000 description 9
- 239000012299 nitrogen atmosphere Substances 0.000 description 9
- 239000012044 organic layer Substances 0.000 description 9
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 9
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 8
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- 238000007792 addition Methods 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 125000005842 heteroatom Chemical group 0.000 description 8
- 125000000592 heterocycloalkyl group Chemical group 0.000 description 8
- 229930195733 hydrocarbon Natural products 0.000 description 8
- 239000012074 organic phase Substances 0.000 description 8
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Chemical compound ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 description 8
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical compound [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 description 8
- 239000004215 Carbon black (E152) Substances 0.000 description 7
- 239000000178 monomer Substances 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- 239000002244 precipitate Substances 0.000 description 7
- 150000003254 radicals Chemical class 0.000 description 7
- OBAJXDYVZBHCGT-UHFFFAOYSA-N tris(pentafluorophenyl)borane Chemical class FC1=C(F)C(F)=C(F)C(F)=C1B(C=1C(=C(F)C(F)=C(F)C=1F)F)C1=C(F)C(F)=C(F)C(F)=C1F OBAJXDYVZBHCGT-UHFFFAOYSA-N 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- 230000003213 activating effect Effects 0.000 description 6
- 239000003638 chemical reducing agent Substances 0.000 description 6
- 125000000753 cycloalkyl group Chemical group 0.000 description 6
- 238000002330 electrospray ionisation mass spectrometry Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 125000001072 heteroaryl group Chemical group 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 239000011541 reaction mixture Substances 0.000 description 6
- 229920006395 saturated elastomer Polymers 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 6
- YNSZTSXGISXCSA-UHFFFAOYSA-N 1-(2-phenoxyphenyl)-3-(2,4,6-trimethylphenyl)imidazolidin-2-imine Chemical compound CC1=CC(C)=C(N2CCN(C2=N)C2=C(OC3=CC=CC=C3)C=CC=C2)C(C)=C1 YNSZTSXGISXCSA-UHFFFAOYSA-N 0.000 description 5
- 239000002841 Lewis acid Substances 0.000 description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 5
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- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 5
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 5
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- 125000006736 (C6-C20) aryl group Chemical group 0.000 description 4
- CZXPCBGOKOOGDN-UHFFFAOYSA-N 1-(2,4,6-trimethylphenyl)ethane-1,2-diamine Chemical compound CC1=CC(C)=C(C(N)CN)C(C)=C1 CZXPCBGOKOOGDN-UHFFFAOYSA-N 0.000 description 4
- ZXLLRIHDLIMTFO-UHFFFAOYSA-N 1-[2,6-di(propan-2-yl)phenyl]-3-(2-methoxyphenyl)imidazolidin-2-imine Chemical compound COC1=C(C=CC=C1)N1CCN(C1=N)C1=C(C=CC=C1C(C)C)C(C)C ZXLLRIHDLIMTFO-UHFFFAOYSA-N 0.000 description 4
- 125000004204 2-methoxyphenyl group Chemical group [H]C1=C([H])C(*)=C(OC([H])([H])[H])C([H])=C1[H] 0.000 description 4
- DISXFZWKRTZTRI-UHFFFAOYSA-N 4,5-dihydro-1h-imidazol-2-amine Chemical compound NC1=NCCN1 DISXFZWKRTZTRI-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
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- 125000004404 heteroalkyl group Chemical group 0.000 description 4
- 231100000518 lethal Toxicity 0.000 description 4
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- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- 231100000925 very toxic Toxicity 0.000 description 4
