JP6546930B2 - 薄膜処理用途のための装置及び方法 - Google Patents

薄膜処理用途のための装置及び方法 Download PDF

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Publication number
JP6546930B2
JP6546930B2 JP2016552515A JP2016552515A JP6546930B2 JP 6546930 B2 JP6546930 B2 JP 6546930B2 JP 2016552515 A JP2016552515 A JP 2016552515A JP 2016552515 A JP2016552515 A JP 2016552515A JP 6546930 B2 JP6546930 B2 JP 6546930B2
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Japan
Prior art keywords
flexible substrate
unit
coating
cleaning
deposition
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Japanese (ja)
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JP2017507247A (ja
JP2017507247A5 (enExample
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トーマス デピッシュ，
トーマス デピッシュ，
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Applied Materials Inc
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Applied Materials Inc
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5873—Removal of material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3321—CVD [Chemical Vapor Deposition]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/335—Cleaning

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Advancing Webs (AREA)
  • Feeding Of Articles By Means Other Than Belts Or Rollers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP2016552515A 2014-02-21 2014-02-21 薄膜処理用途のための装置及び方法 Active JP6546930B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2014/053460 WO2015124207A1 (en) 2014-02-21 2014-02-21 Apparatus and method for thin-film processing applications

Publications (3)

Publication Number Publication Date
JP2017507247A JP2017507247A (ja) 2017-03-16
JP2017507247A5 JP2017507247A5 (enExample) 2017-04-20
JP6546930B2 true JP6546930B2 (ja) 2019-07-17

Family

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Application Number Title Priority Date Filing Date
JP2016552515A Active JP6546930B2 (ja) 2014-02-21 2014-02-21 薄膜処理用途のための装置及び方法

Country Status (6)

Country Link
US (1) US10066291B2 (enExample)
EP (1) EP3108031A1 (enExample)
JP (1) JP6546930B2 (enExample)
KR (1) KR20160124846A (enExample)
CN (1) CN106029944A (enExample)
WO (1) WO2015124207A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109477203A (zh) * 2016-07-01 2019-03-15 应用材料公司 用于涂布柔性基板的沉积设备和涂布柔性基板的方法
CN109415804A (zh) * 2017-06-14 2019-03-01 应用材料公司 用于涂覆柔性基板的沉积设备
US20210222288A1 (en) * 2017-11-28 2021-07-22 Applied Materials, Inc. Deposition apparatus for coating a flexible substrate, method of coating a flexible substrate and flexible substrate having a coating
KR102480828B1 (ko) * 2018-06-14 2022-12-23 어플라이드 머티어리얼스, 인코포레이티드 가요성 기판을 가이딩하기 위한 롤러 디바이스, 가요성 기판을 운송하기 위한 롤러 디바이스의 사용, 진공 프로세싱 장치, 및 가요성 기판을 프로세싱하는 방법
JP7285430B2 (ja) * 2019-05-30 2023-06-02 住友金属鉱山株式会社 真空成膜装置と真空成膜方法
US20210126247A1 (en) * 2019-10-28 2021-04-29 Applied Materials, Inc. Dielectric coated lithium metal anode
CN117460858A (zh) * 2021-05-21 2024-01-26 应用材料公司 用于制造复合膜的设备和方法
JP2024531190A (ja) 2021-08-12 2024-08-29 アプライド マテリアルズ インコーポレイテッド 有効表面積での蒸発のための蒸発器
CN114381695A (zh) * 2021-12-31 2022-04-22 重庆金美新材料科技有限公司 一种薄膜生产线和薄膜生产方法
CN115893068B (zh) * 2022-08-09 2023-11-10 安徽鼎宏橡塑科技股份有限公司 一种防止飞絮堵塞的纺织加工用传输辊

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000293847A (ja) * 1999-04-09 2000-10-20 Victor Co Of Japan Ltd 磁気記録媒体の製造装置
JP2002020863A (ja) * 2000-05-01 2002-01-23 Canon Inc 堆積膜の形成方法及び形成装置、及び基板処理方法
JP4103368B2 (ja) * 2001-10-23 2008-06-18 東レ株式会社 金属酸化物膜つきフィルムの製造方法および製造装置
JP2003132737A (ja) * 2001-10-30 2003-05-09 Mitsui Chemicals Inc 保護フィルム付き透明導電性フィルム、及びそれを用いたディスプレイ用光学フィルター、及びその製造方法
US20050145326A1 (en) * 2004-01-05 2005-07-07 Eastman Kodak Company Method of making an OLED device
JP4339137B2 (ja) * 2004-01-22 2009-10-07 積水化成品工業株式会社 シート状物用除塵装置
EP1921180A4 (en) * 2005-08-31 2010-03-17 Konica Minolta Holdings Inc PLASMA DISCHARGE TREATMENT DEVICE AND METHOD FOR MANUFACTURING GAS PROTECTION FILM
ATE524575T1 (de) * 2006-11-28 2011-09-15 Ulvac Inc Verfahren und vorrichtung zur herstellung einer vakuumwickelfolie
JP2011127188A (ja) 2009-12-18 2011-06-30 Fuji Electric Co Ltd Ｃｖｄ成膜装置
EP2508646A1 (en) * 2011-04-05 2012-10-10 Bayer Material Science AG A process for multi-layer continuous roll-to-roll coating

Also Published As

Publication number Publication date
US20170067149A1 (en) 2017-03-09
WO2015124207A1 (en) 2015-08-27
CN106029944A (zh) 2016-10-12
JP2017507247A (ja) 2017-03-16
KR20160124846A (ko) 2016-10-28
US10066291B2 (en) 2018-09-04
EP3108031A1 (en) 2016-12-28

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