JP6514568B2 - ジアルキル亜鉛部分加水分解物含有溶液及びこの溶液を用いる酸化亜鉛薄膜の製造方法 - Google Patents
ジアルキル亜鉛部分加水分解物含有溶液及びこの溶液を用いる酸化亜鉛薄膜の製造方法 Download PDFInfo
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- JP6514568B2 JP6514568B2 JP2015101817A JP2015101817A JP6514568B2 JP 6514568 B2 JP6514568 B2 JP 6514568B2 JP 2015101817 A JP2015101817 A JP 2015101817A JP 2015101817 A JP2015101817 A JP 2015101817A JP 6514568 B2 JP6514568 B2 JP 6514568B2
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- Prior art keywords
- zinc
- dialkyl
- solvent
- solution
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 title claims description 104
- 239000011701 zinc Substances 0.000 title claims description 90
- 229910052725 zinc Inorganic materials 0.000 title claims description 88
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 title claims description 86
- 239000010409 thin film Substances 0.000 title claims description 56
- 239000011787 zinc oxide Substances 0.000 title claims description 52
- 238000004519 manufacturing process Methods 0.000 title description 8
- -1 cyclic amide compound Chemical class 0.000 claims description 71
- 239000002904 solvent Substances 0.000 claims description 58
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 54
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 44
- 229910001868 water Inorganic materials 0.000 claims description 43
- 238000000034 method Methods 0.000 claims description 35
- HQWPLXHWEZZGKY-UHFFFAOYSA-N diethylzinc Chemical compound CC[Zn]CC HQWPLXHWEZZGKY-UHFFFAOYSA-N 0.000 claims description 33
- 239000000203 mixture Substances 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 23
- 150000001875 compounds Chemical class 0.000 claims description 16
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 12
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims description 10
- 238000002834 transmittance Methods 0.000 claims description 10
- 238000009835 boiling Methods 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 8
- 229930195733 hydrocarbon Natural products 0.000 claims description 8
- 239000004215 Carbon black (E152) Substances 0.000 claims description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 150000001408 amides Chemical group 0.000 claims description 5
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 claims description 4
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 claims description 4
- 150000002430 hydrocarbons Chemical class 0.000 claims description 4
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 claims description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 claims description 3
- 150000002894 organic compounds Chemical class 0.000 claims description 3
- GUVUOGQBMYCBQP-UHFFFAOYSA-N dmpu Chemical compound CN1CCCN(C)C1=O GUVUOGQBMYCBQP-UHFFFAOYSA-N 0.000 claims description 2