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- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 3
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 3
- 125000006376 (C3-C10) cycloalkyl group Chemical group 0.000 description 3
- 125000006651 (C3-C20) cycloalkyl group Chemical group 0.000 description 3
- BDNKZNFMNDZQMI-UHFFFAOYSA-N 1,3-diisopropylcarbodiimide Chemical compound CC(C)N=C=NC(C)C BDNKZNFMNDZQMI-UHFFFAOYSA-N 0.000 description 3
- HEVQKTSFRAXZIU-UHFFFAOYSA-N 1-(2-chloroethyl)-3-(2,4,6-trimethylphenyl)urea Chemical compound CC1=CC(C)=C(NC(=O)NCCCl)C(C)=C1 HEVQKTSFRAXZIU-UHFFFAOYSA-N 0.000 description 3
- VFSODTOUXYOMAM-UHFFFAOYSA-N 1-[2,6-di(propan-2-yl)phenyl]ethane-1,2-diamine Chemical compound CC(C)C1=CC=CC(C(C)C)=C1C(N)CN VFSODTOUXYOMAM-UHFFFAOYSA-N 0.000 description 3
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- 239000012455 biphasic mixture Substances 0.000 description 3
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- 239000012018 catalyst precursor Substances 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 150000004985 diamines Chemical class 0.000 description 3
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- 229910052744 lithium Inorganic materials 0.000 description 3
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 3
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- 239000011734 sodium Substances 0.000 description 3
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- 239000011343 solid material Substances 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
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- 125000006653 (C1-C20) heteroaryl group Chemical group 0.000 description 2
- KLWNVJQJSRCDKW-UHFFFAOYSA-N 1-(2,4,6-trimethylphenyl)imidazolidin-2-one Chemical compound CC1=CC(C)=C(N2CCNC2=O)C(C)=C1 KLWNVJQJSRCDKW-UHFFFAOYSA-N 0.000 description 2
- PYCDOXYHGGXYBQ-UHFFFAOYSA-N 1-(2-chloroethyl)-3-[2,6-di(propan-2-yl)phenyl]urea Chemical compound CC(C)C1=CC=CC(C(C)C)=C1NC(=O)NCCCl PYCDOXYHGGXYBQ-UHFFFAOYSA-N 0.000 description 2
- SJMHPTOVPSFUIJ-UHFFFAOYSA-N 1-(2-ethylphenyl)-N'-(2,4,6-trimethylphenyl)ethane-1,2-diamine Chemical compound C(C)C1=C(C=CC=C1)C(CNC1=C(C=C(C=C1C)C)C)N SJMHPTOVPSFUIJ-UHFFFAOYSA-N 0.000 description 2
- IRUYVWVQTXESNX-UHFFFAOYSA-N 1-(2-phenoxyphenyl)-3-(2,4,6-trimethylphenyl)imidazolidin-2-one Chemical compound CC1=CC(C)=C(N2CCN(C2=O)C2=C(OC3=CC=CC=C3)C=CC=C2)C(C)=C1 IRUYVWVQTXESNX-UHFFFAOYSA-N 0.000 description 2
- NMASHUDAXHLLHE-UHFFFAOYSA-N 1-(2-phenoxyphenyl)-3-(2,4,6-trimethylphenyl)imidazolidine-2-thione Chemical compound CC1=CC(C)=C(N2CCN(C2=S)C2=C(OC3=CC=CC=C3)C=CC=C2)C(C)=C1 NMASHUDAXHLLHE-UHFFFAOYSA-N 0.000 description 2
- YGMCQWFBYDRTNT-UHFFFAOYSA-N 1-[2,6-di(propan-2-yl)phenyl]-3-(2-methoxyphenyl)imidazolidin-2-one Chemical compound COC1=C(C=CC=C1)N1CCN(C1=O)C1=C(C=CC=C1C(C)C)C(C)C YGMCQWFBYDRTNT-UHFFFAOYSA-N 0.000 description 2
- XTYBLGRDJLZEGF-UHFFFAOYSA-N 1-[2,6-di(propan-2-yl)phenyl]-3-(2-methoxyphenyl)imidazolidine-2-thione Chemical compound COC1=C(C=CC=C1)N1CCN(C1=S)C1=C(C=CC=C1C(C)C)C(C)C XTYBLGRDJLZEGF-UHFFFAOYSA-N 0.000 description 2
- WAICIWDWFAEYKZ-UHFFFAOYSA-N 1-[2,6-di(propan-2-yl)phenyl]-3-[2-[3-[2-[3-[2,6-di(propan-2-yl)phenyl]-2-iminoimidazolidin-1-yl]-4-methylphenoxy]propoxy]-5-methylphenyl]imidazolidin-2-imine Chemical compound C(CCOC1=C(C=C(C=C1)C)N1C(N(CC1)C1=C(C=CC=C1C(C)C)C(C)C)=N)OC1=C(C=C(C=C1)C)N1C(N(CC1)C1=C(C=CC=C1C(C)C)C(C)C)=N WAICIWDWFAEYKZ-UHFFFAOYSA-N 0.000 description 2
- JPZHJPFBOLMODX-UHFFFAOYSA-N 1-[2,6-di(propan-2-yl)phenyl]imidazolidin-2-one Chemical compound CC(C)C1=CC=CC(C(C)C)=C1N1C(=O)NCC1 JPZHJPFBOLMODX-UHFFFAOYSA-N 0.000 description 2
