KR20160124846A - 얇은-필름 프로세싱 어플리케이션들을 위한 장치 및 방법 - Google Patents

얇은-필름 프로세싱 어플리케이션들을 위한 장치 및 방법 Download PDF

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Publication number
KR20160124846A
KR20160124846A KR1020167025821A KR20167025821A KR20160124846A KR 20160124846 A KR20160124846 A KR 20160124846A KR 1020167025821 A KR1020167025821 A KR 1020167025821A KR 20167025821 A KR20167025821 A KR 20167025821A KR 20160124846 A KR20160124846 A KR 20160124846A
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KR
South Korea
Prior art keywords
flexible substrate
adhesive roll
coating
deposition
cleaning unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020167025821A
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English (en)
Korean (ko)
Inventor
토마스 데피슈
Original Assignee
어플라이드 머티어리얼스, 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 어플라이드 머티어리얼스, 인코포레이티드 filed Critical 어플라이드 머티어리얼스, 인코포레이티드
Publication of KR20160124846A publication Critical patent/KR20160124846A/ko
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5873—Removal of material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3321—CVD [Chemical Vapor Deposition]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/335—Cleaning

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Advancing Webs (AREA)
  • Feeding Of Articles By Means Other Than Belts Or Rollers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
KR1020167025821A 2014-02-21 2014-02-21 얇은-필름 프로세싱 어플리케이션들을 위한 장치 및 방법 Ceased KR20160124846A (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2014/053460 WO2015124207A1 (en) 2014-02-21 2014-02-21 Apparatus and method for thin-film processing applications

Publications (1)

Publication Number Publication Date
KR20160124846A true KR20160124846A (ko) 2016-10-28

Family

ID=50239590

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167025821A Ceased KR20160124846A (ko) 2014-02-21 2014-02-21 얇은-필름 프로세싱 어플리케이션들을 위한 장치 및 방법

Country Status (6)

Country Link
US (1) US10066291B2 (enExample)
EP (1) EP3108031A1 (enExample)
JP (1) JP6546930B2 (enExample)
KR (1) KR20160124846A (enExample)
CN (1) CN106029944A (enExample)
WO (1) WO2015124207A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190065231A (ko) * 2017-11-28 2019-06-11 어플라이드 머티어리얼스, 인코포레이티드 가요성 기판을 코팅하기 위한 증착 장치, 가요성 기판을 코팅하는 방법, 및 코팅을 갖는 가요성 기판
CN115893068A (zh) * 2022-08-09 2023-04-04 南通万富佳纺织有限公司 一种防止飞絮堵塞的纺织加工用传输辊

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109477203A (zh) * 2016-07-01 2019-03-15 应用材料公司 用于涂布柔性基板的沉积设备和涂布柔性基板的方法
WO2018228683A1 (en) * 2017-06-14 2018-12-20 Applied Materials, Inc. Deposition apparatus for coating a flexible substrate and method of coating a flexible substrate
WO2019238236A1 (en) * 2018-06-14 2019-12-19 Applied Materials, Inc. Roller device for guiding a flexible substrate, use of a roller device for transporting a flexible substrate, vacuum processing apparatus, and method of processing a flexible substrate
JP7285430B2 (ja) * 2019-05-30 2023-06-02 住友金属鉱山株式会社 真空成膜装置と真空成膜方法
US20210126247A1 (en) * 2019-10-28 2021-04-29 Applied Materials, Inc. Dielectric coated lithium metal anode
WO2022242879A1 (en) * 2021-05-21 2022-11-24 Applied Materials, Inc. Apparatus and method for manufacturing a composite film
EP4384648A1 (en) 2021-08-12 2024-06-19 Applied Materials, Inc. Evaporator for effective surface area evaporation
CN114381695A (zh) * 2021-12-31 2022-04-22 重庆金美新材料科技有限公司 一种薄膜生产线和薄膜生产方法

Family Cites Families (10)

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Publication number Priority date Publication date Assignee Title
JP2000293847A (ja) * 1999-04-09 2000-10-20 Victor Co Of Japan Ltd 磁気記録媒体の製造装置
JP2002020863A (ja) * 2000-05-01 2002-01-23 Canon Inc 堆積膜の形成方法及び形成装置、及び基板処理方法
JP4103368B2 (ja) * 2001-10-23 2008-06-18 東レ株式会社 金属酸化物膜つきフィルムの製造方法および製造装置
JP2003132737A (ja) * 2001-10-30 2003-05-09 Mitsui Chemicals Inc 保護フィルム付き透明導電性フィルム、及びそれを用いたディスプレイ用光学フィルター、及びその製造方法
US20050145326A1 (en) * 2004-01-05 2005-07-07 Eastman Kodak Company Method of making an OLED device
JP4339137B2 (ja) * 2004-01-22 2009-10-07 積水化成品工業株式会社 シート状物用除塵装置
EP1921180A4 (en) * 2005-08-31 2010-03-17 Konica Minolta Holdings Inc PLASMA DISCHARGE TREATMENT DEVICE AND METHOD FOR MANUFACTURING GAS PROTECTION FILM
JP5061119B2 (ja) * 2006-11-28 2012-10-31 株式会社アルバック 巻取式真空成膜装置の運転方法および巻取式真空成膜装置
JP2011127188A (ja) * 2009-12-18 2011-06-30 Fuji Electric Co Ltd Ｃｖｄ成膜装置
EP2508646A1 (en) * 2011-04-05 2012-10-10 Bayer Material Science AG A process for multi-layer continuous roll-to-roll coating

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190065231A (ko) * 2017-11-28 2019-06-11 어플라이드 머티어리얼스, 인코포레이티드 가요성 기판을 코팅하기 위한 증착 장치, 가요성 기판을 코팅하는 방법, 및 코팅을 갖는 가요성 기판
CN115893068A (zh) * 2022-08-09 2023-04-04 南通万富佳纺织有限公司 一种防止飞絮堵塞的纺织加工用传输辊
CN115893068B (zh) * 2022-08-09 2023-11-10 安徽鼎宏橡塑科技股份有限公司 一种防止飞絮堵塞的纺织加工用传输辊

Also Published As

Publication number Publication date
JP2017507247A (ja) 2017-03-16
EP3108031A1 (en) 2016-12-28
US10066291B2 (en) 2018-09-04
CN106029944A (zh) 2016-10-12
JP6546930B2 (ja) 2019-07-17
US20170067149A1 (en) 2017-03-09
WO2015124207A1 (en) 2015-08-27

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