- 235000016804 zinc Nutrition 0.000 description 78
- 239000000243 solution Substances 0.000 description 69
- 239000010408 film Substances 0.000 description 35
- 238000006460 hydrolysis reaction Methods 0.000 description 17
- 238000000576 coating method Methods 0.000 description 14
- 238000001035 drying Methods 0.000 description 14
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- 230000032683 aging Effects 0.000 description 12
- 230000007062 hydrolysis Effects 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 11
- 239000007787 solid Substances 0.000 description 10
- 238000005102 attenuated total reflection Methods 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- 239000011521 glass Substances 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- 238000001228 spectrum Methods 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 238000001816 cooling Methods 0.000 description 5
- 125000004122 cyclic group Chemical group 0.000 description 5
- 239000011261 inert gas Substances 0.000 description 5
- 238000002329 infrared spectrum Methods 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 4
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- 229910007542 Zn OH Inorganic materials 0.000 description 4
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 4
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 4
- 238000003618 dip coating Methods 0.000 description 4
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 4
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 4
- 239000005416 organic matter Substances 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- 238000005979 thermal decomposition reaction Methods 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- IIEWJVIFRVWJOD-UHFFFAOYSA-N ethylcyclohexane Chemical compound CCC1CCCCC1 IIEWJVIFRVWJOD-UHFFFAOYSA-N 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000005118 spray pyrolysis Methods 0.000 description 3
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 2
- WNXJIVFYUVYPPR-UHFFFAOYSA-N 1,3-dioxolane Chemical compound C1COCO1 WNXJIVFYUVYPPR-UHFFFAOYSA-N 0.000 description 2
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 2
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 2
- KIAMPLQEZAMORJ-UHFFFAOYSA-N 1-ethoxy-2-[2-(2-ethoxyethoxy)ethoxy]ethane Chemical compound CCOCCOCCOCCOCC KIAMPLQEZAMORJ-UHFFFAOYSA-N 0.000 description 2
- CRWNQZTZTZWPOF-UHFFFAOYSA-N 2-methyl-4-phenylpyridine Chemical compound C1=NC(C)=CC(C=2C=CC=CC=2)=C1 CRWNQZTZTZWPOF-UHFFFAOYSA-N 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 2
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 2