- MCFWHGVKLLORMK-UHFFFAOYSA-N 1-[2-(methoxymethyl)phenyl]-3-(2,4,6-trimethylphenyl)imidazolidin-2-imine Chemical compound COCC1=C(C=CC=C1)N1CCN(C1=N)C1=C(C)C=C(C)C=C1C MCFWHGVKLLORMK-UHFFFAOYSA-N 0.000 description 2
- HVRUGFJYCAFAAN-UHFFFAOYSA-N 1-bromo-2-ethylbenzene Chemical compound CCC1=CC=CC=C1Br HVRUGFJYCAFAAN-UHFFFAOYSA-N 0.000 description 2
- BCMYXYHEMGPZJN-UHFFFAOYSA-N 1-chloro-2-isocyanatoethane Chemical compound ClCCN=C=O BCMYXYHEMGPZJN-UHFFFAOYSA-N 0.000 description 2
- AOZLGVLVAJRLPS-UHFFFAOYSA-N 1-iodo-2-phenoxybenzene Chemical compound IC1=CC=CC=C1OC1=CC=CC=C1 AOZLGVLVAJRLPS-UHFFFAOYSA-N 0.000 description 2
- KWVPRPSXBZNOHS-UHFFFAOYSA-N 2,4,6-Trimethylaniline Chemical compound CC1=CC(C)=C(N)C(C)=C1 KWVPRPSXBZNOHS-UHFFFAOYSA-N 0.000 description 2
- WKBALTUBRZPIPZ-UHFFFAOYSA-N 2,6-di(propan-2-yl)aniline Chemical compound CC(C)C1=CC=CC(C(C)C)=C1N WKBALTUBRZPIPZ-UHFFFAOYSA-N 0.000 description 2
- WJAXXWSZNSFVNG-UHFFFAOYSA-N 2-bromoethanamine;hydron;bromide Chemical compound [Br-].[NH3+]CCBr WJAXXWSZNSFVNG-UHFFFAOYSA-N 0.000 description 2
- VZLJZJJAFDMHRZ-UHFFFAOYSA-M 2-chloro-1-(2-phenoxyphenyl)-3-(2,4,6-trimethylphenyl)-4,5-dihydroimidazol-3-ium chloride Chemical compound [Cl-].ClC=1N(CC[N+]1C1=C(C=C(C=C1C)C)C)C1=C(C=CC=C1)OC1=CC=CC=C1 VZLJZJJAFDMHRZ-UHFFFAOYSA-M 0.000 description 2
- AQZWEFBJYQSQEH-UHFFFAOYSA-N 2-methyloxaluminane Chemical compound C[Al]1CCCCO1 AQZWEFBJYQSQEH-UHFFFAOYSA-N 0.000 description 2
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- IWMMXPNBCHCFCY-UHFFFAOYSA-M dicyclohexyl-[3,6-dimethoxy-2-[2,4,6-tri(propan-2-yl)phenyl]phenyl]phosphane;palladium(2+);2-phenylethanamine;chloride Chemical compound [Pd+]Cl.NCCC1=CC=CC=[C-]1.COC1=CC=C(OC)C(C=2C(=CC(=CC=2C(C)C)C(C)C)C(C)C)=C1P(C1CCCCC1)C1CCCCC1 IWMMXPNBCHCFCY-UHFFFAOYSA-M 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 238000000113 differential scanning calorimetry Methods 0.000 description 1
- 125000004639 dihydroindenyl group Chemical group C1(CCC2=CC=CC=C12)* 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000012674 dispersion polymerization Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000012065 filter cake Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000012458 free base Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 150000004795 grignard reagents Chemical class 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 239000002638 heterogeneous catalyst Substances 0.000 description 1
- 229920006158 high molecular weight polymer Polymers 0.000 description 1
- 239000002815 homogeneous catalyst Substances 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 150000003840 hydrochlorides Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 125000003037 imidazol-2-yl group Chemical group [H]N1C([*])=NC([H])=C1[H] 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 125000003454 indenyl group Chemical group C1(C=CC2=CC=CC=C12)* 0.000 description 1
- 125000000593 indol-1-yl group Chemical group [H]C1=C([H])C([H])=C2N([*])C([H])=C([H])C2=C1[H] 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229920000592 inorganic polymer Polymers 0.000 description 1
- 125000002346 iodo group Chemical group I* 0.000 description 1
- 239000001282 iso-butane Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000004501 isothiazol-5-yl group Chemical group S1N=CC=C1* 0.000 description 1
- 125000000842 isoxazolyl group Chemical group 0.000 description 1
