JP6406250B2 - 液浸部材、露光装置及びデバイス製造方法 - Google Patents

液浸部材、露光装置及びデバイス製造方法 Download PDF

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Publication number
JP6406250B2
JP6406250B2 JP2015522464A JP2015522464A JP6406250B2 JP 6406250 B2 JP6406250 B2 JP 6406250B2 JP 2015522464 A JP2015522464 A JP 2015522464A JP 2015522464 A JP2015522464 A JP 2015522464A JP 6406250 B2 JP6406250 B2 JP 6406250B2
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liquid
substrate
space
path
immersion
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JP2015528132A (ja
JP2015528132A5 (https=
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真路 佐藤
真路 佐藤
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2015522464A 2012-07-20 2013-07-16 液浸部材、露光装置及びデバイス製造方法 Active JP6406250B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261674078P 2012-07-20 2012-07-20
US61/674,078 2012-07-20
US201361790328P 2013-03-15 2013-03-15
US61/790,328 2013-03-15
PCT/JP2013/069959 WO2014014123A1 (en) 2012-07-20 2013-07-16 Liquid immersion member and exposure apparatus

Publications (3)

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JP2015528132A JP2015528132A (ja) 2015-09-24
JP2015528132A5 JP2015528132A5 (https=) 2016-07-28
JP6406250B2 true JP6406250B2 (ja) 2018-10-17

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JP2015522464A Active JP6406250B2 (ja) 2012-07-20 2013-07-16 液浸部材、露光装置及びデバイス製造方法

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US (3) US9823580B2 (https=)
EP (1) EP2875405B1 (https=)
JP (1) JP6406250B2 (https=)
KR (1) KR102139033B1 (https=)
CN (2) CN104487897B (https=)
HK (1) HK1208914A1 (https=)
TW (3) TWI617894B (https=)
WO (1) WO2014014123A1 (https=)

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JP6369472B2 (ja) 2013-10-08 2018-08-08 株式会社ニコン 液浸部材、露光装置及び露光方法、並びにデバイス製造方法
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CN112286012A (zh) * 2020-10-29 2021-01-29 浙江启尔机电技术有限公司 一种浸液回收系统及采用该系统的浸液回收方法

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US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
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US8610873B2 (en) * 2008-03-17 2013-12-17 Nikon Corporation Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
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US8896806B2 (en) * 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
KR20120113238A (ko) * 2010-01-08 2012-10-12 가부시키가이샤 니콘 액침 부재, 노광 장치, 노광 방법, 및 디바이스 제조 방법
US9323160B2 (en) * 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9823580B2 (en) * 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

Also Published As

Publication number Publication date
CN107422612B (zh) 2020-05-26
CN104487897B (zh) 2017-08-29
US10007189B2 (en) 2018-06-26
TWI700557B (zh) 2020-08-01
TW201925928A (zh) 2019-07-01
US9823580B2 (en) 2017-11-21
WO2014014123A1 (en) 2014-01-23
CN104487897A (zh) 2015-04-01
EP2875405B1 (en) 2020-02-26
TW201809910A (zh) 2018-03-16
US20140022522A1 (en) 2014-01-23
EP2875405A1 (en) 2015-05-27
JP2015528132A (ja) 2015-09-24
HK1206435A1 (en) 2016-01-08
KR102139033B1 (ko) 2020-08-11
TWI617894B (zh) 2018-03-11
TW201405256A (zh) 2014-02-01
KR20150038075A (ko) 2015-04-08
US20180314166A1 (en) 2018-11-01
US20150124230A1 (en) 2015-05-07
US10739683B2 (en) 2020-08-11
TWI661277B (zh) 2019-06-01
CN107422612A (zh) 2017-12-01
HK1208914A1 (en) 2016-03-18

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