- 239000002033 PVDF binder Substances 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 239000004734 Polyphenylene sulfide Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- 230000000844 anti-bacterial effect Effects 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 230000001877 deodorizing effect Effects 0.000 description 2
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 2
- 230000008034 disappearance Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000005038 ethylene vinyl acetate Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 239000003350 kerosene Substances 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- SKTCDJAMAYNROS-UHFFFAOYSA-N methoxycyclopentane Chemical compound COC1CCCC1 SKTCDJAMAYNROS-UHFFFAOYSA-N 0.000 description 2
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 235000010755 mineral Nutrition 0.000 description 2
- 239000003595 mist Substances 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000003208 petroleum Substances 0.000 description 2
- 230000001699 photocatalysis Effects 0.000 description 2
- 229920002493 poly(chlorotrifluoroethylene) Polymers 0.000 description 2
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 229920002620 polyvinyl fluoride Polymers 0.000 description 2
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000411 transmission spectrum Methods 0.000 description 2
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 2
- LEEANUDEDHYDTG-UHFFFAOYSA-N 1,2-dimethoxypropane Chemical compound COCC(C)OC LEEANUDEDHYDTG-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- GDXHBFHOEYVPED-UHFFFAOYSA-N 1-(2-butoxyethoxy)butane Chemical compound CCCCOCCOCCCC GDXHBFHOEYVPED-UHFFFAOYSA-N 0.000 description 1
- XJSGGBRZXRTZQN-MDZDMXLPSA-N 1-[(e)-2-butoxyethenoxy]butane Chemical group CCCCO\C=C\OCCCC XJSGGBRZXRTZQN-MDZDMXLPSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- JHUUPUMBZGWODW-UHFFFAOYSA-N 3,6-dihydro-1,2-dioxine Chemical compound C1OOCC=C1 JHUUPUMBZGWODW-UHFFFAOYSA-N 0.000 description 1
- LAJCGGVHZQXHDU-UHFFFAOYSA-N COCC(C)OC.CC(COC(C)CO)O Chemical compound COCC(C)OC.CC(COC(C)CO)O LAJCGGVHZQXHDU-UHFFFAOYSA-N 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- 229920001774 Perfluoroether Polymers 0.000 description 1
- 229920012266 Poly(ether sulfone) PES Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- FMRLDPWIRHBCCC-UHFFFAOYSA-L Zinc carbonate Chemical compound [Zn+2].[O-]C([O-])=O FMRLDPWIRHBCCC-UHFFFAOYSA-L 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 238000010908 decantation Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- KYHHMFUFEIHUHB-UHFFFAOYSA-N di-tert-butylzinc Chemical compound CC(C)(C)[Zn]C(C)(C)C KYHHMFUFEIHUHB-UHFFFAOYSA-N 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- FRLYMSHUDNORBC-UHFFFAOYSA-N diisopropylzinc Chemical compound [Zn+2].C[CH-]C.C[CH-]C FRLYMSHUDNORBC-UHFFFAOYSA-N 0.000 description 1