- 238000004895 liquid chromatography mass spectrometry Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- NXPHGHWWQRMDIA-UHFFFAOYSA-M magnesium;carbanide;bromide Chemical compound [CH3-].[Mg+2].[Br-] NXPHGHWWQRMDIA-UHFFFAOYSA-M 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- NRQNMMBQPIGPTB-UHFFFAOYSA-N methylaluminum Chemical compound [CH3].[Al] NRQNMMBQPIGPTB-UHFFFAOYSA-N 0.000 description 1
- 125000004573 morpholin-4-yl group Chemical group N1(CCOCC1)* 0.000 description 1
- 239000010705 motor oil Substances 0.000 description 1
- AXTNYCDVWRSOCU-UHFFFAOYSA-N n'-tert-butyl-n-ethylmethanediimine Chemical compound CCN=C=NC(C)(C)C AXTNYCDVWRSOCU-UHFFFAOYSA-N 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 150000002835 noble gases Chemical class 0.000 description 1
- 239000010502 orange oil Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 125000003145 oxazol-4-yl group Chemical group O1C=NC(=C1)* 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- 229920002959 polymer blend Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000012041 precatalyst Substances 0.000 description 1
- OLBCVFGFOZPWHH-UHFFFAOYSA-N propofol Chemical compound CC(C)C1=CC=CC(C(C)C)=C1O OLBCVFGFOZPWHH-UHFFFAOYSA-N 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 125000004307 pyrazin-2-yl group Chemical group [H]C1=C([H])N=C(*)C([H])=N1 0.000 description 1
- 125000004353 pyrazol-1-yl group Chemical group [H]C1=NN(*)C([H])=C1[H] 0.000 description 1
- 125000000246 pyrimidin-2-yl group Chemical group [H]C1=NC(*)=NC([H])=C1[H] 0.000 description 1
- 125000004159 quinolin-2-yl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C([H])C(*)=NC2=C1[H] 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 150000004819 silanols Chemical class 0.000 description 1
- SCABQASLNUQUKD-UHFFFAOYSA-N silylium Chemical class [SiH3+] SCABQASLNUQUKD-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- QLUMLEDLZDMGDW-UHFFFAOYSA-N sodium;1h-naphthalen-1-ide Chemical compound [Na+].[C-]1=CC=CC2=CC=CC=C21 QLUMLEDLZDMGDW-UHFFFAOYSA-N 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000003319 supportive effect Effects 0.000 description 1
- 229920001897 terpolymer Polymers 0.000 description 1
- 125000001712 tetrahydronaphthyl group Chemical group C1(CCCC2=CC=CC=C12)* 0.000 description 1
- 125000004523 tetrazol-1-yl group Chemical group N1(N=NN=C1)* 0.000 description 1
- 125000004299 tetrazol-5-yl group Chemical group [H]N1N=NC(*)=N1 0.000 description 1
- 125000000437 thiazol-2-yl group Chemical group [H]C1=C([H])N=C(*)S1 0.000 description 1
- MCULRUJILOGHCJ-UHFFFAOYSA-N triisobutylaluminium Chemical compound CC(C)C[Al](CC(C)C)CC(C)C MCULRUJILOGHCJ-UHFFFAOYSA-N 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- ANEFWEBMQHRDLH-UHFFFAOYSA-N tris(2,3,4,5,6-pentafluorophenyl) borate Chemical compound FC1=C(F)C(F)=C(F)C(F)=C1OB(OC=1C(=C(F)C(F)=C(F)C=1F)F)OC1=C(F)C(F)=C(F)C(F)=C1F ANEFWEBMQHRDLH-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
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- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/003—Compounds containing elements of Groups 4 or 14 of the Periodic Table without C-Metal linkages
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- C08F210/00—Copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond
- C08F210/02—Ethene
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- C08F210/00—Copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond
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- C08F4/42—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors
- C08F4/44—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides
