JP6443380B2 - イットリウム系フッ化物溶射皮膜、及び該溶射皮膜を含む耐食性皮膜 - Google Patents

イットリウム系フッ化物溶射皮膜、及び該溶射皮膜を含む耐食性皮膜 Download PDF

Info

Publication number
JP6443380B2
JP6443380B2 JP2016079258A JP2016079258A JP6443380B2 JP 6443380 B2 JP6443380 B2 JP 6443380B2 JP 2016079258 A JP2016079258 A JP 2016079258A JP 2016079258 A JP2016079258 A JP 2016079258A JP 6443380 B2 JP6443380 B2 JP 6443380B2
Authority
JP
Japan
Prior art keywords
yttrium
coating
sprayed coating
sprayed
powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2016079258A
Other languages
English (en)
Japanese (ja)
Other versions
JP2017190475A5 (ja
JP2017190475A (ja
Inventor
典明 濱谷
典明 濱谷
康 高井
康 高井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP2016079258A priority Critical patent/JP6443380B2/ja
Priority to US15/479,451 priority patent/US20170292182A1/en
Priority to TW110107991A priority patent/TWI745247B/zh
Priority to TW106111744A priority patent/TWI724150B/zh
Priority to KR1020170046504A priority patent/KR20170116962A/ko
Priority to CN201710234426.7A priority patent/CN107287545B/zh
Priority to CN202110108214.0A priority patent/CN112779488B/zh
Publication of JP2017190475A publication Critical patent/JP2017190475A/ja
Publication of JP2017190475A5 publication Critical patent/JP2017190475A5/ja
Application granted granted Critical
Publication of JP6443380B2 publication Critical patent/JP6443380B2/ja
Priority to US17/101,137 priority patent/US20210079509A1/en
Priority to KR1020220015955A priority patent/KR102501039B1/ko
Priority to KR1020220092904A priority patent/KR20220110695A/ko
Priority to KR1020230018503A priority patent/KR102702566B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • C23C4/11—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/126—Detonation spraying
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/134—Plasma spraying

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Drying Of Semiconductors (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Analytical Chemistry (AREA)
JP2016079258A 2016-04-12 2016-04-12 イットリウム系フッ化物溶射皮膜、及び該溶射皮膜を含む耐食性皮膜 Active JP6443380B2 (ja)

Priority Applications (11)

Application Number Priority Date Filing Date Title
JP2016079258A JP6443380B2 (ja) 2016-04-12 2016-04-12 イットリウム系フッ化物溶射皮膜、及び該溶射皮膜を含む耐食性皮膜
US15/479,451 US20170292182A1 (en) 2016-04-12 2017-04-05 Yttrium fluoride sprayed coating, spray material therefor, and corrosion resistant coating including sprayed coating
TW110107991A TWI745247B (zh) 2016-04-12 2017-04-07 經氟化釔噴塗的塗層、用於彼之噴塗材料、及含該噴塗塗層的耐腐蝕性塗層
TW106111744A TWI724150B (zh) 2016-04-12 2017-04-07 經氟化釔噴塗的塗層、用於彼之噴塗材料、及含該噴塗塗層的耐腐蝕性塗層
KR1020170046504A KR20170116962A (ko) 2016-04-12 2017-04-11 이트륨 플루오라이드 분무된 코팅, 이를 위한 분무 물질, 및 분무된 코팅을 포함하는 내식성 코팅
CN202110108214.0A CN112779488B (zh) 2016-04-12 2017-04-12 氟化钇喷涂涂层、用于其的喷涂材料以及包括喷涂涂层的抗腐蚀涂层
CN201710234426.7A CN107287545B (zh) 2016-04-12 2017-04-12 氟化钇喷涂涂层、用于其的喷涂材料以及包括喷涂涂层的抗腐蚀涂层
US17/101,137 US20210079509A1 (en) 2016-04-12 2020-11-23 Yttrium fluoride sprayed coating, spray material therefor, and corrosion resistant coating including sprayed coating
KR1020220015955A KR102501039B1 (ko) 2016-04-12 2022-02-08 이트륨 플루오라이드 분무된 코팅, 이를 위한 분무 물질, 및 분무된 코팅을 포함하는 내식성 코팅
KR1020220092904A KR20220110695A (ko) 2016-04-12 2022-07-27 이트륨 플루오라이드 분무된 코팅, 이를 위한 분무 물질, 및 분무된 코팅을 포함하는 내식성 코팅
KR1020230018503A KR102702566B1 (ko) 2016-04-12 2023-02-13 이트륨 플루오라이드 분무된 코팅, 이를 위한 분무 물질, 및 분무된 코팅을 포함하는 내식성 코팅

