CN106029944A - 用于薄膜处理应用的装置和方法 - Google Patents

用于薄膜处理应用的装置和方法 Download PDF

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Publication number
CN106029944A
CN106029944A CN201480075991.8A CN201480075991A CN106029944A CN 106029944 A CN106029944 A CN 106029944A CN 201480075991 A CN201480075991 A CN 201480075991A CN 106029944 A CN106029944 A CN 106029944A
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CN
China
Prior art keywords
flexible substrate
coating
unit
deposition
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201480075991.8A
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English (en)
Chinese (zh)
Inventor
T·德皮施
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of CN106029944A publication Critical patent/CN106029944A/zh
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5873—Removal of material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3321—CVD [Chemical Vapor Deposition]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/335—Cleaning

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding Of Articles By Means Other Than Belts Or Rollers (AREA)
  • Advancing Webs (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
CN201480075991.8A 2014-02-21 2014-02-21 用于薄膜处理应用的装置和方法 Pending CN106029944A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2014/053460 WO2015124207A1 (en) 2014-02-21 2014-02-21 Apparatus and method for thin-film processing applications

Publications (1)

Publication Number Publication Date
CN106029944A true CN106029944A (zh) 2016-10-12

Family

ID=50239590

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201480075991.8A Pending CN106029944A (zh) 2014-02-21 2014-02-21 用于薄膜处理应用的装置和方法

Country Status (6)

Country Link
US (1) US10066291B2 (enExample)
EP (1) EP3108031A1 (enExample)
JP (1) JP6546930B2 (enExample)
KR (1) KR20160124846A (enExample)
CN (1) CN106029944A (enExample)
WO (1) WO2015124207A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109415804A (zh) * 2017-06-14 2019-03-01 应用材料公司 用于涂覆柔性基板的沉积设备
CN112334596A (zh) * 2018-06-14 2021-02-05 应用材料公司 用于导引柔性基板的滚轴装置、用于传送柔性基板的滚轴装置的用途、真空处理设备及处理柔性基板的方法
CN117460858A (zh) * 2021-05-21 2024-01-26 应用材料公司 用于制造复合膜的设备和方法

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109477203A (zh) * 2016-07-01 2019-03-15 应用材料公司 用于涂布柔性基板的沉积设备和涂布柔性基板的方法
JP6768087B2 (ja) * 2017-11-28 2020-10-14 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ フレキシブル基板を被覆するための堆積装置、フレキシブル基板を被覆する方法、及び被覆を有するフレキシブル基板
JP7285430B2 (ja) * 2019-05-30 2023-06-02 住友金属鉱山株式会社 真空成膜装置と真空成膜方法
US20210126247A1 (en) * 2019-10-28 2021-04-29 Applied Materials, Inc. Dielectric coated lithium metal anode
EP4384648A1 (en) 2021-08-12 2024-06-19 Applied Materials, Inc. Evaporator for effective surface area evaporation
CN114381695A (zh) * 2021-12-31 2022-04-22 重庆金美新材料科技有限公司 一种薄膜生产线和薄膜生产方法
CN115893068B (zh) * 2022-08-09 2023-11-10 安徽鼎宏橡塑科技股份有限公司 一种防止飞絮堵塞的纺织加工用传输辊

Citations (5)

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JP2000293847A (ja) * 1999-04-09 2000-10-20 Victor Co Of Japan Ltd 磁気記録媒体の製造装置
JP2003132737A (ja) * 2001-10-30 2003-05-09 Mitsui Chemicals Inc 保護フィルム付き透明導電性フィルム、及びそれを用いたディスプレイ用光学フィルター、及びその製造方法
CN101501237A (zh) * 2006-11-28 2009-08-05 株式会社爱发科 卷绕式真空成膜方法及卷绕式真空成膜装置
JP2011127188A (ja) * 2009-12-18 2011-06-30 Fuji Electric Co Ltd Ｃｖｄ成膜装置
CN103748259A (zh) * 2011-04-05 2014-04-23 拜耳东南亚私人有限公司 用于多层连续卷对卷式涂布的方法

Family Cites Families (5)

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Publication number Priority date Publication date Assignee Title
JP2002020863A (ja) * 2000-05-01 2002-01-23 Canon Inc 堆積膜の形成方法及び形成装置、及び基板処理方法
JP4103368B2 (ja) * 2001-10-23 2008-06-18 東レ株式会社 金属酸化物膜つきフィルムの製造方法および製造装置
US20050145326A1 (en) * 2004-01-05 2005-07-07 Eastman Kodak Company Method of making an OLED device
JP4339137B2 (ja) * 2004-01-22 2009-10-07 積水化成品工業株式会社 シート状物用除塵装置
EP1921180A4 (en) * 2005-08-31 2010-03-17 Konica Minolta Holdings Inc PLASMA DISCHARGE TREATMENT DEVICE AND METHOD FOR MANUFACTURING GAS PROTECTION FILM

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000293847A (ja) * 1999-04-09 2000-10-20 Victor Co Of Japan Ltd 磁気記録媒体の製造装置
JP2003132737A (ja) * 2001-10-30 2003-05-09 Mitsui Chemicals Inc 保護フィルム付き透明導電性フィルム、及びそれを用いたディスプレイ用光学フィルター、及びその製造方法
CN101501237A (zh) * 2006-11-28 2009-08-05 株式会社爱发科 卷绕式真空成膜方法及卷绕式真空成膜装置
JP2011127188A (ja) * 2009-12-18 2011-06-30 Fuji Electric Co Ltd Ｃｖｄ成膜装置
CN103748259A (zh) * 2011-04-05 2014-04-23 拜耳东南亚私人有限公司 用于多层连续卷对卷式涂布的方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109415804A (zh) * 2017-06-14 2019-03-01 应用材料公司 用于涂覆柔性基板的沉积设备
CN112334596A (zh) * 2018-06-14 2021-02-05 应用材料公司 用于导引柔性基板的滚轴装置、用于传送柔性基板的滚轴装置的用途、真空处理设备及处理柔性基板的方法
CN112334596B (zh) * 2018-06-14 2023-10-20 应用材料公司 用于导引柔性基板的滚轴装置、用于传送柔性基板的滚轴装置的用途、真空处理设备及处理柔性基板的方法
CN117460858A (zh) * 2021-05-21 2024-01-26 应用材料公司 用于制造复合膜的设备和方法

Also Published As

Publication number Publication date
JP2017507247A (ja) 2017-03-16
EP3108031A1 (en) 2016-12-28
US10066291B2 (en) 2018-09-04
JP6546930B2 (ja) 2019-07-17
KR20160124846A (ko) 2016-10-28
US20170067149A1 (en) 2017-03-09
WO2015124207A1 (en) 2015-08-27

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Application publication date: 20161012