- C08F4/60—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides together with refractory metals, iron group metals, platinum group metals, manganese, rhenium technetium or compounds thereof
- C08F4/62—Refractory metals or compounds thereof
- C08F4/64—Titanium, zirconium, hafnium or compounds thereof
- C08F4/64003—Titanium, zirconium, hafnium or compounds thereof the metallic compound containing a multidentate ligand, i.e. a ligand capable of donating two or more pairs of electrons to form a coordinate or ionic bond
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- C08F4/64044—NN
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- C08F4/64072—NN
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- B01J2531/46—Titanium
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- B01J31/18—Catalysts comprising hydrides, coordination complexes or organic compounds containing coordination complexes containing nitrogen, phosphorus, arsenic or antimony as complexing atoms, e.g. in pyridine ligands, or in resonance therewith, e.g. in isocyanide ligands C=N-R or as complexed central atoms
- B01J31/1805—Catalysts comprising hydrides, coordination complexes or organic compounds containing coordination complexes containing nitrogen, phosphorus, arsenic or antimony as complexing atoms, e.g. in pyridine ligands, or in resonance therewith, e.g. in isocyanide ligands C=N-R or as complexed central atoms the ligands containing nitrogen
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- B01J31/1845—Catalysts comprising hydrides, coordination complexes or organic compounds containing coordination complexes containing nitrogen, phosphorus, arsenic or antimony as complexing atoms, e.g. in pyridine ligands, or in resonance therewith, e.g. in isocyanide ligands C=N-R or as complexed central atoms the ligands containing phosphorus
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Description
[態様1]
式(I)の金属−配位子錯体であって、
Jが、(R K )(R L )(R X )P=N−、(R K )(R L )C=N−、(R K )((R L )(R X )N)C=N−、(R K )(R L )B−O−、R K O−、R K S−、R K S(O)−、(R K )(R L )N−、(R K N=C(R L )−N(R X ))−、(R K )(R L )NO−、R K C(O)O−、R K C(O)NH−、及び(R K )(R L )P−から選択されるモノアニオン性部分であり、式中、各R K 、R L 、及びR X が独立して、水素、(C 1 〜C 40 ))ヒドロカルビル−、((C 1 〜C 15 )ヒドロカルビル) 3 Si、((C 1 〜C 15 )ヒドロカルビル) 2 N−、または(C 1 〜C 40 )ヘテロヒドロカルビル−であり、
Lが、各出現箇所で独立して、ハロゲン、水素、((C 1 〜C 40 )ヒドロカルビル)C(O)N(H)−、((C 1 〜C 40 )ヒドロカルビル)C(O)N(H)(C 1 〜C 20 )ヒドロカルビル−、((C 1 〜C 40 )ヒドロカルビル)C(O)O−、(C 1 〜C 40 )ヒドロカルビル−、(C 1 〜C 40 )ヘテロヒドロカルビル−、R K (R L )N−、R L O−、R L S−、またはR K (R L )P−であり、式中、R K 及びR L の各々が独立して、上に定義される通りであり、Lの各出現箇所が、Mに結合しているモノアニオン性部分であり、
Mが、元素周期表の第3、4、5、及び6族のうちのいずれか1つの金属であり、前記金属が+2、+3、+4、+5、または+6の形式上の酸化状態にあり、
R 1 、R 2 、R 3 、及びR 4 が、各出現箇所で独立して、水素、(C 1 〜C 40 )ヒドロカルビル−、((C 1 〜C 40 )ヒドロカルビル)O−、((C 1 〜C 40 )ヒドロカルビル)S−、((C 1 〜C 40 )ヒドロカルビル) 3 Si−、または(C 1 〜C 40 )ヘテロヒドロカルビル−であり、
Xが、R X N(R K )(R L )、R X =N(R K )、R K O(R L )、R K S(R L )、及びR X P(R K )(R L )から選択される中性ルイス塩基性基であり、式中、R K 、R L 、及びR X の各々が独立して、上に定義される通りであり、
pが、0、1、2、または3であり、qが、0または1であるが、但し、p及びqの合計が少なくとも1であることを条件とし、
rが、2または3であり、
Lの2つの出現箇所が、任意に一緒になって、(C 2 〜C 40 )ヒドロカルビレンもしくは(C 1 〜C 40 )ヘテロヒドロカルビレン、または(R D ) 2 C=C(R D )〜C(R D )=C(R D ) 2 を形成し、式中、各R D が独立して、H、非置換(C 1 〜C 6 )アルキル、フェニル、またはナフチルであり、
JならびにR 1 、R 2 、R 3 、及びR 4 のうちの1つが、任意に一緒になって、(C 2 〜C 40 )ヒドロカルビレンまたは(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
Lの1つの出現箇所ならびにR 1 、R 2 、R 3 、及びR 4 のうちの1つが、任意に一緒になって、(C 2 〜C 40 )ヒドロカルビレンまたは(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
Xの1つの出現箇所ならびにR 1 、R 2 、R 3 、及びR 4 のうちの1つが、任意に一緒になって、(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
R 1 、R 2 、R 3 、及びR 4 のうちのいずれか2つが、任意に一緒になって(C 2 〜C 40 )ヒドロカルビレンまたは(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