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016079258A JP6443380B2 (ja) 2016-04-12 2016-04-12 イットリウム系フッ化物溶射皮膜、及び該溶射皮膜を含む耐食性皮膜

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018194918A Division JP6699701B2 (ja) 2018-10-16 2018-10-16 イットリウム系フッ化物溶射皮膜、該溶射皮膜を形成するための溶射材料、該溶射皮膜の形成方法、及び該溶射皮膜を含む耐食性皮膜

Publications (3)

Publication Number Publication Date
JP2017190475A JP2017190475A (ja) 2017-10-19
JP2017190475A5 JP2017190475A5 (ja) 2017-11-30
JP6443380B2 true JP6443380B2 (ja) 2018-12-26

Family

ID=59999244

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016079258A Active JP6443380B2 (ja) 2016-04-12 2016-04-12 イットリウム系フッ化物溶射皮膜、及び該溶射皮膜を含む耐食性皮膜

Country Status (5)

Country Link
US (2) US20170292182A1 (ko)
JP (1) JP6443380B2 (ko)
KR (3) KR20170116962A (ko)
CN (2) CN107287545B (ko)
TW (2) TWI724150B (ko)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD839956S1 (en) 2016-02-04 2019-02-05 Ccl Label, Inc. Label sheets
USD841087S1 (en) 2016-11-17 2019-02-19 Ccl Label, Inc. Label sheet with a feed edge assembly
USD853480S1 (en) 2017-05-10 2019-07-09 Ccl Label, Inc. Label sheet assembly
USD879875S1 (en) 2016-03-22 2020-03-31 Ccl Label, Inc. Label sheet assembly with improved printer feeding
US10636329B2 (en) 2015-10-23 2020-04-28 Ccl Label, Inc. Label sheet assembly with improved printer feeding