- AXAZMDOAUQTMOW-UHFFFAOYSA-N dimethylzinc Chemical compound C[Zn]C AXAZMDOAUQTMOW-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 1
- 235000013312 flour Nutrition 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000005355 lead glass Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 235000015096 spirit Nutrition 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- ABIAVOPWHAWUGT-UHFFFAOYSA-N zinc;2-methanidylpropane Chemical compound [Zn+2].CC(C)[CH2-].CC(C)[CH2-] ABIAVOPWHAWUGT-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G9/00—Compounds of zinc
- C01G9/02—Oxides; Hydroxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/7869—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
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Description
[1]
下記一般式(1)で表されるジアルキル亜鉛の部分加水分解物及び溶媒を含有する、ジアルキル亜鉛部分加水分解物含有溶液であって、
前記溶媒は、沸点が160℃以上であり、下記一般式(2)で示すアミド構造を有し、かつ、環状構造を有する有機化合物(以下、環状アミド化合物と呼ぶ)であり、
前記部分加水分解物は、前記ジアルキル亜鉛中の亜鉛に対して、モル比が0.4〜0.9の範囲の水で加水分解したものである、
前記溶液。
前記環状アミド化合物は、沸点が160℃以上の化合物である、[1]に記載の溶液。
[3]
ジアルキル亜鉛部分加水分解物中の亜鉛に対してモル比で1以上の前記環状アミド化合物を含有する、[1]又は[2]に記載の溶液。
[4]
前記環状アミド化合物は、N−メチル−2−ピロリドン、又は1,3−ジメチル−イミダゾリジノン、1,3−ジメチル−3,4,5,6−テトラヒドロ−2(1H)−ピリミジノン、又はそれらの混合物である、[1]〜[3]のいずれか1項に記載の溶液。
[5]
前記ジアルキル亜鉛がジエチル亜鉛である、[1]〜[4]のいずれか1項に記載の溶液。
[6]
前記環状アミド化合物以外の溶媒をさらに含み、環状アミド化合物以外の溶媒は、脂肪族炭化水素、脂環式炭化水素、芳香族炭化水素、炭化水素系溶媒、エーテル化合物、エチレングリコールジアルキルエーテル化合物、ジエチレングリコールジアルキルエーテル化合物、トリエチレングリコールジアルキルエーテル化合物、プロピレングリコールジアルキル化合物、ジプロピレングリコールジアルキルおよびトリプロピレングリコールジアルキル化合物から成る群から選ばれる少なくとも1種の溶媒である、[1]〜[5]のいずれか1項に記載の溶液。
[7]
[1]〜[6]のいずれか1項に記載のジアルキル亜鉛部分加水分解物含有溶液を基材に塗布し、次いで300℃以下の温度で基材を加熱することにより酸化亜鉛薄膜を得ることを特徴とする、酸化亜鉛薄膜の製造方法。
[8]
前記塗布を空気中で行うことを特徴とする、[7]に記載の製造方法。
[9]
前記酸化亜鉛薄膜は、550nmの可視光線に対して80%以上の透過率を有する、[7]又は[8]に記載の製造方法。
本発明の第一の態様は、一般式(1)で表されるジアルキル亜鉛の部分加水分解物及び溶媒を含有する、ジアルキル亜鉛部分加水分解物含有溶液である。前記溶媒は、沸点が160℃以上であり、下記一般式(2)で示すアミド構造を有し、かつ、環状構造を有する有機化合物(環状アミド化合物と呼ぶことがある)である。さらに、前記部分加水分解物は、前記ジアルキル亜鉛中の亜鉛に対して、モル比が0.6〜0.9の範囲の水で加水分解したものである。前記部分加水分解物は、前記ジアルキル亜鉛と前記環状アミド化合物との混合物に対して水を添加してジアルキル亜鉛を加水分解することで得られる物であることが、加水分解の操作により、本発明のジアルキル亜鉛加水分解物含有溶液を得ることができることから適当である。
アルキル基としては、メチル基、エチル基、イソプロピル基、イソブチル基、tert−ブチル基を挙げることができるが、これらに限定される意図ではない。
本発明の第2の態様は、酸化亜鉛薄膜の製造方法であり、この方法は、前記本発明のジアルキル亜鉛部分加水分解物含有溶液を基材に塗布することを含む、酸化亜鉛薄膜を得る方法である。
本発明のジアルキル亜鉛含有溶液、ジアルキル亜鉛部分加水分解物含有溶液をC6D6に溶解させた後、NMR装置(JEOL RESONANCE社製「JNM−ECA500」)にて1H−NMR測定を実施した。
N−メチル−2−ピロリドン(以下、NMP)5.0gにジエチル亜鉛(東ソー・ファインケム社製)2.15gを25℃で加え、十分攪拌することにより30質量%のジエチル亜鉛NMP溶液を得た。NMRスペクトルは図1のようになり、24時間後再測定したところ全く同じスペクトルが得られた。
ジエチル亜鉛
NMP90.0gにジエチル亜鉛(東ソー・ファインケム社製)10.0gを25℃で加え、十分攪拌した(NMP/ジエチル亜鉛(モル比)=11.2)。−15℃に冷却した後、11.5質量%水含有NMP溶液11.6g([水]/[ジエチル亜鉛]=0.6)を90分かけて滴下して加えた。−15℃で30分熟成した後、25℃まで昇温した後5時間攪拌を続けることにより熟成反応を行い、薄黄色透明なジエチル亜鉛部分加水分解組成物NMP溶液を得た。空気(湿度約40%)中に少量取り出したところ自然発火性はなかった。NMR測定したところ図2のようなスペクトルが得られ、実施例1のスペクトルと比較してジエチル亜鉛のエチル基由来のピークの消失したことから、原料のジエチル亜鉛の消失が確認された。