X及びJが、任意に一緒になって、モノアニオン性二座部分X−Jを形成するが、但し、X−JがMに結合して以下の構造を有する断片を形成する場合、
前記上述の(C 1 〜C 40 )ヒドロカルビル、(C 1 〜C 40 )ヘテロヒドロカルビル、(C 2 〜C 40 )ヒドロカルビレン、及び(C 1 〜C 40 )ヘテロヒドロカルビレンの各々が独立して、同一または異なり、かつ非置換であるか、またはハロゲン、非置換(C 1 〜C 18 )ヒドロカルビル、F 3 C−、FCH 2 O−、F 2 HCO−、F 3 CO−、オキソ、R 3 Si−、RO−、RS−、RS(O)−、RS(O) 2 −、R 2 P−、R 2 N−、R 2 C=N−、NC−、RC(O)O−、ROC(O)−、RC(O)N(R)−、及びR 2 NC(O)−から選択される1つ以上の置換基R S で置換され、各Rが独立して、非置換(C 1 〜C 18 )ヒドロカルビルである、前記金属−配位子錯体。
[態様2]
Mが、Ti、Zr、またはHfである、上記態様1に記載の前記金属−配位子錯体。
[態様3]
R 1 及びR 2 のうちの1つならびにR 3 及びR 4 のうちの1つが、一緒になって、
[態様4]
式(II)を有し、
L、M、R 1 、R 2 、R 3 、及びR 4 が、上記態様1に定義される通りであり、
R 5 、R 6 、及びR 7 が各々独立して、水素、(C 1 〜C 40 )ヒドロカルビル−、((C 1 〜C 40 )ヒドロカルビル)O−、((C 1 〜C 40 )ヒドロカルビル)S−、((C 1 〜C 40 )ヒドロカルビル) 3 Si−、または(C 1 〜C 40 )ヘテロヒドロカルビル−であり、
Lの1つの出現箇所ならびにR 1 、R 2 、R 3 、及びR 4 のうちのいずれか1つが、任意に一緒になって、(C 2 〜C 40 )ヒドロカルビレンまたは(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
R 1 、R 2 、R 3 、及びR 4 のうちのいずれか2つが、任意に一緒になって(C 2 〜C 40 )ヒドロカルビレンまたは(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
R 5 、R 6 、及びR 7 のうちの1つが、任意に、R 1 、R 2 、R 3 、R 4 、及びLのうちの1つと一緒になって、(C 2 〜C 40 )ヒドロカルビレンまたは(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
前記Lの2つの出現箇所が、任意に一緒になって、(C 2 〜C 40 )ヒドロカルビレンもしくは(C 1 〜C 40 )ヘテロヒドロカルビレン、または(R D ) 2 C=C(R D )〜C(R D )=C(R D ) 2 を形成し、式中、各R D が独立して、H、非置換(C 1 〜C 6 )アルキル、フェニル、またはナフチルである、上記態様1〜3のいずれか一項に記載の前記金属−配位子錯体。
[態様5]
[態様6]
式(III)を有し、
L、M、p、R 1 、R 2 、R 3 、R 4 、及びXが、上記態様1に定義される通りであり、
J 1 が、NまたはPであり、
R 8 及びR 9 が各々独立して、水素、(C 1 〜C 40 )ヒドロカルビル−、((C 1 〜C 40 )ヒドロカルビル)O−、((C 1 〜C 40 )ヒドロカルビル)S−、((C 1 〜C 40 )ヒドロカルビル) 3 Si−、または(C 1 〜C 40 )ヘテロヒドロカルビル−であり、
Lの1つの出現箇所ならびにR 1 、R 2 、R 3 、及びR 4 のうちのいずれか1つが、任意に一緒になって、(C 2 〜C 40 )ヒドロカルビレンまたは(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
前記Lの2つの出現箇所が、任意に一緒になって、(C 2 〜C 40 )ヒドロカルビレンもしくは(C 1 〜C 40 )ヘテロヒドロカルビレン、または(R D ) 2 C=C(R D )〜C(R D )=C(R D ) 2 を形成し、式中、各R D が独立して、H、非置換(C 1 〜C 6 )アルキル、フェニル、またはナフチルであり、
R 1 、R 2 、R 3 、及びR 4 のうちのいずれか2つが、任意に一緒になって、(C 2 〜C 40 )ヒドロカルビレンまたは(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
R 8 及びR 9 が、任意に一緒になって、(C 2 〜C 40 )ヒドロカルビレンまたは(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
R 8 及びR 9 が、任意に一緒になって、J 1 に2重結合する基を形成し、
R 8 及びR 9 のうちの1つが、任意に、R 1 、R 2 、R 3 、R 4 、及びLのうちの1つと一緒になって、(C 2 〜C 40 )ヒドロカルビレンまたは(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
R 8 及びR 9 のうちの1つが、任意に、Xに共有結合し、
XならびにR 1 、R 2 、R 3 、及びR 4 のうちのいずれか1つが、任意に一緒になって、(C 1 〜C 40 )ヘテロヒドロカルビレンを形成する、上記態様1〜3のいずれか一項に記載の前記金属−配位子錯体。
[態様7]
[態様8]
式(IV)を有し、
L、M、p、R 1 、R 2 、R 3 、R 4 、及びXが、上記態様1に定義される通りであり、
J 2 が、OまたはSであり、
R 10 が、(C 1 〜C 40 )ヒドロカルビル−、((C 1 〜C 40 )ヒドロカルビル) 3 Si−、または(C 1 〜C 40 )ヘテロヒドロカルビル−であり、
Lの1つの出現箇所ならびにR 1 、R 2 、R 3 、及びR 4 のうちのいずれか1つが、任意に一緒になって、(C 2 〜C 40 )ヒドロカルビレンまたは(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
R 1 、R 2 、R 3 、及びR 4 のうちのいずれか2つが、任意に一緒になって、(C 2 〜C 40 )ヒドロカルビレンまたは(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
XならびにR 1 、R 2 、R 3 、及びR 4 のうちのいずれか1つが、任意に一緒になって、(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
R 10 が、任意に、R 1 、R 2 、R 3 、R 4 、及びLのうちの1つと一緒になって、(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
R 10 が、任意に、Xに共有結合する、上記態様1〜3のいずれか一項に記載の前記金属−配位子錯体。
[態様9]
[態様10]
式(V)を有し、
L、M、R 1 、R 2 、R 3 、及びR 4 が、式(I)に定義される通りであり、
J 3 が、OまたはNR 12 であり、
R 11 及びR 12 が各々独立して、水素、(C 1 〜C 40 )ヒドロカルビル−、((C 1 〜C 40 )ヒドロカルビル)O−、((C 1 〜C 40 )ヒドロカルビル)S−、((C 1 〜C 40 )ヒドロカルビル) 3 Si−、または(C 1 〜C 40 )ヘテロヒドロカルビル−であり、
R 11 及びR 12 が、任意に一緒になって、(C 2 〜C 40 )ヒドロカルビレンまたは(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
R 11 及びR 12 のうちの1つが、任意に、R 1 、R 2 、R 3 、R 4 、及びLのうちの1つと一緒になって、(C 2 〜C 40 )ヒドロカルビレンまたは(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