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107109611B (zh) * 2015-02-10 2019-07-26 日本钇股份有限公司 成膜用粉末以及成膜用材料
US10538845B2 (en) * 2016-06-22 2020-01-21 Ngk Spark Plug Co., Ltd. Yttrium oxyfluoride sprayed coating and method for producing the same, and sprayed member
US12024439B2 (en) 2016-07-14 2024-07-02 Shin-Etsu Chemical Co., Ltd. Slurry for suspension plasma spraying, method for forming rare earth acid fluoride sprayed film, and spraying member
CN110382730B (zh) * 2017-03-01 2022-09-23 信越化学工业株式会社 喷镀被膜、喷镀用粉、喷镀用粉的制造方法和喷镀被膜的制造方法
JP6857235B2 (ja) * 2017-11-21 2021-04-14 日本碍子株式会社 光導波路構造、蛍光体素子および光導波路構造の製造方法
WO2019132550A1 (ko) * 2017-12-29 2019-07-04 아이원스 주식회사 코팅막의 형성 방법 및 이에 따른 코팅막
JP7122854B2 (ja) * 2018-04-20 2022-08-22 株式会社日立ハイテク プラズマ処理装置およびプラズマ処理装置用部材、またはプラズマ処理装置の製造方法およびプラズマ処理装置用部材の製造方法
JP7147675B2 (ja) * 2018-05-18 2022-10-05 信越化学工業株式会社 溶射材料、及び溶射部材の製造方法
JP7124798B2 (ja) * 2018-07-17 2022-08-24 信越化学工業株式会社 成膜用粉末、皮膜の形成方法、及び成膜用粉末の製造方法
US20200024735A1 (en) * 2018-07-18 2020-01-23 Applied Materials, Inc. Erosion resistant metal fluoride coatings deposited by atomic layer deposition
JP6939853B2 (ja) 2018-08-15 2021-09-22 信越化学工業株式会社 溶射皮膜、溶射皮膜の製造方法、及び溶射部材
KR102686791B1 (ko) 2019-05-22 2024-07-19 어플라이드 머티어리얼스, 인코포레이티드 고온 부식성 환경을 위한 기판 지지부 커버
CN112447548A (zh) * 2019-09-03 2021-03-05 中微半导体设备(上海)股份有限公司 一种半导体处理设备及腔室间传送口结构
CN112908822B (zh) * 2019-12-04 2024-04-05 中微半导体设备(上海)股份有限公司 形成耐等离子体涂层的方法、零部件和等离子体处理装置
WO2021124996A1 (ja) * 2019-12-18 2021-06-24 信越化学工業株式会社 フッ化イットリウム系溶射皮膜、溶射部材、及びフッ化イットリウム系溶射皮膜の製造方法
JP6960062B1 (ja) 2019-12-23 2021-11-05 株式会社日立ハイテク プラズマ処理装置の部品の製造方法及び部品の検査方法
CN113522688B (zh) * 2020-03-30 2022-12-30 中微半导体设备(上海)股份有限公司 耐等离子体腐蚀部件及其制备方法，等离子体处理设备
USD947280S1 (en) 2020-03-31 2022-03-29 Ccl Label, Inc. Label sheet assembly with matrix cuts
KR102284838B1 (ko) * 2020-05-06 2021-08-03 (주)코미코 서스펜션 플라즈마 용사용 슬러리 조성물, 그 제조방법 및 서스펜션 플라즈마 용사 코팅막
USD968509S1 (en) 2020-07-02 2022-11-01 Ccl Label, Inc. Label sheet assembly with raised tactile features
CN112210741A (zh) * 2020-08-27 2021-01-12 沈阳富创精密设备股份有限公司 一种应用于集成电路行业的陶瓷层的制备方法
CN112831744A (zh) * 2020-12-31 2021-05-25 沈阳富创精密设备股份有限公司 一种应用于半导体设备的陶瓷涂层的制备方法
CN113611589B (zh) * 2021-10-08 2021-12-24 中微半导体设备(上海)股份有限公司 零部件、等离子体装置、形成耐腐蚀涂层的方法及其装置
CN114256039B (zh) * 2021-12-21 2024-02-09 苏州众芯联电子材料有限公司 一种干刻下部电极的制作工艺
CN117957641A (zh) 2022-08-30 2024-04-30 株式会社日立高新技术 等离子处理装置、等离子处理装置的内部构件以及等离子处理装置的内部构件的制造方法
CN117626159A (zh) * 2023-11-20 2024-03-01 江苏凯威特斯半导体科技有限公司 一种高纯度y2o3立方相涂层的制备方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1167565B1 (en) * 2000-06-29 2007-03-07 Shin-Etsu Chemical Co., Ltd. Method for thermal spray coating and rare earth oxide powder used therefor
JP3523222B2 (ja) * 2000-07-31 2004-04-26 信越化学工業株式会社 溶射材料およびその製造方法
JP3894313B2 (ja) * 2002-12-19 2007-03-22 信越化学工業株式会社 フッ化物含有膜、被覆部材及びフッ化物含有膜の形成方法
JP4985928B2 (ja) * 2005-10-21 2012-07-25 信越化学工業株式会社 多層コート耐食性部材
US7968205B2 (en) * 2005-10-21 2011-06-28 Shin-Etsu Chemical Co., Ltd. Corrosion resistant multilayer member
US7655328B2 (en) * 2006-04-20 2010-02-02 Shin-Etsu Chemical Co., Ltd. Conductive, plasma-resistant member
JP4905697B2 (ja) * 2006-04-20 2012-03-28 信越化学工業株式会社 導電性耐プラズマ部材
US20090214825A1 (en) * 2008-02-26 2009-08-27 Applied Materials, Inc. Ceramic coating comprising yttrium which is resistant to a reducing plasma
US9017765B2 (en) * 2008-11-12 2015-04-28 Applied Materials, Inc. Protective coatings resistant to reactive plasma processing
JP2011231356A (ja) * 2010-04-26 2011-11-17 Nhk Spring Co Ltd 金属基材の絶縁被膜方法、絶縁被膜金属基材、および、これを用いた半導体製造装置
JP5861612B2 (ja) * 2011-11-10 2016-02-16 信越化学工業株式会社 希土類元素フッ化物粉末溶射材料及び希土類元素フッ化物溶射部材
JP5396672B2 (ja) * 2012-06-27 2014-01-22 日本イットリウム株式会社 溶射材料及びその製造方法
JP5939084B2 (ja) * 2012-08-22 2016-06-22 信越化学工業株式会社 希土類元素オキシフッ化物粉末溶射材料の製造方法
US9869013B2 (en) * 2014-04-25 2018-01-16 Applied Materials, Inc. Ion assisted deposition top coat of rare-earth oxide
JP6388153B2 (ja) * 2014-08-08 2018-09-12 日本イットリウム株式会社 溶射材料
TWI751106B (zh) * 2015-05-08 2022-01-01 日商東京威力科創股份有限公司 熔射用材料、熔射被膜及附熔射被膜之構件
JP6722004B2 (ja) * 2015-05-08 2020-07-15 東京エレクトロン株式会社 溶射用材料、溶射皮膜および溶射皮膜付部材
JP6742341B2 (ja) * 2015-12-28 2020-08-19 日本イットリウム株式会社 成膜用材料