NMP90.0gにジエチル亜鉛(東ソー・ファインケム社製)10.0gを25℃で加え、十分攪拌した(NMP/ジエチル亜鉛(モル比)=11.2)。−15℃に冷却した後、11.5質量%水含有NMP溶液15.4g([水]/[ジエチル亜鉛]=0.8)を90分かけて滴下して加えた。−15℃で30分熟成した後、25℃まで昇温した後5時間攪拌を続けることにより熟成反応を行い、薄黄色透明なジエチル亜鉛部分加水分解組成物NMP溶液を得た。空気(湿度約40%)中に少量取り出したところ自然発火性はなかった。
NMP80.0gに、混合キシレン10.0g、ジエチル亜鉛(東ソー・ファインケム社製)10.0gを25℃で加え、十分攪拌した(NMP/ジエチル亜鉛(モル比)=9.97)。−15℃に冷却した後、11.5質量%水含有NMP溶液11.5g([水]/[ジエチル亜鉛]=0.6)を90分間かけて滴下して加えた。−15℃で30分熟成した後、25℃まで昇温した後5時間攪拌を続けることにより熟成反応を行い、薄黄色透明なジエチル亜鉛部分加水分解組成物NMPキシレン混合溶液を得た。空気(湿度約40%)中に少量取り出したところ自然発火性はなかった。
NMP90.0gにジエチル亜鉛(東ソー・ファインケム社製)10.0gを25℃で加え、十分攪拌した(NMP/ジエチル亜鉛(モル比)=11.2)。−15℃に冷却した後、11.5質量%水NMP溶液19.4g([水]/[ジエチル亜鉛]=1.0)を90分かけて滴下して加えた。−15℃で30分熟成した後、25℃まで昇温した後5時間攪拌を続けることにより熟成反応を行い、薄黄色透明なジエチル亜鉛部分加水分解組成物NMP溶液を得た。しかし、数日以内にゲル化し、薄黄色透明な固体になり、塗布困難な組成物となった。
実施例1で得られたジエチル亜鉛部分加水分解組成物NMP溶液を、空気雰囲気下、15mm角のガラス基板(コーニング社製、EagleXG)上に100μl滴下し、スピンコーターにより2000rpm、20秒間スピンして塗布した。100℃で5分乾燥を兼ねた加熱を実施することで薄膜を形成させた。
実施例2で得られたジエチル亜鉛部分加水分解組成物NMP溶液を滴下した以外は実施例4と同様にして薄膜を形成させた。
テトラヒドロフラン90.0gにジエチル亜鉛(東ソー・ファインケム社製)10.0gを25℃で加え、十分攪拌した。−15℃に冷却した後、11.5質量%水含有テトラヒドロフラン(以下、THF)溶液11.5g([水]/[ジエチル亜鉛]=0.6)を90分かけて滴下して加えた。−15℃で30分熟成した後、25℃まで昇温した後5時間攪拌を続けることにより熟成反応を行い、薄黄色透明なジエチル亜鉛部分加水分解組成物THF混合溶液を得た。
Claims (8)
- 下記一般式(1)で表されるジアルキル亜鉛の部分加水分解物及び溶媒を含有する、ジアルキル亜鉛部分加水分解物含有溶液であって、
前記溶媒は、下記一般式(2)で示すアミド構造を有し、環状構造を有し、かつ沸点が160℃以上、245℃以下である有機化合物(以下、環状アミド化合物と呼ぶ)であり、
前記部分加水分解物は、前記ジアルキル亜鉛中の亜鉛に対して、モル比が0.4〜0.9の範囲の水で加水分解したものである、
前記溶液。
- ジアルキル亜鉛部分加水分解物中の亜鉛に対してモル比で1以上の前記環状アミド化合物を含有する、請求項1に記載の溶液。
- 前記環状アミド化合物は、N−メチル−2−ピロリドン、又は1,3−ジメチル−イミダゾリジノン、1,3−ジメチル−3,4,5,6−テトラヒドロ−2(1H)−ピリミジノン、又はそれらの混合物である、請求項1又は2に記載の溶液。
- 前記ジアルキル亜鉛がジエチル亜鉛である、請求項1〜3のいずれか1項に記載の溶液。
- 前記環状アミド化合物以外の溶媒をさらに含み、環状アミド化合物以外の溶媒は、脂肪族炭化水素、脂環式炭化水素、芳香族炭化水素、炭化水素系溶媒、エーテル化合物、エチレングリコールジアルキルエーテル化合物、ジエチレングリコールジアルキルエーテル化合物、トリエチレングリコールジアルキルエーテル化合物、プロピレングリコールジアルキル化合物、ジプロピレングリコールジアルキルおよびトリプロピレングリコールジアルキル化合物から成る群から選ばれる少なくとも1種の溶媒である、請求項1〜4のいずれか1項に記載の溶液。
- 請求項1〜5のいずれか1項に記載のジアルキル亜鉛部分加水分解物含有溶液を基材に塗布し、次いで300℃以下の温度で基材を加熱することにより酸化亜鉛薄膜を得ることを特徴とする、酸化亜鉛薄膜の製造方法。
- 前記塗布を空気中で行うことを特徴とする、請求項6に記載の製造方法。
- 前記酸化亜鉛薄膜は、550nmの可視光線に対して80%以上の透過率を有する、請求項6又は請求項7に記載の製造方法。
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PCT/JP2016/063823 WO2016185939A1 (ja) | 2015-05-19 | 2016-05-10 | ジアルキル亜鉛部分加水分解物含有溶液及びこの溶液を用いる酸化亜鉛薄膜の製造方法 |
EP16796333.9A EP3299341A4 (en) | 2015-05-19 | 2016-05-10 | SOLUTION CONTAINING PARTIAL ZINC DIALKYL HYDROLYSAT AND PROCESS FOR PRODUCING ZINC OXIDE THIN FILM USING THE SOLUTION |
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US15/574,746 US10381488B2 (en) | 2015-05-19 | 2016-05-10 | Dialkylzinc partial hydrolysate-containing solution and method of production of zinc oxide thin film using the solution |
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