Lの2つの出現箇所が、任意に一緒になって、(C 2 〜C 40 )ヒドロカルビレンもしくは(C 1 〜C 40 )ヘテロヒドロカルビレン、または(R D ) 2 C=C(R D )〜C(R D )=C(R D ) 2 を形成し、式中、各R D が独立して、H、非置換(C 1 〜C 6 )アルキル、フェニル、またはナフチルであり、
Lの1つの出現箇所ならびにR 1 、R 2 、R 3 、及びR 4 のうちの1つが、任意に一緒になって、(C 2 〜C 40 )ヒドロカルビレンまたは(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
R 1 、R 2 、R 3 、及びR 4 のうちのいずれか2つが、任意に一緒になって、(C 2 〜C 40 )ヒドロカルビレンまたは(C 1 〜C 40 )ヘテロヒドロカルビレンを形成する、上記態様1〜3のいずれか一つに記載の前記金属−配位子錯体。
[態様11]
[態様12]
式(VI)を有し、
L、M、R 1 、R 2 、R 3 、R 4 、及びXが、式(I)に定義される通りであり、
Lの2つの出現箇所が、任意に一緒になって、(C 2 〜C 40 )ヒドロカルビレンもしくは(C 1 〜C 40 )ヘテロヒドロカルビレン、または(R D ) 2 C=C(R D )〜C(R D )=C(R D ) 2 を形成し、式中、各R D が独立して、H、非置換(C 1 〜C 6 )アルキル、フェニル、またはナフチルであり、
Lの1つの出現箇所ならびにR 1 、R 2 、R 3 、及びR 4 のうちの1つが、任意に一緒になって、(C 2 〜C 40 )ヒドロカルビレンまたは(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
XならびにR 1 、R 2、 R 3 、及びR 4 のうちの1つが、任意に一緒になって、(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
R 1 、R 2 、R 3 、及びR 4 のうちのいずれか2つが、任意に一緒になって、(C 2 〜C 40 )ヒドロカルビレンまたは(C 1 〜C 40 )ヘテロヒドロカルビレンを形成する、上記態様1〜3のいずれか一つに記載の前記金属−配位子錯体。
[態様13]
[態様14]
[態様15]
上記態様1〜14のいずれか一つに記載の1つ以上の金属−配位子錯体と、1つ以上の活性化助触媒とを含む、またはそれらの反応生成物を含む触媒であって、前記1つ以上の金属−配位子錯体の総モル数と前記1つ以上の活性化助触媒の総モル数との比率が、1:10,000〜100:1である、前記触媒。
[態様16]
ポリオレフィンを調製するためのプロセスであって、少なくとも1つの重合可能なオレフィンと上記態様15に記載の前記触媒とを、前記少なくとも1つの重合可能なオレフィンのうちの少なくとも一部を重合するのに十分な条件下で接触させ、それによりポリオレフィンを生成することを含む、前記プロセス。
[態様17]
前記少なくとも1つの重合可能なオレフィンが、エチレン及びオクテンを含む、上記態様16に記載の前記プロセス。
Claims (10)
- 式(I)の金属−配位子錯体を含むオレフィン重合用触媒であって、
Jが、(RK)(RL)(RX)P=N−、(RK)(RL)C=N−、(RK)((RL)(RX)N)C=N−、(RK)(RL)B−O−、RKO−、RKS−、RKS(O)−、(RK)(RL)N−、(RKN=C(RL)−N(RX))−、(RK)(RL)NO−、RKC(O)O−、RKC(O)NH−、及び(RK)(RL)P−から選択されるモノアニオン性部分であり、式中、各RK、RL、及びRXが独立して、水素、(C1〜C40))ヒドロカルビル−、((C1〜C15)ヒドロカルビル)3 Si−、((C1〜C15)ヒドロカルビル)2N−、または(C1〜C40)ヘテロヒドロカルビル−であり、
Lが、各出現箇所で独立して、ハロゲン、水素、((C1〜C40)ヒドロカルビル)C(O)N(H)−、((C1〜C40)ヒドロカルビル)C(O)N(H)(C1〜C20)ヒドロカルビル−、((C1〜C40)ヒドロカルビル)C(O)O−、(C1〜C40)ヒドロカルビル−、(C1〜C40)ヘテロヒドロカルビル−、RK(RL)N−、RLO−、RLS−、またはRK(RL)P−であり、式中、RK及びRLの各々が独立して、上に定義される通りであり、Lの各出現箇所が、Mに結合しているモノアニオン性部分であり、
Mが、元素周期表の第4族の金属であり、前記金属が+2、+3、または+4の形式上の酸化状態にあり、
R1、R2、R3、及びR4が、各出現箇所で独立して、(C1〜C40)ヒドロカルビル−、((C1〜C40)ヒドロカルビル)O−、((C 1 〜C 40 )ヒドロカルビル)S−、((C1〜C40)ヒドロカルビル)3Si−、または(C1〜C40)ヘテロヒドロカルビル−であり、
Xが、RXN(RK)(RL)、RKO(RL)、RKS(RL)、及びRXP(RK)(RL)から選択される中性ルイス塩基性基であり、式中、RK、RL、及びRXの各々が独立して、上に定義される通りであり、
pが、0、1、2、または3であり、qが、0または1であるが、但し、p及びqの合計が少なくとも1であることを条件とし、
rが、2または3であり、
Lの2つの出現箇所が、任意に一緒になって、(C2〜C40)ヒドロカルビレンもしくは(C1〜C40)ヘテロヒドロカルビレン、または(RD)2C=C(RD)−C(RD)=C(RD)2を形成し、式中、各RDが独立して、H、非置換(C1〜C6)アルキル、フェニル、またはナフチルであり、
JならびにR1、R2、R3、及びR4のうちの1つが、任意に一緒になって、(C2〜C40)ヒドロカルビレンまたは(C1〜C40)ヘテロヒドロカルビレンを形成し、
Lの1つの出現箇所ならびにR1、R2、R3、及びR4のうちの1つが、任意に一緒になって、(C2〜C40)ヒドロカルビレンまたは(C1〜C40)ヘテロヒドロカルビレンを形成し、
Xの1つの出現箇所ならびにR1、R2、R3、及びR4のうちの1つが、任意に一緒になって、(C1〜C40)ヘテロヒドロカルビレンを形成し、
R1、R2、R3、及びR4のうちのいずれか2つが、任意に一緒になって(C2〜C40)ヒドロカルビレンまたは(C1〜C40)ヘテロヒドロカルビレンを形成し、
X及びJが、任意に一緒になって、モノアニオン性二座部分X−Jを形成するが、但し、X−JがMに結合して以下の構造を有する断片を形成する場合、
R 5 、R 6 、及びR 7 のうちの1つは、任意に、R 1 、R 2 、R 3 、R 4 及びLのうちの1つと一緒になって、(C 2 〜C 40 )ヒドロカルビレンまたは(C 1 〜C 40 )ヘテロヒドロカルビレンを形成し、
X−Jがアニオン性窒素及びルイス塩基窒素を介してMに結合している場合、X−J及びMは、4員メタロサイクルまたは6員メタロサイクルを形成することを条件とし、
前記(C1〜C40)ヒドロカルビル、(C1〜C40)ヘテロヒドロカルビル、(C2〜C40)ヒドロカルビレン、及び(C1〜C40)ヘテロヒドロカルビレンの各々が独立して、同一または異なり、かつ非置換であるか、またはハロゲン、非置換(C1〜C18)ヒドロカルビル、F3C−、FCH2O−、F2HCO−、F3CO−、オキソ、R3Si−、RO−、RS−、RS(O)−、RS(O)2−、R2P−、R2N−、R2C=N−、NC−、RC(O)O−、ROC(O)−、RC(O)N(R)−、及びR2NC(O)−から選択される1つ以上の置換基RSで置換され、各Rが独立して、非置換(C1〜C18)ヒドロカルビルである、前記オレフィン重合用触媒。 - Mが、Ti、Zr、またはHfである、請求項1に記載のオレフィン重合用触媒。
- 前記金属−配位子錯体が、式(II)を有し、
L、M、R1、R2、R3、及びR4が、請求項1に定義される通りであり、
R5、R6、及びR7が各々独立して、水素、(C1〜C40)ヒドロカルビル−、((C1〜C40)ヒドロカルビル)O−、((C1〜C40)ヒドロカルビル)S−、または((C 1 〜C 40 )ヒドロカルビル) 3 Si−であり、
Lの1つの出現箇所ならびにR1、R2、R3、及びR4のうちのいずれか1つが、任意に一緒になって、(C2〜C40)ヒドロカルビレンまたは(C1〜C40)ヘテロヒドロカルビレンを形成し、