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10636329B2 (en) 2015-10-23 2020-04-28 Ccl Label, Inc. Label sheet assembly with improved printer feeding
US11200817B2 (en) 2015-10-23 2021-12-14 Ccl Label, Inc. Label sheet assembly with improved printer feeding
USD839956S1 (en) 2016-02-04 2019-02-05 Ccl Label, Inc. Label sheets
USD882681S1 (en) 2016-02-04 2020-04-28 Ccl Label, Inc. Label sheets
USD940235S1 (en) 2016-02-04 2022-01-04 Ccl Label, Inc. Label sheets
USD1013775S1 (en) 2016-02-04 2024-02-06 Ccl Label, Inc. Label sheet
USD879875S1 (en) 2016-03-22 2020-03-31 Ccl Label, Inc. Label sheet assembly with improved printer feeding
USD841087S1 (en) 2016-11-17 2019-02-19 Ccl Label, Inc. Label sheet with a feed edge assembly
USD900926S1 (en) 2016-11-17 2020-11-03 Ccl Label, Inc. Label sheet with feed edge assembly
USD961676S1 (en) 2016-11-17 2022-08-23 Ccl Label, Inc. Label sheet with feed edge assembly
USD986319S1 (en) 2016-11-17 2023-05-16 Ccl Label, Inc. Label sheet with a feed edge assembly
USD853480S1 (en) 2017-05-10 2019-07-09 Ccl Label, Inc. Label sheet assembly

Also Published As

Publication number Publication date
TW202126835A (zh) 2021-07-16
TWI724150B (zh) 2021-04-11
KR20230026372A (ko) 2023-02-24
CN107287545B (zh) 2022-07-05
KR102501039B1 (ko) 2023-02-21
KR20220024286A (ko) 2022-03-03
TWI745247B (zh) 2021-11-01
CN112779488B (zh) 2023-06-27
US20170292182A1 (en) 2017-10-12
CN112779488A (zh) 2021-05-11
CN107287545A (zh) 2017-10-24
TW201807217A (zh) 2018-03-01
US20210079509A1 (en) 2021-03-18
KR20170116962A (ko) 2017-10-20
KR20220110695A (ko) 2022-08-09
JP2017190475A (ja) 2017-10-19

Similar Documents

Publication Publication Date Title
JP6443380B2 (ja) イットリウム系フッ化物溶射皮膜、及び該溶射皮膜を含む耐食性皮膜
EP3443136B1 (en) Coated semiconductor processing members having chlorine and fluorine plasma erosion resistance and complex oxide coatings therefor
JP4985928B2 (ja) 多層コート耐食性部材
KR101304082B1 (ko) 내식성 다층 부재
US10840112B2 (en) Coated article and semiconductor chamber apparatus formed from yttrium oxide and zirconium oxide
KR100489172B1 (ko) 이트리아-알루미나 복합 산화물막의 제조 방법,이트리아-알루미나 복합 산화물막, 용사막, 내식성 부재및 저파티클 부재
TWI483291B (zh) 減小曝露於含鹵素電漿下之表面腐蝕速率的方法與設備
JP2017190475A5 (ja) イットリウム系フッ化物溶射皮膜、該溶射皮膜を形成するための溶射材料、及び該溶射皮膜を含む耐食性皮膜
KR20070043670A (ko) 내식성 부재
JP6699701B2 (ja) イットリウム系フッ化物溶射皮膜、該溶射皮膜を形成するための溶射材料、該溶射皮膜の形成方法、及び該溶射皮膜を含む耐食性皮膜
JP2007308794A (ja) 導電性耐プラズマ部材
JP7306490B2 (ja) フッ化イットリウム系溶射皮膜、溶射部材、及びフッ化イットリウム系溶射皮膜の製造方法
JP2003321760A (ja) プラズマ処理容器内部材およびその製造方法
KR102702566B1 (ko) 이트륨 플루오라이드 분무된 코팅, 이를 위한 분무 물질, 및 분무된 코팅을 포함하는 내식성 코팅
KR20240134100A (ko) 이트륨 플루오라이드 분무된 코팅, 이를 위한 분무 물질, 및 분무된 코팅을 포함하는 내식성 코팅
JP2009158938A (ja) ウエハ
JP2001019549A (ja) 耐食性部材及びこれを用いた半導体・液晶製造装置用構成部材

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20171023

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20171023

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20171023

A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20171025

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20180208

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20180227

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180427

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20180621

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20180815

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20181016

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20181030

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20181112

R150 Certificate of patent or registration of utility model

Ref document number: 6443380

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150