R1、R2、R3、及びR4のうちのいずれか2つが、任意に一緒になって(C2〜C40)ヒドロカルビレンまたは(C1〜C40)ヘテロヒドロカルビレンを形成し、
R5、R6、及びR7のうちの1つが、任意に、R1、R2、R3、R4、及びLのうちの1つと一緒になって、(C2〜C40)ヒドロカルビレンまたは(C1〜C40)ヘテロヒドロカルビレンを形成し、
前記Lの2つの出現箇所が、任意に一緒になって、(C2〜C40)ヒドロカルビレンもしくは(C1〜C40)ヘテロヒドロカルビレン、または(RD)2C=C(RD)−C(RD)=C(RD)2を形成し、式中、各RDが独立して、H、非置換(C1−C6)アルキル、フェニル、またはナフチルである、請求項1〜3のいずれか一項に記載のオレフィン重合用触媒。 - 前記金属−配位子錯体が、式(III)を有し、
L、M、p、R1、R2、R3、R4、及びXが、請求項1に定義される通りであり、
J1が、NまたはPであり、
R8及びR9が各々独立して、水素、(C1〜C40)ヒドロカルビル−、((C1〜C40)ヒドロカルビル)O−、((C1〜C40)ヒドロカルビル)S−、((C1〜C 15 )ヒドロカルビル)3Si−、または(C1〜C40)ヘテロヒドロカルビル−であり、
Lの1つの出現箇所ならびにR1、R2、R3、及びR4のうちのいずれか1つが、任意に一緒になって、(C2〜C40)ヒドロカルビレンまたは(C1〜C40)ヘテロヒドロカルビレンを形成し、
前記Lの2つの出現箇所が、任意に一緒になって、(C2〜C40)ヒドロカルビレンもしくは(C1〜C40)ヘテロヒドロカルビレン、または(RD)2C=C(RD)−C(RD)=C(RD)2を形成し、式中、各RDが独立して、H、非置換(C1〜C6)アルキル、フェニル、またはナフチルであり、
R1、R2、R3、及びR4のうちのいずれか2つが、任意に一緒になって、(C2〜C40)ヒドロカルビレンまたは(C1〜C40)ヘテロヒドロカルビレンを形成し、
J 1 がPである場合には、R8及びR9が、任意に一緒になって、(C2〜C40)ヒドロカルビレンまたは(C1〜C40)ヘテロヒドロカルビレンを形成し、
J 1 がPである場合には、R8及びR9が、任意に一緒になって、J1に2重結合する基を形成し、
R8及びR9のうちの1つが、任意に、R1、R2、R3、R4、及びLのうちの1つと一緒になって、(C2〜C40)ヒドロカルビレンまたは(C1〜C40)ヘテロヒドロカルビレンを形成し、
R8及びR9のうちの1つが、任意に、Xに共有結合し、
XならびにR1、R2、R3、及びR4のうちのいずれか1つが、任意に一緒になって、(C1〜C40)ヘテロヒドロカルビレンを形成する、請求項1〜3のいずれか一項に記載のオレフィン重合用触媒。 - 前記金属−配位子錯体が、式(IV)を有し、
L、M、p、R1、R2、R3、R4、及びXが、請求項1に定義される通りであり、
J2が、OまたはSであり、
R10が、(C1〜C40)ヒドロカルビル−、((C1〜C 15 )ヒドロカルビル)3Si−、または(C1〜C40)ヘテロヒドロカルビル−であり、
Lの1つの出現箇所ならびにR1、R2、R3、及びR4のうちのいずれか1つが、任意に一緒になって、(C2〜C40)ヒドロカルビレンまたは(C1〜C40)ヘテロヒドロカルビレンを形成し、
R1、R2、R3、及びR4のうちのいずれか2つが、任意に一緒になって、(C2〜C40)ヒドロカルビレンまたは(C1〜C40)ヘテロヒドロカルビレンを形成し、
XならびにR1、R2、R3、及びR4のうちのいずれか1つが、任意に一緒になって、(C1〜C40)ヘテロヒドロカルビレンを形成し、
R10が、任意に、R1、R2、R3、R4、及びLのうちの1つと一緒になって、(C1〜C40)ヘテロヒドロカルビレンを形成し、
R10が、任意に、Xに共有結合する、請求項1〜3のいずれか一項に記載のオレフィン重合用触媒。 - 式(V)を有する金属−配位子錯体であって、
Lは、各出現箇所で独立して、ハロゲン、水素、((C 1 〜C 40 )ヒドロカルビル)C(O)N(H)−、((C 1 〜C 40 )ヒドロカルビル)C(O)N(H)(C 1 〜C 20 )ヒドロカルビル−、((C 1 〜C 40 )ヒドロカルビル)C(O)O−、(C 1 〜C 40 )ヒドロカルビル−、または(C 1 〜C 40 )ヘテロヒドロカルビル−であり、Lの各出現箇所はMに結合しているモノアニオン性部分であり、
Mは、元素周期表の第3、4、5、及び6族のうちのいずれか1つの金属であり、前記金属は+2、+3、+4、+5、または+6の形式上の酸化状態にあり、
R1、R2、R3、及びR4 は、各出現箇所で独立して、水素、(C 1 〜C 40 )ヒドロカルビル−、((C 1 〜C 40 )ヒドロカルビル)O−、((C 1 〜C 40 )ヒドロカルビル)S−、((C 1 〜C 40 )ヒドロカルビル) 3 Si−、または(C 1 〜C 40 )ヘテロヒドロカルビル−であり、
J3が、OまたはNR12であり、
R11及びR12が各々独立して、水素、(C1〜C40)ヒドロカルビル−、((C1〜C40)ヒドロカルビル)O−、((C1〜C40)ヒドロカルビル)S−、((C1〜C40)ヒドロカルビル)3Si−、または(C1〜C40)ヘテロヒドロカルビル−であり、
R11及びR12が、任意に一緒になって、(C2〜C40)ヒドロカルビレンまたは(C1〜C40)ヘテロヒドロカルビレンを形成し、
R11及びR12のうちの1つが、任意に、R1、R2、R3、R4、及びLのうちの1つと一緒になって、(C2〜C40)ヒドロカルビレンまたは(C1〜C40)ヘテロヒドロカルビレンを形成し、
Lの2つの出現箇所が、任意に一緒になって、(C2〜C40)ヒドロカルビレンもしくは(C1〜C40)ヘテロヒドロカルビレン、または(RD)2C=C(RD)−C(RD)=C(RD)2を形成し、式中、各RDが独立して、H、非置換(C1〜C6)アルキル、フェニル、またはナフチルであり、
Lの1つの出現箇所ならびにR1、R2、R3、及びR4のうちの1つが、任意に一緒になって、(C2〜C40)ヒドロカルビレンまたは(C1〜C40)ヘテロヒドロカルビレンを形成し、
R1、R2、R3、及びR4のうちのいずれか2つが、任意に一緒になって、(C2〜C40)ヒドロカルビレンまたは(C1〜C40)ヘテロヒドロカルビレンを形成する、前記金属−配位子錯体。 - 前記金属−配位子錯体が、式(VI)を有し、
L、M、R1、R2、R3、R4、及びXが、式(I)に定義される通りであり、
Lの2つの出現箇所が、任意に一緒になって、(C2〜C40)ヒドロカルビレンもしくは(C1〜C40)ヘテロヒドロカルビレン、または(RD)2C=C(RD)−C(RD)=C(RD)2を形成し、式中、各RDが独立して、H、非置換(C1〜C6)アルキル、フェニル、またはナフチルであり、
Lの1つの出現箇所ならびにR1、R2、R3、及びR4のうちの1つが、任意に一緒になって、(C2〜C40)ヒドロカルビレンまたは(C1〜C40)ヘテロヒドロカルビレンを形成し、
XならびにR1、R2、R3、及びR4のうちの1つが、任意に一緒になって、(C1〜C40)ヘテロヒドロカルビレンを形成し、
R1、R2、R3、及びR4のうちのいずれか2つが、任意に一緒になって、(C2〜C40)ヒドロカルビレンまたは(C1〜C40)ヘテロヒドロカルビレンを形成する、請求項1〜3のいずれか一項に記載のオレフィン重合用触媒。 - 請求項1〜8のいずれか一項に記載の1つ以上の金属−配位子錯体と、1つ以上の活性化助触媒とを含む、またはそれらの反応生成物を含む触媒であって、前記1つ以上の金属−配位子錯体の総モル数と前記1つ以上の活性化助触媒の総モル数との比率が、1:10,000〜100:1である、前記触媒。
- ポリオレフィンを調製するためのプロセスであって、少なくとも1つの重合可能なオレフィンと請求項9に記載の前記触媒とを、前記少なくとも1つの重合可能なオレフィンのうちの少なくとも一部を重合するのに十分な条件下で接触させ、それによりポリオレフィンを生成することを含む、前記プロセス。
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